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    SLURRIES FOR POLISHING OXIDE AND NITRIDE WITH HIGH REMOVAL RATES
    1.
    发明申请
    SLURRIES FOR POLISHING OXIDE AND NITRIDE WITH HIGH REMOVAL RATES 审中-公开
    用于抛光氧化物和硝酸盐的高脱除率

    公开(公告)号：US20090090696A1

    公开(公告)日：2009-04-09

    申请号：US11868744

    申请日：2007-10-08

    Applicant: Daniela White ,  John Parker

    Inventor： Daniela White ,  John Parker

    IPC: B44C1/22 ,  C09K3/14

    CPC classification number: C09K3/1463 ,  C09G1/02 ,  H01L21/31053

    Abstract: The invention provides a chemical-mechanical polishing composition comprising (a) an abrasive selected from the group consisting of alumina, ceria, titania, and zirconia, (b) a cationic copolymer comprising (A) a cationic monomer comprising a quaternary amino group and (B) a nonionic monomer, and (c) water. The invention also provides a method of polishing a substrate using the aforementioned polishing composition.

    Abstract translation: 本发明提供一种化学机械抛光组合物，其包含（a）选自氧化铝，二氧化铈，二氧化钛和氧化锆的研磨剂，（b）阳离子共聚物，其包含（A）包含季氨基的阳离子单体和（ B）非离子单体，和（c）水。 本发明还提供了使用上述抛光组合物抛光衬底的方法。

    Synthesis of vinyl polymers by controlled radical polymerization
    2.
    发明授权
    Synthesis of vinyl polymers by controlled radical polymerization 失效
    通过控制自由基聚合合成乙烯基聚合物

    公开(公告)号：US07351781B2

    公开(公告)日：2008-04-01

    申请号：US11041154

    申请日：2005-01-21

    Applicant: Daniela White ,  James B. O'Dwyer

    Inventor： Daniela White ,  James B. O'Dwyer

    IPC: C08F4/04

    CPC classification number: C08F4/00 ,  C08F2/32 ,  C08F293/005

    Abstract: A controlled free radical polymerization process, which includes the steps of: adding a monofunctional iniferter compound to an oxygen-free solvent; heating the solution to a temperature sufficient to allow the iniferter compound to form two carbon centered radical residues; adding a first monomer composition comprising one or more monomers to the solution containing the radical containing residues; polymerizing the first monomer composition to form a quasi-living polymer; and optionally polymerizing a second monomer composition comprising one or more monomers, which are different than the first monomer composition. The resulting non-random copolymer having the general formula: φ-[-Ap-Bs-]t-φ where A and B are different compositions of ethylenically unsaturated monomers; p is an integer from 1 to 1,000; s is an integer from 0 to 1,000; t is an integer from 1 to 100; and φ is a residue from the iniferter.

    Abstract translation: 一种受控的自由基聚合方法，其包括以下步骤：将单官能异构体化合物加入到无氧溶剂中; 将溶液加热至足以允许引发剂化合物形成两个碳中心自由基残基的温度; 将含有一种或多种单体的第一单体组合物加入到含有基团的残基的溶液中; 聚合第一单体组合物以形成准活性聚合物; 并且任选地聚合包含与第一单体组合物不同的一种或多种单体的第二单体组合物。 所得到的具有以下通式的非无规共聚物：<？in-line-formula description =“In-line Formulas”end =“lead”？> phi - [ - A

    其中A和B是不饱和烯键式的不同组成，其中A和B是不同组成的烯键式不饱和键 单体; p是1至1,000的整数; s是0到1,000之间的整数; t为1〜100的整数; phi是来自引物的残基。

    Thermosetting compositions containing hydroxyl-functional polymers prepared using atom transfer radical polymerization
    6.
    发明授权
    Thermosetting compositions containing hydroxyl-functional polymers prepared using atom transfer radical polymerization 失效
    含有使用原子转移自由基聚合制备的羟基官能聚合物的热固性组合物

    公开(公告)号：US06517905B2

    公开(公告)日：2003-02-11

    申请号：US09964964

    申请日：2001-09-27

    Applicant: Daniela White ,  James B. O'Dwyer ,  Dennis A. Simpson

    Inventor： Daniela White ,  James B. O'Dwyer ,  Dennis A. Simpson

    IPC: C08F440

    CPC classification number: C08L53/00 ,  C08F293/00 ,  C08F293/005 ,  C08F2438/01 ,  C08G18/6229 ,  C09D153/00 ,  Y10T428/31504 ,  Y10T428/31855 ,  C08L2666/02

    Abstract: A thermosetting composition that includes: (a) a crosslinking agent having at least two functional groups reactive with hydroxyl groups; and (b) a non-gelled, hydroxyl functional polymer prepared by atom transfer radical polymerization. The polymer contains at least one of the following polymer chain structures: —{(M)p—(G)q}x—  or —{(G)q—(M)p}x— wherein M is a residue, that is free of hydroxyl functionality, of at least one monomer; G is a residue, that has hydroxyl functionality, of at least one monomer; p and q represent average numbers of residues occurring in a block of residues in each polymer chain structure; and p, q, and x are each independently selected for each structure such that the hydroxyl functional polymer has a number average molecular weight of at least 250. Also provided are methods of coating a substrate using compositions of the present invention and substrates coated by such methods, as well as color-plus-clear composite coatings.

    Abstract translation: 一种热固性组合物，其包括：（a）具有至少两个与羟基反应的官能团的交联剂; 和（b）通过原子转移自由基聚合制备的非胶凝的羟基官能聚合物。 该聚合物含有至少一种以下聚合物链结构：或其中M是至少一种单体不含羟基官能团的残基; G是具有至少一个单体的羟基官能团的残基; p和q表示在每个聚合物链结构的残基块中发生的残基的平均数目; 对于每种结构，p，q和x各自独立地选择，使得羟基官能聚合物的数均分子量为至少250.还提供了使用本发明的组合物涂覆底物的方法和由其涂覆的底物 方法，以及彩色+透明复合涂层。

    Thermosetting compositions containing hydroxyl-functional polymers prepared using atom transfer radical polymerization
    7.
    发明授权
    Thermosetting compositions containing hydroxyl-functional polymers prepared using atom transfer radical polymerization 有权
    含有使用原子转移自由基聚合制备的羟基官能聚合物的热固性组合物

    公开(公告)号：US06319987B1

    公开(公告)日：2001-11-20

    申请号：US09375019

    申请日：1999-08-16

    Applicant: Daniela White ,  James B. O'Dwyer ,  Dennis A. Simpson

    Inventor： Daniela White ,  James B. O'Dwyer ,  Dennis A. Simpson

    IPC: C08L5300

    CPC classification number: C08L53/00 ,  C08F293/00 ,  C08F293/005 ,  C08F2438/01 ,  C08G18/6229 ,  C09D153/00 ,  Y10T428/31504 ,  Y10T428/31855 ,  C08L2666/02

    Abstract: A thermosetting composition is provided comprising: (a) a crosslinking agent having at least two functional groups that are reactive with hydroxyl groups; and (b) a non-gelled, hydroxyl functional polymer prepared by atom transfer radical polymerization, in the presence of an initiator having at least one radically transferable group. The polymer contains at least one of the following polymer chain structures: —{(M)p—(G)q}x— or —{(G)q—(M)p}x— wherein M is a residue, that is free of hydroxyl functionality, of at least one ethylenically unsaturated radically polymerizable monomer; G is a residue, that has hydroxyl functionality, of at least one ethylenically unsaturated radically polymerizable monomer; p and q represent average numbers of residues occurring in a block of residues in each polymer chain structure; and p, q, and x are each independently selected for each structure such that the hydroxyl functional polymer has a number average molecular weight of at least 250.

    Abstract translation: 提供一种热固性组合物，其包括：（a）具有至少两个与羟基反应的官能团的交联剂; 和（b）在具有至少一个可自由基转移基团的引发剂的存在下通过原子转移自由基聚合制备的非胶凝的羟基官能聚合物。 聚合物含有至少一种以下聚合物链结构：或其中M是至少一种烯属不饱和自由基聚合单体的残基，其不含羟基官能团; G是具有至少一个烯属不饱和自由基聚合性单体的羟基官能团的残基; p和q表示在每个聚合物链结构的残基块中发生的残基的平均数目; 对于每种结构，p，q和x各自独立地选择，使得羟基官能聚合物的数均分子量至少为250。

    Copper CMP composition containing ionic polyelectrolyte and method
    9.
    发明申请
    Copper CMP composition containing ionic polyelectrolyte and method 审中-公开
    含有离子聚电解质的铜CMP组成及方法

    公开(公告)号：US20090056231A1

    公开(公告)日：2009-03-05

    申请号：US11895896

    申请日：2007-08-28

    Applicant: Daniela White ,  Jason J. Keleher ,  John Parker

    Inventor： Daniela White ,  Jason J. Keleher ,  John Parker

    IPC: C09K3/14 ,  B24B1/00

    CPC classification number: C09K3/1463 ,  C09G1/02 ,  H01L21/3212

    Abstract: The CMP compositions of the invention comprise not more than about 1 percent by weight of a particulate abrasive, a polyelectrolyte, which preferably has a weight average molecular weight of at least about 10,000 grams-per-mole (g/mol), a copper-complexing agent, and an aqueous carrier therefor. The polyelectrolyte can be an anionic polymer (e.g., an acrylate polymer or copolymer) or a cationic polymer (e.g., poly(2-[(methacryloyloxy)ethyl] trimethyl-ammonium halide). When an anionic polyelectrolyte is utilized, the copper-complexing agent preferably comprises an amino polycarboxylate compound (e.g., iminodiacetic acid or a salt thereof). When a cationic polyelectrolyte is utilized, the copper-complexing agent preferably comprises an amino acid (e.g., glycine). Preferably, the particulate abrasive comprises metal oxide such as titanium dioxide or silicon dioxide. Methods of polishing copper-containing substrates with the compositions are also disclosed.

    Abstract translation: 本发明的CMP组合物包含不超过约1重量％的颗粒磨料，聚电解质，其优选具有至少约10,000克/摩尔（g / mol）的重均分子量，铜 - 络合剂及其载体。 聚电解质可以是阴离子聚合物（例如，丙烯酸酯聚合物或共聚物）或阳离子聚合物（例如聚（2 - [（甲基丙烯酰氧基）乙基]三甲基 - 卤化铵）），当使用阴离子聚电解质时，铜络合 药剂优选包含氨基多羧酸盐化合物（例如亚氨基二乙酸或其盐）当使用阳离子聚电解质时，铜络合剂优选包含氨基酸（例如甘氨酸），优选颗粒磨料包含金属氧化物 作为二氧化钛或二氧化硅。还公开了用组合物抛光含铜基材的方法。

    Pigment dispersions containing dispersants prepared by controlled radical polymerization having hydrophilic and hydrophobic segments
    10.
    发明授权
    Pigment dispersions containing dispersants prepared by controlled radical polymerization having hydrophilic and hydrophobic segments 失效
    含有通过具有亲水和疏水链段的受控自由基聚合制备的分散剂的颜料分散体

    公开(公告)号：US06462125B1

    公开(公告)日：2002-10-08

    申请号：US09464946

    申请日：1999-12-16

    Applicant: Daniela White ,  Simion Coca ,  James B. O'Dwyer

    Inventor： Daniela White ,  Simion Coca ,  James B. O'Dwyer

    IPC: C08J3100

    CPC classification number: C09D17/001 ,  C09B67/009

    Abstract: A pigment dispersion that includes a pigment, an aqueous carrier, and a pigment dispersant. The pigment dispersant is prepared by atom transfer radical polymerization initiated and has the polymer chain structure: &phgr;—(G)p—(E)a—T where G is a residue of at least One ethylenically unsaturated monomer; E is a hydrophilic residue of at least one ethylenically unsaturated monomer; &phgr; is a hydrophobic residue of or derived from an initiator; T is or is derived from a radically transferable group from the initiator, p and s represent average numbers of residues occurring in a block of residues; p and s are each individually selected such that said pigment dispersant has a number average molecular weight of at least 250.

    Abstract translation: 包含颜料，水性载体和颜料分散剂的颜料分散体。 颜料分散剂通过引发原子转移自由基聚合制备，并具有聚合物链结构：其中G是至少一个烯属不饱和单体的残基; E是至少一种烯属不饱和单体的亲水性残基; phi是引发剂的疏水残基或衍生自引发剂; T是衍生自起始基团的可自由转移的基团，p和s代表在残基块中发生的残基的平均数; p和s各自单独选择，使得所述颜料分散剂的数均分子量为至少250。

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