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公开(公告)号：US12025923B2
公开(公告)日：2024-07-02
申请号：US18151163
申请日：2023-01-06
发明人： Chi-Hung Liao , Min-Cheng Wu
CPC分类号： G03F7/70916 , G03F7/70033 , H05G2/005
摘要： A method includes shooting a primary droplet and a satellite droplet from a droplet generator along a common initial direction; applying a force to the primary droplet and the satellite droplet, wherein after applying the force, the primary droplet has a first deflection toward a first direction different than the common initial direction, and the satellite droplet has a second deflection toward a second direction different than the common initial direction, wherein the second deflection of the satellite droplet is greater than the first deflection of the primary droplet; and generating an extreme ultraviolet (EUV) light using an excitation laser hitting the primary droplet with the first deflection.
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公开(公告)号：US11959864B2
公开(公告)日：2024-04-16
申请号：US18058004
申请日：2022-11-22
发明人： Chi-Hung Liao , Wei Chang Cheng
IPC分类号： G01N21/956 , G01N21/95 , G03F7/16 , H01L21/027 , H01L21/67 , H01L21/68
CPC分类号： G01N21/95607 , G01N21/9501 , G03F7/162 , G03F7/168 , H01L21/0276 , H01L21/6715 , H01L21/67259 , H01L21/681
摘要： A photolithography method includes dispensing a first liquid toward a target layer through a nozzle at a first distance from the target layer; moving the nozzle such that the nozzle is at a second distance from the target layer, wherein the second distance is different from the first distance; dispensing a second liquid toward the target layer through the nozzle at the second distance from the target layer; and patterning the target layer after dispensing the first liquid and the second liquid.
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公开(公告)号：US11914288B2
公开(公告)日：2024-02-27
申请号：US17406654
申请日：2021-08-19
发明人： Yu-Yu Chen , Chi-Hung Liao
IPC分类号： G03F1/76 , G03F1/00 , G03F7/16 , G03F7/20 , G03F7/30 , H01L21/027 , H01L21/308
CPC分类号： G03F1/76 , G03F1/00 , G03F7/162 , G03F7/20 , G03F7/30 , H01L21/0274 , H01L21/3086
摘要： A method includes forming a photoresist layer over a wafer. The photoresist layer is exposed to a pattern of radiation using a photomask. The photoresist layer is developed after the photoresist layer is exposed to the pattern of radiation. The photomask includes a substrate and at least one opaque main feature. The substrate has a recessed region recessed from a first surface of the substrate and has a first width. The at least one opaque main feature protrudes from the first surface of the substrate and has a second width greater than the first width of the recessed region of the substrate. A height of the at least one opaque main feature is greater than a depth of the recess region of the substrate.
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公开(公告)号：US11809084B2
公开(公告)日：2023-11-07
申请号：US17874204
申请日：2022-07-26
发明人： Chi-Hung Liao , Yueh Lin Yang
CPC分类号： G03F7/7015 , G03F7/702 , G03F7/70025
摘要： Embodiments described herein provide a lithographic system having two or more lithographic tools connected to a radiation source using two or more variable attenuation units. In some embodiments, the variable attenuation unit reflects a portion of the received light beam to the lithographic tool attached thereto and transmits a remaining portion of the received light beam to the lithographic tools downstream. In some embodiments, the radiation source includes two or more laser sources to provide laser beams with an enhanced power level and which can prevent operation interruption due to laser source maintenances and repair.
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公开(公告)号：US11435669B2
公开(公告)日：2022-09-06
申请号：US17233090
申请日：2021-04-16
发明人： Chi-Hung Liao , Yueh Lin Yang
IPC分类号： G03F7/20
摘要： Embodiments described herein provide a lithographic system having two or more lithographic tools connected to a radiation source using two or more variable attenuation units. In some embodiments, the variable attenuation unit reflects a portion of the received light beam to the lithographic tool attached thereto and transmits a remaining portion of the received light beam to the lithographic tools downstream. In some embodiments, the radiation source includes two or more laser sources to provide laser beams with an enhanced power level and which can prevent operation interruption due to laser source maintenances and repair.
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公开(公告)号：US11409200B2
公开(公告)日：2022-08-09
申请号：US17374647
申请日：2021-07-13
发明人： Min-Cheng Wu , Chi-Hung Liao
摘要： Embodiments of the present disclosure provide a substrate measuring device in a lithography projection apparatus that provides multiple light sources having different wavelengths. In some embodiments, a lithography projection apparatus includes a substrate measuring system disposed proximate to a substrate stage, the substrate measuring system further including an emitter including multiple light sources configured to provide multiple beams of light, each of at least some of the multiple beams of light having a different wavelength, at least one optical fiber, wherein each of respective portions of the at least one optical fiber is configured to pass a respective one of the multiple beams of light, and a receiver positioned to collected light emitted from the emitter and reflected off of a substrate disposed on the substrate stage.
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公开(公告)号：US11287751B2
公开(公告)日：2022-03-29
申请号：US16942575
申请日：2020-07-29
发明人： Chi-Hung Liao , Yueh Lin Yang
摘要： Embodiments of the present disclosure provide a system and method for stabilizing optical lens temperatures, including detecting infrared radiation emitted from one or more optical lens, generating an infrared sensor signal based upon the detected infrared radiation, directing emission of light from one or more infrared light sources to the one or more optical lenses, and regulating the emission of the light from the one or more infrared light sources based on the infrared sensor signal for adjusting the temperature of the one or more optical lens.
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公开(公告)号：US11187997B2
公开(公告)日：2021-11-30
申请号：US17013267
申请日：2020-09-04
发明人： Po-Ming Shih , Chi-Hung Liao
IPC分类号： G03F7/20 , H01L21/027 , H01L21/687
摘要： A method for adhering a reticle onto a top surface of a chuck is provided in accordance with some embodiments of the present disclosure. The method includes sliding a reticle relative to a chuck along a first direction, such that a plurality of fibers over a top surface of the chuck are inclined away from an imaginary line normal to the top surface of the chuck by sliding the reticle relative to the chuck along the first direction; performing a photolithography process using the reticle; and after performing the photolithography process, sliding the reticle relative to the chuck along a second direction opposite to the first direction, such that the fibers are moved back toward the imaginary line by sliding the reticle relative to the chuck along the second direction.
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公开(公告)号：US11130107B2
公开(公告)日：2021-09-28
申请号：US16673771
申请日：2019-11-04
发明人： Chi-Hung Liao , Wei-Chang Cheng , Chien-Hung Wang
摘要： A method includes mixing a first deionized water (DI) water from a first pipe and a second DI water from a second pipe in a merging pipe that is in fluid communication with the first pipe and the second pipe. An electrical resistivity of the first DI water is different from an electrical resistivity of the second DI water. A mixture of the first DI water and the second DI water is applied from the merging pipe onto a wafer.
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公开(公告)号：US11081383B2
公开(公告)日：2021-08-03
申请号：US15821971
申请日：2017-11-24
发明人： Min-Cheng Wu , Chi-Hung Liao
IPC分类号： H01L21/687 , H01L21/683 , H01L21/67 , B25B11/00
摘要： A substrate table is provided. The substrate table includes a main body configured to support a substrate thereon. The substrate table further includes a number of vacuum channels provided in the main body and respectively formed with a vacuum opening on a surface of the main body. The vacuum channels are configured to apply a vacuum to the substrate. The vacuum channels are distributed throughout the main body and arranged in a grid pattern.
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