Multipart suture
    4.
    发明授权

    公开(公告)号:US12220122B2

    公开(公告)日:2025-02-11

    申请号:US18487601

    申请日:2023-10-16

    Inventor: Bart Bracy

    Abstract: A multicomponent suture comprising first and second substantially elongate suture portions with respective first and second cross-sectional profiles, and further including respective first and second materials, one of said materials being bioabsorbable and a second of said materials being non-bioabsorbable.

    Systems and methods for nasal irrigation

    公开(公告)号:US12213939B2

    公开(公告)日:2025-02-04

    申请号:US18077002

    申请日:2022-12-07

    Abstract: Systems and methods for nasal irrigation are provided in which a nasal irrigation device includes a source of saline solution, an effluent receptacle, a nasal interface, a vacuum source, a fluid passageway to communicate the source of saline solution with the effluent receptacle through the nasal interface and a nasal cavity of a user, and a switch and valve assembly for selectively controlling the vacuum source and flow of the saline solution through the fluid passageway. The source of saline solution is disposed relative to the device to provide gravitational inducement of the saline solution to the nasal interface in engagement to the device user's nostrils. A combination of the gravitational inducement and a relative vacuum from the effluent receptacle generates a fluid flow for irrigating, cleansing and massaging the nasal cavity and ostia of the user. The entire device is assembled as a hand-held device for convenient lifting and disposal against the user's nostrils.

    Wave driven variable leverage pump for water desalination

    公开(公告)号:US12203461B2

    公开(公告)日:2025-01-21

    申请号:US18438252

    申请日:2024-02-09

    Applicant: BlueDesal Inc.

    Inventor: Joseph B. Tate

    Abstract: A wave driven variable leverage pump for water desalination is disclosed. According to one embodiment, a variable leverage pump comprises a platform and a paddle comprising at least one lever arm extending therefrom. The at least one lever arm is pivotally coupled with the platform. The pump further comprises a pump having a first end pivotally coupled with the platform, and a second end pivotally coupled with the paddle. A pivot point of the at least one lever arm is located above a pivot point of the pump relative to the platform.

    Hybrid terrain-adaptive lower-extremity systems

    公开(公告)号:US12201539B2

    公开(公告)日:2025-01-21

    申请号:US18058479

    申请日:2022-11-23

    Abstract: Hybrid terrain-adaptive lower-extremity apparatus and methods that perform in a variety of different situations by detecting the terrain that is being traversed, and adapting to the detected terrain. In some embodiments, the ability to control the apparatus for each of these situations builds upon five basic capabilities: (1) determining the activity being performed; (2) dynamically controlling the characteristics of the apparatus based on the activity that is being performed; (3) dynamically driving the apparatus based on the activity that is being performed; (4) determining terrain texture irregularities (e.g., how sticky is the terrain, how slippery is the terrain, is the terrain coarse or smooth, does the terrain have any obstructions, such as rocks) and (5) a mechanical design of the apparatus that can respond to the dynamic control and dynamic drive.

    Method for manufacturing semiconductor device

    公开(公告)号:US12198930B2

    公开(公告)日:2025-01-14

    申请号:US17630674

    申请日:2021-11-12

    Abstract: A method for manufacturing a semiconductor device. A photolithographic coating, including a first film, a photolithographic film, and a second film, is formed on the to-be-connected structure. Refractive indexes of the first film and the second film are smaller than 1, so that the photolithographic coating forms an optical structure with a high reflection coefficient. The photolithographic coating is exposed to a light having a target wavelength through a mask. The to-be-connected structure is reflected in the photolithographic coating, and hence serves as another mask and is imaged to the photolithographic film. A pattern of the mask is simultaneously imaged to the photolithographic film. That is, both the to-be-connected structure and the pattern of the mask are imaged to a target region of the photolithographic film, and the target region corresponds to the to-be-connected structure.

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