Abstract:
Abstract of DisclosureThe present invention utilizes radiation reflectors on the refractory wall of a fired furnace opposite the spaces between adjacent tubes. The refractory radiation reflectors have a base contiguous with the refractory surface and secured to a subjacent structure, and an isosceles triangular cross section with similar sides extending from the base. The base has a dimension less than the spaces between adjacent tubes to facilitate installation in a modular construction. The radiation reflectors focus the reflected radiation from the flame onto the dark side of the tubes. The invention increases the overall heat transfer of the tube by increasing the heat flux rate for the backside of the tube, and also decreases the flux and temperature differentials between the front and rear sides of the tubes.
Abstract:
A paper web drying apparatus and process is provided in which the heated air drying medium is replaced with between 10 percent to 100 percent of live steam. The addition of a steam component to the drying medium provides for a higher drying temperature to be supplied to the wet moving web. The introduction of live pressurized steam contributes to the load of force of the drying medium, thereby decreasing the energy requirements of blower motors. The introduction of pressurized live steam also lowers the free atmospheric oxygen content of the drying medium which reduces the burning or scorch hazard associated with high temperature drying of a cellulose web.
Abstract:
A drying section of a machine for the manufacture of a material web, in particular of a paper or of a board web, comprises a smoothing nip which is extended in the web running direction and is formed between two pressing areas lying opposite one another of which at least one is formed by a shoe roll, with at least 70%, and preferably at least 90%, of the outer shoe roll diameter lying above the machine base. In a method for the combined drying and smoothing of a material web, in particular of a paper web or of a board web, in a drying section, the following steps are provided: the material web is first dried to a pre-settable drying content>60%, in particular >65%, and preferably >70%; the material web having this pre-settable drying content is guided through a smoothing nip which is extended in the web running direction and is formed between two pressing surfaces lying opposite one another of which at least one is formed by a rotating belt and of which at least one is heated; the pressing time resulting in the extended smoothing nip is selected >0.8 ms; and the material web is further dried after the smoothing nip.
Abstract:
A drying system for drying a semiconductor substrate is provided. The drying system includes: a chamber for housing a vapor distributor and a fluid bath, said fluid bath being disposed in a lower portion of the chamber and said distributor being disposed in an upper portion of the chamber for distributing vapor for drying the substrate; and a fluid flow system for supplying fluid flow into said fluid bath for cleaning and drying the substrate and for draining said fluid from the fluid bath, wherein the chamber includes a plurality of exhaust vents disposed at the upper portion for venting the vapor.
Abstract:
A processor for rinsing and drying of semiconductor substrates includes a process vessel contained within an outer containment vessel. A diluted organic vapor creates a Marangoni effect flow along the surface of processing liquid contained within the process vessel. The process vessel includes porous walls that allow residual chemicals, organic species, and other unwanted materials to flow from the process vessel to the outer containment vessel. The porous walls allow for the maintenance of a stable surface tension gradient to sustain a consistent Marangoni force for even drying. Replacement processing fluid is preferably introduced to the process vessel to prevent the build up of organic species in the surface layer of the processing fluid.
Abstract:
Device and process for dewatering a fibrous material web by expelling water via gas pressure. The dewatering device includes at least four rolls arranged to radially limit at least one pressure chamber and sealing units arranged to axially limit the at least one pressure chamber. Adjustment devices are arranged to at least partially individually axially adjust positions of the at least four rolls and the sealing units. A pressure gas is introducible into and the fibrous material web is guidable through the at least one pressure chamber.
Abstract:
An apparatus for performing contaminant sensitive processing on a substrate. A substrate load chamber receives the substrate from an ambient contaminant laden environment, and isolates the substrate from the ambient contaminant laden environment. The substrate load chamber further forms a first environment of intermediate cleanliness around the substrate. A substrate pass through chamber receives the substrate from the substrate load chamber, and isolates the substrate from the intermediate cleanliness of the first environment of the substrate load chamber. The substrate pass through chamber further forms a second environment of high cleanliness around the substrate. A substrate transfer chamber receives the substrate from the substrate pass through chamber, and isolates the substrate from the high cleanliness of the second environment of the substrate pass through chamber. The substrate transfer chamber maintains a third environment of high cleanliness around the substrate, and transfers the substrate into more than one substrate processing chambers, where the substrate is selectively transferred into and out of the more than one substrate processing chambers without leaving the high cleanliness of the third environment. The substrate transfer chamber also selectively passes the substrate to the substrate pass through chamber when the substrate pass through chamber has formed the high cleanliness of the second environment. The substrate pass through chamber also receives the substrate from the substrate transfer chamber, and selectively passes the substrate to the substrate load chamber when the substrate load chamber has formed the intermediate cleanliness of the first environment. The substrate load chamber receives the substrate from the substrate pass through chamber, and selectively passes the substrate out of the substrate load chamber and into the ambient contaminant laden environment when the substrate load chamber is not open to the substrate pass through chamber.
Abstract:
A method of operating an automatic cycle of a clothes dryer is disclosed wherein, after initiation of an automatic cycle, a CPU displays the expected time remaining during the current cycle. At various times during the cycle, the expected time remaining is updated by comparing the time required to reach certain moisture levels of the articles contained therein to reference times. The comparison also results in the expected times being updated for future uses of the clothes dryer. Finally, the invention includes a system for updating the amount of time required to reach a desired final temperature during a cooldown sequence.
Abstract:
The present invention provides a method and an apparatus for drying semiconductor wafers by using an IPA drying apparatus. The present invention uses a vapor generator to generate an IPA vapor. The IPA vapor is generated and saved in a closed surrounding and then transferred in a porous hollow plate in the dryer tank by using a quartz pipe. The IPA vapor is diffused evenly from the porous hollow plate. Furthermore, the present invention increases the safety of the process and can easily control the input amount of the IPA vapor.
Abstract:
An apparatus and method for cleaning objects having generally irregular surface features, such as reloadable photographic cameras, has a partial enclosure having opposing side walls, and a top wall joining the opposing side walls. An air ionizing element composed of an ion emitter and an air knife is arranged in the enclosure for electrostatically neutralizing the object with ions entrained in a curtain-like stream of air directed onto the object.