摘要:
New dichroitic dyestuffs useful as components of liquid crystalline dielectrics for electro-optical indicator elements based on the guest-host effect have the formula ##STR1## wherein W, X, Y and Z each is hydrogen, NH.sub.2, OH, NHCH.sub.3 or NHC.sub.2 H.sub.5, provided that not more than 3 of these are the same, and one or two of R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are a group of the formulae (IIa), (IIb), (IIc), (IId) or (IIe) ##STR2## and the others are hydrogen, R being alkyl of 1-12 carbon atoms.
摘要:
Compounds of the formula ##STR1## wherein R.sub.1 is alkyl of 1-12 C atoms and R.sub.2 is an optionally perfluorinated alkyl, alkoxy or alkanoyloxy group, each of 1-12 C atoms are valuable liquid crystalline components for broadening the mesophase temperature range of liquid crystalline dielectrics having negative dielectric anisotropy.
摘要:
3-Cyano-4-phenyl-5-dimethylaminomethylene-5H-furanone-(2) and compositions containing the same, are useful for controlling the growth of undesirable pest plant growth, e.g., algae, weeds and undesirable grasses, when applied to the locus to be protected.
摘要:
In a process for the production of thin films and epitaxial layers by gas-phase deposition, intramolecularly stabilized organometallic compounds are employed as a source of metal.
摘要:
The invention relates to organometallic compounds which are intramolecularly stabilized, and also to their use for the production of thin films and epitaxial layers by gas-phase deposition.
摘要:
The invention relates to cyclic organometallic compounds which are intramolecularly stabilized and also to their use to produce thin films and epitaxial layers by gas-phase deposition.
摘要:
In a process for the production of thin films and epitaxial layers by gas-phase deposition, intramolecularly stabilized organometallic compounds are employed as a source of metal.
摘要:
Benzoin oximes of the formula ##STR1## wherein R.sup.1 is alkyl of 3 to 16 carbon atoms, alkenyl of 3 or 4 carbon atoms, 3,7-dimethyl-2,6-octadienyl-1, or -A-S-R.sup.4 ; R.sup.2 and R.sup.3 independently are H, methyl or chlorine; R.sup.4 is alkyl or 1 to 8 carbon atoms; and A is alkylene of 3 or 4 carbon atoms, are chelating agents for copper.
摘要:
The invention relates to the use of organometallic compounds containing, as metals, aluminum, gallium or indium for the deposition of thin films or epitactic layers from the gas phase.
摘要:
The invention relates to organometallic compounds which are stabilized intramolecularly and have a cyclic or bicyclic structure and to the use thereof for the preparation of thin films and epitaxial layers by gas phase deposition.