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1.发明授权Method of forming a chemical mechanical polishing pad utilizing laser sintering 失效使用激光烧结形成化学机械抛光垫的方法公开(公告)号：US07517488B2
公开(公告)日：2009-04-14
申请号：US11372322
申请日：2006-03-08
申请人： Alan H. Saikin
发明人： Alan H. Saikin
IPC分类号： B29C35/08
CPC分类号： H01S3/00 , B24B37/24 , B24D18/00 , B29C67/205 , B29C2791/009 , B29L2031/736 , B33Y10/00 , B33Y30/00 , B33Y70/00
摘要： The present invention provides a method of manufacturing a porous chemical mechanical polishing pad comprising focusing a laser beam from a laser into a sintering nozzle and injecting the fluidized thermoplastic particles into the sintering nozzle via an injection port. The method further provides sintering the thermoplastic particles with the laser beam and selectively depositing the sintered thermoplastic particles onto a table to form the polishing pad.
摘要翻译： 本发明提供一种制造多孔化学机械抛光垫的方法，其包括将来自激光器的激光束聚焦到烧结喷嘴中，并通过注射口将流化的热塑性颗粒注入烧结喷嘴。 该方法还提供用激光束烧结热塑性颗粒，并将烧结的热塑性颗粒选择性地沉积在工作台上以形成抛光垫。
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公开(公告)号：US07396497B2
公开(公告)日：2008-07-08
申请号：US10956847
申请日：2004-09-30
申请人： Joseph P. Koetas , Alan E. Leviton , Kari-Ell Norton , Samuel J. November , Malcolm W. Robertson , Alan H. Saikin
发明人： Joseph P. Koetas , Alan E. Leviton , Kari-Ell Norton , Samuel J. November , Malcolm W. Robertson , Alan H. Saikin
IPC分类号： B28B11/18
CPC分类号： B29C39/006 , B24B37/205 , B24D18/00 , B29B7/726 , B29B7/748
摘要： The present invention provides a method of forming a chemical mechanical polishing pad, comprising providing a tank with polymeric materials and providing a storage hopper with microspheres having an initial bulk density, wherein the storage hopper further comprises a porous membrane provided over a plenum. The method further provides the steps of connecting a fluidizing gas source to the plenum through a gas inlet line and fluidizing the microspheres and reducing the initial bulk density by feeding gas into the plenum. In addition, the method further provides the steps of providing a delivery system for delivering the polymeric materials and the microspheres to a mixer, forming a mixture of the polymeric materials and the microspheres, pouring the mixture into a mold to form a molded product and cutting the molded product into the polishing pad.
摘要翻译： 本发明提供一种形成化学机械抛光垫的方法，包括向罐提供聚合材料，并为储存料斗提供具有初始堆积密度的微球，其中储存料斗还包括设置在增压室上的多孔膜。 该方法还提供了通过气体入口管线将流化气体源连接到增压室并使微球流化并通过将气体进入气室而降低初始堆积密度的步骤。 此外，该方法还提供了提供用于将聚合物材料和微球体输送到混合器，形成聚合材料和微球体的混合物的输送系统的步骤，将混合物倒入模具中以形成模制产品并切割 模制产品进入抛光垫。
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公开(公告)号：US07275856B2
公开(公告)日：2007-10-02
申请号：US10956844
申请日：2004-09-30
申请人： Joseph P. Koetas , Alan E. Leviton , Kari-Ell Norton , Samuel J. November , Malcolm W. Robertson , Alan H. Saikin
发明人： Joseph P. Koetas , Alan E. Leviton , Kari-Ell Norton , Samuel J. November , Malcolm W. Robertson , Alan H. Saikin
IPC分类号： B01F13/02
CPC分类号： B24D18/009 , B01F13/02 , B29B7/726 , B29B7/748
摘要： The present invention provides an apparatus 20 for forming a striation-reduced chemical mechanical polishing pad 4. The polishing pad 4 comprises a first delivery line 66 for delivering a polymeric material 52 into a mixer 68 and a second delivery line 44 for delivering microspheres 48 into the mixer 68 with the polymeric material 52. The second delivery line 44 is connected to a bulk density control unit 21. The bulk density control unit 21 comprises a storage hopper 22 for storing the microspheres 48. The storage hopper 22 further comprises a porous membrane 24 provided over a plenum 26. A fluidizing gas source 23 is connected to the plenum 26 through a gas inlet line 27. Gas 28 fed into the plenum 26 from the fluidizing gas source 23 permeates through the porous membrane 24 and reduces the initial bulk density of the microspheres 48 in the storage hopper 22.
摘要翻译： 本发明提供一种用于形成条纹化学机械抛光垫4的装置20。 抛光垫4包括用于将聚合物材料52输送到混合器68中的第一输送管线66和用聚合物材料52将微球48输送到混合器68中的第二输送管线44。 第二输送管线44连接到体积密度控制单元21。 体积密度控制单元21包括用于储存微球48的储存料斗22。 存储料斗22还包括设置在增压室26上方的多孔膜24。 流化气体源23通过气体入口管线27连接到集气室26。 从流化气体源23供给到增压室26中的气体28渗入多孔膜24并降低储存料斗22中的微球48的初始堆积密度。
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公开(公告)号：US08357027B2
公开(公告)日：2013-01-22
申请号：US11494050
申请日：2006-07-27
申请人： Alan H. Saikin
发明人： Alan H. Saikin
IPC分类号： B24B7/22
CPC分类号： B24B37/205 , B24D18/0009
摘要： The present invention relates to a method of manufacturing a polishing pad with embedded polymeric capsules useful for planarizing a substrate in a CMP process using a polishing composition. The method reduces non-uniformity of the polishing pad due to capsule floating, differential heating and capsule expansion by the use of novel capsule materials. The method also increases the efficiency of the manufacturing process by reducing the number of defective products and reducing waste.
摘要翻译： 本发明涉及一种制造抛光垫的方法，所述抛光垫具有嵌入式聚合物胶囊，其可用于使用抛光组合物在CMP工艺中平坦化基材。 该方法通过使用新颖的胶囊材料，减少了胶囊漂浮，差动加热和胶囊膨胀，从而降低了抛光垫的不均匀性。 该方法还通过减少不良产品的数量并减少废物来提高制造工艺的效率。
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公开(公告)号：US07273407B2
公开(公告)日：2007-09-25
申请号：US11494434
申请日：2006-07-27
申请人： Alan H. Saikin
发明人： Alan H. Saikin
IPC分类号： B24B5/00
CPC分类号： B24B37/205
摘要： The present invention relates to a polishing pad useful for planarizing a substrate in a CMP process using a polishing composition. The polishing pad is transparent and allows for the use of an in-situ optical end-point detection apparatus without the need for a separate aperture or window in the polishing pad.
摘要翻译： 本发明涉及一种可用于使用抛光组合物在CMP工艺中平坦化基板的抛光垫。 抛光垫是透明的，并且允许使用原位光学终点检测装置，而不需要抛光垫中的单独的孔或窗口。
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公开(公告)号：US07132033B2
公开(公告)日：2006-11-07
申请号：US10788951
申请日：2004-02-27
申请人： Mark J. Boldizar , Robert T. Gamble , Vincent Matthew Hedrick , Jason M. Lawhorn , Alan H. Saikin , Katherine L. Tome
发明人： Mark J. Boldizar , Robert T. Gamble , Vincent Matthew Hedrick , Jason M. Lawhorn , Alan H. Saikin , Katherine L. Tome
IPC分类号： B32B37/02
CPC分类号： B32B38/10 , B24B37/205 , B24D18/00 , B32B37/12 , B32B38/0012 , B32B38/04 , B32B38/1841 , Y10T156/1052 , Y10T156/1057 , Y10T156/1084
摘要： A method of forming a layered polishing pad is disclosed. The method includes double-laminating a subpad on opposing sides with respective adhesive layers and bonding a polishing pad top layer to the subpad via the upper adhesive layer. The polishing pad optionally includes a window. Because the subpad is double-laminated, an opening can be formed through both the top and bottom adhesive layers as well as the subpad. Thus, when bonded to a top polishing pad layer having a window, the result is a layered polishing pad with a through optical path that does not include an adhesive layer.
摘要翻译： 公开了一种形成分层抛光垫的方法。 该方法包括在相对侧面上用相应的粘合剂层将亚垫层压并通过上部粘合剂层将抛光垫顶层粘合到子垫上。 抛光垫可选地包括窗口。 由于子层是双层的，所以可以通过顶部和底部粘合剂层以及子垫形成开口。 因此，当结合到具有窗口的顶部抛光垫层时，结果是具有不包括粘合剂层的贯穿光路的分层抛光垫。
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7.发明授权公开(公告)号：US07275928B2
公开(公告)日：2007-10-02
申请号：US10996199
申请日：2004-11-23
摘要： The present invention provides an apparatus for forming a chemical mechanical polishing pad, comprising a tank with polymeric materials, a storage silo with microspheres and a curative storage tank with curing agents. The apparatus further provides a premix prep tank for forming a pre-mixture of the polymeric materials and the microspheres and a recirculation loop in the premix prep tank for recirculating the pre-mixture until a desired bulk density is reached. The apparatus further provides a premix run tank for storing the pre-mixture, a mixer for forming a mixture of the pre-mixture and the curing agents and a mold for molding the mixture.
摘要翻译： 本发明提供了一种用于形成化学机械抛光垫的装置，包括具有聚合材料的罐，具有微球的储存仓和具有固化剂的固化储存罐。 该装置还提供了一种用于形成聚合物材料和微球体的预混合物的预混合制备罐和在预混料制备罐中的再循环回路，用于再循环预混合物直到达到所需的体积密度。 该装置还提供了用于储存预混合物的预混运行罐，用于形成预混合物和固化剂的混合物的混合器和用于模制混合物的模具。
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公开(公告)号：US07169017B1
公开(公告)日：2007-01-30
申请号：US11492443
申请日：2006-07-25
申请人： Alan H. Saikin
发明人： Alan H. Saikin
CPC分类号： B24B37/205 , B24D11/008
摘要： The present invention provides a polishing pad for performing chemical mechanical planarization of semiconductor substrates. The polishing pad comprises a polishing pad body having an aperture formed therein and a window fixed in the aperture for performing in-situ optical measurements of the substrate. The window has a lower surface capable of transmitting light incident thereon. The lower surface has been treated by laser ablation to remove surface roughness present on the lower surface.
摘要翻译： 本发明提供一种用于进行半导体基板的化学机械平面化的抛光垫。 抛光垫包括其中形成有孔的抛光垫体和固定在孔中的窗口，用于对衬底进行原位光学测量。 窗口具有能够透过入射到其上的光的下表面。 通过激光烧蚀处理下表面以去除下表面上的表面粗糙度。
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公开(公告)号：US06358130B1
公开(公告)日：2002-03-19
申请号：US09671774
申请日：2000-09-28
IPC分类号： B24B2900
CPC分类号： B24B37/205 , B24B49/12 , B24D9/08
摘要： A polishing pad for use with a polishing fluid has, a polishing layer, a window in an opening through the polishing layer, and a fluid impermeable layer spanning across the polishing layer and the window and the opening to provide an uninterrupted continuous barrier to leakage of polishing fluid, the fluid impermeable layer having thereon an adhesive forming bond seals with the polishing layer and the window.
摘要翻译： 与抛光液一起使用的抛光垫具有抛光层，通过抛光层的开口中的窗口，以及穿过抛光层和窗口和开口的不透液层，以提供不间断的连续屏障 抛光液，其上具有粘合剂形成粘合的流体不可渗透层与抛光层和窗口密封。
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