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    High-throughput direct-write electron-beam exposure system and method
    42.
    发明授权
    High-throughput direct-write electron-beam exposure system and method 失效
    高通量直写电子束曝光系统及方法

    公开(公告)号：US5969362A

    公开(公告)日：1999-10-19

    申请号：US30653

    申请日：1998-02-05

    申请人： Shintaro Kawata ,  Kazuya Okamoto

    发明人： Shintaro Kawata ,  Kazuya Okamoto

    IPC分类号： H01J37/073 ,  H01J37/305 ,  H01J37/317 ,  H01J37/30 ,  H01J37/14

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3177

    摘要： An electron-beam exposure system includes: (1) a stage for supporting a wafer, (2) a planar electron-beam source that emits multiple electron beamlets toward the stage, (3) an electric-field generator for forming an electric field to accelerate the electrons in the electron beamlets, (4) a magnetic-field generator for forming a magnetic flux in the space between the planar electron-beam source and the wafer stage. The magnetic filed generator is structured and arranged such that the magnetic flux formed thereby is (1) substantially evenly distributed within a plane perpendicular to the optical axis, and (2) of increasing flux density, ranging from a first density in the vicinity of the planar electron-beam source, to a second density (greater than the first density) in the vicinity of the wafer stage. The electrons in the electron beamlets follow the lines of magnetic flux such that the beamlet width is decreased at the stage compared to the beamlet width at the planar electron-beam source. The electron beamlets are preferably individually switchable, on and off, by word lines and bit lines on the planar electron-beam source. To form a desired pattern on a wafer surface, the stage is moved through a small area, while the electron beamlets are modulated as needed to write the desired pattern.

    摘要翻译： 电子束曝光系统包括：（1）用于支撑晶片的台，（2）朝向平台发射多个电子束的平面电子束源，（3）用于形成电场的电场发生器 加速电子束中的电子，（4）用于在平面电子束源和晶片台之间的空间中形成磁通量的磁场发生器。 磁场发生器的结构和布置使得由此形成的磁通量是（1）在垂直于光轴的平面内基本上均匀分布，以及（2）增加磁通密度，范围从第 平面电子束源在晶片台附近达到第二密度（大于第一密度）。 电子束中的电子遵循磁通线，使得在与平面电子束源处的子束宽度相比较的阶段，子束宽度减小。 电子子束优选地可以通过平面电子束源上的字线和位线单独地切换，打开和关闭。 为了在晶片表面上形成期望的图案，将载物台移动通过小的区域，同时根据需要对电子束进行调制以写入期望的图案。

    Imaging electron energy filter
    43.
    发明授权
    Imaging electron energy filter 失效
    成像电子能过滤器

    公开(公告)号：US5449914A

    公开(公告)日：1995-09-12

    申请号：US218343

    申请日：1994-03-25

    申请人： Harald Rose ,  Stephan Uhlemann ,  Eugen Weimer

    发明人： Harald Rose ,  Stephan Uhlemann ,  Eugen Weimer

    IPC分类号： G01Q30/02 ,  H01J37/05 ,  H01J37/26 ,  H01J49/44 ,  H01J49/46 ,  H01J37/14

    CPC分类号： H01J37/05 ,  H01J49/46 ,  H01J2237/055 ,  H01J2237/057 ,  H01J2237/26

    摘要： The invention relates to an electron energy filter for electron microscopes as well as to an electron microscope equipped with such a filter. The filter comprises three sector magnets with the deflection field in the first sector magnet being homogeneous. The deflection field in each of the two other sector magnets is an inhomogeneous gradient field. To generate the gradient field, the pole pieces of the two other sector magnets have the form of segments of truncated double cones. The electron beam passes the first homogeneous sector magnet twice. Multipole elements are arranged in front of, behind and between the three sector magnets. The filter has a large dispersion also for high-energy electrons while at the same time providing a compact configuration. All second-order aberrations and the significant second-rank aberrations are corrected by means of the multiple elements.

    摘要翻译： 本发明涉及一种用于电子显微镜的电子能量过滤器以及配有这种过滤器的电子显微镜。 滤波器包括三扇形磁体，其中第一扇形磁体中的偏转场是均匀的。 两个其他扇形磁体中的每一个中的偏转场是不均匀的梯度场。 为了产生梯度场，两个其他扇形磁体的极片具有截顶双锥段的形式。 电子束通过第一均匀扇形磁体两次。 多极元件布置在三个扇形磁体之前，后面和之间。 该滤波器对于高能电子也具有大的色散，同时提供紧凑的结构。 通过多个元素校正所有二阶像差和显着的二次像差。

    Deflective focusing system for charged particle beam
    44.
    发明授权
    Deflective focusing system for charged particle beam 失效
    带电粒子束的反射聚焦系统

    公开(公告)号：US4525629A

    公开(公告)日：1985-06-25

    申请号：US386115

    申请日：1982-06-07

    申请人： Hirofumi Morita ,  Teruo Hosokawa

    发明人： Hirofumi Morita ,  Teruo Hosokawa

    IPC分类号： H01J37/141 ,  H01J29/46 ,  H01J29/64 ,  H01J29/74 ,  H01J37/14 ,  H01J37/147 ,  H01J37/30 ,  H04N3/16 ,  G21K1/08 ,  H01J3/14

    CPC分类号： H01J37/1477 ,  H01J29/46 ,  H01J37/3007

    摘要： A deflective focusing system includes a magnetic lens for focusing a charged particle beam, a plurality of rings made of magnetic material arranged substantially concentrically with the magnetic lens inside of the magnetic lens, the rings being arranged at spaced apart positions in the direction of the central axis of the magnetic lens so as to form a predetermined magnetic focusing field distribution, a one-stage electrostatic deflector having a plurality of deflection electrodes which are spaced apart in a circumferential direction of the magnetic lens, which are arranged substantially concentrically with the magnetic lens inside of the magnetic lens, and which extend in the direction of the central axis so as to form a predetermined electrostatic deflection field distribution, so that the charged particle beam passes through the concentrically arranged deflection electrodes to be deflected in accordance with a voltage applied to the deflection electrodes, and ring-like grounding electrodes disposed substantially concentrically with the magnetic lens on the object plane side and the image plane side of the electrostatic deflector along the passage of the charged particle beam. The electromagnetic field is adjusted by the deflector, the rings and the grounding electrodes to obtain small aberrations and a small landing angle.

    摘要翻译： 偏转聚焦系统包括用于聚焦带电粒子束的磁性透镜，由磁性材料制成的多个环，该磁性材料与磁性透镜在磁性透镜的内部基本上同心地布置，该环被布置在中心的方向上的间隔位置 以形成预定的磁性聚焦场分布;一级静电偏转器，具有与磁性透镜大致同心配置的在磁性透镜的圆周方向间隔开的多个偏转电极; 在磁透镜的内部，并且在中心轴线的方向上延伸以形成预定的静电偏转场分布，使得带电粒子束通过同心设置的偏转电极，以根据施加到 偏转电极和环状接地电极 沿着带电粒子束的通过，磁性透镜基本上同心地设置在静电偏转器的物平面侧和像面侧上。 电磁场由偏转器，环和接地电极调节，以获得小的像差和小的着陆角。

    Electron lens equipped with three magnetic pole pieces
    45.
    发明授权
    Electron lens equipped with three magnetic pole pieces 失效
    电子透镜配有三个磁极片

    公开(公告)号：US4384208A

    公开(公告)日：1983-05-17

    申请号：US220183

    申请日：1980-12-23

    申请人： Katsushige Tsuno

    发明人： Katsushige Tsuno

    IPC分类号： H01J37/14 ,  H01J37/141 ,  G01N23/00

    CPC分类号： H01J37/141 ,  H01J37/14

    摘要： An electron lens equipped with three magnetic pole pieces defining two gaps forms two magnetic fields. The magnetic fields are generated in said gaps by opposite and same strength excitation. The bore diameters of the middle and lower magnetic pole pieces are equal and the bore diameter of the upper magnetic pole piece is 1.5 to 5 times larger than those of the middle and lower magnetic pole pieces, so that radial (isotropic) distortion is eliminated and spiral (anisotropic) distortion is extremely reduced.

    摘要翻译： 配备有限定两个间隙的三个磁极片的电子透镜形成两个磁场。 通过相反和相同的强度激励在所述间隙中产生磁场。 中，低磁极片的孔径相等，上磁极片的孔径比中，下磁极片的孔径大1.5〜5倍，消除了径向（各向同性）畸变， 螺旋（各向异性）畸变大大降低。

    Error compensating deflection coils in a conducting magnetic tube
    46.
    发明授权
    Error compensating deflection coils in a conducting magnetic tube 失效
    误差补偿导磁管中的偏转线圈

    公开(公告)号：US3911321A

    公开(公告)日：1975-10-07

    申请号：US39112073

    申请日：1973-08-27

    申请人： IBM

    发明人： WARDLY GEORGE A

    IPC分类号： H01J29/70 ,  H01J29/76 ,  H01J37/14 ,  H01J37/147

    CPC分类号： H01J29/706 ,  H01J29/76 ,  H01J37/14 ,  H01J37/1475

    摘要： This invention relates to an error compensating arrangement for use with the deflection system in a conducting magnetic tube such as that of an electron microscope or the like. More particularly, compensating coils are provided to correct time lag errors due to eddy currents set up in permeable magnetic enclosures which surround the principal deflection coils and act essentially as pole-pieces.

    摘要翻译： 本发明涉及一种与诸如电子显微镜等的导电磁性管中的偏转系统一起使用的误差补偿装置。 更具体地，提供补偿线圈以校正由围绕主偏转线圈的可渗透磁性壳体中设置的涡流引起的时间差误差，并且基本上作为极点起作用。

    Electron microscope comprising a velocity filter system
    47.
    发明授权
    Electron microscope comprising a velocity filter system 失效
    包含速度滤波系统的电子显微镜

    公开(公告)号：US3624393A

    公开(公告)日：1971-11-30

    申请号：US3624393D

    申请日：1970-07-13

    申请人： SOPELEM

    发明人： TORQUEBIAU EMILE

    IPC分类号： H01J37/26 ,  G01Q20/02 ,  G01Q30/02 ,  H01J37/05 ,  H01J37/12 ,  H01J37/14

    CPC分类号： H01J37/05

    摘要： In an electron microscope having a velocity filtering system involving reflection in a prism, the normal objective lens is replaced by a complex lens comprising three electrostatic lens elements. This arrangement enables the order of image and diffraction diagram in the propagation path to be reversed, so that the diffraction diagram can be filtered as well as the image.