公开(公告)号：US06462298B1

公开(公告)日：2002-10-08

申请号：US09045526

申请日：1998-03-20

申请人： Tadahiro Ohmi ,  Takahisa Nitta ,  Yasuyuki Shirai ,  Osamu Nakamura

发明人： Tadahiro Ohmi ,  Takahisa Nitta ,  Yasuyuki Shirai ,  Osamu Nakamura

IPC分类号： B23K3538

CPC分类号： B23K35/0205 ,  B23K9/28 ,  B23K35/222

摘要： The present invention provides a fixing structure for a welding electrode and a welding head which enable improvement of durability of a welding electrode, improvement of work efficiency in welding, and reduction of time required for welding and also which make it possible to execute welding for a long time with high reliability. In this fixing structure, a fixed section of a welding electrode is inserted via a thermally conductive material into an inserting section of a fixing base and a peripheral surface of the fixed section of the welding electrode is uniformly contacted to the fixing base to fix the welding electrode to the fixing base.

摘要翻译： 本发明提供一种焊接电极和焊接头的固定结构，其能够提高焊接电极的耐久性，提高焊接中的工作效率，并且减少焊接所需的时间，并且还可以执行焊接 长时间具有高可靠性。在该固定结构中，焊接电极的固定部分通过导热材料插入到固定基座的插入部分中，焊接电极的固定部分的周面与 固定基座，将焊接电极固定在固定基座上。

公开(公告)号：US06425042B1

公开(公告)日：2002-07-23

申请号：US09357835

申请日：1999-07-21

申请人： Katsumi Ikeda ,  Masaki Yoshida ,  Hideto Suzuki ,  Yoshihisa Takayama ,  Tatsuya Kato ,  Osamu Nakamura ,  Hironori Miyoshi

发明人： Katsumi Ikeda ,  Masaki Yoshida ,  Hideto Suzuki ,  Yoshihisa Takayama ,  Tatsuya Kato ,  Osamu Nakamura ,  Hironori Miyoshi

IPC分类号： G06F1200

CPC分类号： G11B20/1207 ,  G06F3/0605 ,  G06F3/0632 ,  G06F3/0644 ,  G06F3/0682 ,  G11B23/042 ,  G11B27/107 ,  G11B27/11 ,  G11B27/328 ,  G11B2220/655 ,  G11B2220/90

摘要： When a tape cassette is mounted, a tape drive apparatus judges whether the tape cassette is of a first mode (normal mode) or a second mode (multi-partition mode) based on one or both of management information that is read out from the magnetic tape and management information that is read out from a memory (MIC) incorporated in the tape cassette. The tape drive apparatus then an performs an operation setting in accordance with the mode thus judged.

摘要翻译： 当安装磁带盒时，磁带驱动装置基于从磁读出的管理信息中的一个或两个来判断磁带盒是否处于第一模式（正常模式）或第二模式（多分区模式） 磁带和管理信息，其从并入在磁带盒中的存储器（MIC）中读出。 然后，磁带驱动装置根据如此判断的模式执行操作设置。

公开(公告)号：US06220500B1

公开(公告)日：2001-04-24

申请号：US09130583

申请日：1998-08-07

申请人： Tadahiro Ohmi ,  Takahisa Nitta ,  Yasuyuki Shirai ,  Osamu Nakamura

发明人： Tadahiro Ohmi ,  Takahisa Nitta ,  Yasuyuki Shirai ,  Osamu Nakamura

IPC分类号： B23K120

CPC分类号： B23K35/383 ,  B23K1/20 ,  Y10T428/12535 ,  Y10T428/12979 ,  Y10T428/31678

摘要： A welding method for materials to be welded which are subjected to fluoride passivation treatment, and a fluoride passivation retreatment method, wherein, when fluoride passivation retreatment is conducted after welding, there is no generation of particles or dust. The method provides superior resistance to fluorine system gases. During fluoride passivation treatment, hydrogen is added to the gas (the back shield gas) flowing through the materials to be welded. In one embodiment of the welding method, the thickness of the fluoride passivated film in a predetermined range from the butt end surfaces of the materials to be welded is set to 10 nm or less, followed by subsequent welding. Furthermore, the fluoride passivation retreatment method, includes the steps of heating at least the welded parts following welding and flowing a gas containing fluorine gas in the interior portion of the parts.

摘要翻译： 对经过氟化物钝化处理的待焊接材料的焊接方法以及氟化物钝化再处理方法，其中，在焊接后进行氟化物钝化再处理时，不产生颗粒或灰尘。 该方法提供了优异的耐氟体系气体阻力。 在氟化物钝化处理期间，将氢气流入待焊接材料的气体（背面保护气体）。 在焊接方法的一个实施例中，氟化钝化膜在待焊接材料的对接端面的预定范围内的厚度设定为10nm以下，随后进行焊接。 此外，氟化物钝化再处理方法包括以下步骤：至少在焊接之后加热焊接部分，并且在部件的内部部分使含有氟气的气体流动。

公开(公告)号：US6129047A

公开(公告)日：2000-10-10

申请号：US122803

申请日：1998-07-27

申请人： Osamu Nakamura

发明人： Osamu Nakamura

IPC分类号： C23C16/44 ,  C23C16/455 ,  C23C16/458 ,  C30B25/12 ,  C30B25/14 ,  H01L21/205 ,  H01L21/683 ,  C23C16/00

CPC分类号： C23C16/4583 ,  C23C16/4412 ,  C30B25/12 ,  C30B25/14

摘要： It was an objective of the present invention to provide a susceptor which can prevent a increasing phenomenon of the dopant concentration of the epitaxial layer at the peripheral portion of the wafer. By providing a through-hole 7 passing through to a rear side at the outer peripheral side of the wafer inside the wafer pocket 6, a down flow of a reacting source gas from the upper surface of the susceptor 5 is formed, so that the unwanted flow of the dopant species being exhausted at the rear surface onto the wafer surface can be avoided. As a result, a raise in the dopant concentration at the outer peripheral portion of the epitaxial layer 9 can be controlled.

摘要翻译： 本发明的目的是提供一种能够防止外延层在晶片周边部分的掺杂剂浓度增加的感受体。 通过在晶片槽6内的晶片的外周侧设置贯通贯通的贯通孔7，形成来自基座5的上表面的反应源气体的向下流动， 可以避免在后表面被排出到晶片表面上的掺杂剂物质的流动。 结果，可以控制在外延层9的外周部分的掺杂剂浓度的升高。

公开(公告)号：US6034469A

公开(公告)日：2000-03-07

申请号：US981187

申请日：1997-12-09

申请人： Eiichirou Uda ,  Toshiharu Higuchi ,  Osamu Nakamura ,  Kiyomi Koyama ,  Sadao Matsumoto ,  Yoshiaki Ouchi ,  Kazuo Kobayashi ,  Takashi Sudo ,  Katsuhisa Homma

发明人： Eiichirou Uda ,  Toshiharu Higuchi ,  Osamu Nakamura ,  Kiyomi Koyama ,  Sadao Matsumoto ,  Yoshiaki Ouchi ,  Kazuo Kobayashi ,  Takashi Sudo ,  Katsuhisa Homma

IPC分类号： H01J1/28 ,  H01J9/04 ,  H01J23/04 ,  H01J23/087 ,  H01J1/14

CPC分类号： H01J23/087 ,  H01J1/28 ,  H01J23/04 ,  H01J9/042 ,  H01J2223/04

摘要： There is provided an impregnated-type cathode substrate comprising a large particle diameter low porosity region and a small particle diameter high porosity region which is provided in a side of an electron emission surface of the large particle diameter low porosity region and has an average particle diameter smaller than an average particle diameter of the large particle diameter low pore region and a porosity higher than a porosity of the large particle diameter low porosity region, the impregnated-type cathode being impregnated with an electron emission substance.

摘要翻译： PCT No.PCT / JP96 / 01527 Sec。 371日期1997年12月9日第 102（e）1997年12月9日PCT PCT 1996年6月6日PCT公布。 公开号WO96 / 42100 PCT 日期：1996年12月27日提供一种浸渍型阴极基板，其包括大粒径低孔隙率区域和小粒径高孔隙率区域，该区域设置在大粒径低孔隙率区域的电子发射表面的一侧， 平均粒径小于大粒径低孔区域的平均粒径，孔隙率高于大粒径低孔隙率区域的孔隙率，浸渍型阴极浸渍有电子发射物质。

公开(公告)号：US5891796A

公开(公告)日：1999-04-06

申请号：US759228

申请日：1996-12-05

申请人： Osamu Nakamura ,  Kazumasa Sasakura

发明人： Osamu Nakamura ,  Kazumasa Sasakura

IPC分类号： B23K20/00 ,  H01L21/60 ,  H01L21/44

CPC分类号： H01L24/85 ,  B23K20/007 ,  H01L24/78 ,  H01L2224/48091 ,  H01L2224/48465 ,  H01L2224/78268 ,  H01L2224/78301 ,  H01L2224/786 ,  H01L2224/85045 ,  H01L2224/851 ,  H01L2224/85181 ,  H01L2224/85201 ,  H01L2924/00014 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01019 ,  H01L2924/01033 ,  H01L2924/01057 ,  H01L2924/01082 ,  H01L2924/3025

摘要： To prevent melting and scattering of a covering-film during ball formation, the covering-film, at the time a ball is formed, has been completely removed from the portion of a covered wire which corresponds to the tail length that protrudes from the tip of a capillary.

摘要翻译： 为了防止球形成期间的覆盖膜的熔融和散射，在形成球时，覆盖膜已经从包覆线的部分完全去除，该覆盖膜对应于从尖端引出的尾部长度 毛细管。

公开(公告)号：US5863512A

公开(公告)日：1999-01-26

申请号：US959976

申请日：1997-10-29

申请人： Kazuaki Ado ,  Mitsuharu Tabuchi ,  Hiroyuki Kageyama ,  Osamu Nakamura

发明人： Kazuaki Ado ,  Mitsuharu Tabuchi ,  Hiroyuki Kageyama ,  Osamu Nakamura

IPC分类号： C01G49/00 ,  C30B7/10 ,  C30B29/22 ,  H01M4/525 ,  C01G1/00 ,  C01D15/00 ,  C01G37/14

CPC分类号： C01G49/0027 ,  H01M4/525 ,  C01P2002/30 ,  C01P2002/72 ,  C01P2002/76 ,  Y02P70/54

摘要： A process for preparing LiFeO.sub.2 having a layered rock salt type structure is characterized in that at least one member selected from the group consisting of water-soluble iron salts, iron hydroxides, iron oxide hydroxides, and metallic iron is subjected to a hydrothermal treatment in an aqueous solution containing lithium hydroxide and at least one of sodium hydroxide and potassium hydroxide at 130.degree. to 300.degree. C.

摘要翻译： 制备具有层状岩盐型结构的LiFeO 2的方法的特征在于，将选自水溶性铁盐，氢氧化铁，氧化铁氢氧化物和金属铁中的至少一种物质进行水热处理 含有氢氧化锂的水溶液和氢氧化钠和氢氧化钾中的至少一种在130〜300℃。

公开(公告)号：US5861880A

公开(公告)日：1999-01-19

申请号：US541697

申请日：1995-10-10

申请人： Takeshi Shimizu ,  Osamu Nakamura ,  Takahiro Saito

发明人： Takeshi Shimizu ,  Osamu Nakamura ,  Takahiro Saito

IPC分类号： H04N5/262 ,  G06F17/30 ,  G11B27/031 ,  G11B27/034 ,  G11B27/34 ,  H04N5/91

CPC分类号： G11B27/031 ,  G11B27/34 ,  G11B27/034

摘要： Disclosed is a multi-media document editing system capable of editing display positions (spatial structures) of a group of multi-media data as well as display start and display end (temporal structures) in a simple manner through an editing interface. The multi-media document editing system is provided with a multi-media data storage means for storing a plurality of multi-media data elements, a multi-media document holding means for holding a multi-media document containing structural information relating to time and display position in the reproduction of each of the multi-media data stored in said multi-media data storage means, an editing means for connecting the elements in the structural information of the multi-media document through a link structure element, and a multi-media document reproducing means for reproducing each of the multi-media data elements stored in said multi-media data storage means in accordance with the structural information of the multi-media document which has been edited by said editing means.

摘要翻译： 公开了能够通过编辑界面以简单的方式编辑一组多媒体数据的显示位置（空间结构）以及显示开始和显示结束（时间结构）的多媒体文档编辑系统。 多媒体文档编辑系统具有多媒体数据存储装置，用于存储多个多媒体数据元素;多媒体文档保持装置，用于保存包含与时间和显示有关的结构信息的多媒体文档 在存储在所述多媒体数据存储装置中的每个多媒体数据的再现中的位置，用于通过链接结构元素连接多媒体文档的结构信息中的元素的编辑装置，以及多媒体 文件再现装置，用于根据已由所述编辑装置编辑的多媒体文档的结构信息再现存储在所述多媒体数据存储装置中的每个多媒体数据元素。

公开(公告)号：US5788141A

公开(公告)日：1998-08-04

申请号：US673686

申请日：1996-06-25

申请人： Osamu Nakamura

发明人： Osamu Nakamura

IPC分类号： H01L21/67 ,  H01L21/00 ,  H01L21/301 ,  H01L21/52 ,  B23K1/00

CPC分类号： H01L21/67144

摘要： A die push-up assembly used in a bonding machine, such as a die bonding or a tape bonding device, is provided on a die-push-up assembly adjustment device including an X-direction adjustment plate which has a pivot shaft, a Y-direction adjustment plate which is mounted on the X-direction adjustment plate so as to be movable in the Y-direction, an X-direction adjustment screw which allows the X-direction adjustment plate to pivot in the X direction about the pivot shaft, an eccentric shaft which allows the Y-direction adjustment plate to move in the Y direction, a first fastening screw which fastens the X-direction adjustment plate to the bonding apparatus, and a second fastening screw which fastens the Y-direction adjustment plate to the X-direction adjustment plate. The die push-up assembly is mounted on the Y direction adjustment plate so as to be adjusted in the horizontal direction.

摘要翻译： 在用于粘合机中的模具上推组件，例如芯片粘接或胶带粘接装置，设置在模具上推组件调整装置上，该组装调整装置包括：X方向调节板，其具有枢轴，Y 方向调整板，其安装在X方向调整板上以能够在Y方向上移动; X方向调节螺钉，其允许X方向调节板在X方向上围绕枢转轴枢转; 允许Y方向调节板沿Y方向移动的偏心轴，将X方向调整板固定到接合装置的第一紧固螺钉和将Y方向调整板固定到接合装置的第二紧固螺钉 X方向调整板。 模具上推组件安装在Y方向调节板上，以便在水平方向上进行调节。

公开(公告)号：US5755373A

公开(公告)日：1998-05-26

申请号：US698668

申请日：1996-08-16

申请人： Osamu Nakamura

发明人： Osamu Nakamura

IPC分类号： H01L21/67 ,  H01L21/00 ,  H01L21/301 ,  H01L21/52 ,  H01L21/683 ,  H05K3/30

CPC分类号： H01L21/67132 ,  H01L21/6838

摘要： A die push-up device used in a bonding machine for semiconductor devices, etc. including a wafer sheet suction assembly and a wafer push-up needle which are moved up and down independently by a suction assembly raising-and-lowering cam and a push-up needle raising-and-lowering cam which are respectively rotated by a suction assembly raising-and-lowering motor and a push-up needle raising-and-lowering motor.

摘要翻译： 一种用于半导体器件等的接合机中使用的管芯上推器件，包括晶片片吸引组件和晶片上推针，其通过抽吸组件升降凸轮和推动件独立地上下移动 分别由抽吸组件升降马达和上推针升降马达旋转的上升针升降凸轮。