公开(公告)号：US20240124969A1

公开(公告)日：2024-04-18

申请号：US18537504

申请日：2023-12-12

Applicant: Applied Materials, Inc.

Inventor： Nai-Wen PI ,  Jinxin FU ,  Kang LUO ,  Ludovic GODET

IPC: C23C14/48 ,  C03C23/00 ,  C23C14/00 ,  C23C14/02 ,  C23C14/58

CPC classification number: C23C14/48 ,  C03C23/0095 ,  C23C14/0031 ,  C23C14/021 ,  C23C14/5873 ,  G02B6/10

Abstract: Embodiments described herein provide for optical devices with methods of forming optical device substrates having at least one area of increased refractive index or scratch resistance. One method includes disposing an etch material on a discrete area of an optical device substrate or an optical device layer, disposing a diffusion material in the discrete area, and removing excess diffusion material to form an optical material in the optical device substrate or the optical device layer having a refractive index greater than or equal to 2.0 or a hardness greater than or equal to 5.5 Mohs.

公开(公告)号：US20220307127A1

公开(公告)日：2022-09-29

申请号：US17655849

申请日：2022-03-22

Applicant: Applied Materials, Inc.

Inventor： Nai-Wen PI ,  Jinxin FU ,  Kang LUO ,  Ludovic GODET

IPC: C23C14/48 ,  C23C14/02 ,  C23C14/58 ,  C23C14/00 ,  C03C23/00

Abstract: Embodiments described herein provide for optical devices with methods of forming optical device substrates having at least one area of increased refractive index or scratch resistance. One method includes disposing an etch material on a discrete area of an optical device substrate or an optical device layer, disposing a diffusion material in the discrete area, and removing excess diffusion material to form an optical material in the optical device substrate or the optical device layer having a refractive index greater than or equal to 2.0 or a hardness greater than or equal to 5.5 Mohs.

公开(公告)号：US20220152724A1

公开(公告)日：2022-05-19

申请号：US17455288

申请日：2021-11-17

Applicant: Applied Materials, Inc.

Inventor： Kang LUO ,  Ludovic GODET ,  Daihua ZHANG ,  Nai-Wen PI ,  Jinrui GUO ,  Rami HOURANI

IPC: B23K10/00 ,  F21V8/00

Abstract: The present disclosure generally relates to a method and apparatus for forming a substrate having a graduated refractive index. A method of forming a waveguide structure includes expelling plasma from an applicator having a head toward a plurality of grating structures formed on a substrate. The plasma is formed in the head at atmospheric pressure. The method further includes changing a depth of the plurality of grating structures with the plasma by removing grating material from the plurality of grating structures.

公开(公告)号：US20220357668A1

公开(公告)日：2022-11-10

申请号：US17661927

申请日：2022-05-04

Applicant: Applied Materials, Inc.

Inventor： Ludovic GODET ,  Hao TANG ,  Nai-Wen PI ,  Yongan XU

IPC: G03F7/20

Abstract: An image projection system is provided. The system can be used for performing lithography. The system includes a deuterium light source, a converging lens coupled to the deuterium light source. The system includes an aperture configured to provide image tiling disposed adjacent to the converging lens. The system includes a movable stage disposed adjacent to the aperture. A method of fabricating an optical device is provided. The method includes depositing a resist over a substrate and determining an exposure pattern for the optical device. The method includes exposing a portion of the resist with a light beam based on the determined exposure pattern. Exposing the portion of the resist includes directing the light beam from a deuterium light source to the substrate and developing the resist.