公开(公告)号：US20140123900A1

公开(公告)日：2014-05-08

申请号：US13935935

申请日：2013-07-05

Applicant: Ching-Chiun WANG ,  Chih-Yung Huang ,  Kung-Liang Lin ,  Jung-Chen Chien ,  Chen-Der Tsai ,  Chien-Chih Chen

Inventor： Ching-Chiun WANG ,  Chih-Yung Huang ,  Kung-Liang Lin ,  Jung-Chen Chien ,  Chen-Der Tsai ,  Chien-Chih Chen

IPC: C23C16/455 ,  B05B1/00

CPC classification number: C23C16/45565 ,  C23C16/45519 ,  C23C16/45572 ,  C23C16/45593

Abstract: A gas shower device having gas curtain comprises a first gas shower unit for injecting a reaction gas, thereby forming a reaction gas region, and a second gas shower unit. The second gas shower unit arranged around a periphery of the first gas shower unit comprises a buffer gas chamber for providing a buffer gas, and a curtain distribution plate. The curtain distribution plate further comprises a plurality through holes for injecting the buffer gas, thereby forming a gas curtain around a periphery of the reaction gas region. In another embodiment, an apparatus for depositing film is provided by utilizing the gas shower device having gas curtain, wherein the gas curtain prevents the reaction gas in the reaction gas region from being affected directly by a vacuum pressure so that a residence time of reaction gas can be extended thereby increasing the utilization of reaction gas and film-forming efficiency.

Abstract translation: 具有气幕的气体淋浴装置包括：用于喷射反应气体的第一气体喷淋单元，从而形成反应气体区域;以及第二气体淋浴单元。 布置在第一气体淋浴器单元周围的第二气体淋浴单元包括用于提供缓冲气体的缓冲气体室和窗帘分配板。 帘幕分配板还包括用于喷射缓冲气体的多个通孔，从而在反应气体区域的周围形成气幕。 在另一个实施例中，通过利用具有气幕的气体淋浴装置，提供一种用于沉积膜的装置，其中气幕防止反应气体区域中的反应气体直接受到真空压力的影响，使得反应气体的停留时间 可延长反应气体的利用率和成膜效率。

公开(公告)号：US20120145078A1

公开(公告)日：2012-06-14

申请号：US13211309

申请日：2011-08-17

Applicant: Chih-Yung Huang ,  Ching-Chiun Wang ,  Chen-Der Tsai ,  Wen-Tung Hsu ,  Fu-Ching Tung ,  Chien-Chih Chen ,  Yi-Tsung Pan ,  Chien-Jen Sun

Inventor： Chih-Yung Huang ,  Ching-Chiun Wang ,  Chen-Der Tsai ,  Wen-Tung Hsu ,  Fu-Ching Tung ,  Chien-Chih Chen ,  Yi-Tsung Pan ,  Chien-Jen Sun

IPC: C23C16/455 ,  B05B1/14

CPC classification number: C23C16/45565 ,  C23C16/4412

Abstract: A showerhead integrating intake and exhaust is provided for showering a gas. The showerhead at least includes a showerhead body that has a gas-active surface and a plurality of intake bores thereon. The showerhead body further includes a central exhaust vent disposed on the gas-active surface. The central exhaust vent may exhaust standing gas and further pre-exhaust byproduct from reaction process.

Abstract translation: 提供集成进气和排气的淋浴头，用于喷射气体。 淋浴头至少包括具有气体活性表面和多个进气孔的喷头体。 喷头体还包括设置在气体活性表面上的中央排气口。 中央排气口可以从反应过程中排放站立气体和进一步预排气副产物。

公开(公告)号：US20100147808A1

公开(公告)日：2010-06-17

申请号：US12537279

申请日：2009-08-07

Applicant: Chen-Der Tsai ,  Wen-Tung Hsu ,  Chin-Jyi Wu ,  Chih-Wei Chen

Inventor： Chen-Der Tsai ,  Wen-Tung Hsu ,  Chin-Jyi Wu ,  Chih-Wei Chen

IPC: B23K10/00

CPC classification number: B23K10/00 ,  B08B7/0035 ,  H05H1/48 ,  H05H2001/3463

Abstract: A casing is used for being rotatably disposed in a plasma jet system. The casing is rotated around a central axis. The casing comprises a main body and a plasma nozzle. The main body has a first cavity. The plasma nozzle is disposed under the main body and has a second cavity and a straight channel. The second cavity is connected to the first cavity. The straight channel is located at a side of the plasma nozzle opposite to the main body and connected to the second cavity. The straight channel has an extension axis which is substantially parallel with the central axis and separated from the central axis by an interval. Plasma generated by the plasma jet system jets out through the straight channel.

Abstract translation: 壳体用于可旋转地设置在等离子体喷射系统中。 套管围绕中心轴旋转。 壳体包括主体和等离子体喷嘴。 主体具有第一腔。 等离子体喷嘴设置在主体下方并具有第二腔和直通道。 第二腔连接到第一腔。 直通道位于与主体相对的等离子体喷嘴的一侧并连接到第二腔。 直通道具有基本上与中心轴平行并且与中心轴分开间隔的延伸轴。 由等离子喷射系统产生的等离子体通过直通道射出。

公开(公告)号：US20100098600A1

公开(公告)日：2010-04-22

申请号：US12388552

申请日：2009-02-19

Applicant: Chi-Hung Liu ,  Chen-Der Tsai ,  Chun-Hsien Su ,  Wen-Tung Hsu ,  Jen-Hui Tsai ,  Chun Huang

Inventor： Chi-Hung Liu ,  Chen-Der Tsai ,  Chun-Hsien Su ,  Wen-Tung Hsu ,  Jen-Hui Tsai ,  Chun Huang

IPC: B01J19/08

CPC classification number: H05H1/2406 ,  H05H2001/2456

Abstract: A plasma system for generating a plasma is generated. The plasma system includes a tube, a positive electrode and a negative electrode. The tube has a plasma jet opening, a first end surface and a second end surface. The plasma jet opening penetrates the wall of the tube. The plasma passes through the plasma jet opening and is emitted to the outside of the tube. The positive electrode has a side surface facing and adjacent to the tube. The negative electrode is separated from the positive electrode by a first predetermined distance. The negative electrode has a negative electrode side surface facing and adjacent to the tube. The first positive electrode and the first negative electrode are disposed between the first end surface and the second end surface, and a portion of the plasma jet opening is disposed between the positive electrode and the negative electrode.

Abstract translation: 产生用于产生等离子体的等离子体系统。 等离子体系包括管，正极和负极。 管具有等离子体射流开口，第一端面和第二端面。 等离子体射流开口穿过管的壁。 等离子体通过等离子体射流开口并被发射到管的外部。 正极具有面向和邻近管的侧表面。 负极与正极分离第一预定距离。 负极具有面对并与管相邻的负极侧面。 第一正极和第一负极设置在第一端面和第二端面之间，等离子体喷射口的一部分配置在正极和负极之间。

公开(公告)号：US07459045B2

公开(公告)日：2008-12-02

申请号：US11144650

申请日：2005-06-06

Applicant: Shiaw-Min Hwang ,  I-Ting Kao ,  Hsin-I Chen ,  Chen-Der Tsai ,  Hann-Tsong Wang

Inventor： Shiaw-Min Hwang ,  I-Ting Kao ,  Hsin-I Chen ,  Chen-Der Tsai ,  Hann-Tsong Wang

IPC: B32B37/00

CPC classification number: B65B53/06

Abstract: A machine for sealing a cryotube with a thermoplastic film, which is heated and shrunk, is disclosed. The cryotube has a cap with threads, a tube body and a tubular thermoplastic film, wherein the cap is threadably connected to an open end of the tube body and the thermoplastic film is received by the cap and the tube body at the connection thereof. The machine includes a holder for holding the cryotube, a rotation mechanism for rotating the cryotube around a longitudinal axis of the cryotube, and a heating mechanism for heating the thermoplastic film of the cryotube hold in the holder, so that the thermoplastic film shrinks.

Abstract translation: 公开了一种用加热和收缩的热塑性薄膜密封低温管的机器。 冷冻管具有带螺纹的盖，管体和管状热塑性薄膜，其中所述盖螺纹连接到所述管体的开口端，并且所述热塑性薄膜由所述盖和所述管体在其连接处被容纳。 该机器包括用于保持低温管的保持器，用于使低温管围绕着低温管的纵向轴线旋转的旋转机构，以及用于将保持器中的低温管保持件的热塑性膜加热的加热机构，使得热塑性膜收缩。

公开(公告)号：US20080185017A1

公开(公告)日：2008-08-07

申请号：US12078505

申请日：2008-04-01

Applicant: Chia-Chiang Chang ,  Chin-Jyi Wu ,  Chen-Der Tsai ,  Chun-Hung Lin

Inventor： Chia-Chiang Chang ,  Chin-Jyi Wu ,  Chen-Der Tsai ,  Chun-Hung Lin

IPC: B08B6/00

CPC classification number: H01J37/32825 ,  G02F1/1303 ,  G02F2001/1316 ,  G03F7/427 ,  H01J37/32366 ,  H01J37/32623 ,  H05H2001/3463

Abstract: A film removal method and apparatus for removing a film from a substrate are disclosed. The method comprises the steps of disposing a plasma generator and a sucking apparatus over the substrate, projecting a plasma beam from the plasma generator onto the film obliquely, disposing the sucking apparatus on a reflection path of plasma projected by the plasma generator, and sucking a by-product of an incomplete plasma reaction occurring to the film so as to keep a surface of the substrate clean, with a view to overcoming the drawbacks of deposition of the by-product which results from using the plasma as a surface cleansing means under atmospheric conditions.

Abstract translation: 公开了一种从基板上去除膜的膜去除方法和装置。 该方法包括以下步骤：将等离子体发生器和吸附装置设置在衬底上，将等离子体发生器的等离子体束倾斜地投射到膜上，将吸引装置设置在由等离子体发生器投射的等离子体的反射路径上， 为了克服在大气压下使用等离子体作为表面清洁装置产生的副产物沉积的缺点，膜的发生不完全等离子体反应的副产物是保持基板的表面清洁的副产物 条件。

公开(公告)号：US06854713B2

公开(公告)日：2005-02-15

申请号：US10394001

申请日：2003-03-24

Applicant: Chun-Hung Lin ,  Chen-Der Tsai ,  Chin-Ching Wu ,  Jung-Chen Ho ,  Hann-Tsong Wang

Inventor： Chun-Hung Lin ,  Chen-Der Tsai ,  Chin-Ching Wu ,  Jung-Chen Ho ,  Hann-Tsong Wang

IPC: F16K1/42 ,  F16K7/16 ,  F16K7/12

CPC classification number: F16K7/16 ,  F16K1/425

Abstract: The diaphragm valve uses a metal dish-type diaphragm set to control the inflow and outflow of fluid. The metal dish-type diaphragm set is above an air flow channel to control the stem above the metal dish-type diaphragm set, and the air will be blocked by pressing the metal dish-type diaphragm to make it fit the metal valve base in the air flow channel; this non-metal valve base is fixed in the air flow channel by a fixed shrunk ring with a taper cross section, and the in-between metal diaphragm in the metal dish-type diaphragm set is annular in the center to reduce the metallic friction between metal diaphragms, to increase application times and to lower the leakage rate of the diaphragm valve.

Abstract translation: 隔膜阀采用金属盘式隔膜套来控制流体的流入和流出。 金属盘式隔膜组件位于空气流通道上方，用于控制金属盘式隔膜组件上方的杆，空气将通过按压金属盘型隔膜而阻塞，使其与金属阀座底座相配合 气流通道; 该非金属阀座通过具有锥形横截面的固定收缩环固定在空气流动通道中，并且金属盘形隔膜组中的金属隔膜在中心是环形的，以减少金属间的金属摩擦 金属隔膜，以增加施工时间并降低隔膜阀的泄漏率。

公开(公告)号：US08381678B2

公开(公告)日：2013-02-26

申请号：US12501557

申请日：2009-07-13

Applicant: Chen-Der Tsai ,  Wen-Tung Hsu ,  Chin-Jyi Wu ,  Chih-Wei Chen

Inventor： Chen-Der Tsai ,  Wen-Tung Hsu ,  Chin-Jyi Wu ,  Chih-Wei Chen

IPC: C23C16/50 ,  C23F1/00 ,  H01L21/306 ,  H01J7/24

CPC classification number: H05H1/44

Abstract: A wide area atmospheric pressure plasma jet apparatus including a transmission mechanism, a plasma housing and two plasma-generating devices is provided. The transmission mechanism includes a rotation output end that has a center axis. The plasma housing has an opening. The plasma housing further has a air-attracting hole near the rotation output end and extended from an outer wall of the plasma housing to the interior of the plasma housing, so that the heat of the plasma housing can be dissipated due to the generated gas circulation. The plasma-generating devices are disposed within the plasma housing and connected with the rotation output end. Each of the plasma-generating devices has a plasma nozzle located at the opening and tilts from the center axis. When the rotation output end drives the plasma-generating devices to rotate, two plasma beams are obliquely ejected from the plasma nozzle and the plasma processing area is increased.

Abstract translation: 提供了包括传动机构，等离子体壳体和两个等离子体产生装置的广域大气压等离子体喷射装置。 传动机构包括具有中心轴的旋转输出端。 等离子体壳体具有开口。 等离子体壳体还具有在旋转输出端附近的空气吸引孔并且从等离子体壳体的外壁延伸到等离子体壳体的内部，使得等离子体壳体的热量可以由于产生的气体循环而消散 。 等离子体产生装置设置在等离子体壳体内并与旋转输出端连接。 每个等离子体产生装置具有位于开口处的等离子体喷嘴并且从中心轴线倾斜。 当旋转输出端驱动等离子体产生装置旋转时，两个等离子体束从等离子体喷嘴倾斜喷射，并且等离子体处理区域增加。

公开(公告)号：US20120315724A1

公开(公告)日：2012-12-13

申请号：US13230788

申请日：2011-09-12

Applicant: Chi-Hung Liu ,  Kuo-Hui Yang ,  Chen-Der Tsai ,  Ying-Fang Chang ,  Ta-Hsin Chou

Inventor： Chi-Hung Liu ,  Kuo-Hui Yang ,  Chen-Der Tsai ,  Ying-Fang Chang ,  Ta-Hsin Chou

IPC: H01L21/06 ,  C23C16/50

CPC classification number: C23C14/06 ,  C23C14/228 ,  C23C14/32

Abstract: A method for deposition of a selenium thin-film includes the following steps. First, a plasma head is provided. Then, a substrate is supported in an atmospheric pressure. Next, a solid-state selenium source is dissociated by the plasma head to deposit the selenium thin-film on the substrate. The plasma head includes a chamber, a housing and the solid-state selenium source. Plasma is produced in the chamber. The chamber is surrounded by the housing. The solid-state selenium source is supported by the housing.

Abstract translation: 一种沉积硒薄膜的方法包括以下步骤。 首先，提供等离子体头。 然后，在大气压下负载基板。 接下来，固体硒源通过等离子体头解离，以将硒薄膜沉积在基底上。 等离子体头包括腔室，壳体和固态硒源。 等离子体在室内产生。 房间被房屋包围。 固态硒源由壳体支撑。

公开(公告)号：US08212174B2

公开(公告)日：2012-07-03

申请号：US12537279

申请日：2009-08-07

Applicant: Chen-Der Tsai ,  Wen-Tung Hsu ,  Chin-Jyi Wu ,  Chih-Wei Chen

Inventor： Chen-Der Tsai ,  Wen-Tung Hsu ,  Chin-Jyi Wu ,  Chih-Wei Chen

IPC: B23K9/00

CPC classification number: B23K10/00 ,  B08B7/0035 ,  H05H1/48 ,  H05H2001/3463

Abstract: A casing is used for being rotatably disposed in a plasma jet system. The casing is rotated around a central axis. The casing comprises a main body and a plasma nozzle. The main body has a first cavity. The plasma nozzle is disposed under the main body and has a second cavity and a straight channel. The second cavity is connected to the first cavity. The straight channel is located at a side of the plasma nozzle opposite to the main body and connected to the second cavity. The straight channel has an extension axis which is substantially parallel with the central axis and separated from the central axis by an interval. Plasma generated by the plasma jet system jets out through the straight channel.

Abstract translation: 壳体用于可旋转地设置在等离子体喷射系统中。 外壳围绕中心轴线旋转。 壳体包括主体和等离子体喷嘴。 主体具有第一腔。 等离子体喷嘴设置在主体下方并具有第二腔和直通道。 第二腔连接到第一腔。 直通道位于与主体相对的等离子体喷嘴的一侧并连接到第二腔。 直通道具有基本上与中心轴平行并且与中心轴分开间隔的延伸轴。 由等离子喷射系统产生的等离子体通过直通道射出。