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61 条记录 (耗时 0.023 秒)

    FABRICATION OF QUARTZ-CLAD CARBON NANOTUBE BUNDLES
    52.
    发明申请
    FABRICATION OF QUARTZ-CLAD CARBON NANOTUBE BUNDLES 失效
    石墨碳纳米管组件的制造

    公开(公告)号：US20080199383A1

    公开(公告)日：2008-08-21

    申请号：US11676378

    申请日：2007-02-19

    申请人： Yuichiro Nishina

    发明人： Yuichiro Nishina

    IPC分类号： C01B15/14

    CPC分类号： B82Y40/00 ,  B82Y30/00 ,  C01B32/168 ,  C01B2202/02 ,  Y10S977/742 ,  Y10T428/30

    摘要： [Objective] To develop a method of fabricating carbon nanotube bundles clad in a quartz sheath with high temperature and chemical resistance.[Method of Fabrication] The microcrystalline carbon nanotube sample in powder form is vacuum-sealed within a quartz tube sheath and heated to the softening temperature of quartz, then quickly quenched to room temperature while simultaneously extending or “drawing” the quartz tube along its major axis.

    摘要翻译： [目的]开发一种具有高温耐化学性的包覆在石英鞘中的碳纳米管束的制造方法。 [制造方法]将粉末状的微晶碳纳米管样品真空密封在石英管外壳内并加热至石英的软化温度，然后迅速淬火至室温，同时沿其主体延伸或“拉制”石英管 轴。

    METHOD FOR PRODUCING CRYSTALLIZED SILICON AS WELL AS CRYSTALLIZED SILICON
    53.
    发明申请
    METHOD FOR PRODUCING CRYSTALLIZED SILICON AS WELL AS CRYSTALLIZED SILICON 失效
    用于生产结晶硅的方法，如结晶硅

    公开(公告)号：US20080152568A1

    公开(公告)日：2008-06-26

    申请号：US11956688

    申请日：2007-12-14

    申请人： Albrecht SEIDL ,  Ingo SCHWIRTLICH

    发明人： Albrecht SEIDL ,  Ingo SCHWIRTLICH

    IPC分类号： H01L21/322 ,  C01B15/14

    CPC分类号： C30B29/06 ,  C30B15/02 ,  C30B15/34 ,  Y10T117/10

    摘要： A method for producing crystallized silicon according to the EFG process by using a shaping part, between which part and a silicon melt, crystallized silicon grows in a growth zone. Inert gas and at least water vapor are fed into the silicon melt and/or growth zone, by means of which the oxygen content of the crystallized silicon is increased. From 50 to 250 ppm of vapor water is added to the inert gas, and the inert gas has an oxygen, CO and/or CO2 content of less than 20 ppm total.

    摘要翻译： 根据EFG方法通过使用成形部分生成结晶硅的方法，其中部分与硅熔体之间的结晶硅在生长区中生长。 惰性气体和至少水蒸气被送入硅熔体和/或生长区，通过该气体，结晶硅的氧含量增加。 向惰性气体中加入50〜250ppm的蒸汽水，惰性气体的总氧含量，CO和/或CO 2含量小于20ppm。

    Silicon Nanosheet , Nanosheet Solution and Process for Producing the Same, Nanosheet -Containing Composite, and Nanosheet Aggregate
    54.
    发明申请
    Silicon Nanosheet , Nanosheet Solution and Process for Producing the Same, Nanosheet -Containing Composite, and Nanosheet Aggregate 审中-公开
    硅纳米片，纳米片溶液及其制备方法，纳米片 - 复合材料和纳米片聚集体

    公开(公告)号：US20080050573A1

    公开(公告)日：2008-02-28

    申请号：US11628031

    申请日：2005-07-14

    申请人： Hideyuki Nakano ,  Hiroshi Nakamura ,  Takuya Mitsuoka ,  Yusuke Akimoto ,  Eiichi Sudo

    发明人： Hideyuki Nakano ,  Hiroshi Nakamura ,  Takuya Mitsuoka ,  Yusuke Akimoto ,  Eiichi Sudo

    IPC分类号： B32B9/00 ,  C01B15/14

    CPC分类号： C01B33/02 ,  Y10T428/265

    摘要： A silicon nanosheet comprising a silicon atom layer formed by bonding two-dimensionally and periodically arranged silicon atoms to each other through an Si—Si bond. A nanosheet solution prepared by dispersing or suspending the silicon nanosheets in a solvent. A nanosheet-containing composite having the silicon nanosheets on the surface and/or in the interior of a substrate. A nanosheet aggregate formed by aggregating the silicon nanosheets. A process for producing a nanosheet solution comprising: an acid treatment step of bringing a layered silicon compound into contact with an aqueous acid solution to derive a siloxene compound; and an exfoliation step of adding the siloxene compound into a solvent containing a surfactant, shaking the mixture, and peeling off the siloxene compound.

    摘要翻译： 一种硅纳米片，包括通过Si-Si键将二维和周期性排列的硅原子结合而形成的硅原子层。 通过将硅纳米片分散或悬浮在溶剂中制备的纳米片溶液。 一种含纳米片的复合材料，其在表面和/或基材内部具有硅纳米片。 通过聚集硅纳米片形成的纳米片聚集体。 一种制备纳米片溶液的方法，包括：酸处理步骤，使层状硅化合物与酸水溶液接触以得到硅氧烷化合物; 以及将硅氧烷化合物添加到含有表面活性剂的溶剂中，摇动混合物并剥离硅氧烷化合物的剥离步骤。

    Disinfecting peroxosilicated compound with scale preventive effect, preparation method and use thereof
    56.
    发明申请
    Disinfecting peroxosilicated compound with scale preventive effect, preparation method and use thereof 失效
    消毒过氧化物化合物具有防垢作用，其制备方法及用途

    公开(公告)号：US20050261153A1

    公开(公告)日：2005-11-24

    申请号：US10450664

    申请日：2001-12-13

    申请人： Morou Boukari ,  Marc Auriol ,  Sophie Auriol

    发明人： Morou Boukari ,  Marc Auriol ,  Sophie Auriol

    IPC分类号： C01B15/14 ,  C11D1/00

    CPC分类号： C01B15/14

    摘要： The invention concerns a peroxosilicated, optionally phosphatized, disinfecting compound with scale preventive effect obtained by reacting an alkaline or alkaline-earth metasilicate with an active oxygen-releasing compound, for example potassium monopersulphate and/or oxygen peroxide, in inert medium. The compound can be stabilised with sodium hexametaphosphate. Copper and aluminium in salt form can be encapsulated or complexed with the metasilicate so that the resulting peroxosilicated compound can be used for its disinfecting, scale preventive, anticorrosive, flocculating and algicidal properties for more than three weeks.

    摘要翻译： 本发明涉及通过使碱性或碱土金属硅酸盐与活性释氧化合物（例如单过硫酸钾和/或氧过氧化物）在惰性介质中反应而获得的具有防垢效果的过氧化硅酸盐，任选磷酸化的消毒化合物。 该化合物可以用六偏磷酸钠稳定。 盐形式的铜和铝可以与偏硅酸盐包封或络合，使得所得过氧化物化合物可用于其消毒，防垢，防腐，絮凝和杀藻性能超过三周。

    Solid silica derivative and process for producing the same
    59.
    发明授权
    Solid silica derivative and process for producing the same 失效
    固体二氧化硅衍生物及其制造方法

    公开(公告)号：US5985229A

    公开(公告)日：1999-11-16

    申请号：US710419

    申请日：1996-09-17

    申请人： Yoshinori Yamada ,  Katsuyoshi Harada

    发明人： Yoshinori Yamada ,  Katsuyoshi Harada

    IPC分类号： C01B33/12 ,  C09C1/28 ,  C01B15/14 ,  C04B14/04

    CPC分类号： C09C1/28 ,  C01B33/12 ,  C01P2004/03 ,  C01P2004/64

    摘要： A solid silica derivative which is represented by the general formula H.sub.n SiO.sub.(4-n)/2 wherein n is a real number larger than 0 but smaller than 2 and which contains Si--H bond, said solid silica derivative being able to be easily produced in a high yield by subjecting to hydrolysis-condensation an alkoxysilane represented by the mean general formula H.sub.n --Si(OR.sup.0).sub.4-n in which R.sup.0 represents an alkyl group having 1 to 4 carbon atoms, plural R.sup.0 groups may be the same as or different from one another and n is a real number greater than 0 but smaller than 2, using water in an amount of (4-n)/2 moles or more per mole of the alkoxysilane at a pH of 10.5 or less.

    摘要翻译： 由通式H n SiO（4-n）/ 2表示的固体二氧化硅衍生物，其中n是大于0但小于2的实数，并且含有Si-H键，所述固体二氧化硅衍生物能够容易地生成 通过水解缩合由通式为Hn-Si（OR0）4-n表示的烷氧基硅烷（其中R 0表示具有1至4个碳原子的烷基）表示的高收率，多个R0基团可以与 使用相对于每摩尔烷氧基硅烷为（10-n）/ 2摩尔以上的水，pH为10.5以下的水，n为大于0但小于2的实数。

    Crystalline silicic acid, its salts, and processes for their preparation
    60.
    发明授权
    Crystalline silicic acid, its salts, and processes for their preparation 失效
    结晶硅酸及其盐及其制备方法

    公开(公告)号：US4581213A

    公开(公告)日：1986-04-08

    申请号：US688454

    申请日：1985-01-02

    申请人： Hans-Peter Rieck

    发明人： Hans-Peter Rieck

    IPC分类号： B01J39/14 ,  C01B33/12 ,  C01B33/143 ,  C01B33/32 ,  C01B33/38 ,  C01B39/06 ,  C01B15/14

    CPC分类号： C01B33/12 ,  C01B33/38

    摘要： Crystalline sodium silicates having a sheet structure and an ion exchange capacity of 83-130 mmol of Na.sup.+ /mol of SiO.sub.2 are prepared by a method in which an aqueous reaction mixture which contains sodium silicate, has a molar ratio SiO.sub.2 /Na.sub.2 O of 3.9:1 to 15:1 and a molar ratio H.sub.2 O/(Na.sub.2 O+SiO.sub.2) of 3:1 to 80:1 and contains 0.01 to 30% by weight, relative to the amount of SiO.sub.2 in the reaction mixture employed, of seed crystals of the desired crystalline sodium silicate is prepared, the mixture is heated to temperatures of 160.degree. to 250.degree. C., the reaction is carried out at least until, in the X-ray diffraction pattern of a sample filtered off under suction and dried at 120.degree. C., the ratio of the intensity of the reflection at the interplanar spacing d.sub.1 =(20.+-.2).multidot.10.sup.-8 cm to the intensity of any reflection present at the interplanar spacing d.sub.2 =(15.5.+-.1.5).multidot.10.sup.-8 cm is at least 3:1, and the reaction is terminated before the intensity of the reflection at the interplanar spacing d.sub.3 =(3.34.+-.0.04).multidot.10.sup.-8 cm reaches or exceeds the intensity of the reflection at the interplanar spacing d.sub.4 =(3.44.+-.0.04).multidot.10.sup.-8 cm. A crystalline silicic acid having a sheet structure and the overall composition H.sub.2 Si.sub.x O.sub.2x+1, wherein 15

    摘要翻译： 具有片状结构和离子交换容量为83-130mmol Na + / mol SiO 2的结晶硅酸钠通过其中含有硅酸钠的含水反应混合物的SiO 2 / Na 2 O为3.9:1的方法制备 至15:1，摩尔比H 2 O /（Na 2 O + SiO 2）为3：1至80：1，相对于所用反应混合物中的SiO 2的含量为0.01至30重量％，所需的晶种为 制备结晶硅酸钠，将混合物加热至160℃至250℃的温度，至少在抽吸过滤掉的样品的X射线衍射图中至少进行反应，并在120℃下干燥 在平面间距d1 =（20 +/- 2）×10-8cm处的反射强度与在面间距处存在的任何反射的强度的比率d2 =（15.5 +/- 1.5）×10-8 cm至少为3:1，并且在晶面间距d3 =（3.34 +/- 0.04）处的反射强度之前终止反应， x10-8cm达到或超过在晶面间距d4 =（3.44 +/- 0.04）×10-8cm处的反射强度。 描述了具有片状结构和总组成为H2SixO2x + 1（其中15