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公开(公告)号：US20230151479A1
公开(公告)日：2023-05-18
申请号：US18094265
申请日：2023-01-06
Applicant: Applied Materials, Inc.
Inventor： Jinrui GUO , Ludovic GODET , Rutger MEYER TIMMERMAN THIJSSEN , Yongan XU , Jhenghan YANG , Chien-An CHEN
CPC classification number: C23C16/042 , C23C16/56 , C23C16/308
Abstract: Embodiments of the present disclosure generally relate to processing a workpiece containing a substrate during deposition, etching, and/or curing processes with a mask to have localized deposition on the workpiece. A mask is placed on a first layer of a workpiece, which protects a plurality of trenches from deposition of a second layer. In some embodiments, the mask is placed before deposition of the second layer. In other embodiments, the second layer is cured before the mask is deposited. In other embodiments, the second layer is etched after the mask is deposited. Methods disclosed herein allow the deposition of a second layer in some of the trenches present in the workpiece, while at least partially preventing deposition of the second layer in other trenches present in the workpiece.
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72.发明申请公开(公告)号：US20230123356A1
公开(公告)日：2023-04-20
申请号：US17947841
申请日：2022-09-19
Applicant: Applied Materials, Inc.
Inventor： Yongan XU , Ludovic GODET
Abstract: A method for aligning a substrate for fabrication of an optical device is disclosed that includes receiving a substrate having a first side and a second side opposite the first side, the first side of the substrate being oriented towards a scanner, the substrate having an alignment mark formed on the first side of the substrate, scanning the alignment mark with the scanner, and fabricating a first pattern for a first optical device on the first side of the substrate. The method includes positioning the substrate such that the second side is oriented toward the scanner, scanning the alignment mark on the first side with the scanner, through the second side, and fabricating a second pattern for a fourth optical device on the second side of the substrate.
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公开(公告)号：US20230112873A1
公开(公告)日：2023-04-13
申请号：US17937415
申请日：2022-09-30
Applicant: Applied Materials, Inc.
Inventor： Kenichi OHNO , Visweswaren SIVARAMAKRISHNAN , Ludovic GODET
Abstract: Embodiments of the present disclosure generally relate to optical devices. More specifically, embodiments described herein relate to a system and method of forming an optical device film. In an embodiment, a method is provided for positioning a substrate in a pre-cleaning chamber disposed in a cluster processing system and pre-cleaning the substrate to remove a native oxide layer from one or more surfaces of the substrate. The substrate is then transferred in an air free state to a deposition chamber disposed in the cluster processing system for forming an optical device film layer on the substrate.
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公开(公告)号：US20220363060A1
公开(公告)日：2022-11-17
申请号：US17647780
申请日：2022-01-12
Applicant: Applied Materials, Inc.
Inventor： Daihua ZHANG , Kang LUO , Kazuya DAITO , Kenneth S. LEDFORD , Elsa MASSONNEAU , Alexey STEPANOV , Ludovic GODET , Mahendran CHIDAMBARAM , Visweswaren SIVARAMAKRISHNAN , Bahubali S. UPADHYE , Hemantha RAJU
IPC: B41J2/165
Abstract: Embodiments described herein relate to an inkjet service station and methods of servicing an inkjet printer with the inkjet service station. The inkjet service station is disposed in an inkjet printer of an inkjet chamber. The inkjet service station is operable to perform servicing operations on a processing apparatus of the inkjet printer. The servicing operations include at least one of printhead spitting, printhead purging, printhead flushing, printhead cleaning, printhead drying, or vacuum suction.
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公开(公告)号：US20220355589A1
公开(公告)日：2022-11-10
申请号：US17647791
申请日：2022-01-12
Applicant: Applied Materials, Inc.
Inventor： Daihua ZHANG , Kazuya DAITO , Kang LUO , Elsa MASSONNEAU , Alexey STEPANOV , Ludovic GODET
IPC: B41J2/165
Abstract: Embodiments described herein provide for a fluid management system and a method of utilizing the fluid management system. The fluid management system includes a servicing fluid management system and an ink management system. The servicing fluid management system and the ink management system run in parallel within an inkjet chamber. The ink management system supports the flow of inkjet materials between a waste tank, one or more inkjet material supply tanks, an ink management module, and the inkjet printer. The servicing fluid management system supports the flow of servicing fluids between the waste tank, one or more servicing fluid supply tanks, a servicing fluid management module, and the inkjet printer.
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Patent Agency Ranking
公开(公告)号：US20220307127A1
公开(公告)日：2022-09-29
申请号：US17655849
申请日：2022-03-22
Applicant: Applied Materials, Inc.
Inventor： Nai-Wen PI , Jinxin FU , Kang LUO , Ludovic GODET
Abstract: Embodiments described herein provide for optical devices with methods of forming optical device substrates having at least one area of increased refractive index or scratch resistance. One method includes disposing an etch material on a discrete area of an optical device substrate or an optical device layer, disposing a diffusion material in the discrete area, and removing excess diffusion material to form an optical material in the optical device substrate or the optical device layer having a refractive index greater than or equal to 2.0 or a hardness greater than or equal to 5.5 Mohs.
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公开(公告)号：US20220260766A1
公开(公告)日：2022-08-18
申请号：US17673538
申请日：2022-02-16
Applicant: Applied Materials, Inc.
Inventor： Kenichi OHNO , Andrew CEBALLOS , Karl J. ARMSTRONG , Rami HOURANI , Takashi KURATOMI , Ludovic GODET
Abstract: An optical device is provided. The optical device includes an optical device substrate having a first surface; and a plurality of optical device structures disposed over the first surface of the optical device substrate, the plurality of optical device structures spaced apart from each other in a direction parallel to the first surface, and each optical device structure of the plurality of optical device structures including an optical device film. The optical device film of each optical device structure includes a first zone and a second zone, the first zone positioned between the optical device substrate and the second zone, wherein the first zone and the second zone each include one or more of oxygen and nitrogen, and the first zone and the second zone collectively include three or more metal, metalloid, or semiconductor elements.
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公开(公告)号：US20220171283A1
公开(公告)日：2022-06-02
申请号：US17534128
申请日：2021-11-23
Applicant: Applied Materials, Inc.
Inventor： Yongan XU , Jinxin FU , Jhenghan YANG , Ludovic GODET
Abstract: The present disclosure generally relates to methods of forming optical devices comprising nanostructures disposed on transparent substrates. A first process of forming the nanostructures comprises depositing a first layer of a first material on a glass substrate, forming one or more trenches in the first layer, and depositing a second layer of a second material in the one or more holes to trenches a first alternating layer of alternating first portions of the first material and second portions of the second material. The first process is repeated one or more times to form additional alternating layers over the first alternating layer. Each first portion of each alternating layer is disposed in contact with and offset a distance from an adjacent first portion in adjacent alternating layers. A second process comprises removing either the first or the second portions from each alternating layer to form the plurality of nanostructures.
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公开(公告)号：US20220161396A1
公开(公告)日：2022-05-26
申请号：US17237533
申请日：2021-04-22
Applicant: Applied Materials, Inc.
Inventor： Yaseer Arafath AHAMED , Kangkang WANG , Benjamin B. RIORDON , James D. STRASSNER , Ludovic GODET
IPC: B25B11/00
Abstract: Embodiments described herein provide for devices and methods for retaining optical devices. The devices and methods described herein provide for retention of the substrate without contacting sensitive portions of the substrate. The devices and methods utilize retention pads or vacuum pins to contact the exclusion zones i.e., inactive areas of the substrate to retain the substrate and prevent the substrate from moving laterally. Additionally, a holding force retains the substrate in the vertical direction, without contacting the substrate. The methods provide for adjusting the devices to account for multiple geometries of the substrate. The methods further provide for adjusting the devices, such as adjusting a gap between the optical device and a suction pad, to alter the holding force of the devices on the optical devices.
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80.发明申请公开(公告)号：US20220152724A1
公开(公告)日：2022-05-19
申请号：US17455288
申请日：2021-11-17
Applicant: Applied Materials, Inc.
Inventor： Kang LUO , Ludovic GODET , Daihua ZHANG , Nai-Wen PI , Jinrui GUO , Rami HOURANI
Abstract: The present disclosure generally relates to a method and apparatus for forming a substrate having a graduated refractive index. A method of forming a waveguide structure includes expelling plasma from an applicator having a head toward a plurality of grating structures formed on a substrate. The plasma is formed in the head at atmospheric pressure. The method further includes changing a depth of the plurality of grating structures with the plasma by removing grating material from the plurality of grating structures.
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