公开(公告)号：US07365321B2

公开(公告)日：2008-04-29

申请号：US11086048

申请日：2005-03-22

Applicant: Mehran Nasser-Ghodsi ,  Mark Borowicz

Inventor： Mehran Nasser-Ghodsi ,  Mark Borowicz

IPC: H01J37/06

CPC classification number: H01J37/317 ,  G01N1/32 ,  H01J37/244 ,  H01J37/3005 ,  H01J2237/2814 ,  H01J2237/3174 ,  H01J2237/31745

Abstract: Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis are provided. One method for measuring a characteristic of a substrate includes removing a portion of a feature on the substrate using an electron beam to expose a cross-sectional profile of a remaining portion of the feature. The feature may be a photoresist feature. The method also includes measuring a characteristic of the cross-sectional profile. A method for preparing a substrate for analysis includes removing a portion of a material on the substrate proximate to a defect using chemical etching in combination with an electron beam. The defect may be a subsurface defect or a partially subsurface defect. Another method for preparing a substrate for analysis includes removing a portion of a material on a substrate proximate to a defect using chemical etching in combination with an electron beam and a light beam.

Abstract translation: 提供了用于测量基板的特性或准备用于分析的基板的方法和系统。 用于测量衬底的特性的一种方法包括使用电子束去除衬底上的特征的一部分以暴露特征的剩余部分的横截面轮廓。 该特征可以是光致抗蚀剂特征。 该方法还包括测量横截面轮廓的特性。 制备用于分析的基板的方法包括使用化学蚀刻与电子束结合来去除靠近缺陷的衬底上的材料的一部分。 缺陷可能是地下缺陷或部分地下缺陷。 制备用于分析的衬底的另一种方法包括使用化学蚀刻与电子束和光束组合地去除邻近缺陷的衬底上的材料的一部分。

公开(公告)号：US07012268B2

公开(公告)日：2006-03-14

申请号：US10847127

申请日：2004-05-17

Applicant: Nobuo Matsuki ,  Atsuki Fukazawa ,  Naoto Tsuji

Inventor： Nobuo Matsuki ,  Atsuki Fukazawa ,  Naoto Tsuji

IPC: H01J37/32 ,  H01J37/06

CPC classification number: H01J33/00 ,  H01J37/06

Abstract: An electron-beam irradiation apparatus includes an evacuatable filament-electron gun chamber housing a filament and an anode and having an inactive-gas inlet through which an inactive gas flows in; an evacuatable treatment chamber connected to an exhaust system; and a separation wall for separating the filament-electrode gun chamber and the treatment chamber. The separation wall has an aperture configured to pass electrons and gas therethrough from the filament-electron gun chamber.

Abstract translation: 电子束照射装置包括容纳灯丝和阳极并具有非活性气体入口的惰性气体入口的可抽出的灯丝电子枪室; 连接到排气系统的可抽空处理室; 以及用于分离灯丝电极枪室和处理室的分离壁。 分隔壁具有孔，该孔被配置为使电子和气体从灯丝电子枪室通过。

公开(公告)号：US06953946B2

公开(公告)日：2005-10-11

申请号：US10674459

申请日：2003-10-01

Applicant: In-kyeong Yoo ,  Chang-wook Moon ,  Soo-hwan Jeong ,  Dong-wook Kim

Inventor： In-kyeong Yoo ,  Chang-wook Moon ,  Soo-hwan Jeong ,  Dong-wook Kim

IPC: G03F7/20 ,  H01J1/312 ,  H01J9/02 ,  H01J37/06 ,  H01J37/073 ,  H01J37/305 ,  H01L21/027 ,  H01L29/06 ,  H01L29/12 ,  H01L29/82 ,  H01L43/00

CPC classification number: B82Y10/00 ,  H01J1/312 ,  H01J9/022 ,  H01J9/027 ,  H01J2237/31774 ,  H01J2237/31783

Abstract: An emitter for an electron-beam projection lithography (EPL) system and a manufacturing method therefor are provided. The electron-beam emitter includes a substrate, an insulating layer overlying the substrate, and a gate electrode including a base layer formed on top of the insulating layer to a uniform thickness and an electron-beam blocking layer formed on the base layer in a predetermined pattern. The manufacturing method includes steps of: preparing a substrate; forming an insulating layer on the substrate; forming a base layer of a gate electrode by depositing a conductive metal on the insulating layer to a predetermined thickness; forming an electron-beam blocking layer of the gate electrode by depositing a metal capable of anodizing on the base layer to a predetermined thickness; and patterning the electron-beam blocking layer in a predetermined pattern by anodizing. The emitter provides a uniform electric field within the insulating layer and simplify the manufacturing method therefor.

Abstract translation: 提供了一种用于电子束投影光刻（EPL）系统的发射器及其制造方法。 电子束发射器包括衬底，覆盖衬底的绝缘层，以及包括形成在绝缘层顶部上的基底层至均匀厚度的栅极电极和以预定的方式形成在基底层上的电子束阻挡层 模式。 该制造方法包括以下步骤：制备衬底; 在所述基板上形成绝缘层; 通过在所述绝缘层上沉积导电金属至预定厚度来形成栅电极的基层; 通过在基底层上沉积能够阳极氧化的金属至预定的厚度来形成栅电极的电子束阻挡层; 并通过阳极氧化将预定图案中的电子束阻挡层图案化。 发射极在绝缘层内提供均匀的电场，并简化其制造方法。

公开(公告)号：US20050212395A1

公开(公告)日：2005-09-29

申请号：US10933296

申请日：2004-09-03

Applicant: Kazunori Anazawa ,  Chikara Manabe ,  Kentaro Kishi ,  Taishi Shigematsu ,  Miho Watanabe ,  Masaki Hirakata ,  Takashi Isozaki ,  Hiroyuki Watanabe ,  Shigeki Ooma ,  Shinsuke Okada

Inventor： Kazunori Anazawa ,  Chikara Manabe ,  Kentaro Kishi ,  Taishi Shigematsu ,  Miho Watanabe ,  Masaki Hirakata ,  Takashi Isozaki ,  Hiroyuki Watanabe ,  Shigeki Ooma ,  Shinsuke Okada

IPC: H01J37/06 ,  H01J1/02 ,  H01J1/304 ,  H01J9/02 ,  H01J29/04 ,  H01J37/073

CPC classification number: H01J1/304 ,  B82Y10/00 ,  H01J1/3044 ,  H01J9/025 ,  H01J37/073 ,  H01J2201/30446 ,  H01J2201/30469 ,  H01J2329/00

Abstract: An electron beam generator device includes a base body having a conductive surface and a electron-emission electrode having a carbon nanotube structure on the conductive surface of the substrate. The carbon nanotube structure constitutes a network structure which has plural carbon nanotubes and a crosslinked part including a chemical bond of plural functional groups. The chemical bond connects one end of one of the carbon nanotubes to another one of the carbon nanotubes. A method for producing an electron beam generator device, includes applying plural carbon nanotubes each having a functional group onto a conductive surface of a base body, and crosslinking the functional groups with a chemical bond to form a crosslinked part, thereby forming a carbon nanotube structure constituting a network structure having plural carbon nanotubes electrically connected to each other.

Abstract translation: 电子束发生器装置包括具有导电表面的基体和在基底的导电表面上具有碳纳米管结构的电子发射电极。 碳纳米管结构构成具有多个碳纳米管和包含多个官能团的化学键的交联部分的网络结构。 化学键将一个碳纳米管的一端连接到另一个碳纳米管。 一种电子束发生装置的制造方法，其特征在于，将具有官能团的多个碳纳米管涂布在基体的导电性表面上，并且通过化学键使所述官能团交联而形成交联部，由此形成碳纳米管结构体 构成具有彼此电连接的多个碳纳米管的网络结构。

公开(公告)号：US06949752B2

公开(公告)日：2005-09-27

申请号：US10295951

申请日：2002-11-18

Applicant: Akimitsu Okura ,  Masashi Kimura ,  Kenichi Hirane ,  Yoshihiko Nakayama

Inventor： Akimitsu Okura ,  Masashi Kimura ,  Kenichi Hirane ,  Yoshihiko Nakayama

IPC: H01J37/06 ,  G09G1/04 ,  H01J37/065 ,  H01J37/24 ,  H01J37/248 ,  H01L21/027 ,  H05B39/04

CPC classification number: H01J37/241 ,  H01J2237/0206

Abstract: Disclosed is an electron beam apparatus and method which can retain the state that minimizes the amount of water content contained at a gap between a high-voltage cable and a high-voltage introduction insulator to thereby prevent creation of high-voltage discharge and current leakage. The apparatus comprises a means for applying a high voltage to an acceleration electrode while eliminating electron release from an electron source and for detecting a change in an emission current corresponding to a change in an acceleration voltage at this time. In addition, the apparatus comprises a means for issuing a cautionary notice or warning when the change of this emission current exceeds a prespecified value. Further, the apparatus comprises a means for letting a dry gas flow in a gap portion between the electron gun's high-voltage cable and the high-voltage introduction insulator to thereby dehumidify said gap portion. With such an arrangement, it is possible to prevent high-voltage discharge due to an increase in water content of the gap portion and also instability of an electron beam due to a leakage current.

Abstract translation: 公开了一种电子束装置和方法，其可以保持使高压电缆和高压引入绝缘体之间的间隙中含有的含水量最小化的状态，从而防止高压放电和电流泄漏的产生。 该装置包括用于向加速电极施加高电压同时消除电子从电子源的释放并且用于检测与此时加速电压的变化相对应的发射电流的变化的装置。 此外，该装置包括当该发射电流的变化超过预定值时发出警告通知或警告的装置。 此外，该装置包括用于使干燥气体在电子枪的高压电缆和高压引入绝缘体之间的间隙部分中流动从而对所述间隙部分进行除湿的装置。 通过这样的布置，可以防止由于间隙部分的水分含量增加引起的高压放电以及由于漏电流引起的电子束的不稳定性。

公开(公告)号：US06903499B2

公开(公告)日：2005-06-07

申请号：US09985737

申请日：2001-11-06

Applicant: Yoshinori Terui ,  Shinpei Hirokawa ,  Katsuyoshi Tsunoda

Inventor： Yoshinori Terui ,  Shinpei Hirokawa ,  Katsuyoshi Tsunoda

IPC: H01J37/06 ,  H01J1/148 ,  H01J1/15 ,  H01J3/02 ,  H01J37/063 ,  H01J37/065 ,  H01J1/02

CPC classification number: H01J3/02 ,  H01J1/148 ,  H01J1/15 ,  H01J37/065

Abstract: An electron gun includes an electron emission cathode, a control electrode, and an extractor and the electron emission cathode is made of rare earth hexaboride. A tip of the electron emission cathode is located between the control electrode and the extractor, and the electron emission surface of the electron emission cathode is spherical or flat.

Abstract translation: 电子枪包括电子发射阴极，控制电极和提取器，电子发射阴极由稀土六硼化物制成。 电子发射阴极的尖端位于控制电极和提取器之间，电子发射阴极的电子发射表面是球形或​​平坦的。

公开(公告)号：US06891176B2

公开(公告)日：2005-05-10

申请号：US10601090

申请日：2003-06-20

Applicant: Petr Viscor ,  Michael Jensen ,  Rolf Stribolt Andersen ,  Vladimir Kolarik ,  Armin Delong

Inventor： Petr Viscor ,  Michael Jensen ,  Rolf Stribolt Andersen ,  Vladimir Kolarik ,  Armin Delong

IPC: G11B9/10 ,  H01J1/312 ,  H01J7/24 ,  H01J37/06 ,  H01J37/317

CPC classification number: B82Y10/00 ,  H01J1/312 ,  H01J2201/3125

Abstract: Metal-insulator-metal planar electron emitters (PEES) have potential for use in advanced lithography for future generations of semiconductor devices. The PEE has, however, a limited lifetime, which restricts its commercial applicability. It is believed that the limited lifetime of the PEE is limited by in-diffusion of metal ions from the anode. The in-diffusion may be countered in a number of different ways. One way is to cool the PEE to temperatures below room temperature. This lowers the metal ion mobility, and so the metal ions are less likely to diffuse into the insulator layer. Another way is to occasionally reverse the electrical potential across the PEE from the polarity used to generate the electron beam. This counteracts the electrical driving force that drives the positively charged metal ions from the PEE anode to the PEE cathode.

Abstract translation: 金属 - 绝缘体 - 金属平面电子发射体（PEES）有潜力用于未来几代半导体器件的先进光刻技术。 然而，PEE的寿命有限，限制了其商业应用。 据信，PEE的有限寿命受到来自阳极的金属离子的扩散的限制。 内扩散可以以多种不同的方式进行反驳。 一种方法是将PEE冷却到低于室温的温度。 这降低了金属离子迁移率，因此金属离子不太可能扩散到绝缘体层中。 另一种方法是偶尔从用于产生电子束的极性反转PEE两端的电位。 这抵消了驱动从PEE阳极到PEE阴极的带正电荷的金属离子的电驱动力。

公开(公告)号：US20050092921A1

公开(公告)日：2005-05-05

申请号：US10989368

申请日：2004-11-17

Applicant: Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Toshifumi Kimba ,  Hirosi Sobukawa ,  Tsutomu Karimata ,  Shin Oowada ,  Shoji Yoshikawa ,  Mutsumi Saito

Inventor： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Toshifumi Kimba ,  Hirosi Sobukawa ,  Tsutomu Karimata ,  Shin Oowada ,  Shoji Yoshikawa ,  Mutsumi Saito

IPC: G01N23/225 ,  G03F1/76 ,  G03F1/78 ,  H01J37/06 ,  H01J37/073 ,  H01J37/18 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  G21K7/00 ,  G01N23/00

CPC classification number: G01N23/225 ,  H01J37/06 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817

Abstract: An electron beam apparatus such as a sheet beam based testing apparatus has an electron-optical system for irradiating an object under testing with a primary electron beam from an electron beam source, and projecting an image of a secondary electron beam emitted by the irradiation of the primary electron beam, and a detector for detecting the secondary electron beam image projected by the electron-optical system. Specifically, the electron beam apparatus comprises beam generating means 2004 for irradiating an electron beam having a particular width, a primary electron-optical system 2001 for leading the beam to reach the surface of a substrate 2006 under testing, a secondary electron-optical system 2002 for trapping secondary electrons generated from the substrate 2006 and introducing them into an image processing system 2015, a stage 2003 for transportably holding the substrate 2006 with a continuous degree of freedom equal to at least one, a testing chamber for the substrate 2006, a substrate transport mechanism for transporting the substrate 2006 into and out of the testing chamber, an image processing analyzer 2015 for detecting defects on the substrate 2006, a vibration isolating mechanism for the testing chamber, a vacuum system for holding the testing chamber at a vacuum, and a control system 2017 for displaying or storing positions of defects on the substrate 2006.

Abstract translation: 诸如基于片材束的测试装置的电子束装置具有电子光学系统，用于用来自电子束源的一次电子束照射待测物体，并且投射通过照射的二次电子束的图像 一次电子束和用于检测由电子 - 光学系统投影的二次电子束图像的检测器。 具体地，电子束装置包括用于照射具有特定宽度的电子束的光束产生装置2004，用于引导光束到达待测基板2006的表面的初级电子 - 光学系统2001，二次电子光学系统2002 用于捕获从衬底2006产生的二次电子并将它们引入到图像处理系统2015中，用于以等于至少一个的连续自由度可移动地保持衬底2006的阶段2003，用于衬底2006的测试室，衬底 用于将基板2006输送到测试室中的传送机构，用于检测基板2006上的缺陷的图像处理分析器2015，用于测试室的隔振机构，用于将测试室保持在真空的真空系统，以及 用于在基板2006上显示或存储缺陷位置的控制系统2017。

公开(公告)号：US5898269A

公开(公告)日：1999-04-27

申请号：US863493

申请日：1997-05-27

Applicant: Aaron W. Baum ,  James Edward Schneider, Jr.

Inventor： Aaron W. Baum ,  James Edward Schneider, Jr.

IPC: H01J37/06 ,  G03F7/20 ,  H01J1/34 ,  H01J3/02 ,  H01J7/18 ,  H01J27/04 ,  H01J37/073 ,  H01J40/06

CPC classification number: G03F7/70375 ,  H01J27/04 ,  H01J3/021 ,  H01J37/073 ,  H01J2201/3423 ,  H01J2237/045 ,  H01J2237/06333 ,  H01J2237/28 ,  H01J2237/31754

Abstract: An electron beam source includes a cathode having an electron emission surface including an active area for emission of electrons and a cathode shield assembly including a conductive shield disposed in proximity to the electron emission surface of the cathode. The shield has an opening aligned with the active area. The electron beam source further includes a device for stimulating emission of electrons from the active area of the cathode, electron optics for forming the electrons into an electron beam and a vacuum enclosure for maintaining the cathode at high vacuum. The cathode may be a negative electron affinity photocathode formed on a light-transmissive substrate. The shield protects non-emitting areas of the emission surface from contamination and inhibits cathode materials from contaminating components of the electron beam source. The cathode may be moved relative to the opening in the shield so as to align an new active area with the opening. Getter materials and sources of activation material may be incorporated into the shield assembly.

Abstract translation: 电子束源包括具有电子发射表面的阴极，该电子发射表面包括用于发射电子的有源区和包括设置在阴极的电子发射表面附近的导电屏蔽的阴极屏蔽组件。 屏蔽罩具有与活动区域对齐的开口。 电子束源还包括用于刺激来自阴极的有源区域的电子的发射的装置，用于将电子形成电子束的电子光学器件和用于将阴极保持在高真空的真空外壳。 阴极可以是形成在透光基板上的负电子亲和光电阴极。 屏蔽保护发射表面的不发射区域免受污染，并阻止阴极材料污染电子束源的部件。 阴极可以相对于屏蔽件中的开口移动，以将新的有效区域与开口对准。 吸气材料和活化材料源可以并入屏蔽组件中。

公开(公告)号：USRE35024E

公开(公告)日：1995-08-22

申请号：US217424

申请日：1994-03-24

Applicant: Charles W. Hanks

Inventor： Charles W. Hanks

IPC: H01J37/077 ,  H01J37/06 ,  H01J37/065 ,  H01J37/24 ,  H01J37/248 ,  H01J37/305

CPC classification number: H01J37/241 ,  H01J37/248 ,  H01J2237/0203 ,  H01J2237/0206 ,  H01J2237/31

Abstract: A grounded metallic shield which comprises an electrode enclosing the filament leads and emitters of an e-Gun in a high vacuum chamber of the type used in melting and casting metals and other materials and evaporation sources. The shield is spaced from the filament leads and emitters a distance in the order of the electron mean free path for the pressure uses within the high vacuum chamber. The structure and method of use thereof suppresses or eliminates arc-downs or glow discharges.

Abstract translation: 一种接地金属屏蔽，其包括在用于熔化和铸造金属和其它材料和蒸发源的类型的高真空室中包围电极枪的细丝引线和发射器的电极。 屏蔽层与灯丝引线和发射器间隔一定距离，用于在高真空室内使用的电子平均自由路径。 其结构及其使用方法抑制或消除掉弧或辉光放电。