公开(公告)号：US10571811B2

公开(公告)日：2020-02-25

申请号：US15159009

申请日：2016-05-19

Applicant: KLA-Tencor Corporation

Inventor： Eran Amit ,  Daniel Kandel ,  Dror Alumot ,  Amit Shaked ,  Liran Yerushalmi

IPC: G03F7/20 ,  H01L21/66 ,  H01L27/02 ,  H01L27/092

Abstract: Metrology methods and targets are provided, that expand metrological procedures beyond current technologies into multi-layered targets, quasi-periodic targets and device-like targets, without having to introduce offsets along the critical direction of the device design. Several models are disclosed for deriving metrology data such as overlays from multi-layered target and corresponding configurations of targets are provided to enable such measurements. Quasi-periodic targets which are based on device patterns are shown to improve the similarity between target and device designs, and the filling of the surroundings of targets and target elements with patterns which are based on device patterns improve process compatibility. Offsets are introduced only in non-critical direction and/or sensitivity is calibrated to enable, together with the solutions for multi-layer measurements and quasi-periodic target measurements, direct device optical metrology measurements.

公开(公告)号：US10274425B2

公开(公告)日：2019-04-30

申请号：US15589801

申请日：2017-05-08

Applicant: KLA-Tencor Corporation

Inventor： Joel Seligson ,  Noam Sapiens ,  Daniel Kandel

IPC: G01N21/47 ,  G03F7/20 ,  G01B11/02 ,  G01N21/00

Abstract: Contrast enhancement in a metrology tool may include generating a beam of illumination, directing a portion of the generated beam onto a surface of a spatial light modulator (SLM), directing at least a portion of the generated beam incident on the surface of the SLM through an aperture of an aperture stop and onto one or more target structures of one or more samples, and generating a selected illumination pupil function of the illumination transmitted through the aperture utilizing the SLM in order to establish a contrast level of one or more field images of the one or more target structures above a selected contrast threshold, and performing one or more metrology measurements on the one or more target structures utilizing the selected illumination pupil function.

公开(公告)号：US10228320B1

公开(公告)日：2019-03-12

申请号：US14820917

申请日：2015-08-07

Applicant: KLA—Tencor Corporation

Inventor： Vladimir Levinski ,  Daniel Kandel

IPC: G01N21/01 ,  G06F17/50

Abstract: Target design methods, targets as well as scanner aberration methods and device design improvements are provided. Metrology targets may be designed by identifying at least two geometric elements in a specified device design, and designing corresponding at least two target cells of an overlay metrology target to have structures related to the at least two geometric elements. Non-printed filling elements may be added to target or device designs which exhibit large spaces (e.g., larger than twice the minimal design rule pitch) in order to avoid placement error and other inaccuracies. Scanner aberrations themselves may be measured using corresponding targets as well.

公开(公告)号：US10139528B1

公开(公告)日：2018-11-27

申请号：US15408351

申请日：2017-01-17

Applicant: KLA-Tencor Corporation

Inventor： Joel Seligson ,  Vladimir Levinski ,  Yuri Paskover ,  Amnon Manassen ,  Daniel Kandel ,  Andrew V. Hill

IPC: G02B3/08 ,  G01N21/47 ,  G01N21/17

Abstract: Objective lenses and corresponding optical systems and metrology tools, as well as methods are provided. Objective lenses comprise a central region conforming to specified imaging requirements and a peripheral region conforming to specified scatterometry requirements. The optical systems may comprise common-path optical elements configured to handle both imaging and scatterometry signals received through the objective lens. Using a single objective lens simplifies the design of the optical system while maintaining, simultaneously, the performance requirements for imaging as well as for scatterometry.

公开(公告)号：US20180106723A1

公开(公告)日：2018-04-19

申请号：US15841219

申请日：2017-12-13

Applicant: KLA-Tencor Corporation

Inventor： Amnon Manassen ,  Andrew Hill ,  Daniel Kandel ,  Ilan Sela ,  Ohad Bachar ,  Barak Bringoltz

IPC: G01N21/55 ,  G01B11/00 ,  G01N21/956 ,  G01N21/95

CPC classification number: G01N21/55 ,  G01B11/00 ,  G01N21/9501 ,  G01N21/956 ,  G01N2201/06113 ,  G01N2201/104

Abstract: Angle-resolved reflectometers and reflectometry methods are provided, which comprise a coherent light source, an optical system arranged to scan a test pattern using a spot of coherent light from the light source to yield realizations of the light distribution in the collected pupil, wherein the spot covers a part of the test pattern and the scanning is carried out optically or mechanically according to a scanning pattern, and a processing unit arranged to generate a composite image of the collected pupil distribution by combining the pupil images. Metrology systems and methods are provided, which reduce diffraction errors by estimating, quantitatively, a functional dependency of measurement parameters on aperture sizes and deriving, from identified diffraction components of the functional dependency which relate to the aperture sizes, correction terms for the measurement parameters with respect to the measurement conditions.

公开(公告)号：US09869543B2

公开(公告)日：2018-01-16

申请号：US14184295

申请日：2014-02-19

Applicant: KLA-Tencor Corporation

Inventor： Barak Bringoltz ,  Mark Ghinovker ,  Daniel Kandel ,  Vladimir Levinski ,  Zeev Bomzon

IPC: G01B11/14 ,  G01B11/24

CPC classification number: G01B11/14 ,  G01B11/2441 ,  G03F7/70633

Abstract: Methods and systems for minimizing of algorithmic inaccuracy in scatterometry overlay (SCOL) metrology are provided. SCOL targets are designed to limit the number of oscillation frequencies in a functional dependency of a resulting SCOL signal on the offset and to reduce the effect of higher mode oscillation frequencies. The targets are segmented in a way that prevents constructive interference of high modes with significant amplitudes, and thus avoids the inaccuracy introduced by such terms into the SCOL signal. Computational methods remove residual errors in a semi-empirical iterative process of compensating for the residual errors algorithmically or through changes in target design.

公开(公告)号：US09864209B2

公开(公告)日：2018-01-09

申请号：US15112819

申请日：2016-05-19

Applicant: KLA-Tencor Corporation

Inventor： Vladimir Levinski ,  Yuri Paskover ,  Daniel Kandel

IPC: G02B27/60 ,  G01B11/25 ,  G01B11/02

CPC classification number: G02B27/60 ,  G01B11/02 ,  G01B11/25 ,  G03F7/70616

Abstract: Metrology targets and methods are provided, which provide self-Moiré measurements of unresolved target features, i.e., interaction of electromagnetic fields re-scattered off elements within a single target layer provides signals with Moiré pitches that are measurable, although the actual target pitches are unresolved and possibly device-like. Targets comprise cell(s) with interlaced lines of elements having different device-like pitches which are selected to yield resolved Moiré pitch(es). Different target designs are presented for scatterometry and imaging metrology measurements, as well as for critical dimension, dose and focus, and pitch walk measurements—of device-like targets.

公开(公告)号：US20170146399A1

公开(公告)日：2017-05-25

申请号：US15369560

申请日：2016-12-05

Applicant: KLA-Tencor Corporation

Inventor： Gregory R. Brady ,  Andrei V. Shchegrov ,  Lawrence D. Rotter ,  Derrick A. Shaughnessy ,  Anatoly Shchemelinin ,  Ilya Bezel ,  Muzammil A. Arain ,  Anatoly A. Vasiliev ,  James Andrew Allen ,  Oleg Shulepov ,  Andrew V. Hill ,  Ohad Bachar ,  Moshe Markowitz ,  Yaron Ish-Shalom ,  Ilan Sela ,  Amnon Manassen ,  Alexander Svizher ,  Maxim Khokhlov ,  Avi Abramov ,  Oleg Tsibulevsky ,  Daniel Kandel ,  Mark Ghinovker

IPC: G01J3/10 ,  H01J65/04 ,  G01J3/02 ,  G02B6/293 ,  G01J3/12

CPC classification number: G01J3/10 ,  F21V13/00 ,  F21V13/08 ,  F21V13/12 ,  G01J3/0218 ,  G01J3/12 ,  G02B6/29332 ,  G02B6/29362 ,  G02B6/29388 ,  G02B6/29395 ,  G02B6/3508 ,  G02B6/353 ,  H01J65/04

Abstract: A system for providing illumination to a measurement head for optical metrology is configured to combine illumination beams from a plurality of illumination sources to deliver illumination at one or more selected wavelengths to the measurement head. The intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. Illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.

公开(公告)号：US20170023358A1

公开(公告)日：2017-01-26

申请号：US15287388

申请日：2016-10-06

Applicant: KLA-Tencor Corporation

Inventor： Myungjun Lee ,  Mark D. Smith ,  Michael E. Adel ,  Eran Amit ,  Daniel Kandel

IPC: G01B11/27 ,  G01J9/00 ,  G03F7/20

CPC classification number: G01J9/00 ,  G03F7/705 ,  G03F7/70683 ,  H01L22/30

Abstract: Metrology methods, modules and targets are provided, for measuring tilted device designs. The methods analyze and optimize target design with respect to the relation of the Zernike sensitivity of pattern placement errors (PPEs) between target candidates and device designs. Monte Carlo methods may be applied to enhance the robustness of the selected target candidates to variation in lens aberration and/or in device designs. Moreover, considerations are provided for modifying target parameters judiciously with respect to the Zernike sensitivities to improve metrology measurement quality and reduce inaccuracies.

Abstract translation: 提供了测量方法，模块和目标，用于测量倾斜的设备设计。 该方法针对目标候选者和设备设计之间的图案布局错误（PPEs）的泽尔尼克敏感度的关系，分析和优化目标设计。 可以应用蒙特卡洛方法来增强所选择的目标候选者对透镜像差和/或装置设计中的变化的鲁棒性。 此外，还提供了考虑到明确地修改Zernike敏感度的目标参数，以提高计量测量质量并减少不准确度。

公开(公告)号：US09512985B2

公开(公告)日：2016-12-06

申请号：US13774025

申请日：2013-02-22

Applicant: KLA-Tencor Corporation

Inventor： Gregory R. Brady ,  Andrei V. Shchegrov ,  Lawrence D. Rotter ,  Derrick Shaughnessy ,  Anatoly Shchemelinin ,  Ilya Bezel ,  Muzammil A. Arain ,  Anatoly A. Vasiliev ,  James Andrew Allen ,  Oleg Shulepov ,  Andrew V. Hill ,  Ohad Bachar ,  Moshe Markowitz ,  Yaron Ish-Shalom ,  Ilan Sela ,  Amnon Manassen ,  Alexander Svizher ,  Maxim Khokhlov ,  Avi Abramov ,  Oleg Tsibulevsky ,  Daniel Kandel ,  Mark Ghinovker

IPC: F21S8/10 ,  F21V13/08 ,  F21V13/00 ,  F21V13/12 ,  G02B6/35 ,  G02B6/293

CPC classification number: G01J3/10 ,  F21V13/00 ,  F21V13/08 ,  F21V13/12 ,  G01J3/0218 ,  G01J3/12 ,  G02B6/29332 ,  G02B6/29362 ,  G02B6/29388 ,  G02B6/29395 ,  G02B6/3508 ,  G02B6/353 ,  H01J65/04

Abstract: The disclosure is directed to systems for providing illumination to a measurement head for optical metrology. In some embodiments of the disclosure, illumination beams from a plurality of illumination sources are combined to deliver illumination at one or more selected wavelengths to the measurement head. In some embodiments of the disclosure, intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. In some embodiments of the disclosure, illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.

Abstract translation: 本公开涉及用于向用于光学测量的测量头提供照明的系统。 在本公开的一些实施例中，来自多个照明源的照明光束被组合以将一个或多个所选波长的照明传送到测量头。 在本公开的一些实施例中，控制传送到测量头的照明的强度和/或空间相干性。 在本公开的一些实施例中，一个或多个所选波长的照明从配置成在连续波长范围内提供照明的宽带照明源传送。