公开(公告)号：US20060114958A1

公开(公告)日：2006-06-01

申请号：US11254282

申请日：2005-10-20

Applicant: Fedor Trintchouk ,  Robert Jacques

Inventor： Fedor Trintchouk ,  Robert Jacques

IPC: H01S3/22

CPC classification number: H01S3/1055 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70041 ,  H01S3/08072 ,  H01S3/097 ,  H01S3/10069 ,  H01S3/225

Abstract: A gas discharge laser system bandwidth control mechanism and method of operation for controlling bandwidth in a laser output light pulse generated in the gas discharge laser system is disclosed which may comprise a bandwidth controller which may comprise an active bandwidth adjustment mechanism; a controller actively controlling the active bandwidth adjustment mechanism utilizing an algorithm implementing bandwidth thermal transient correction based upon a model of the impact of laser system operation on the wavefront of the laser light pulse being generated and line narrowed in the laser system as it is incident on the bandwidth adjustment mechanism. The controller algorithm may comprises a function of the power deposition history in at least a portion of an optical train of the gas discharge laser system, e.g., a linear function, e.g., a combination of a plurality of decay functions each comprising a respective decay time constant and a respective coefficient.

Abstract translation: 公开了一种气体放电激光器系统带宽控制机构和用于控制在气体放电激光器系统中产生的激光输出光脉冲中的带宽的操作方法，其可以包括带宽控制器，其可以包括有源带宽调整机构; 控制器主动地控制有源带宽调整机制，利用实现带宽热瞬变校正的算法，该算法基于激光系统操作对激光系统中产生的激光光脉冲的波前的影响的模型，并且在激光系统中入射时产生线窄 带宽调整机制。 控制器算法可以包括在气体放电激光系统的光学系列的至少一部分中的功率沉积历史的功能，例如线性函数，例如多个衰减函数的组合，每个衰减函数包括相应的衰减时间 常数和相应的系数。

公开(公告)号：US20050094698A1

公开(公告)日：2005-05-05

申请号：US10953100

申请日：2004-09-29

Applicant: Herve Besaucele ,  Wayne Dunstan ,  Toshihiko Ishihara ,  Robert Jacques ,  Fedor Trintchouk

Inventor： Herve Besaucele ,  Wayne Dunstan ,  Toshihiko Ishihara ,  Robert Jacques ,  Fedor Trintchouk

IPC: H01S3/036 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225 ,  H01S3/23

CPC classification number: H01S3/036 ,  H01S3/225 ,  H01S3/2316 ,  H01S3/2366

Abstract: A multi-chambered excimer or molecular halogen gas discharge laser system comprising at least one oscillator chamber and at least one amplifier chamber producing oscillator output laser light pulses that are amplified in the at least one power chamber, having a fluorine injection control system and a method of using same is disclosed, which may comprise: a halogen gas consumption estimator: estimating the amount of halogen gas that has been consumed in one of the at least one oscillator chamber based upon at least a first operating parameter of one of the least one oscillator chamber and the at least one amplifier chamber, and the difference between a second operating parameter of the at least one oscillator chamber and the at least one amplifier chamber, and estimating the amount of halogen gas that has been consumed in the other of the at least one oscillator chamber and the at least one amplifier chamber based upon at least a third operating parameter of the other of the at least one oscillator chamber and the at least one amplifier chamber, and producing an output representative of an estimated halogen gas consumption in the at least one oscillator chamber and of the halogen gas consumption in the at least one amplifier chamber, and a halogen gas injection controller determining the amount of halogen gas injection for the at least one oscillator chamber and the at least one amplifier chamber based upon the estimated fluorine consumption outputs from the fluorine consumption estimator and a cost function comprising a plurality of weighted injection decision determinations.

Abstract translation: 一种多腔准分子或分子卤素气体放电激光系统，包括至少一个振荡器室和至少一个产生振荡器的放大器室输出在至少一个功率室中放大的激光脉冲，具有氟注入控制系统和方法 其中可以包括：卤素气体消耗估计器：基于至少一个振荡器之一的至少一个振荡器中的至少一个振荡器的至少一个振荡器的至少第一操作参数来估计在所述至少一个振荡器腔室中的一个中消耗的卤素气体的量 室和至少一个放大器室，以及所述至少一个振荡器室和所述至少一个放大器室的第二操作参数之间的差异，并且估计至少在另一个中消耗的卤素气体的量 基于所述至少一个的另一个的至少第三操作参数，所述至少一个振荡器室和所述至少一个放大器室 e振荡器室和所述至少一个放大器室，并且产生代表所述至少一个振荡器室中的估计的卤素气体消耗量的输出和所述至少一个放大器室中的卤素气体消耗量，以及卤素气体注入控制器确定 基于来自氟消耗估计器的估计的氟消耗量输出和包括多个加权喷射判定确定的成本函数，至少一个振荡室和至少一个放大器室的卤素气体喷射量。

公开(公告)号：US20050226301A1

公开(公告)日：2005-10-13

申请号：US10815387

申请日：2004-03-31

Applicant: William Partlo ,  Yoshiho Amada ,  James Carmichael ,  Timothy Dyer ,  Walter Gillespie ,  Bryan Moosman ,  Richard Morton ,  Curtis Rettig ,  Brian Strate ,  Thomas Steiger ,  Fedor Trintchouk ,  Richard Ujazdowski

Inventor： William Partlo ,  Yoshiho Amada ,  James Carmichael ,  Timothy Dyer ,  Walter Gillespie ,  Bryan Moosman ,  Richard Morton ,  Curtis Rettig ,  Brian Strate ,  Thomas Steiger ,  Fedor Trintchouk ,  Richard Ujazdowski

IPC: H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/041 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/22 ,  H01S3/225

CPC classification number: H01S3/036 ,  H01S3/0384 ,  H01S3/041 ,  H01S3/0971 ,  H01S3/225

Abstract: A method and apparatus if disclosed which may comprise a high power high repetition rate gas discharge laser UV light source which may comprise: a gas discharge chamber comprising an interior wall comprising a vertical wall and an adjacent bottom wall; a gas circulation fan creating a gas flow path adjacent the interior vertical wall and the adjacent bottom wall; an in-chamber dust trap positioned a region of low gas flow, which may be along an interior wall and may comprise at least one meshed screen, e.g., a plurality of meshed screens, which may comprise at least two different gauge meshed screens. The dust trap may extend along the bottom interior wall of the chamber and/or a vertical portion of the interior wall. The dust trap may comprise a first meshed screen having a first gauge; a second meshed screen having a second gauge smaller than the first gauge; and the second meshed screen intermediate the first meshed screen and the interior wall. The chamber may comprise a plurality of dust collecting recesses in at least one of the vertical interior wall and the bottom wall of the chamber which may be selected from a group comprising a one-part recess and a multi-part recess, which may comprise two sections angled with respect to each other. The dust trap may comprise a pressure trap positioned between a portion of a main insulator and an interior wall of the chamber. The chamber may comprise a gas circulating fan comprising a cross-flow fan with a fan cutoff that may comprise a vortex control pocket. The chamber may comprise a preionization mechanism comprising a preionization tub containing a ground rod within an elongated opening in the preionization tube that may comprise a compliant member, an automatic preionization shut-off mechanism, a preionization onset control mechanism and/or a focusing element. The chamber may comprise an elongated baffle plate that may comprise a plurality of pyramidal structures including varying numbers of generally pyramidal elements and oriented in groups of varying numbers of generally pyramidal elements and oriented along and transverse to the longitudinal axis. Acoustic resonances within the chamber may also be reduced by introducing an artificial jitter into the timing of the laser discharges varying the inter-pulse period randomly or in a repeating pattern from pulse to pulse within a burst.

公开(公告)号：US20060227839A1

公开(公告)日：2006-10-12

申请号：US11095293

申请日：2005-03-31

Applicant: Herve Besaucele ,  Igor Fomenkov ,  William Partlo ,  Fedor Trintchouk ,  Hao Ton That

Inventor： Herve Besaucele ,  Igor Fomenkov ,  William Partlo ,  Fedor Trintchouk ,  Hao Ton That

IPC: H01S3/22

CPC classification number: H01S3/036 ,  H01S3/038 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/134

Abstract: A line narrowed gas discharge laser system and method of operation are disclosed which may comprise: an oscillator cavity; a laser chamber comprising a chamber housing containing a lasing medium gas; at least one peaking capacitor electrically connected to the chamber housing and to a first one of a pair of electrodes; a second one of the pair of electrodes connected to an opposite terminal of the at least one peaking capacitor; a current return path connected to the chamber housing; the one terminal, the first one of the electrodes, the lasing medium gas, the second one of the electrodes, the current return path and the second terminal forming a head current inductive loop having an inductance unique to the particular head current inductive loo; a spectral quality tuning mechanism comprising a mechanism for changing the particular head current inductive loop inductance value for the particular head current inductance loop.

Abstract translation: 公开了一种窄气体放电激光系统和操作方法，其可以包括：振荡器腔; 激光室，包括容纳激光介质气体的腔室; 至少一个峰值电容器电连接到所述腔室壳体和一对电极中的第一电极; 所述一对电极中的第二个连接到所述至少一个峰值电容器的相对端子; 连接到所述腔室壳体的电流返回路径; 一个端子，第一个电极，激光介质气体，第二个电极，电流返回路径和第二个端子，形成具有特定头电流电感槽独有的电感的头电流感应回路; 光谱质量调谐机构包括用于改变特定头电流电感回路的特定头电流感应环电感值的机构。

公开(公告)号：US07522650B2

公开(公告)日：2009-04-21

申请号：US10815387

申请日：2004-03-31

Applicant: William N. Partlo ,  Yoshiho Amada ,  James A. Carmichael ,  Timothy S. Dyer ,  Walter D. Gillespie ,  Bryan G. Moosman ,  Richard G. Morton ,  Curtis L. Rettig ,  Brian D. Strate ,  Thomas D. Steiger ,  Fedor Trintchouk ,  Richard C. Ujazdowski

Inventor： William N. Partlo ,  Yoshiho Amada ,  James A. Carmichael ,  Timothy S. Dyer ,  Walter D. Gillespie ,  Bryan G. Moosman ,  Richard G. Morton ,  Curtis L. Rettig ,  Brian D. Strate ,  Thomas D. Steiger ,  Fedor Trintchouk ,  Richard C. Ujazdowski

IPC: H01S3/22

CPC classification number: H01S3/036 ,  H01S3/0384 ,  H01S3/041 ,  H01S3/0971 ,  H01S3/225

Abstract: A method and apparatus if disclosed which may comprise a high power high repetition rate gas discharge laser UV light source which may comprise: a gas discharge chamber comprising an interior wall comprising a vertical wall and an adjacent bottom wall; a gas circulation fan creating a gas flow path adjacent the interior vertical wall and the adjacent bottom wall; an in-chamber dust trap positioned a region of low gas flow, which may be along an interior wall and may comprise at least one meshed screen, e.g., a plurality of meshed screens, which may comprise at least two different gauge meshed screens. The dust trap may extend along the bottom interior wall of the chamber and/or a vertical portion of the interior wall. The dust trap may comprise a first meshed screen having a first gauge; a second meshed screen having a second gauge smaller than the first gauge; and the second meshed screen intermediate the first meshed screen and the interior wall. The chamber may comprise a plurality of dust collecting recesses in at least one of the vertical interior wall and the bottom wall of the chamber which may be selected from a group comprising a one-part recess and a multi-part recess, which may comprise two sections angled with respect to each other. The dust trap may comprise a pressure trap positioned between a portion of a main insulator and an interior wall of the chamber. The chamber may comprise a gas circulating fan comprising a cross-flow fan with a fan cutoff that may comprise a vortex control pocket. The chamber may comprise a preionization mechanism comprising a preionization tub containing a ground rod within an elongated opening in the preionization tube that may comprise a compliant member, an automatic preionization shut-off mechanism, a preionization onset control mechanism and/or a focusing element. The chamber may comprise an elongated baffle plate that may comprise a plurality of pyramidal structures including varying numbers of generally pyramidal elements and oriented in groups of varying numbers of generally pyramidal elements and oriented along and transverse to the longitudinal axis. Acoustic resonances within the chamber may also be reduced by introducing an artificial jitter into the timing of the laser discharges varying the inter-pulse period randomly or in a repeating pattern from pulse to pulse within a burst.

公开(公告)号：US20060114956A1

公开(公告)日：2006-06-01

申请号：US11000571

申请日：2004-11-30

Applicant: Richard Sandstrom ,  William Partlo ,  Daniel Brown ,  J. Martin Algots ,  Fedor Trintchouk

Inventor： Richard Sandstrom ,  William Partlo ,  Daniel Brown ,  J. Martin Algots ,  Fedor Trintchouk

IPC: H01S3/22

CPC classification number: H01S3/08009 ,  H01S3/08031 ,  H01S3/08059 ,  H01S3/097 ,  H01S3/1055

Abstract: A line narrowing apparatus and method for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses is disclosed, which may comprise a dispersive center wavelength selection optic contained within a line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on a dispersive wavelength selection optic dispersive surface; a first dispersive optic bending mechanism operatively connected to the dispersive center wavelength selection optic and operative to change the curvature of the dispersive surface in a first manner; and, a second dispersive optic bending mechanism operatively connected to the dispersive center wavelength selection optic and operative to change the curvature of the dispersive surface in a second manner. The first manner may modify a first measure of bandwidth and the second manner may modify a second measure of bandwidth such that the ratio of the first measure to the second measure substantially changes. The first measure may be a spectrum width at a selected percentage of the spectrum peak value (FWX % M) and the second measure may be width within which some selected percentage of the spectral intensity is contained (EX %). The first dispersive optic bending mechanism may change the curvature of the dispersive surface in a first dimension and the second in a second dimension generally orthogonal to the first dimension. The laser system may comprise a beam path insert comprising a material having an different index of refraction and an index of refraction thermal gradient opposite from that of a neighboring optical element. The first dispersive optic bending mechanism may change the curvature of the dispersive surface in a first dimension and the second a second dimension generally parallel to the first dimension. An optical beam twisting element in the lasing cavity may optically twist the laser light pulse beam to present a twisted wavefront to the dispersive center wavelength selection optic. Bending may change the curvature and wavelength selection, e.g., in a burst may create two center wavelength peaks to select FWX % M and EX % independently.

公开(公告)号：US06963595B2

公开(公告)日：2005-11-08

申请号：US10356168

申请日：2003-01-31

Applicant: John A. Rule ,  Richard C. Morton ,  Vladimir V. Fleurov ,  Fedor Trintchouk ,  Toshihiko Ishihara ,  Alexander I. Ershov ,  James A. Carmichael

Inventor： John A. Rule ,  Richard C. Morton ,  Vladimir V. Fleurov ,  Fedor Trintchouk ,  Toshihiko Ishihara ,  Alexander I. Ershov ,  James A. Carmichael

IPC: H01L21/027 ,  G03F7/20 ,  H01S20060101 ,  H01S3/036 ,  H01S3/041 ,  H01S3/08 ,  H01S3/134 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225 ,  H01S3/23

CPC classification number: H01S3/225 ,  G03F7/70025 ,  H01S3/036 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/09702 ,  H01S3/2258 ,  H01S3/2333

Abstract: An automatic F2 laser gas control, for a modular high repetition rate ultraviolet gas discharge laser. The laser gas control includes techniques, monitors, and processor for monitoring the F2 consumption rates through the operating life of the laser system. These consumption rates are used by a processor programmed with an algorithm to determine F2 injections needed to maintain laser beam quality within a delivery range. Preferred embodiments include F2 controls for a two-chamber MOPA laser system.

Abstract translation: 用于模块化高重复率紫外线气体放电激光器的自动F 2激光气体控制。 激光气体控制包括技术，监视器和处理器，用于在激光系统的使用寿命期间监视F 2消耗率。 这些消耗速率由用算法编程的处理器用于确定在输送范围内保持激光束质量所需的F 2注射。 优选实施例包括用于两室MOPA激光系统的F 2控制。