公开(公告)号：US06753943B2

公开(公告)日：2004-06-22

申请号：US09986302

申请日：2001-11-08

申请人： Toshihiko Tsuji ,  Akiyoshi Suzuki

发明人： Toshihiko Tsuji ,  Akiyoshi Suzuki

IPC分类号： G03B2742

CPC分类号： G03F7/70075 ,  G03F7/70241 ,  G03F7/70358 ,  G03F7/70566 ,  G03F7/70575 ,  G03F7/70958

摘要： A scanning exposure apparatus includes an illumination optical system for defining an illumination region, having a slit-like section, on an original with use of laser light from a continuous emission type excimer laser, and a driving device for relatively, scanningly moving an original and a substrate relative to the illumination region. The illumination optical system includes a scanning optical system for scanning a pupil plane of the illumination system with the laser light to produce a secondary light source thereon, such that the illumination region is defined by light from the secondary light source. When the width of the illumination region is W (mm), the scan speed of at least one of the original and the substrate is V (mm/sec/), and the time necessary for defining the secondary light source once is T (sec), a relation W/V=nT is satisfied, in which n is an integer.

摘要翻译： 扫描曝光装置包括：照明光学系统，用于使用来自连续发射型准分子激光器的激光在原稿上定义具有狭缝状部分的照明区域;以及驱动装置，用于相对地，扫描地移动原稿和 相对于照明区域的基板。 照明光学系统包括扫描光学系统，用于利用激光扫描照明系统的光瞳平面，以在其上产生二次光源，使得照明区域由来自次光源的光限定。 当照明区域的宽度为W（mm）时，原稿和基板中的至少一个的扫描速度为V（mm / sec /），并且限定二次光源一次所需的时间为T（秒 ），满足关系W / V = nT，其中n是整数。

公开(公告)号：US06285855B1

公开(公告)日：2001-09-04

申请号：US09044148

申请日：1998-03-19

申请人： Toshihiko Tsuji

发明人： Toshihiko Tsuji

IPC分类号： G02B2710

CPC分类号： G03F7/70075 ,  G03F7/70091

摘要： An illumination system includes a first optical integrator of inside reflection type, for reflecting at least a portion of received light, with its inside surface, and for defining a surface light source at or adjacent a light exit surface thereof, a second optical integrator of wavefront division type, for dividing the wavefront of received light and for defining a plurality of light sources at or adjacent a light exit surface thereof, an imaging optical system for imaging the surface light source at or adjacent a light entrance surface of the second optical integrator, and a collecting optical system for superposing light rays from the plurality of light sources one upon another, on a surface to be illuminated, wherein the imaging optical system has a variable imaging magnification.

摘要翻译： 照明系统包括内部反射型的第一光学积分器，用于将其接收的光的至少一部分与其内表面反射，并且用于在其光出射表面处或邻近其光出射表面限定表面光源;波阵面的第二光学积分器 用于分割接收的光的波前并用于在其光出射表面处或邻近光出射表面限定多个光源的成像光学系统，用于在第二光学积分器的光入射表面处或邻近第二光学积分器的相邻处对摄像光源进行成像， 以及收集光学系统，用于将多个光源的光线彼此叠置在待照亮的表面上，其中成像光学系统具有可变的成像倍率。

公开(公告)号：US06211947B1

公开(公告)日：2001-04-03

申请号：US09212101

申请日：1998-12-15

申请人： Toshihiko Tsuji

发明人： Toshihiko Tsuji

IPC分类号： G03B2774

CPC分类号： G03F7/70058 ,  G03B27/74

摘要： A method of measuring an illuminance distribution on a substrate; which is characterized in that the method comprises a step of reciprocatively moving a detecting sensor positioned on a substrate stage along a route during which the detecting sensor is intermittently stopped at a plurality of locations within an exposure region over the substrate, and, after reaching a turning location, moved to return along the route during which the detecting sensor is intermittently stopped again at these locations; in that measurement of illuminance is performed an even number of times at each location; and in that the illuminance distribution in the exposure region over the substrate is determined based not only on a measured value of illuminance obtained at each location during the forward movement of the detecting sensor but also on a measured value of illuminance obtained at each location during the returning movement of the detecting sensor.

摘要翻译： 一种测量衬底上的照度分布的方法; 其特征在于，所述方法包括：沿着所述检测传感器在所述基板上的曝光区域内的多个位置间歇地停止的路径往复移动位于基板台上的检测传感器的步骤，并且在达到 转动位置，沿着路线返回，在该路线期间，检测传感器在这些位置处再次间歇地停止; 在每个位置进行照度测量偶数次; 并且基于不仅基于在检测传感器的向前移动期间在每个位置处获得的照度的测量值，而且基于在检测传感器的向前移动期间获得的照度的测量值来确定衬底上的曝光区域中的照度分布 返回检测传感器的运动。

公开(公告)号：US6151122A

公开(公告)日：2000-11-21

申请号：US332027

申请日：1999-06-14

申请人： Tetsuo Taniguchi ,  Toshihiko Tsuji

发明人： Tetsuo Taniguchi ,  Toshihiko Tsuji

IPC分类号： G03F7/20 ,  G01B11/00

CPC分类号： G03F7/706 ,  G03F7/70358 ,  G03F7/70691

摘要： The present invention relates to a method of detecting an image formation characteristic of a projection optical system for projecting a reference pattern on a reticle on a substrate. According to the detection method, a reticle stage is moved so that a reference mark on the reticle comes to a first reference position and a second reference position, and a wafer stage is moved so that a light transmission portion on the wafer stage crosses an image forming position of a projected image of the reference mark obtained through the projection optical system. The positions of the reticle stage and the wafer stage at the first and second reference positions are measured as moved distances of the stages, respectively. From the distances of movement of the reticle and wafer stages measured, the image formation characteristic of the projection optical system is calculated.

公开(公告)号：US5894341A

公开(公告)日：1999-04-13

申请号：US677365

申请日：1996-07-05

申请人： Kenji Nishi ,  Toshihiko Tsuji

发明人： Kenji Nishi ,  Toshihiko Tsuji

IPC分类号： G03B27/72 ,  G03F7/20 ,  H01L21/027 ,  G03B27/74 ,  G03B27/80 ,  G03B27/42 ,  H01J7/24

CPC分类号： G03F7/70066 ,  G03F7/701 ,  G03F7/70358 ,  G03F7/70558 ,  G03F7/70875

摘要： A reticle and a wafer are relatively scanned in a scanning exposure type of projection exposure apparatus so that a pattern on the reticle is transferred onto the wafer by exposure. Heat exchangers which has the Peltier device are provided on a side surface of an integrator sensor which measures the quantity of exposure to control temperature of a photosensitive surface of the integrator sensor. In a side of heat irradiation surface of the heat exchangers, cooling water is circulated so that the heat exchangers are cooled. Saturation temperature at which temperature of the photosensitive surface is saturated when an illumination beam is irradiated to the photosensitive surface is determined and then the quantity of light irradiated to the photosensitive surface is measured with the temperature of the photosensitive surface being maintained at the saturation temperature. Based on the relation determined in advance between temperature of the photosensitive surface and the sensitivity of the integrator sensor at the saturation temperature, values of the quantity of light measured are corrected and then intensity of a light source is controlled by a main control system based on the corrected quantity of light.

摘要翻译： 在扫描曝光型投影曝光装置中相对扫描掩模版和晶片，使得通过曝光将掩模版上的图案转印到晶片上。 具有珀耳帖装置的热交换器设置在积分器传感器的侧表面上，该积分器传感器测量积分器传感器的感光表面的控制温度的暴露量。 在热交换器的热照射面的一侧，冷却水循环使得热交换器被冷却。 确定照射光束照射到感光表面时感光表面的温度饱和的饱和温度，然后在感光表面的温度保持在饱和温度下测量照射到感光表面的光量。 基于在感光表面的温度和积分传感器在饱和温度下的灵敏度之间的关系，校正所测量的光量的值，然后基于主控制系统控制光源的强度 校正光量。

公开(公告)号：US5767962A

公开(公告)日：1998-06-16

申请号：US755352

申请日：1996-11-25

申请人： Masayuki Suzuki ,  Noriyuki Nose ,  Minoru Yoshii ,  Kyoichi Miyazaki ,  Toshihiko Tsuji ,  Seiji Takeuchi

发明人： Masayuki Suzuki ,  Noriyuki Nose ,  Minoru Yoshii ,  Kyoichi Miyazaki ,  Toshihiko Tsuji ,  Seiji Takeuchi

IPC分类号： G01N21/88 ,  G01B11/30 ,  G01N21/94 ,  G01N21/956 ,  G03F1/84 ,  H01L21/66 ,  G01N21/00

CPC分类号： G01N21/94

摘要： An inspection system includes a light source, a scanning device for scanning a surface to be inspected, with light from the light source, wherein the scanning device includes an optical member disposed with inclination with respect to a primary scan direction, the optical member being adapted to provide a convergent light being converged to form a spot at a distance changeable with the position of a scan, and a light receiving device for receiving scattered light from the surface.

摘要翻译： 检查系统包括光源，用于扫描来自光源的光的扫描装置，其中所述扫描装置包括相对于主扫描方向倾斜设置的光学构件，所述光学构件适于 以提供会聚的光会聚在一起形成与扫描位置可变的距离的光点，以及用于接收来自表面的散射光的光接收装置。

公开(公告)号：US5751426A

公开(公告)日：1998-05-12

申请号：US460708

申请日：1995-06-02

申请人： Noriyuki Nose ,  Minoru Yoshii ,  Kenji Saitoh ,  Hiroshi Osawa ,  Koichi Sentoku ,  Toshihiko Tsuji ,  Takahiro Matsumoto

发明人： Noriyuki Nose ,  Minoru Yoshii ,  Kenji Saitoh ,  Hiroshi Osawa ,  Koichi Sentoku ,  Toshihiko Tsuji ,  Takahiro Matsumoto

IPC分类号： H01L21/027 ,  G03F7/20 ,  G03F9/00 ,  G01B9/02

CPC分类号： G03F7/70633 ,  G03F9/7049

摘要： A device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object include an illumination optical system for illuminating the plurality of diffraction gratings with a light beam, the illumination by the optical system generating a plurality of diffracted light beams from the plurality of diffraction gratings, an interference optical system for forming at least one interference light beam from the plurality of diffracted light beams, a detector for detecting the at least one interference light beam, the result of the detection serving as the basis for measuring the positional deviation between the plurality of diffraction gratings, and a measuring portion for measuring the relative positional relation between the illumination optical system and the plurality of diffraction gratings.

摘要翻译： 用于测量形成在同一物体上的多个衍射光栅之间的位置偏差的装置和方法包括用光束照射多个衍射光栅的照明光学系统，光学系统的照明产生多个衍射光束 来自多个衍射光栅的干涉光学系统，用于形成来自多个衍射光束的至少一个干涉光束，用于检测至少一个干涉光束的检测器，检测结果作为测量的基础 多个衍射光栅之间的位置偏差，以及用于测量照明光学系统和多个衍射光栅之间的相对位置关系的测量部分。

公开(公告)号：US5585918A

公开(公告)日：1996-12-17

申请号：US494539

申请日：1995-06-26

申请人： Seiji Takeuchi ,  Kyoichi Miyazaki ,  Toshihiko Tsuji

发明人： Seiji Takeuchi ,  Kyoichi Miyazaki ,  Toshihiko Tsuji

IPC分类号： G01N21/88 ,  G01N21/94 ,  G01N21/956 ,  G03F1/84 ,  H01L21/00 ,  H01L21/027 ,  H05B37/00

CPC分类号： H01L21/67253 ,  G01N21/94 ,  G03F1/84 ,  G01N2021/95676

摘要： An inspecting system includes a light source, an irradiating optical system for irradiating a surface of an object such as a reticle or photomask with light from the light source, a detection optical system for detecting scattered light from the surface of the object, and a light blocking device provided substantially parallel to the surface of the object, the light blocking device having a first light transmitting portion for passing light coming from the light source toward the surface of the object and a second light transmitting portion for passing light coming from an irradiated position on the surface of the object toward the detection optical system.

摘要翻译： 一种检查系统，包括光源，用于从光源的光照射诸如掩模版或光掩模的物体的表面的照射光学系统，用于检测来自物体的表面的散射光的检测光学系统，以及光 遮光装置设置成基本上平行于物体的表面，遮光装置具有用于使来自光源的光朝向物体的表面通过的第一透光部分和用于使来自照射位置的光通过的第二透光部分 在物体的表面上朝向检测光学系统。