Optical inspection method and apparatus including intensity modulation
of a light beam and detection of light scattered at an inspection
position
    3.
    发明授权
    Optical inspection method and apparatus including intensity modulation of a light beam and detection of light scattered at an inspection position 失效
    包括光束的强度调制和在检查位置散射的光的检测的光学检查方法和装置

    公开(公告)号:US5861952A

    公开(公告)日:1999-01-19

    申请号:US984509

    申请日:1992-12-02

    IPC分类号: G01N21/94 G01B9/02 G01N21/88

    CPC分类号: G01N21/94

    摘要: A light source portion having an acousto-optic element produces a laser beam of two light components having a frequency difference .DELTA.w and having registered polarization directions. The laser beam is subsequently divided by a half mirror. One of the divided laser beams is detected by a photoelectric detector as reference light, and a corresponding signal is applied to a synchronism detector. The other laser beam is projected by a scanning optical system to the surface of, e.g., an original to be examined to scan the same. At the position on the surface irradiated by the scanning light spot, the laser beam is modulated at a beat frequency .DELTA.w on the basis of optical heterodyne interference. A synchronism detector detects a signal corresponding to the scattered light from a particle or defect on the surface being examined, in synchronism with the frequency of the reference light, whereby the particle or defect can be detected with a good signal-to-noise ratio.

    摘要翻译: 具有声光元件的光源部分产生具有频差DELTA w并具有记录的偏振方向的两个光分量的激光束。 激光束随后被半反射镜分开。 其中一个激光束被光电检测器作为参考光检测,相应的信号被施加到同步检测器。 另一个激光束由扫描光学系统投影到例如要检查的原件的表面以扫描它。 在由扫描光点照射的表面上的位置处,基于光学外差干扰以激光束以拍频DELTA w进行调制。 同步检测器与参考光的频率同步地检测与被检查的表面上的颗粒或缺陷相对应的散射光的信号,从而可以以良好的信噪比检测颗粒或缺陷。

    Foreign particle inspecting system
    7.
    发明授权
    Foreign particle inspecting system 失效
    国外颗粒检测系统

    公开(公告)号:US5585918A

    公开(公告)日:1996-12-17

    申请号:US494539

    申请日:1995-06-26

    摘要: An inspecting system includes a light source, an irradiating optical system for irradiating a surface of an object such as a reticle or photomask with light from the light source, a detection optical system for detecting scattered light from the surface of the object, and a light blocking device provided substantially parallel to the surface of the object, the light blocking device having a first light transmitting portion for passing light coming from the light source toward the surface of the object and a second light transmitting portion for passing light coming from an irradiated position on the surface of the object toward the detection optical system.

    摘要翻译: 一种检查系统,包括光源,用于从光源的光照射诸如掩模版或光掩模的物体的表面的照射光学系统,用于检测来自物体的表面的散射光的检测光学系统,以及光 遮光装置设置成基本上平行于物体的表面,遮光装置具有用于使来自光源的光朝向物体的表面通过的第一透光部分和用于使来自照射位置的光通过的第二透光部分 在物体的表面上朝向检测光学系统。

    Illumination system and exposure apparatus
    8.
    发明授权
    Illumination system and exposure apparatus 有权
    照明系统和曝光装置

    公开(公告)号:US07324187B2

    公开(公告)日:2008-01-29

    申请号:US10956614

    申请日:2004-10-01

    IPC分类号: G03B27/74 G03B27/42 G03B27/54

    摘要: Disclosed is an illumination optical system and an exposure apparatus having the same, and specifically, as an aspect of the invention, an illumination optical system for illuminating a surface to be illuminated, that includes an aperture stop for defining an effective light source distribution upon a predetermined plane which is substantially in a Fourier transform relation with the surface to be illuminated, and a detector disposed adjacent an opening of the aperture stop.

    摘要翻译: 本发明公开了一种照明光学系统和曝光装置,具体而言,作为本发明的一个方面,照明光学系统用于照亮被照射的表面,该照明光学系统包括用于限定有效光源分布的孔径光阑 与被照射的表面基本上是傅里叶变换关系的预定平面以及邻近孔径光阑的开口设置的检测器。

    Illumination system, projection exposure apparatus and device manufacturing method
    9.
    发明授权
    Illumination system, projection exposure apparatus and device manufacturing method 失效
    照明系统,投影曝光装置及装置的制造方法

    公开(公告)号:US06919951B2

    公开(公告)日:2005-07-19

    申请号:US10205348

    申请日:2002-07-25

    申请人: Toshihiko Tsuji

    发明人: Toshihiko Tsuji

    CPC分类号: G03F7/70075

    摘要: Disclosed is an illumination system for illuminating an illumination region with uniform illuminance, wherein the light intensity gravity center of light impinging on the illumination region is registered with the center of light rays. The illumination system includes a first reflection type integrator, a first condensing mirror system for superposing light beams from the first reflection type integrator one upon another on the surface to be illuminated, a second reflection type integrator disposed between the light source and said first reflection type integrator, and a second condensing mirror system for superposing light beams from the second reflection type integrator one upon another on the first reflection type integrator. Also disclosed is an exposure apparatus having such illumination system, and a device manufacturing method using the same.

    摘要翻译: 公开了一种用于照明具有均匀照度的照明区域的照明系统,其中照射在照明区域上的光的重心重心与光线的中心对准。 照明系统包括第一反射型积分器,第一聚光镜系统,用于将第一反射型积分器的光束在被照射的表面上叠加起来;第二反射型积分器,设置在光源和所述第一反射型之间 积分器和第二聚光镜系统,用于在第一反射型积分器上叠加来自第二反射型积分器的光束。 还公开了具有这种照明系统的曝光装置和使用该照明系统的装置制造方法。

    Illumination optical system and exposure apparatus
    10.
    发明申请
    Illumination optical system and exposure apparatus 失效
    照明光学系统和曝光装置

    公开(公告)号:US20050057738A1

    公开(公告)日:2005-03-17

    申请号:US10769373

    申请日:2004-01-30

    申请人: Toshihiko Tsuji

    发明人: Toshihiko Tsuji

    CPC分类号: G03F7/702 G21K2201/06

    摘要: Attempting to provide an illumination optical system and an exposure apparatus using the same, which provide a more uniform angular distribution of light for illuminating a mask than the prior art, an illumination optical system for illuminating an object surface includes an optical unit that converts light from a light source section into approximately parallel light, and includes first and second mirrors, wherein the first mirror has an opening, through which light reflected by the second mirror passes.

    摘要翻译: 为了提供照明光学系统和使用该照明光学系统的曝光装置,其提供了比现有技术更光亮的用于照射掩模的光的角度分布,用于照射物体表面的照明光学系统包括:光学单元,其将来自 光源部分成近似平行的光,并且包括第一和第二反射镜,其中第一反射镜具有开口,第二反射镜反射的光穿过该开口。