METHOD AND APPARATUS FOR DETECTING AND PASSIVATING DEFECTS IN THIN FILM SOLAR CELLS
    2.
    发明申请
    METHOD AND APPARATUS FOR DETECTING AND PASSIVATING DEFECTS IN THIN FILM SOLAR CELLS 失效
    用于检测和释放薄膜太阳能电池中的缺陷的方法和装置

    公开(公告)号:US20100124600A1

    公开(公告)日:2010-05-20

    申请号:US12272499

    申请日:2008-11-17

    IPC分类号: C23C16/52

    摘要: The embodiments of the present invention provide a defect detection process and apparatus to detect defects in solar cell structures. During the process, an input signal from a signal source is applied to a top surface of a transparent conductive layer of a solar cell structure. In response to the input signal, an output signal is generated from a predetermined area of the top surface and detected by a defect detector. The output signal carrying the defect position information is transmitted to a computer and registered in a database. With the position information, an injector is driven to the defect location to apply an insulator to passivate the defect. A finger pattern layer may be formed over the predetermined area after completing the defect detection and passivation processes.

    摘要翻译: 本发明的实施例提供了一种用于检测太阳能电池结构中的缺陷的缺陷检测过程和装置。 在该过程中,来自信号源的输入信号被施加到太阳能电池结构的透明导电层的顶表面。 响应于输入信号,从顶表面的预定区域产生输出信号并由缺陷检测器检测。 携带缺陷位置信息的输出信号被发送到计算机并登记在数据库中。 利用位置信息,将喷射器驱动到缺陷位置以施加绝缘体以钝化缺陷。 在完成缺陷检测和钝化处理之后,可以在预定区域上形成指形图案层。

    Systems and methods for reducing alteration of a specimen during analysis for charged particle based and other measurement systems
    4.
    发明授权
    Systems and methods for reducing alteration of a specimen during analysis for charged particle based and other measurement systems 有权
    用于减少基于带电粒子和其他测量系统的分析期间样品变化的系统和方法

    公开(公告)号:US07394067B1

    公开(公告)日:2008-07-01

    申请号:US11185915

    申请日:2005-07-20

    IPC分类号: G01B15/04

    CPC分类号: G03F1/84

    摘要: Systems and methods for reducing alteration of a specimen during by charged particle based and other measurements systems are provided. One system configured to reduce alteration of a specimen during analysis includes a vacuum chamber in which the specimen is disposed during the analysis and an element disposed within the vacuum chamber. A surface of the element is cooled such that molecules in the vacuum chamber are adsorbed onto the surface and cannot cause alteration of a characteristic of the specimen during the analysis. One system configured to analyze a specimen includes an analysis subsystem configured to analyze the specimen while the specimen is disposed in a vacuum chamber and an element disposed within the vacuum chamber. A surface of the element is cooled such that molecules in the vacuum chamber are adsorbed onto the surface and cannot cause alteration of a characteristic of the specimen during the analysis.

    摘要翻译: 提供了通过基于带电粒子和其他测量系统来减少样品变化的系统和方法。 被配置为减少分析期间样品变化的一个系统包括:真空室,其中在分析过程中放置​​试样并设置在真空室内的元件。 元件的表面被冷却,使得真空室中的分子被吸附到表面上,并且在分析期间不能引起样品特性的改变。 被配置为分析样本的一个系统包括分析子系统,该分析子系统构造成在样本被布置在真空室中并且设置在真空室内的元件时分析样本。 元件的表面被冷却,使得真空室中的分子被吸附到表面上,并且在分析期间不能引起样品特性的改变。

    Systems configured to reduce distortion of a resist during a metrology process and systems and methods for reducing alteration of a specimen during analysis
    5.
    发明授权
    Systems configured to reduce distortion of a resist during a metrology process and systems and methods for reducing alteration of a specimen during analysis 有权
    被配置为在测量过程中减少抗蚀剂变形的系统以及用于减少分析期间样品变化的系统和方法

    公开(公告)号:US07304302B1

    公开(公告)日:2007-12-04

    申请号:US11215745

    申请日:2005-08-29

    IPC分类号: H01J37/21

    摘要: Various systems configured to reduce distortion of a resist during a metrology process are provided. The systems include an electron beam metrology tool configured to measure one or more characteristics of one or more resist features formed on a specimen. The electron beam metrology tool may be configured as a scanning electron microscope. The resist may be designed for exposure at a wavelength of about 193 nm. One system includes a cooling subsystem configured to alter a temperature of the specimen during measurements by the tool such that the resist feature(s) are not substantially distorted during the measurements. Another system includes a drying subsystem that is configured to reduce moisture proximate the specimen during measurements by the electron beam metrology tool such that the resist feature(s) are not substantially distorted during the measurements. An additional system may include both the cooling subsystem and the drying subsystem.

    摘要翻译: 提供了在计量过程中减少抗蚀剂失真的各种系统。 该系统包括电子束计量工具,其被配置为测量形成在样本上的一个或多个抗蚀剂特征的一个或多个特性。 电子束计量工具可以被配置为扫描电子显微镜。 抗蚀剂可以设计用于在约193nm的波长下曝光。 一个系统包括一个冷却子系统,该冷却子系统被配置成在由该工具进行的测量期间改变样品的温度,使得抗蚀剂特征在测量期间基本上不失真。 另一种系统包括干燥子系统,该干燥子系统被配置为通过电子束计量工具在测量期间减少靠近样本的水分,使得抗蚀剂特征在测量期间基本上不失真。 另外的系统可以包括冷却子系统和干燥子系统。

    Methods and systems for preparing a copper containing substrate for analysis
    6.
    发明授权
    Methods and systems for preparing a copper containing substrate for analysis 有权
    用于制备含铜底物的方法和系统用于分析

    公开(公告)号:US07148073B1

    公开(公告)日:2006-12-12

    申请号:US11082039

    申请日:2005-03-15

    IPC分类号: H01L21/302

    摘要: Methods and systems for preparing a substrate for analysis are provided. One method includes removing a portion of a copper structure on the substrate using an etch chemistry in combination with an electron beam. The etch chemistry is substantially inert with respect to the copper structure except in the presence of the electron beam. Other methods involve forming masking layers on a substrate that will protect the substrate during etching. For example, one method includes exposing a first portion of the substrate to an electron beam. A second portion of the substrate not exposed to the electron beam includes a copper structure. The method also includes exposing the substrate to a fluorine containing chemical. The fluorine containing chemical bonds to the first portion but not the second portion to form a fluorine containing layer on the first portion.

    摘要翻译: 提供了用于制备用于分析的底物的方法和系统。 一种方法包括使用与电子束组合的蚀刻化学法去除衬底上的一部分铜结构。 除了存在电子束之外,蚀刻化学物质对于铜结构基本上是惰性的。 其他方法包括在衬底上形成掩模层,其将在蚀刻期间保护衬底。 例如,一种方法包括将基板的第一部分暴露于电子束。 未暴露于电子束的基板的第二部分包括铜结构。 该方法还包括将基底暴露于含氟化学品。 含氟化学键合到第一部分而不是第二部分,以在第一部分上形成含氟层。

    Method and apparatus for detecting and passivating defects in thin film solar cells
    7.
    发明授权
    Method and apparatus for detecting and passivating defects in thin film solar cells 失效
    用于检测和钝化薄膜太阳能电池中的缺陷的方法和装置

    公开(公告)号:US08318239B2

    公开(公告)日:2012-11-27

    申请号:US12272499

    申请日:2008-11-17

    IPC分类号: B05D5/06

    摘要: The embodiments of the present invention provide a defect detection process and apparatus to detect defects in solar cell structures. During the process, an input signal from a signal source is applied to a top surface of a transparent conductive layer of a solar cell structure. In response to the input signal, an output signal is generated from a predetermined area of the top surface and detected by a defect detector. The output signal carrying the defect position information is transmitted to a computer and registered in a database. With the position information, an injector is driven to the defect location to apply an insulator to passivate the defect. A finger pattern layer may be formed over the predetermined area after completing the defect detection and passivation processes.

    摘要翻译: 本发明的实施例提供了一种用于检测太阳能电池结构中的缺陷的缺陷检测过程和装置。 在该过程中,来自信号源的输入信号被施加到太阳能电池结构的透明导电层的顶表面。 响应于输入信号,从顶表面的预定区域产生输出信号并由缺陷检测器检测。 携带缺陷位置信息的输出信号被发送到计算机并登记在数据库中。 利用位置信息,将喷射器驱动到缺陷位置以施加绝缘体以钝化缺陷。 在完成缺陷检测和钝化处理之后,可以在预定区域上形成指形图案层。