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    ORGANIC LIGHT-EMITTING DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME
    61.
    发明申请
    ORGANIC LIGHT-EMITTING DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME 有权
    有机发光显示装置及其制造方法

    公开(公告)号：US20160248046A1

    公开(公告)日：2016-08-25

    申请号：US15146518

    申请日：2016-05-04

    Applicant: Samsung Display Co., Ltd.

    Inventor： Sung-Chul Kim ,  Myung-Soo Huh ,  Chang-Woo Shim

    IPC: H01L51/52 ,  H01L51/00 ,  H01L51/56

    CPC classification number: H01L51/5256 ,  H01L27/3246 ,  H01L27/3258 ,  H01L27/3262 ,  H01L27/3274 ,  H01L51/0034 ,  H01L51/004 ,  H01L51/5218 ,  H01L51/56 ,  H01L2227/323 ,  H01L2251/303 ,  H01L2251/5338 ,  H01L2251/558

    Abstract: In an aspect, an organic light-emitting display apparatus and a method of manufacturing the same are provided. The organic light-emitting display apparatus may include a substrate; a display unit formed on the substrate; and a thin film encapsulating layer encapsulating the display unit. The thin film encapsulating layer may include a plurality of organic layers and inorganic layers that are laminated alternately. At least one of the plurality of the inorganic films may include a first layer formed of a first material, a second layer formed of a second material other than the first material, and an intermediate layer provided between the first and second layers.

    Abstract translation: 在一方面，提供一种有机发光显示装置及其制造方法。 有机发光显示装置可以包括基板; 形成在所述基板上的显示单元; 以及封装所述显示单元的薄膜封装层。 薄膜封装层可以包括交替层叠的多个有机层和无机层。 多个无机膜中的至少一个可以包括由第一材料形成的第一层，由除第一材料之外的第二材料形成的第二层以及设置在第一和第二层之间的中间层。

    DISPLAY APPARATUS MANUFACTURING APPARATUS
    65.
    发明申请
    DISPLAY APPARATUS MANUFACTURING APPARATUS 审中-公开
    显示设备制造设备

    公开(公告)号：US20150368790A1

    公开(公告)日：2015-12-24

    申请号：US14839035

    申请日：2015-08-28

    Applicant: SAMSUNG DISPLAY CO., LTD.

    Inventor： Myung-Soo Huh ,  Tae-Seung Yoon ,  Jeong-Ho Yi

    IPC: C23C14/34 ,  C23C16/04

    CPC classification number: C23C14/34 ,  C23C14/541 ,  C23C14/568 ,  C23C16/042 ,  C23C16/463 ,  C23C16/54 ,  H01L51/001 ,  H01L51/5253 ,  H01L51/56

    Abstract: A thin film encapsulation manufacturing apparatus includes a first cluster configured to form a first inorganic layer on a first substrate, on which an emission unit is formed, by a sputtering process; a second cluster configured to form a first organic layer on the first inorganic layer on the first substrate conveyed from the first cluster by an organic deposition process; a first connection module configured to connect the first cluster and the second cluster, configured to convey the first substrate on which the first inorganic layer is formed from the first cluster to the second cluster, and configured to cool the first substrate in a non-contact manner; and a third cluster configured to form a second inorganic layer on the first organic layer on the first substrate conveyed from the second cluster by a chemical vapor deposition (CVD) process or a plasma enhanced chemical vapor deposition (PECVD) process.

    Abstract translation: 一种薄膜封装制造装置，包括：第一簇，被配置为通过溅射工艺在其上形成发光单元的第一基板上形成第一无机层; 第二簇，被配置为通过有机沉积工艺从所述第一簇输送的所述第一基板上的所述第一无机层上形成第一有机层; 第一连接模块，被配置为连接所述第一集群和所述第二集群，所述第一连接模块被配置为将其上形成有所述第一无机层的所述第一基板从所述第一集群传送到所述第二集群，并且被配置为以非接触方式冷却所述第一衬底 方式; 以及第三簇，其被配置为通过化学气相沉积（CVD）工艺或等离子体增强化学气相沉积（PECVD）工艺在由第二簇传送的第一有机层上的第一有机层上形成第二无机层。

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
    68.
    发明申请
    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD 审中-公开
    等离子体加工设备和等离子体处理方法

    公开(公告)号：US20150110974A1

    公开(公告)日：2015-04-23

    申请号：US14445951

    申请日：2014-07-29

    Applicant: Samsung Display Co., Ltd.

    Inventor： Yong-Suk LEE ,  Suk-Won Jung ,  Myung-Soo Huh ,  Mi-Ra An

    IPC: C23C16/46 ,  C23C16/455 ,  C23C16/34 ,  C23C16/52 ,  C23C16/509 ,  C23C16/40

    CPC classification number: C23C16/46 ,  C23C16/345 ,  C23C16/401 ,  C23C16/4586 ,  C23C16/509 ,  C23C16/52 ,  H01J37/32091 ,  H01J37/32165 ,  H01L21/67109 ,  H01L21/67248

    Abstract: A plasma processing apparatus including: a chamber configured to provide a space for processing a substrate; a substrate stage configured to support the substrate within the chamber and including a first electrode, the first electrode configured to receive a first radio frequency signal; a second electrode disposed on an upper portion of the chamber to face the first electrode, the second electrode configured to receive a second radio frequency signal; a gas supply unit configured to supply a process gas onto the substrate within the chamber; and a thermal control unit configured to circulate a heat transfer medium through a first fluid passage provided in the first electrode and a second fluid passage provided in the second electrode to maintain the first and second electrodes at the same temperature.

    Abstract translation: 一种等离子体处理装置，包括：室，被配置为提供用于处理基板的空间; 衬底台，被配置为在所述腔室内支撑所述衬底并且包括第一电极，所述第一电极被配置为接收第一射频信号; 第二电极，设置在所述室的上部以面对所述第一电极，所述第二电极被配置为接收第二射频信号; 气体供给单元，其构造成将处理气体供给到所述室内的所述基板上; 以及热控制单元，其被配置为使传热介质循环通过设置在第一电极中的第一流体通道和设置在第二电极中的第二流体通道，以将第一和第二电极保持在相同的温度。

    DISPLAY APPARATUS MANUFACTURING METHOD
    69.
    发明申请
    DISPLAY APPARATUS MANUFACTURING METHOD 有权
    显示设备制造方法

    公开(公告)号：US20150064825A1

    公开(公告)日：2015-03-05

    申请号：US14298795

    申请日：2014-06-06

    Applicant: SAMSUNG DISPLAY CO., LTD.

    Inventor： Myung-Soo Huh ,  Tae-Seung Yoon ,  Jeong-Ho Yi

    IPC: H01L51/00 ,  H01L51/56

    CPC classification number: C23C14/34 ,  C23C14/541 ,  C23C14/568 ,  C23C16/042 ,  C23C16/463 ,  C23C16/54 ,  H01L51/001 ,  H01L51/5253 ,  H01L51/56

    Abstract: A thin film encapsulation manufacturing apparatus includes a first cluster configured to form a first inorganic layer on a first substrate, on which an emission unit is formed, by a sputtering process; a second cluster configured to form a first organic layer on the first inorganic layer on the first substrate conveyed from the first cluster by an organic deposition process; a first connection module configured to connect the first cluster and the second cluster, configured to convey the first substrate on which the first inorganic layer is formed from the first cluster to the second cluster, and configured to cool the first substrate in a non-contact manner; and a third cluster configured to form a second inorganic layer on the first organic layer on the first substrate conveyed from the second cluster by a chemical vapor deposition (CVD) process or a plasma enhanced chemical vapor deposition (PECVD) process.

    Abstract translation: 一种薄膜封装制造装置，包括：第一簇，被配置为通过溅射工艺在其上形成发光单元的第一基板上形成第一无机层; 第二簇，被配置为通过有机沉积工艺从所述第一簇输送的所述第一基板上的所述第一无机层上形成第一有机层; 第一连接模块，被配置为连接所述第一集群和所述第二集群，所述第一连接模块被配置为将其上形成有所述第一无机层的所述第一基板从所述第一集群传送到所述第二集群，并且被配置为以非接触方式冷却所述第一衬底 方式; 以及第三簇，其被配置为通过化学气相沉积（CVD）工艺或等离子体增强化学气相沉积（PECVD）工艺在由第二簇传送的第一有机层上的第一有机层上形成第二无机层。

    VAPOR DEPOSITION APPARATUS
    70.
    发明申请
    VAPOR DEPOSITION APPARATUS 审中-公开
    蒸气沉积装置

    公开(公告)号：US20150034008A1

    公开(公告)日：2015-02-05

    申请号：US14183963

    申请日：2014-02-19

    Applicant: Samsung Display Co., Ltd.

    Inventor： Choel-Min JANG ,  Myung-Soo Huh ,  Suk-Won Jung ,  Sung-Hun Key ,  In-Kyo Kim

    IPC: C23C16/52 ,  C23C16/455

    CPC classification number: C23C16/52 ,  C23C16/4401 ,  C23C16/45527 ,  C23C16/45551 ,  C23C16/45561

    Abstract: Provided is a vapor deposition apparatus including a deposition unit including a plurality of deposition modules disposed parallel to each other and a substrate mounting unit located below the deposition unit, on which a substrate is mounted. In this case, each of the plurality of deposition modules includes a nozzle configured to selectively inject a raw gas and a purge gas toward the substrate mounting unit, and the nozzle injects the raw gas while the substrate mounting unit is being located below the nozzle.

    Abstract translation: 本发明提供一种蒸镀装置，其特征在于，包括具有彼此平行配置的多个沉积模块的沉积单元和位于所述沉积单元的下方的基板安装单元，基板安装在所述沉积单元上。 在这种情况下，多个沉积模块中的每一个都包括一个喷嘴，该喷嘴构造成选择性地将原料气体和净化气体朝向基板安装单元喷射，并且喷嘴在基板安装单元位于喷嘴下方时喷射原料气体。

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