Invention Grant
- Patent Title: Casing and plasma jet system using the same
- Patent Title (中): 套管和等离子体喷射系统使用相同
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Application No.: US12537279Application Date: 2009-08-07
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Publication No.: US08212174B2Publication Date: 2012-07-03
- Inventor: Chen-Der Tsai , Wen-Tung Hsu , Chin-Jyi Wu , Chih-Wei Chen
- Applicant: Chen-Der Tsai , Wen-Tung Hsu , Chin-Jyi Wu , Chih-Wei Chen
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Agency: Thomas|Kayden
- Priority: TW97148615A 20081212
- Main IPC: B23K9/00
- IPC: B23K9/00

Abstract:
A casing is used for being rotatably disposed in a plasma jet system. The casing is rotated around a central axis. The casing comprises a main body and a plasma nozzle. The main body has a first cavity. The plasma nozzle is disposed under the main body and has a second cavity and a straight channel. The second cavity is connected to the first cavity. The straight channel is located at a side of the plasma nozzle opposite to the main body and connected to the second cavity. The straight channel has an extension axis which is substantially parallel with the central axis and separated from the central axis by an interval. Plasma generated by the plasma jet system jets out through the straight channel.
Public/Granted literature
- US20100147808A1 CASING AND PLASMA JET SYSTEM USING THE SAME Public/Granted day:2010-06-17
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