公开(公告)号：US20070125762A1

公开(公告)日：2007-06-07

申请号：US11293626

申请日：2005-12-01

Applicant: Anqing Cui ,  Binh Tran ,  Alexander Tam ,  Jacob Smith ,  R. Iyer ,  Joseph Yudovsky ,  Sean Seutter

Inventor： Anqing Cui ,  Binh Tran ,  Alexander Tam ,  Jacob Smith ,  R. Iyer ,  Joseph Yudovsky ,  Sean Seutter

IPC: H05B3/68

CPC classification number: H01L21/67103

Abstract: Apparatus, reactors, and methods for heating substrates are disclosed. The apparatus comprises a stage comprising a body and a surface having an area to support a substrate, a shaft coupled to the stage, a first heating element disposed within a central region of the body of the stage, and at least second and third heating elements disposed within the body of the stage, the at least second and third heating elements each partially surrounding the first heating element and wherein the at least second and third heating elements are circumferentially adjacent to each other.

Abstract translation: 公开了用于加热基底的装置，反应器和方法。 该装置包括一个舞台，包括主体和具有支撑衬底的区域的表面，耦合到舞台的轴，设置在舞台的身体的中心区域内的第一加热元件，以及至少第二和第三加热元件 设置在所述台体内，所述至少第二和第三加热元件各自部分地围绕所述第一加热元件，并且其中所述至少第二和第三加热元件彼此周向相邻。

公开(公告)号：US20060240921A1

公开(公告)日：2006-10-26

申请号：US11201402

申请日：2005-08-10

Applicant: Joseph Yudovsky ,  Tai Ngo ,  Anne-Douce Coulin

Inventor： Joseph Yudovsky ,  Tai Ngo ,  Anne-Douce Coulin

IPC: F16H7/08 ,  F16H7/14

CPC classification number: F16H7/14 ,  F16H7/12 ,  F16H2007/088

Abstract: In a first aspect, a method is provided for adjusting tension of a belt of a semiconductor device manufacturing tool. The first method includes (1) coupling an elastic element between a pulley coupled to the belt and a fixed surface of the semiconductor device manufacturing tool; and (2) compressing or decompressing the elastic element so as to adjust at least one of a height and a tilt of the pulley and a tension of the belt coupled to the pulley. Numerous other aspects are provided.

Abstract translation: 在第一方面，提供一种用于调节半导体器件制造工具的带的张力的方法。 第一种方法包括（1）在耦合到带的皮带和半导体器件制造工具的固定表面之间耦合弹性元件; 和（2）压缩或解压缩弹性元件，以便调节滑轮的高度和倾斜度以及耦合到皮带轮的皮带的张力中的至少一个。 提供了许多其他方面。

公开(公告)号：US20060156979A1

公开(公告)日：2006-07-20

申请号：US11286063

申请日：2005-11-22

Applicant: Randhir Thakur ,  Steve Ghanayem ,  Joseph Yudovsky ,  Aaron Webb ,  Adam Brailove ,  Nir Merry ,  Vinay Shah ,  Andreas Hegedus

Inventor： Randhir Thakur ,  Steve Ghanayem ,  Joseph Yudovsky ,  Aaron Webb ,  Adam Brailove ,  Nir Merry ,  Vinay Shah ,  Andreas Hegedus

IPC: H01L21/322 ,  C23C16/00

CPC classification number: H01L21/67109 ,  C23C16/4412 ,  C23C16/45546 ,  C23C16/45593 ,  C23C16/4584 ,  C23C16/481 ,  C23C16/54 ,  H01L21/67017 ,  H01L21/67115 ,  H01L21/67167 ,  H01L21/6719 ,  H01L21/67207 ,  H01L21/67745 ,  H01L21/67757 ,  H01L21/67781

Abstract: Aspects of the invention include a method and apparatus for processing a substrate using a multi-chamber processing system (e.g., a cluster tool) adapted to process substrates in one or more batch and/or single substrate processing chambers to increase the system throughput. In one embodiment, a system is configured to perform a substrate processing sequence that contains batch processing chambers only, or batch and single substrate processing chambers, to optimize throughput and minimize processing defects due to exposure to a contaminating environment. In one embodiment, a batch processing chamber is used to increase the system throughput by performing a process recipe step that is disproportionately long compared to other process recipe steps in the substrate processing sequence that are performed on the cluster tool. In another embodiment, two or more batch chambers are used to process multiple substrates using one or more of the disproportionately long processing steps in a processing sequence. Aspects of the invention also include an apparatus and method for delivering a precursor to a processing chamber so that a repeatable ALD or CVD deposition process can be performed.

Abstract translation: 本发明的方面包括使用适于在一个或多个批次和/或单个基板处理室中处理基板以增加系统吞吐量的多室处理系统（例如，集群工具）来处理基板的方法和装置。 在一个实施例中，系统被配置为执行仅包含批处理室的衬底处理序列，或批处理和单个衬底处理室，以优化生产量并且由于暴露于污染环境而最小化处理缺陷。 在一个实施例中，批处理室用于通过执行与在集群工具上执行的衬底处理序列中的其他工艺配方步骤相比不成比例地长的工艺配方步骤来增加系统吞吐量。 在另一个实施方案中，使用两个或更多个间隔室来处理多个基板，使用处理顺序中的一个或多个不成比例的长处理步骤。 本发明的方面还包括用于将前体输送到处理室的装置和方法，使得可以执行可重复的ALD或CVD沉积工艺。

公开(公告)号：US06994319B2

公开(公告)日：2006-02-07

申请号：US10354600

申请日：2003-01-29

Applicant: Joseph Yudovsky

Inventor： Joseph Yudovsky

IPC: F16K31/44

CPC classification number: F16K31/52491 ,  C23C16/45544 ,  F16K31/047

Abstract: A gas valve for pulsing a gas comprises a housing having an inlet port, an outlet port, a membrane, and an actuator, wherein the actuator selectively engages the membrane with the inlet port. In one embodiment, a plurality of the gas valves are coupled together to form an apparatus for synchronized pulsing of a plurality of individual gases.

Abstract translation: 用于脉冲气体的气阀包括具有入口端口，出口，膜和致动器的壳体，其中致动器选择性地将膜与入口端接合。 在一个实施例中，多个气阀联接在一起以形成用于同时脉冲多个单独气体的装置。

公开(公告)号：US20050211276A1

公开(公告)日：2005-09-29

申请号：US11080361

申请日：2005-03-15

Applicant: Joseph Yudovsky ,  Hui Chen ,  Gary Ettinger

Inventor： Joseph Yudovsky ,  Hui Chen ,  Gary Ettinger

IPC: B08B3/02 ,  B08B3/12 ,  B08B3/14 ,  B08B13/00 ,  H01L21/00

CPC classification number: H01L21/67126 ,  B08B3/02 ,  B08B3/12 ,  B08B13/00 ,  H01L21/67051

Abstract: A lid for a semiconductor device processing apparatus is provided. The lid includes a cover having an opening and may include (1) a wall formed around the opening, the wall adapted to prevent fluid present on the lid from entering a body of the processing apparatus through the opening; (2) an outer door adapted to prevent fluid from entering the body of the processing apparatus through the opening of the cover; (3) an inner door coupled to the outer door and adapted to prevent fluid from exiting the body of the processing apparatus through the opening of the cover; and/or (4) a rinsing mechanism adapted to rinse a top surface of the cover. Numerous other aspects are provided.

Abstract translation: 提供了一种用于半导体器件处理设备的盖子。 盖子包括具有开口的盖，并且可以包括（1）围绕开口形成的壁，所述壁适于防止存在于盖上的流体通过开口进入处理装置的主体; （2）外门，其适于防止流体通过盖的打开进入加工设备的主体; （3）内门，其联接到所述外门并且适于防止流体通过所述盖的打开而离开所述处理设备的主体; 和/或（4）适于冲洗所述盖的顶表面的冲洗机构。 提供了许多其他方面。

公开(公告)号：US06821563B2

公开(公告)日：2004-11-23

申请号：US10354849

申请日：2003-01-29

Applicant: Joseph Yudovsky

Inventor： Joseph Yudovsky

IPC: C23C1600

CPC classification number: C23C16/45551 ,  C23C16/4412 ,  C23C16/45561 ,  C23C16/54 ,  C30B25/14 ,  H01L21/67017

Abstract: Embodiments of the invention are generally directed to a cyclical layer deposition system, which includes a processing chamber, at least one load lock chamber connected to the processing chamber, a plurality of gas ports disposed on the processing chamber. The gas ports are configured to transmit one or more gas streams into the processing chamber. The system further includes a plurality of vacuum ports disposed on the processing chamber between the gas ports. The vacuum ports are configured to transmit the gas streams out of the processing chamber.

公开(公告)号：US06589352B1

公开(公告)日：2003-07-08

申请号：US09459313

申请日：1999-12-10

Applicant: Joseph Yudovsky ,  Lawrence C. Lei ,  Salvador Umotoy ,  Tom Madar ,  Girish Dixit ,  Gwo-Chuan Tzu

Inventor： Joseph Yudovsky ,  Lawrence C. Lei ,  Salvador Umotoy ,  Tom Madar ,  Girish Dixit ,  Gwo-Chuan Tzu

IPC: C23C1600

CPC classification number: C23C16/4585 ,  C30B25/12 ,  C30B31/14

Abstract: The invention provides a removable first edge ring configured for pin and recess/slot coupling with a second edge ring disposed on the substrate support. In one embodiment, a first edge ring includes a plurality of pins, and a second edge ring includes one or more alignment recesses and one or more alignment slots for mating engagement with the pins. Each of the alignment recesses and alignment slots are at least as wide as the corresponding pins, and each of the alignment slots extends in the radial direction a length that is sufficient to compensate for the difference in thermal expansion between the first edge ring and the second edge ring.

Abstract translation: 本发明提供了可拆卸的第一边缘环，其被配置用于与设置在基板支撑件上的第二边缘环的销和凹槽/狭槽联接。 在一个实施例中，第一边缘环包括多个销，并且第二边缘环包括一个或多个对准凹槽和用于与销配合接合的一个或多个对准槽。 每个对准凹槽和对准槽至少与相应的销一样宽，并且每个对准槽在径向方向上延伸的长度足以补偿第一边缘环和第二边缘之间的热膨胀差 边缘环。

公开(公告)号：US06544340B2

公开(公告)日：2003-04-08

申请号：US09733374

申请日：2000-12-08

Applicant: Joseph Yudovsky

Inventor： Joseph Yudovsky

IPC: H01L2100

CPC classification number: H01L21/68742 ,  C23C16/4581 ,  C23C16/4585 ,  C23C16/46 ,  H01L21/68785

Abstract: A substrate support assembly for supporting a substrate during processing is provided. In one embodiment, a support assembly includes a support plate supported by a second plate. The support plate has a first side and a second side. The second side of the support has a recess formed therein. The second plate includes a boss extending from the second plate which mates with the recess of the support plate. Other embodiments include a flange that extends from the support plate that supports a shadow ring and a plurality of sleeves extending from the support plate for guiding lift pins.

公开(公告)号：US06503331B1

公开(公告)日：2003-01-07

申请号：US09660006

申请日：2000-09-12

Applicant: Joseph Yudovsky ,  Lawrence C. Lei ,  Salvador Umotoy

Inventor： Joseph Yudovsky ,  Lawrence C. Lei ,  Salvador Umotoy

IPC: C23C1600

CPC classification number: H01J37/3244 ,  H01J2237/022

Abstract: Provided herewith is a chamber for depositing a film on a substrate comprising a process compartment; a purge compartment, a purge ring located on the chamber body to separate the two compartments, a heater, and a shadow ring covering the periphery of the substrate. Alternatively, the chamber may further comprise a shield interconnected with the shadow ring. Still provided is a method for depositing a film of uniformity on a substrate in such a chamber. The method comprises the steps of positioning the substrate in a process compartment; flowing a process gas into the process compartment; flowing a purge gas in a purge compartment; and exhausting the process and purge gas from the chamber, thereby depositing a film of uniformity on the substrate.

Abstract translation: 提供了一种用于在包括处理隔室的基板上沉积膜的室; 净化室，位于室主体上以分离两个隔室的清洗环，加热器和覆盖基板周边的阴影环。 或者，腔室可以进一步包括与阴影环互连的护罩。 仍然提供了一种在这种室中的基板上沉积均匀膜的方法。 该方法包括以下步骤：将基板定位在处理室中; 将工艺气体流入加工室; 将吹扫气体流入净化室; 并排出该过程并从室中吹扫气体，从而在衬底上沉积均匀的膜。

公开(公告)号：US06223447B1

公开(公告)日：2001-05-01

申请号：US09504288

申请日：2000-02-15

Applicant: Joseph Yudovsky ,  Salvador Umotoy ,  Lawrence C. Lei ,  Ronald Rose

Inventor： Joseph Yudovsky ,  Salvador Umotoy ,  Lawrence C. Lei ,  Ronald Rose

IPC: F26B1724

CPC classification number: H01L21/68721 ,  H01L21/68735

Abstract: A fastening device which prevents rotational and vertical displacement of a purge ring caused by purge gas exiting the purge ring or caused by other processing conditions. The fastening device comprises a clamp which releasably holds the purge ring together with the wafer support. A pin is inserted into a bore through the purge ring, wafer support and the clamp to releasably secure the clamp in place. Slots may be formed in the purge ring to guide placement of the clamp.

Abstract translation: 一种紧固装置，其防止由吹扫气体离开吹扫环或由其它加工条件引起的清洗环的旋转和垂直位移。 紧固装置包括可拆卸地将清洗环与晶片支撑件一起保持的夹具。 销通过清洗环，晶片支架和夹具插入孔中，以将夹具可释放地固定到位。 槽可以形成在清洗环中以引导夹具的放置。