公开(公告)号：US20090047608A1

公开(公告)日：2009-02-19

申请号：US12191108

申请日：2008-08-13

Applicant: W. Thomas Novak ,  Daniel Gene Smith

Inventor： W. Thomas Novak ,  Daniel Gene Smith

IPC: G03F7/20 ,  G03B27/42

CPC classification number: G03F7/2028 ,  G03F7/70216 ,  G03F7/70425 ,  G03F7/70991

Abstract: An edge shot (“ES”) exposure apparatus (14) for transferring edge features (ef) to a substrate edge region (222) of a substrate (18) includes a feature transferer (55), and an ES wafer stage assembly (62). The feature transferer (55) transfers one or more edge features (ef) to the substrate edge region (222), while the ES wafer stage assembly (62) rotates the substrate (18) about a substrate axis (23). This allows the feature transferer (55) to transfer the edge features (ef) to a plurality of alternative locations in the substrate edge region (222). The ES exposure apparatus (14) can be used in conjunction with a primary exposure apparatus (12) that transfers usable features (uf) to a substrate usable region (220) of the substrate (18). With this design, the primary exposure apparatus (12) can be transferring usable features (uf) to a first substrate (18A) while the ES exposure apparatus (14) is transferring edge features (ef) to a second substrate (18B). As a result thereof, the overall throughput is improved because the primary exposure apparatus (12) does not need to transfer features to the substrate edge region (222).

Abstract translation: 用于将边缘特征（ef）传送到基板（18）的基板边缘区域（222）的边缘投射（“ES”）曝光装置（14）包括特征转移器（55）和ES晶片台组件 ）。 特征转移器（55）将一个或多个边缘特征（ef）传送到衬底边缘区域（222），而ES晶片台组件（62）围绕衬底轴线（23）旋转衬底（18）。 这允许特征转移器（55）将边缘特征（ef）传送到衬底边缘区域（222）中的多个替代位置。 ES曝光装置（14）可以与将可用特征（uf）传送到基板（18）的基板可用区域（220）的一次曝光装置（12）结合使用。 通过这种设计，当ES曝光装置（14）将边缘特征（ef）传送到第二基板（18B）时，一次曝光装置（12）可以将可用特征（uf）传送到第一基板（18A）。 结果，由于一次曝光装置（12）不需要将特征传送到基板边缘区域（222），所以整体吞吐量得到改善。

公开(公告)号：US20080316445A1

公开(公告)日：2008-12-25

申请号：US11628942

申请日：2004-12-20

Applicant: Douglas C. Watson ,  W. Thomas Novak

Inventor： Douglas C. Watson ,  W. Thomas Novak

IPC: G03B27/42 ,  G03B27/52

CPC classification number: G03F7/70258 ,  G03F7/70341 ,  G03F7/70833 ,  G03F7/709

Abstract: An immersion lithography system that compensating for any displacement of the optical caused by the immersion fluid. The system includes an optical assembly (14) to project an image defined by the reticle (12) onto the wafer (20). The optical assembly includes a final optical element (16) spaced from the wafer by a gap (24). An immersion element (22) is provided to supply an immersion fluid into the gap and to recover any immersion fluid that escapes the gap. A fluid compensation system is provided for the force on the final optical element of the optical assembly caused by pressure variations of the immersion fluid. The resulting force created by the varying pressure may cause final optical element to become displaced. The fluid compensation system is configured to provide a substantially equal, but opposite force on the optical assembly, to prevent the displacement of the final optical element.

Abstract translation: 一种浸没式光刻系统，用于补偿由浸液引起的光学位移。 该系统包括光学组件（14），用于将由标线片（12）限定的图像投影到晶片（20）上。 光学组件包括通过间隙（24）与晶片间隔开的最终光学元件（16）。 提供浸入元件（22）以将浸没流体供应到间隙中并且回收逸出间隙的任何浸没流体。 为由于浸没流体的压力变化引起的光学组件的最终光学元件上的力提供流体补偿系统。 由变化的压力产生的所产生的力可能导致最终的光学元件变位。 流体补偿系统被配置为在光学组件上提供基本相等但相反的力，以防止最终光学元件的位移。

公开(公告)号：US07397532B2

公开(公告)日：2008-07-08

申请号：US11235323

申请日：2005-09-27

Applicant: W. Thomas Novak

Inventor： W. Thomas Novak

IPC: G03B27/52

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/7095

Abstract: An exposure apparatus for transferring an image to a device includes an optical assembly, an immersion fluid system, and a device stage assembly. The optical assembly is positioned so that there is a gap above the device. The immersion fluid system fills the gap with an immersion fluid. The device stage assembly includes a sloped region that facilitates movement of the immersion fluid that exits the gap away from the device. The device stage assembly can include a collection region and a recovery system that recovers immersion fluid from the collection region.

公开(公告)号：US07333179B2

公开(公告)日：2008-02-19

申请号：US10918182

申请日：2004-08-13

Applicant: Bausan Yuan ,  Martin E. Lee ,  W. Thomas Novak

Inventor： Bausan Yuan ,  Martin E. Lee ,  W. Thomas Novak

IPC: G03B27/58 ,  G03B27/62

CPC classification number: G03F7/70775 ,  G03F7/70725 ,  G03F7/70758 ,  G03F7/70766

Abstract: Methods and apparatus for providing a stage with a relatively high positioning bandwidth and low transmissibility are disclosed. According to one aspect of the present invention, a method for positioning a stage including providing a first force of a first magnitude to the stage using a primary actuator and providing a second force of a second magnitude to the stage using a secondary actuator. The first force is arranged to cause the stage to translate along a first axis. The secondary actuator is also arranged to cause the stage to translate along the first axis, and has a relatively high positioning bandwidth. The first force is arranged to enable the stage to be relatively coarsely positioned and the second force is arranged to enable the stage to be relatively finely positioned. In one embodiment, the secondary actuator is one of a voice coil motor and a piezoelectric motor.

Abstract translation: 公开了提供具有相对高的定位带宽和低传输性的平台的方法和装置。 根据本发明的一个方面，一种用于定位平台的方法，包括使用主致动器向舞台提供第一幅度的第一力，并使用辅助致动器向舞台提供第二大小的第二力。 第一力布置成使得台架沿着第一轴线平移。 次级致动器还被布置成使得平台沿着第一轴线平移，并且具有相对较高的定位带宽。 第一力被布置成使得台架能够相对粗略地定位，并且第二力被布置成使得台架能够相对精细地定位。 在一个实施例中，次级致动器是音圈电动机和压电电动机之一。

公开(公告)号：US07172493B2

公开(公告)日：2007-02-06

申请号：US11252483

申请日：2005-10-18

Applicant: W. Thomas Novak ,  Douglas C. Watson ,  Pai-Hsueh Yang ,  Bausan Yuan

Inventor： W. Thomas Novak ,  Douglas C. Watson ,  Pai-Hsueh Yang ,  Bausan Yuan

IPC: B24B49/00

CPC classification number: B24B37/042 ,  B24B37/005 ,  B24B37/30 ,  B24B41/068

Abstract: A polishing apparatus (10) for polishing a device (12) with a polishing pad (48) includes a pad holder (50) and an actuator assembly (432). The pad holder (50) retains the polishing pad (48). The actuator assembly (432) includes a plurality of spaced apart actuators (438F) (438S) (438T) that are coupled to the pad holder (50). The actuators (438F) (438S) (438T) cooperate to direct forces on the pad holder (50) to alter the pressure of the polishing pad (48) on the device (12). At least one of the actuators (438F) (438S) (438T) includes a first actuator subassembly (440) and a second actuator subassembly (442) that interacts with the first actuator subassembly (440) to direct a force on the pad holder (50). The second actuator subassembly (442) is coupled to the pad holder (50) and the second actuator subassembly (442) rotates with the pad holder (50) relative to the first actuator subassembly (440).

Abstract translation: 用于用抛光垫（48）抛光装置（12）的抛光装置（10）包括垫保持器（50）和致动器组件（432）。 垫保持器（50）保持抛光垫（48）。 致动器组件（432）包括多个间隔开的致动器（438F）（438S）（438T），其联接到所述垫保持器（50）。 致动器（438F）（438S）（438T）协作以引导焊盘保持器（50）上的力，以改变设备（12）上的抛光垫（48）的压力。 致动器（438F）（438T）（438T）中的至少一个包括与第一致动器子组件（440）相互作用的第一致动器子组件（440）和第二致动器子组件（442），以将力 垫座（50）。 第二致动器子组件（442）联接到焊盘保持器（50），并且第二致动器子组件（442）相对于第一致动器子组件（440）与焊盘保持器（50）一起旋转。

公开(公告)号：US07072024B2

公开(公告)日：2006-07-04

申请号：US10761436

申请日：2004-01-20

Applicant: W. Thomas Novak

Inventor： W. Thomas Novak

IPC: G03B27/42 ,  G03B27/52 ,  G03B27/58 ,  G01N21/86

CPC classification number: G03F7/7075 ,  G03F9/7003 ,  G03F9/7034

Abstract: A lithographic projection apparatus for successively projecting a pattern on wafers by preliminarily determining locations of surface points of each wafer before it is illuminated in a projection station has a pair of measuring stations arranged oppositely with respect to the projection station at the center. Each measuring station has a wafer surface sensor for determining the locations of surface points of the wafer carried on a stage and a stage height sensor for measuring the height of a reference plane on the stage. A wafer on a stage is placed in one of the measuring stations to have measurements taken and ideal height data are collected while another wafer is being illuminated in the projection station. After these measurement and illumination processes are completed, the illuminated wafer is removed from the projection station and replaced with a new wafer to be measured and illuminated. In the meantime, the measured wafer is transported into the projection station while the stage height sensor continues to monitor the height of its reference plane by using a measuring beam. Once inside the projection station, the collected ideal height data are used to control the wafer during exposure.

Abstract translation: 通过预先确定每个晶片在投影站中被照射之前的表面点的位置，在晶片上连续地投影图案的光刻投影装置具有相对于投影站在中心相对布置的一对测量站。 每个测量站具有晶片表面传感器，用于确定载置在载物台上的晶片的表面点的位置和用于测量载物台上参考平面高度的载物台高度传感器。 将台架上的晶片放置在一个测量站中，以进行测量，并且在投影站中照亮另一个晶片时收集理想的高度数据。 在这些测量和照明处理完成之后，将照射的晶片从投影站移除并替换为待测量和照明的新晶片。 同时，测量的晶片被输送到投影站，而台架高度传感器通过使用测量梁继续监视其参考平面的高度。 一旦在投影站内，采集的理想高度数据被用于在曝光期间控制晶片。

公开(公告)号：US06765650B2

公开(公告)日：2004-07-20

申请号：US09927683

申请日：2001-08-09

Applicant: W. Thomas Novak

Inventor： W. Thomas Novak

IPC: G03B2758

CPC classification number: G03F7/70816 ,  G03B27/42 ,  G03F7/70841

Abstract: An air bearing stage device which is suitable for use with a vacuum environment is disclosed. According to one aspect of the present invention, a stage apparatus includes a table that is positioned in a system vacuum chamber, a first rod that carries the table, and first and second plates that support the first rod. The first plate includes an air bearing surface that is held against the first side of a first wall by a first vacuum force. A first drive mechanism drives the first plate to move the first rod in a first direction, and also drives the second plate to move the first rod in the first direction, while a second drive mechanism which includes a second rod and a first linear motor causes the second rod to move the first rod in a second direction.

Abstract translation: 公开了适用于真空环境的空气轴承平台装置。 根据本发明的一个方面，一种舞台装置包括一个位于系统真空室中的工作台，一个承载工作台的第一个杆以及支撑第一个杆的第一个和第二个板。 第一板包括通过第一真空力保持抵靠第一壁的第一侧的空气轴承表面。 第一驱动机构驱动第一板沿第一方向移动第一杆，并且还驱动第二板以沿第一方向移动第一杆，而包括第二杆和第一线性马达的第二驱动机构导致 所述第二杆沿第二方向移动所述第一杆。

公开(公告)号：US06653639B1

公开(公告)日：2003-11-25

申请号：US09691303

申请日：2000-10-17

Applicant: W. Thomas Novak

Inventor： W. Thomas Novak

IPC: G01J100

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F7/707 ,  G03F7/70708 ,  H01J37/3174 ,  H01J2237/31794

Abstract: A lithography system for processing a substrate is disclosed. The lithography system includes a stage for moving the substrate relative to a beam. The lithography system further includes a chuck for securely holding the substrate during stage movement. The lithography system additionally includes a support assembly for holding the chuck in a fixed position relative to the stage while accommodating for deformations in either the chuck or the stage during processing so as to precisely locate the substrate relative to the stage and to reduce external stresses that cause substrate distortions.

Abstract translation: 公开了一种用于处理衬底的光刻系统。 光刻系统包括用于相对于光束移动衬底的台。 光刻系统还包括用于在阶段运动期间牢固地保持衬底的卡盘。 光刻系统还包括支撑组件，用于将卡盘保持在相对于载物台的固定位置，同时在加工期间容纳用于卡盘或台架中的变形，以便相对于载物台精确地定位基板并且减小外部应力 导致基板失真。

公开(公告)号：US06478136B2

公开(公告)日：2002-11-12

申请号：US09755099

申请日：2001-01-08

Applicant: W. Thomas Novak

Inventor： W. Thomas Novak

IPC: B65G3700

CPC classification number: B23Q7/04 ,  B23Q1/621 ,  B23Q16/02

Abstract: In a system and method for automatically transporting and precisely positioning a work piece at a station for processing, a relatively low precision transport mechanism is utilized to transfer a chuck that holds the work piece to and from the processing station. Notwithstanding the use of the low precision transport mechanism, the chuck can be precisely positioned at the processing station by using a quasi-kinematic coupling. More specifically, the chuck is precisely located at the coupling by engaging pre-defined indexing notches at the coupling. The chuck is securely held against the coupling at the processing station by suction. The coupling may be supported on a precision stage, which is configured to further position the chuck with the work piece thereon with high precision for processing at the processing station. In another aspect of the invention, the chuck is configured to securely hold a smooth surface of the work piece by suction. In a further aspect of the invention, the transport mechanism may be configured to transfer the chuck between multiple processing stations. Each processing station has a similar quasi-kinetic coupling. The coupling may be supported on a single precision stage, which further positions the chuck with relatively high precision with respect to the processing apparatus.

Abstract translation: 在用于在工位进行自动运送和精确定位工件以进行处理的系统和方法中，使用相对低精度的传送机构来传送将工件保持在加工站和从处理站的卡盘。 尽管使用了低精度的传送机构，但卡盘可以通过使用准运动学耦合精确地定位在处理站。 更具体地，卡盘通过在联轴器处接合预定义的分度凹槽来精确地位于联接器处。 卡盘通过抽吸牢固地固定在处理站处的联接器上。 联轴器可以被支撑在精密台上，该精密台被配置为进一步将卡盘与其上的工件以高精度进一步放置在处理站处进行处理。 在本发明的另一方面，卡盘构造成通过抽吸可靠地保持工件的光滑表面。 在本发明的另一方面，传送机构可以被配置成在多个处理站之间传送卡盘。 每个处理站具有类似的准动力耦合。 联接器可以被支撑在单个精密平台上，这进一步相对于处理装置以相对较高的精度来定位卡盘。

公开(公告)号：US06239924B1

公开(公告)日：2001-05-29

申请号：US09386255

申请日：1999-08-31

Applicant: Douglas C. Watson ,  W. Thomas Novak

Inventor： Douglas C. Watson ,  W. Thomas Novak

IPC: G02B702

CPC classification number: G03F7/70241 ,  G02B7/022 ,  G02B7/026 ,  G02B7/028 ,  G03F7/70825

Abstract: A cell for mounting a lens includes a set of resilient mounting structures which can include a plurality of seats affixed to radial flexure mounts, a set of compliant soft mounts or a combination of the radial flexure mounts and soft mounts. The radial flexure mounts additionally include a pair of flexures extending at opposite ends of the flexure mount. The flexures permit the lens to radially expand and contract relative to the cell due to temperature changes. The seats are affixed to the flexure mounts to prevent torsional moments on the flexure mounts due to gravity or vibration. Additionally, there is no torsion moment on the radial flexure mounts due to radial expansion. The set of soft mounts include a spring member for distributing the gravitational load without overconstraining the lens.

Abstract translation: 用于安装透镜的单元包括一组弹性安装结构，其可以包括固定到径向弯曲安装座的多个座，一组柔性软安装座或径向挠性安装座和软座的组合。 径向弯曲安装件还包括在挠曲安装件的相对端延伸的一对挠曲件。 由于温度变化，挠曲件允许镜片相对于电池径向膨胀和收缩。 座椅固定在挠性支架上，以防止由于重力或振动引起的弯曲安装座上的扭转力矩。 另外，由于径向膨胀，径向弯曲安装座上没有扭转力矩。 该软组件包括用于分配重力载荷而不过度约束透镜的弹簧构件。