公开(公告)号：US20070229346A1

公开(公告)日：2007-10-04

申请号：US11802971

申请日：2007-05-29

Applicant: Osamu Okada

Inventor： Osamu Okada

IPC: H01Q17/00

CPC classification number: H05K9/0075 ,  H01F1/348 ,  H01F1/375 ,  H01F1/42 ,  H05K9/0083

Abstract: This invention provides a rubber composition and an electromagnetic wave absorbing sheet that can realize excellent electromagnetic wave absorbance properties while only having a small thickness and is also excellent in flexibility. The rubber composition comprises 100 parts by weight of a rubber component such as natural rubber and 300 to 1500 parts by weight, preferably 500 to 1000 parts by weight, of carbonyl iron. The incorporation of a predetermined amount of carbonyl iron in the rubber component can realize excellent electromagnetic wave absorbance properties, whereby the thickness of the electromagnetic wave absorbing sheet for providing a necessary electromagnetic wave absorbance amount can be reduced. The rubber composition comprising carbonyl iron incorporated together with the rubber component has low hardness, and is also excellent in flexibility. Accordingly, the rubber composition has good processability, is less likely to break, and is also excellent in durability. The rubber component may contain not less than 5 parts by weight of a weather-resistant rubber in 100 parts by weight of the rubber component and further may contain 1 to 10 parts by weight of carbon black.

Abstract translation: 本发明提供一种橡胶组合物和电磁波吸收片，其可以实现优异的电磁波吸收特性，同时仅具有较小的厚度并且柔性也优异。 橡胶组合物包含100重量份的橡胶组分如天然橡胶和300至1500重量份，优选500至1000重量份的羰基铁。 在橡胶组分中加入预定量的羰基铁可以实现优异的电磁波吸收性能，从而可以降低用于提供所需电磁波吸收量的电磁波吸收片的厚度。 包含与橡胶组分一起的羰基铁的橡胶组合物具有低硬度，并且柔软性也优异。 因此，橡胶组合物具有良好的加工性，不太可能破裂，并且耐久性也优异。 橡胶组分可以在100重量份的橡胶组分中含有不少于5重量份的耐候橡胶，并且还可以含有1至10重量份的炭黑。

公开(公告)号：US20070085224A1

公开(公告)日：2007-04-19

申请号：US11524455

申请日：2006-09-20

Applicant: Ichiro Kouno ,  Osamu Okada

Inventor： Ichiro Kouno ,  Osamu Okada

IPC: H01L21/00 ,  H01L23/29

CPC classification number: H01L24/10 ,  H01L23/3114 ,  H01L24/13 ,  H01L2224/05001 ,  H01L2224/05008 ,  H01L2224/05022 ,  H01L2224/05024 ,  H01L2224/05124 ,  H01L2224/05147 ,  H01L2224/05166 ,  H01L2224/05171 ,  H01L2224/05548 ,  H01L2224/05647 ,  H01L2224/13 ,  H01L2224/13099 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01018 ,  H01L2924/01022 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01045 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/014 ,  H01L2924/14 ,  H01L2924/00 ,  H01L2924/00014

Abstract: A semiconductor device has a semiconductor substrate having a plurality of connection pads on an upper surface thereof, a protective film made of a resin which is provided on the semiconductor substrate, and has openings at those portions to which the respective connection pads correspond, an altered layer having a mesh-like structure formed on an upper surface of the protective film, and a metallic layer provided on upper surfaces of the connection pads and an upper surfaces of the altered layer.

Abstract translation: 半导体器件具有在其上表面上具有多个连接焊盘的半导体衬底，设置在半导体衬底上的由树脂制成的保护膜，并且在各个连接焊盘对应的那些部分处具有开口， 具有形成在保护膜的上表面上的网状结构的层以及设置在连接焊盘的上表面上的金属层和改变层的上表面。

公开(公告)号：US06387444B1

公开(公告)日：2002-05-14

申请号：US09511698

申请日：2000-02-23

Applicant: Osamu Okada ,  Atsushi Sekiguchi

Inventor： Osamu Okada ,  Atsushi Sekiguchi

IPC: C23C1606

CPC classification number: C23C16/18 ,  C23C16/54

Abstract: In the field of depositing a metal film for wiring purposes on a substrate by means of single-substrate processing CVD, a procedure for depositing a copper film on a substrate is carried out by utilizing a first CVD module in which film deposition is carried out under first film deposition conditions where the film deposition rate is low and the filling characteristics are good, and a second CVD module in which film deposition is carried out under second film deposition conditions where the film deposition rate is high and the filling characteristics are poor. One CVD film deposition process in which a metal film for wiring purposes is deposited is carried out with sub-processes based on two different sets of film deposition conditions.

Abstract translation: 在通过单基板处理CVD在衬底上沉积用于配线的金属膜的领域中，通过利用其中进行膜沉积的第一CVD模块来进行在衬底上沉积铜膜的步骤 成膜速度低，填充特性良好的第一膜沉积条件以及在成膜速度高，填充特性差的第二膜沉积条件下进行成膜的第二CVD模块。 用于布线目的的金属膜沉积的一个CVD膜沉积工艺是基于两组不同的膜沉积条件的子工艺进行的。

公开(公告)号：US6087924A

公开(公告)日：2000-07-11

申请号：US990447

申请日：1997-12-15

Applicant: Kazuhisa Hasumi ,  Kentaro Nagano ,  Hideyuki Horiuchi ,  Osamu Okada

Inventor： Kazuhisa Hasumi ,  Kentaro Nagano ,  Hideyuki Horiuchi ,  Osamu Okada

IPC: G01N27/12 ,  G01N33/00 ,  H01C7/00

CPC classification number: G01N27/12 ,  G01N33/004

Abstract: In a gas sensor which uses CuO as a p-type semiconductor, by adding Na.sub.2 CO.sub.3 in excess of 1 wt % relative to CuO, sensitivity to gases such as H.sub.2, NO, NO.sub.2 and SO.sub.2 is suppressed, whereby selectivity for CO is increased. Sensitivity to CO.sub.2 can also be obtained. In addition, by adding a sodium salt of tungstic acid or molybdic acid, CO.sub.2 sensitivity can be made lower than the CO sensitivity, and CO gas in the exhaust gases discharged from gas-fired water heaters or other combustion equipment can be selectively detected. It is therefore possible to detect incomplete combustion.

Abstract translation: 在使用CuO作为p型半导体的气体传感器中，通过相对于CuO添加超过1重量％的Na 2 CO 3，抑制了对气体如H 2，NO，NO 2和SO 2的敏感性，从而提高了对CO的选择性。 也可以获得对二氧化碳的敏感性。 此外，通过添加钨酸或钼酸钠盐，可以使CO敏感性低于CO敏感度，并且可以选择性地检测从燃气热水器或其他燃烧设备排出的废气中的CO气体。 因此可以检测不完全燃烧。

公开(公告)号：US6042798A

公开(公告)日：2000-03-28

申请号：US785379

申请日：1997-01-21

Applicant: Masataka Masuda ,  Osamu Okada ,  Takeshi Tabata ,  Yasuhiro Hirai ,  Hiroki Fujita

Inventor： Masataka Masuda ,  Osamu Okada ,  Takeshi Tabata ,  Yasuhiro Hirai ,  Hiroki Fujita

IPC: B01J23/80 ,  B01J23/887 ,  C07C7/163 ,  C10G29/06 ,  C10G45/04 ,  B01J8/00 ,  C07C7/12 ,  C10G45/02

CPC classification number: C10G45/04 ,  B01J23/80 ,  B01J23/8873 ,  C07C7/163

Abstract: A method for the desulfurization of hydrocarbons by desulfurizing unsaturated hydrocarbons or hydrocarbon materials containing unsaturated hydrocarbons, in the presence or absence of hydrogen, using a copper-zinc desulfurizing agent prepared by the co-precipitation method. By this method, the sulfur content of the hydrocarbons can be reduced while suppressing hydrogenation of the unsaturated hydrocarbons.

Abstract translation: 通过使用通过共沉淀法制备的铜 - 锌脱硫剂，在存在或不存在氢的情况下，使含有不饱和烃的不饱和烃或烃类材料脱硫，从而使烃脱硫的方法。 通过该方法，可以抑制烃的硫含量，同时抑制不饱和烃的氢化。

公开(公告)号：US5985225A

公开(公告)日：1999-11-16

申请号：US849557

申请日：1997-08-28

Applicant: Hirofumi Ohtsuka ,  Takeshi Tabata ,  Osamu Okada ,  Giuseppe Bellussi ,  Luigina Maria Flora Sabatino

Inventor： Hirofumi Ohtsuka ,  Takeshi Tabata ,  Osamu Okada ,  Giuseppe Bellussi ,  Luigina Maria Flora Sabatino

IPC: B01D53/86 ,  B01J29/072 ,  B01J29/76 ,  B01J29/78 ,  B01D53/56

CPC classification number: B01J29/072 ,  B01D53/8628

Abstract: The present invention relates to a catalyst for reduction of nitrogen oxides in exhaust gas containing oxygen by hydrocarbons, which comprises cobalt-loaded zeolite not showing a Raman spectral band assignable to cobalt oxide (Co.sub.3 O.sub.4).

Abstract translation: PCT No.PCT / JP96 / 02891 Sec。 371日期1997年7月28日第 102（e）日期1997年7月28日PCT提交1996年10月4日PCT公布。 公开号WO97 / 12663 日期：1997年04月10日本发明涉及一种用于还原含有氧的废气中的氮氧化物的催化剂，其包括不显示可分配给氧化钴（Co 3 O 4）的拉曼光谱带的含钴负载沸石。

公开(公告)号：US5449529A

公开(公告)日：1995-09-12

申请号：US104410

申请日：1993-08-10

Applicant: Osamu Okada ,  Hiroaki Ogura ,  Toshiaki Sogabe

Inventor： Osamu Okada ,  Hiroaki Ogura ,  Toshiaki Sogabe

IPC: B05D3/02 ,  C04B35/52 ,  C04B35/563

CPC classification number: C04B35/563 ,  C04B35/52 ,  C04B35/645 ,  Y10T428/12056 ,  Y10T428/12097 ,  Y10T428/30 ,  Y10T442/2557

Abstract: There is provided according to the invention a method for producing a composite material mainly composed of a carbon and boron comprising the steps of impregnating a carbon material with a boron oxide and/or a hydrate compound thereof, and baking such carbon material under pressure by inert gas at a temperature of not lower than 1500.degree. C. A neutron absorbent and an oxidation resistant carbon material both including the composite material are also provided.

Abstract translation: 根据本发明提供了一种主要由碳和硼组成的复合材料的制造方法，包括以下步骤：用氧化硼和/或其水化合物浸渍碳材料，并在惰性气氛下加压焙烧该碳材料 温度不低于1500℃的气体。还提供了包括复合材料的中子吸收剂和抗氧化碳材料。

公开(公告)号：US5124140A

公开(公告)日：1992-06-23

申请号：US523022

申请日：1990-05-14

Applicant: Osamu Okada ,  Takeshi Tabata ,  Masataka Masuda

Inventor： Osamu Okada ,  Takeshi Tabata ,  Masataka Masuda

IPC: C01B3/34 ,  B01J20/02 ,  B01J23/80 ,  C01B3/38 ,  C10G11/20 ,  C10G25/00

CPC classification number: C10G25/003 ,  C01B3/38 ,  C01B2203/0233 ,  C01B2203/1058 ,  C01B2203/1064 ,  C01B2203/1241 ,  C01B2203/1247 ,  C01B2203/127 ,  C01B2203/142 ,  Y02P20/52

Abstract: A novel process for desulfurizing and steam reforming sulfur-containing hydrocarbons is disclosed. The process comprises the steps of (a) desulfurizing the sulfur-containing hydrocarbon to a sulfur content of 5 ppb or less by use of a desulfurization agent, (b) reforming the desulfurized hydrocarbon at low temperature in an adiabatic reactor by use of steam, and (c) reforming the resultant gas reformed in the course of step (b) at high temperature in an external-heating reformer furnance.

公开(公告)号：US5016132A

公开(公告)日：1991-05-14

申请号：US376645

申请日：1989-07-07

Applicant: Tohru Okuda ,  Hideo Okada ,  Takashi Koyama ,  Osamu Okada ,  Mamoru Nakatsuka

Inventor： Tohru Okuda ,  Hideo Okada ,  Takashi Koyama ,  Osamu Okada ,  Mamoru Nakatsuka

IPC: G11B5/10 ,  G11B5/48 ,  G11B15/60 ,  G11B15/62

CPC classification number: G11B15/60 ,  G11B15/62 ,  G11B5/4893

Abstract: A magnetic recording and reproducing head unit which includes a tape guide unit including a set of spaced two tape guide substrates, a spacer provided between the tape guide substrates so as to dispose the two tape guide substrates through a predetermined distance in an approximately parallel relationship to each other, and guide poles for guiding the surface of a magnetic tape, arranged to extend through front portions of the tape guide substrates in a direction generally perpendicular to surfaces of the tape guide substrates, and a plurality of magnetic heads fixed, in a state where their postures are adjusted, to the tape guide unit.

公开(公告)号：US09453291B2

公开(公告)日：2016-09-27

申请号：US13881074

申请日：2011-11-21

Applicant: Osamu Okada ,  Masaaki Kawakami

Inventor： Osamu Okada ,  Masaaki Kawakami

IPC: C30B15/02 ,  C30B15/14 ,  C30B15/10 ,  C30B29/06 ,  C30B15/30

CPC classification number: C30B15/14 ,  C30B15/10 ,  C30B15/30 ,  C30B29/06 ,  Y10T117/1032 ,  Y10T117/1068 ,  Y10T117/1072

Abstract: A single crystal pulling apparatus (1) has a quartz crucible (2) for accommodating silicon melt (3), a graphite crucible (4) for retaining the quartz crucible (2), a tray (5) for securing and holding the graphite crucible (4) from below, and a crucible rotating shaft (6) for supporting the tray (5) from below and for elevating and lowering the tray (5) and the crucibles (2), (4) while rotating them. A low heat conductive member (10) is interposed on a joint surface between the tray (5) and the crucible rotating shaft (6). The low heat conductive member (10) is formed in a substantially tubular shape, and is interposed in such a manner that a protruding portion of the crucible rotating shaft (6) is inserted through a center hole of the low heat conductive member (10). Thereby, a gap portion (11) is formed below a bottom portion of the tray (5).

Abstract translation: 单晶拉制装置（1）具有用于容纳硅熔体（3）的石英坩埚（2），用于保持石英坩埚（2）的石墨坩埚（4），用于固定和保持石墨坩埚的托盘（5） （4），以及用于从下方支撑托盘（5）并用于在旋转托盘（5）和坩埚（2），（4）时升降的坩埚旋转轴（6）。 低导热构件（10）插入在托盘（5）和坩埚旋转轴（6）之间的接合表面上。 低导热构件（10）形成为大致筒状，并且以坩埚旋转轴（6）的突出部穿过低导热构件（10）的中心孔插入的方式插入， 。 由此，在托盘（5）的底部下方形成有间隙部（11）。