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    SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
    52.
    发明申请
    SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD 有权
    基板处理装置和基板处理方法

    公开(公告)号：US20130108975A1

    公开(公告)日：2013-05-02

    申请号：US13665169

    申请日：2012-10-31

    申请人： SEMES CO., LTD.

    发明人： UnKyu KANG ,  Sungun KIM

    IPC分类号： F03B11/02 ,  F27D7/00

    CPC分类号： H01L21/67017 ,  Y10T137/8593

    摘要： Provided is a substrate treating apparatus. The substrate treating apparatus includes a chamber, a support member disposed within the chamber to support a substrate, and an exhaust member for exhausting a gas within an inner space of the chamber to the outside of the chamber. A trap space for collecting fumes contained in the gas is defined in the exhaust member.

    摘要翻译： 提供了一种基板处理装置。 基板处理装置包括室，设置在室内以支撑基板的支撑构件以及用于将腔室的内部空间内的气体排出到室外的排气构件。 在排气构件中限定用于收集气体中所含的烟雾的捕集空间。

    METHOD AND DEVICE FOR HEATING A FILM
    53.
    发明申请
    METHOD AND DEVICE FOR HEATING A FILM 审中-公开
    用于加热薄膜的方法和装置

    公开(公告)号：US20130011802A1

    公开(公告)日：2013-01-10

    申请号：US13542499

    申请日：2012-07-05

    申请人： Dieter HOLZEM

    发明人： Dieter HOLZEM

    IPC分类号： F27D7/00 ,  B65B47/02

    CPC分类号： B65B47/04 ,  B29C51/424 ,  B65B47/02 ,  B65B47/10

    摘要： The invention relates generally to a method for contact-free heating a thermoformable film prior to deforming the thermoformable film. Heating is carried out by at least one heater having at least one porous surface which faces the film and through which air flows. An air film is formed between the porous surface and the thermoformable film due to the flow of air through the porous surface. The invention also relates to a heating unit for contact-free heating a thermoformable film as well as to a packaging machine that includes such a heating unit.

    摘要翻译： 本发明一般涉及在可热成型膜变形之前对可热成型膜进行无接触加热的方法。 通过至少一个加热器进行加热，所述加热器具有面向薄膜的至少一个多孔表面，空气流过该加热器。 由于穿过多孔表面的空气流动，在多孔表面和可热成膜之间形成空气膜。 本发明还涉及一种用于对可热成型膜进行无接触加热的加热单元以及包括这种加热单元的包装机。

    ROLLER SEALING DEVICE AND GAS-SEALING METHOD THEREOF
    54.
    发明申请
    ROLLER SEALING DEVICE AND GAS-SEALING METHOD THEREOF 审中-公开
    滚筒密封装置及其密封方法

    公开(公告)号：US20120178037A1

    公开(公告)日：2012-07-12

    申请号：US12986358

    申请日：2011-01-07

    申请人： A-TZU CHEN ,  MING-HUI YU ,  CHANG-FA CHEN ,  WANG-TSUNG LIANG ,  CHIA-JUNG KAO

    发明人： A-TZU CHEN ,  MING-HUI YU ,  CHANG-FA CHEN ,  WANG-TSUNG LIANG ,  CHIA-JUNG KAO

    IPC分类号： F27D7/00 ,  F27B9/30

    CPC分类号： F27B9/30 ,  F27B9/04 ,  F27D99/0073

    摘要： A roller sealing device arranged at an access port of a continuous furnace for adapting a continuous processed planar processed material. The rolling device includes a pair of first roller carriers arranged correspondingly opposite to each other, each having a first roller assembly. Each first roller carrier includes a first sealing roller and two first auxiliary rollers; the first sealing roller and two first auxiliary rollers are pivoted to a respective one of the first roller carriers; the two first auxiliary rollers are located between the first sealing roller and the corresponding first roller carrier. The first auxiliary rollers rollingly abut against the first sealing roller and the corresponding first roller carrier. Therefore, the roller sealing device is sealed well so as to prevent the gas from leakage. The present invention further provides a gas-sealing method.

    摘要翻译： 一种布置在连续炉的入口处的辊密封装置，用于适应连续加工的平面加工材料。 滚动装置包括彼此相对布置的一对第一辊支架，每一个具有第一辊组件。 每个第一辊架包括第一密封辊和两个第一辅助辊; 第一密封辊和两个第一辅助辊枢转到相应的一个第一辊架; 两个第一辅助辊位于第一密封辊和相应的第一辊架之间。 第一辅助辊滚动地抵靠第一密封辊和相应的第一辊架。 因此，辊密封装置密封好以防止气体泄漏。 本发明还提供一种气体密封方法。

    ELECTRODE CATALYST MATERIAL AND METHOD OF MANUFACTURING THE SAME
    56.
    发明申请
    ELECTRODE CATALYST MATERIAL AND METHOD OF MANUFACTURING THE SAME 审中-公开
    电极催化剂材料及其制造方法

    公开(公告)号：US20110256468A1

    公开(公告)日：2011-10-20

    申请号：US13075419

    申请日：2011-03-30

    申请人： Shuichi SUZUKI ,  Jun Kawaji ,  Yoshiyuki Takamori ,  Makoto Morishima

    发明人： Shuichi SUZUKI ,  Jun Kawaji ,  Yoshiyuki Takamori ,  Makoto Morishima

    IPC分类号： H01M8/10 ,  B05D5/12 ,  F27D7/00 ,  H01M8/00 ,  H01M4/86 ,  H01M4/66

    CPC分类号： H01M4/926 ,  H01M4/9083 ,  H01M2008/1095

    摘要： The invention provides an electrode catalyst material in which a resistance loss is reduced by enhancing an electric conductivity as a whole of an electrode catalyst as well as suppressing a corrosion and a disappearance by a catalyst metal in a conductive catalyst support so as to prevent a dropout and an aggregation of a catalyst metal particle, and a method of manufacturing the same. The electrode catalyst material in accordance with the present invention is an electrode catalyst material for a fuel cell having a catalyst metal particle and a carbon support supporting the catalyst metal particle, in which a carbon support protection layer including a metal element is formed in a coating manner on a surface of the carbon support, a silicone is included at 20 atomic % or more in the metal element contained in the carbon support protection layer, and the silicone exists in a state of an oxide and a carbide.

    摘要翻译： 本发明提供一种电极催化剂材料，其中通过提高整个电极催化剂的导电性以及通过催化剂金属在导电催化剂载体中抑制腐蚀和消失来降低电阻损失，从而防止出现脱落 和催化剂金属颗粒的聚集体及其制造方法。 根据本发明的电极催化剂材料是具有催化剂金属颗粒和支撑催化剂金属颗粒的碳载体的燃料电池用电极催化剂材料，其中在涂层中形成包含金属元素的碳载体保护层 在碳载体表面上的含碳量在20原子％以上的硅载体保护层中含有的金属元素中，硅氧烷以氧化物和碳化物的状态存在。

    QUARTZ WINDOW HAVING GAS FEED AND PROCESSING EQUIPMENT INCORPORATING SAME
    57.
    发明申请
    QUARTZ WINDOW HAVING GAS FEED AND PROCESSING EQUIPMENT INCORPORATING SAME 有权
    具有气体进料和加工设备的QUARTZ窗口

    公开(公告)号：US20100267249A1

    公开(公告)日：2010-10-21

    申请号：US12759873

    申请日：2010-04-14

    申请人： TAE JUNG KIM ,  MARTIN RIPLEY

    发明人： TAE JUNG KIM ,  MARTIN RIPLEY

    IPC分类号： H01L21/26 ,  F27D11/12 ,  F27D7/00

    CPC分类号： H01L21/67115 ,  F27B17/0025

    摘要： Methods and apparatus for providing a process gas to a substrate in a processing system are disclosed herein. In some embodiments, the substrate processing system may include a process chamber having a substrate support disposed therein; a light source disposed above the process chamber to direct energy towards the substrate support; and a window assembly disposed between the light source and the substrate support to allow light energy provided by the light source to enter the process chamber towards the substrate support, wherein the window assembly includes an inlet to receive a process gas and one or more outlets to distribute the process gas into the process chamber.

    摘要翻译： 本文公开了在处理系统中向工艺气体提供工艺气体的方法和设备。 在一些实施例中，衬底处理系统可以包括其中布置有衬底支撑件的处理室; 设置在所述处理室上方以将能量引向所述衬底支撑件的光源; 以及窗组件，其设置在所述光源和所述基板支撑件之间，以允许由所述光源提供的光能量朝向所述基板支撑件进入所述处理室，其中所述窗组件包括用于接收处理气体的入口和一个或多个出口 将处理气体分配到处理室中。