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108 条记录 (耗时 0.03 秒)

    Multi-mode fiber coupler system
    52.
    发明授权
    Multi-mode fiber coupler system 有权
    多模光纤耦合器系统

    公开(公告)号：US06952507B2

    公开(公告)日：2005-10-04

    申请号：US10291805

    申请日：2002-11-12

    申请人： Eric G. Johnson ,  Michael R. Feldman ,  Thomas J. Suleski

    发明人： Eric G. Johnson ,  Michael R. Feldman ,  Thomas J. Suleski

    IPC分类号： G02B6/34 ,  G02B6/42 ,  G02B6/26

    CPC分类号： G02B6/4204 ,  G02B6/29311 ,  G02B6/4203 ,  G02B6/4206 ,  G02B6/4214

    摘要： An optical coupler reduces differential mode delay in a fiber by reducing an amount of light incident on the fiber in a region in which the refractive index is not well controlled. This region of the fiber is typically in the center of the fiber The optical coupler directs light away from the this region and/or provides a high angle of incidence to any light on this region. A diffuser may be used to reduce sensitivity of the coupler to any fluctutations in the output of the light source. The optical coupler does not need to be offset from the center of the multi-mode coupler. A phase function of an azimuthal mode of the fiber may be imposed on the light beam so that a substantial null on axis is maintained even after propogation of the light beam beyond the depth of focus of the coupler. A diffractive element generating a beam which propogates in a spiral fashion along an axis allows the shape of the beam to be maintained for longer than a depth of focus of the diffractive element.

    摘要翻译： 光耦合器通过减少入射在光纤上的光的折射率不能很好地控制的区域中的光纤中的差模延迟。 光纤的该区域通常在光纤的中心。光耦合器将光远离该区域并且/或提供与该区域上的任何光的高角度入射。 可以使用扩散器来降低耦合器对光源的输出中的任何波动的灵敏度。 光耦合器不需要偏离多模耦合器的中心。 光纤的方位角模式的相位函数可以施加在光束上，使得即使在光束传播超过耦合器的焦深之后，也保持基本上的零轴。 产生沿着轴以螺旋方式传播的光束的衍射元件允许光束的形状保持长于衍射元件的焦深。

    Wavelength compensated optical wavelength division coupler and associated methods
    53.
    发明授权
    Wavelength compensated optical wavelength division coupler and associated methods 有权
    波长补偿光波分复用器及相关方法

    公开(公告)号：US06684010B1

    公开(公告)日：2004-01-27

    申请号：US09749773

    申请日：2000-12-28

    申请人： James E. Morris, Jr. ,  Michael R. Feldman

    发明人： James E. Morris, Jr. ,  Michael R. Feldman

    IPC分类号： G02B642

    CPC分类号： G02B6/29367 ,  G02B6/2938

    摘要： A coupler having fewer individual parts improves manufacturability and scalability. The coupler includes a wavelength selective filter, a first port for propagating at least a first wavelength, a second port for propagating at least a second wavelength different from the first wavelength, and a third port for propagating at least the first wavelength and the second wavelength. The three ports are positioned relative to the wavelength selective filter. At least two individual optical elements are also included in the coupler. Each optical element is associated with one of the three ports, between an associated port and the wavelength selective filter. All optical elements needed for directing light between the ports and the wavelength selective filter are provided on at least one of a substrate and substrates bonded thereto.

    摘要翻译： 具有较少单个部件的耦合器提高了可制造性和可扩展性。 耦合器包括波长选择滤波器，用于传播至少第一波长的第一端口，用于传播不同于第一波长的至少第二波长的第二端口，以及用于传播至少第一波长和第二波长的第三端口 。 三个端口相对于波长选择滤波器定位。 耦合器中还包括至少两个单独的光学元件。 每个光学元件与相关联的端口和波长选择滤波器之间的三个端口中的一个相关联。 在端口和波长选择性滤光器之间引导光所需的所有光学元件设置在基板和与其结合的基板中的至少一个上。

    Diffractive vertical cavity surface emitting laser power monitor and system
    56.
    发明授权
    Diffractive vertical cavity surface emitting laser power monitor and system 有权
    衍射垂直腔表面发射激光功率监视器和系统

    公开(公告)号：US06404959B1

    公开(公告)日：2002-06-11

    申请号：US09984915

    申请日：2001-10-31

    申请人： Robert Te Kolste ,  Alan D. Kathman ,  Eric G. Johnson ,  Michael R. Feldman

    发明人： Robert Te Kolste ,  Alan D. Kathman ,  Eric G. Johnson ,  Michael R. Feldman

    IPC分类号： G02B676

    CPC分类号： H01S5/02296 ,  G02B6/4201 ,  G02B6/4206 ,  G02B6/424 ,  G02B6/4245 ,  G02B6/4251 ,  G02B6/4255 ,  G02B6/4259 ,  G02B6/4263 ,  G02B6/4286 ,  H01S5/0683 ,  H01S5/183

    摘要： A power monitor for a light emitter emitting from a single face creates a monitor beam by deflecting a portion of the application beam and further manipulating the monitor beam to allow more efficient use of the monitor beam. For example, the monitor beam may be collimated to allow an increase in spacing between the light emitter and a detector for sensing the monitor beam. Alternatively or additionally, the monitor beam may be focused to allow use of a smaller detector and of a smaller percentage of the application beam. The diffractive element deflecting the beam may be either transmissive or reflective. The additionally manipulation of the monitor beam may be provided by the same diffractive element which deflects the beam, which is particularly useful when the diffractive element is reflective, and/or by additional optical elements.

    摘要翻译： 用于从单个面发射的发光体的功率监视器通过偏转施加光束的一部分而产生监视器光束，并进一步操纵监视器光束以允许更有效地使用监视器光束。 例如，监视器光束可以被准直，以允许光发射器和用于感测监视器光束的检测器之间的间隔的增加。 或者或另外，监视器光束可以被聚焦以允许使用较小的检测器和较小百分比的施加光束。 偏转光束的衍射元件可以是透射的或反射的。 监视器光束的附加操作可以由偏转光束的相同的衍射元件提供，当衍射元件是反射的时，该光束是特别有用的，和/或通过附加的光学元件。

    Beam homogenizer
    57.
    发明授权
    Beam homogenizer 有权
    梁匀浆机

    公开(公告)号：US06278550B1

    公开(公告)日：2001-08-21

    申请号：US09484050

    申请日：2000-01-18

    申请人： Alan D Kathman ,  Michael R. Feldman

    发明人： Alan D Kathman ,  Michael R. Feldman

    IPC分类号： G02B502

    CPC分类号： G02B5/0252 ,  B23K26/06 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/066 ,  B23K26/0665 ,  G02B5/0278 ,  G02B5/1819 ,  G02B5/1857 ,  G02B5/32 ,  G02B19/0014 ,  G02B19/0057 ,  G02B19/0095 ,  G02B27/09 ,  G02B27/0927 ,  G02B27/0944 ,  G03F7/70058 ,  G03H1/0236 ,  G03H2001/085 ,  G03H2001/303 ,  H04B10/50 ,  Y10S359/90

    摘要： A beam homogenizer that minimizes undesired intensity variations at the output plane caused by sharp breaks between facets in previous embodiments. The homogenizer includes a hologram made up of irregularly patterned diffractive fringes. An input beam illuminates at least part of the hologram. The hologram transmits a portion of the input beam onto an output plane. In doing so, the energy of the input beam is spatially redistributed at the output plane into a homogenized output beam having a preselected spatial energy distribution at the output plane. Thus, the illuminated portion of the output plane has a shape predetermined by the designer of the homogenizer.

    摘要翻译： 一种光束均化器，其最小化在先前实施例中由小面之间的尖锐断裂引起的在输出平面处的不期望的强度变化。 均化器包括由不规则图案化的衍射条纹构成的全息图。 输入光束照亮全息图的至少一部分。 全息图将输入光束的一部分传输到输出平面上。 在这样做时，输入光束的能量在输出平面处被空间重新分布成具有在输出平面处的预选的空间能量分布的均质输出光束。 因此，输出平面的照明部分具有由均化器的设计者预定的形状。

    Fabricating optical elements using a photoresist formed from contact printing of a gray level mask
    59.
    发明授权
    Fabricating optical elements using a photoresist formed from contact printing of a gray level mask 失效
    使用由灰度级掩模的接触印刷形成的光致抗蚀剂制造光学元件

    公开(公告)号：US6071652A

    公开(公告)日：2000-06-06

    申请号：US44864

    申请日：1998-03-20

    申请人： Michael R. Feldman ,  Thomas J. Suleski ,  William F. Delaney

    发明人： Michael R. Feldman ,  Thomas J. Suleski ,  William F. Delaney

    IPC分类号： G02B3/00 ,  G03F1/00 ,  G03F9/00

    CPC分类号： G02B3/0012 ,  G03F1/50 ,  G02B3/0056

    摘要： Gray scale masks used to create optical elements are formed. Desired gray scale patterns may be created by varying the thickness of a light absorbing layer. Such variations in thickness may be created using multiple binary masks. Desired gray scale patterns may also be created on a computer using available software and then imaged onto film or a glass film plate. Direct contact or proximity printing is then used to transfer the true gray scale pattern onto photoresist. The photoresist is then etched, thereby forming the desired pattern therein. All portions of the desired pattern are simultaneously formed in the photoresist. The etched photoresist is then used to photolithographically fabricate either the optical element itself or a master element to be used in injection molding or other replication techniques. The gray scale mask itself may be used repeatedly to generate photoresists. The imaging is particularly useful for forming optical elements having a plurality of arrays of refractive elements.

    摘要翻译： 形成用于产生光学元件的灰度掩模。 可以通过改变光吸收层的厚度来产生期望的灰度图案。 可以使用多个二进制掩模来创建厚度的这种变化。 也可以使用可用的软件在计算机上创建所需的灰度图案，然后将其成像到薄膜或玻璃薄膜板上。 然后使用直接接触或接近印刷将真实灰度图案转印到光致抗蚀剂上。 然后蚀刻光致抗蚀剂，从而在其中形成所需的图案。 所需图案的所有部分同时形成在光致抗蚀剂中。 然后将蚀刻的光致抗蚀剂光刻地制造用于注射成型或其它复制技术的光学元件本身或主元件。 可以重复使用灰度掩模本身以产生光刻胶。 该成像对于形成具有多个折射元件阵列的光学元件特别有用。