Lithographic projection apparatus, purge gas supply system and gas purging method

    公开(公告)号:US07789940B2

    公开(公告)日:2010-09-07

    申请号:US10565486

    申请日:2004-07-21

    IPC分类号: B01D53/22 G03B21/14

    摘要: A lithographic projection apparatus (1) includes a support configured to support a patterning device (MA), the patterning device configured to pattern the projection beam according to a desired pattern. The apparatus has a substrate (W) table configure to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate. The apparatus also has a purge gas supply system (100) configured to provide a purge gas near a surface of a component of the lithographic projection apparatus. The purge gas supply system (100) includes a purge gas mixture generator (120) configured to generate a purge gas mixture which includes at least one purging gas and moisture. The purge gas mixture generator has a moisturizer (150) configured to add the moisture to the purge gas and a purge gas mixture outlet (130) connected to the purge gas mixture generator (120) configured to supply the purge gas mixture near the surface.

    Polymeric membranes functionalized with polyhydroxypyridinone ligands
    5.
    发明授权
    Polymeric membranes functionalized with polyhydroxypyridinone ligands 失效
    用聚羟基吡啶酮配体官能化的聚合膜

    公开(公告)号:US06221476B1

    公开(公告)日:2001-04-24

    申请号:US09330543

    申请日:1999-06-11

    IPC分类号: B32B326

    摘要: Compositions and methods for selectively binding metal ions from a source solution comprise using a polyhydroxypyridinone-containing ligand covalently bonded to a membrane support having the formula M—A—L(HOPO)n. M is a membrane having a hydrophilic surface, A is a covalent linkage mechanism, L is a ligand carrier, HOPO is a hydroxypyridinone appropriately spaced on the ligand carrier to provide a minimum of six functional coordination metal binding sites, and n is an integer of 3 to 6. The separation is accomplished by passing a source solution containing the ions to be separated through a cartridge containing the membrane-ligand composition, causing the selected ions to be complexed to the HOPO ligands and subsequently removing the selected ions from the cartridge by passing an aqueous receiving solution through the cartridge and quantitatively stripping the selected ions from the HOPO ligand.

    摘要翻译: 用于选择性地结合源溶液的金属离子的组合物和方法包括使用共价键合到具有式M-A-L(HOPO)n的膜载体的含聚羟基吡啶酮的配体。 M是具有亲水性表面的膜,A是共价连接机理,L是配体载体,HOPO是在配体载体上适当间隔的羟基吡啶酮,以提供至少六个功能性配位金属结合位点,并且n是 通过将含有待分离的离子的源溶液通过含有膜 - 配体组合物的筒,使所选择的离子与HOPO配体络合并随后通过以下步骤从盒中除去选定的离子,从而实现分离: 使含水接收溶液通过滤筒并定量地从HOPO配体中剥离选定的离子。

    Lithographic projection apparatus, purge gas supply system and gas purging method
    6.
    发明授权
    Lithographic projection apparatus, purge gas supply system and gas purging method 失效
    平版印刷设备,吹扫气体供应系统和气体清洗方法

    公开(公告)号:US07879137B2

    公开(公告)日:2011-02-01

    申请号:US10565486

    申请日:2004-07-21

    IPC分类号: B01D53/22 G03B21/14

    CPC分类号: G02B27/0006 G03F7/70933

    摘要: A lithographic projection apparatus (1) includes a support configured to support a patterning device (MA), the patterning device configured to pattern the projection beam according to a desired pattern. The apparatus has a substrate (W) table configure to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate. The apparatus also has a purge gas supply system (100) configured to provide a purge gas near a surface of a component of the lithographic projection apparatus. The purge gas supply system (100) includes a purge gas mixture generator (120) configured to generate a purge gas mixture which includes at least one purging gas and moisture. The purge gas mixture generator has a moisturizer (150) configured to add the moisture to the purge gas and a purge gas mixture outlet (130) connected to the purge gas mixture generator (120) configured to supply the purge gas mixture near the surface.

    摘要翻译: 光刻投影设备(1)包括被配置为支撑图案形成装置(MA)的支撑件,所述图案形成装置被配置成根据期望的图案对投影光束进行图案化。 该装置具有构造成保持基板的基板(W)台,配置成将图案化的光束投影到基板的目标部分上的投影系统。 该设备还具有净化气体供应系统(100),其构造成在光刻投影设备的部件的表面附近提供净化气体。 净化气体供应系统(100)包括净化气体混合物发生器(120),其被配置为产生包括至少一个净化气体和湿气的净化气体混合物。 净化气体混合物发生器具有配置成将湿气添加到净化气体中的保湿剂(150)和连接到净化气体混合物发生器(120)的净化气体混合物出口(130),其构造成在表面附近提供净化气体混合物。