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公开(公告)号：US11899477B2
公开(公告)日：2024-02-13
申请号：US17670723
申请日：2022-02-14
申请人： Ichor Systems, Inc.
CPC分类号： G05D7/0652 , F16K27/003 , F16K37/005
摘要： Systems for processing articles are essential for semiconductor fabrication. In one embodiment, a system is disclosed comprising a plurality of fluid supplies configured to supply process fluids, a plurality of apparatuses for controlling flow, a plurality of mounting substrates, a vacuum manifold fluidly coupled to the plurality of mounting substrates, an outlet manifold fluidly coupled to the plurality of mounting substrates, a vacuum source fluidly coupled to the vacuum manifold, and a processing chamber fluidly coupled to the outlet manifold. The plurality of apparatuses for controlling flow have a bleed port and an outlet. The outlets of the plurality of apparatuses are fluidly coupled to corresponding outlet ports of the plurality of mounting substrates. The bleed ports of the plurality of apparatuses are fluidly coupled to the corresponding vacuum ports of the plurality of mounting substrates.
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公开(公告)号：US20240028055A1
公开(公告)日：2024-01-25
申请号：US18481298
申请日：2023-10-05
申请人： Ichor Systems, Inc.
发明人： Daniel T. Mudd , Marshall B. Grill , Norman L. Batchelor, II , Sean Joseph Penley , Michael Maeder , Patti J. Mudd , Zachariah Ezekiel McIntyre , Tyler James Wright , Matthew Eric Kovacic , Christopher Bryant Davis
CPC分类号： G05D7/0126 , G05D7/0682 , G01F1/6842 , G01F1/6847 , G01F15/002 , G05D7/0635 , F16K27/003
摘要： A gas flow control system for delivering a plurality of gas flows. The gas flow control system has a gas flow path extending from a gas inlet to first and second gas outlets. First and second flow restrictors are operably coupled to the gas flow path. First and second valves are operably coupled to the gas flow path such that when both first and second valves are in a fully open state, flows of gas from the first and second gas outlets are split according to the impedances of the first and second flow restrictors.
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3.发明公开公开(公告)号：US20230296175A1
公开(公告)日：2023-09-21
申请号：US18321873
申请日：2023-05-23
申请人： Ichor Systems, Inc.
发明人： Stephen CARSON , Randolph Treur
CPC分类号： F16J15/061 , B23P19/10 , F16J15/104 , H01L21/67017
摘要： Apparatuses for controlling fluid flow are important components for delivering process fluids for semiconductor fabrication. These apparatuses for controlling fluid flow require a variety of fluid flow components which are tightly packaged within the apparatuses for controlling flow. Servicing the apparatuses requires specialized equipment and methods which enable installation of seals in close quarters in apparatuses which are installed in the field. Seal retainers may be used to retain the seals during assembly of fluid flow components into apparatus for controlling flow.
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公开(公告)号：US20220283596A1
公开(公告)日：2022-09-08
申请号：US17670723
申请日：2022-02-14
申请人： Ichor Systems, Inc.
摘要： Systems for processing articles are essential for semiconductor fabrication. In one embodiment, a system is disclosed comprising a plurality of fluid supplies configured to supply process fluids, a plurality of apparatuses for controlling flow, a plurality of mounting substrates, a vacuum manifold fluidly coupled to the plurality of mounting substrates, an outlet manifold fluidly coupled to the plurality of mounting substrates, a vacuum source fluidly coupled to the vacuum manifold, and a processing chamber fluidly coupled to the outlet manifold. The plurality of apparatuses for controlling flow have a bleed port and an outlet. The outlets of the plurality of apparatuses are fluidly coupled to corresponding outlet ports of the plurality of mounting substrates. The bleed ports of the plurality of apparatuses are fluidly coupled to the corresponding vacuum ports of the plurality of mounting substrates.
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公开(公告)号：US20210366735A1
公开(公告)日：2021-11-25
申请号：US17393468
申请日：2021-08-04
申请人： Ichor Systems, Inc.
IPC分类号： H01L21/67 , H01J37/32 , H01L21/677
摘要： An improved fluid delivery system and method that directly controls the concentration of constituent components in a fluid mixture delivered, for example, to a process chamber. Pressure of the fluid mixture can also be directly controlled. A concentration sensor capable of measuring concentration of all of the constituent components in a fluid mixture is used to provide signals used to vary the flow rate of constituent gases under a closed loop feedback system. The signal output of one or more pressure sensors can also be used to provide a signal used to vary the flow rate of constituent gases under a closed loop feedback system. By directly controlling these two extremely important process variables, embodiments of the present invention provide a significant advantage in measurement accuracy over the prior art, enable real-time process control, reduce system level response time, and allow for a system with a significant footprint reduction.
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公开(公告)号：US20210356041A1
公开(公告)日：2021-11-18
申请号：US17318241
申请日：2021-05-12
申请人： Ichor Systems, Inc.
发明人： Stephen CARSON , Randolph TREUR
摘要： Apparatuses for controlling fluid flow are important components for delivering process fluids for semiconductor fabrication. These apparatuses for controlling fluid flow require a variety of fluid flow components which are tightly packaged within the apparatuses for controlling flow. Servicing the apparatuses requires specialized equipment and methods which enable installation of seals in close quarters in apparatuses which are installed in the field. Seal retainers may be used to retain the seals during assembly of fluid flow components into apparatus for controlling flow.
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公开(公告)号：US10663337B2
公开(公告)日：2020-05-26
申请号：US15858689
申请日：2017-12-29
发明人： Sean Penley , Michael Maeder
IPC分类号： G01F15/00 , G05B13/02 , G01N7/00 , G05D7/06 , G01F17/00 , G05D7/00 , G05D7/01 , G01F22/02 , G01F25/00 , G01F1/36
摘要： Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. In one embodiment, a method of calibrating an apparatus for controlling gas flow is disclosed. Specifically, the apparatus may be calibrated on installation using a two-step process of measuring the volume of gas box downstream from the apparatus by flowing nitrogen gas into the gas box and measuring the resulting temperature and rate of pressure rise. Using the computed volume of the gas box, a sweep of several mass flow rates may be performed using the process gas and the gas map for the process gas. The apparatus is calibrated based on the measured temperature and pressure values, which allow calculation of the actual mass flow rate for the process gas as compared with the commanded mass flow rates.
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公开(公告)号：US20240026909A1
公开(公告)日：2024-01-25
申请号：US18375629
申请日：2023-10-02
申请人： Ichor Systems, Inc.
发明人： Sean Joseph Penley , Zachariah Ezekiel McIntyre , Tyler James Wright , Matthew Eric Kovacic , Christopher Bryant Davis
CPC分类号： F15D1/025 , H01L21/67017 , F16K1/32
摘要： Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. These apparatuses for controlling gas flow frequently rely on flow restrictors which can provide a known flow impedance of the process gas. In one embodiment, a flow restrictor is disclosed, the flow restrictor constructed of a plurality of layers, one or more of the layers having a flow passage therein that extends from a first aperture at a first end of the flow restrictor to a second aperture at a second end of the flow restrictor.
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公开(公告)号：US11682565B2
公开(公告)日：2023-06-20
申请号：US17393468
申请日：2021-08-04
申请人： Ichor Systems, Inc.
IPC分类号： H01J37/32 , H01L21/67 , H01L21/677
CPC分类号： H01L21/67017 , H01J37/32449 , H01L21/6715 , H01L21/67161 , H01L21/67739
摘要： An improved fluid delivery system and method that directly controls the concentration of constituent components in a fluid mixture delivered, for example, to a process chamber. Pressure of the fluid mixture can also be directly controlled. A concentration sensor capable of measuring concentration of all of the constituent components in a fluid mixture is used to provide signals used to vary the flow rate of constituent gases under a closed loop feedback system. The signal output of one or more pressure sensors can also be used to provide a signal used to vary the flow rate of constituent gases under a closed loop feedback system. By directly controlling these two extremely important process variables, embodiments of the present invention provide a significant advantage in measurement accuracy over the prior art, enable real-time process control, reduce system level response time, and allow for a system with a significant footprint reduction.
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公开(公告)号：US11585444B2
公开(公告)日：2023-02-21
申请号：US16985635
申请日：2020-08-05
申请人： Ichor Systems, Inc.
发明人： Matthew Eric Kovacic , Zachariah Ezekiel McIntyre , Sean Joseph Penley , Christopher Bryant Davis
摘要： Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. These apparatuses for controlling gas flow frequently rely on effectively sealed flow restrictors which can eliminate leakage of process gas around the flow restrictors. In one embodiment, a seal for a flow restrictor is disclosed, the seal comprising a plastic cylinder which is shrink fit onto a sealing portion of the flow restrictor. In another embodiment, a seal for a flow restrictor is disclosed, the seal having a first sealing ring with a flow aperture, a flow restrictor installed into the flow aperture.
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