公开(公告)号：US20230003659A1

公开(公告)日：2023-01-05

申请号：US17363100

申请日：2021-06-30

申请人： Gloria J Sheppard ,  Nick F Bursic, JR. ,  Rachelle E LaLonde ,  Liana A Danciu ,  Harry J Glikis ,  Giuraevea Palincas ,  Brian C Adams ,  Keith Windmill

发明人： Gloria J Sheppard ,  Nick F Bursic, JR. ,  Rachelle E LaLonde ,  Liana A Danciu ,  Harry J Glikis ,  Giuraevea Palincas ,  Brian C Adams ,  Keith Windmill

IPC分类号： G01N21/84 ,  B05C11/10 ,  G01N21/956 ,  G01N21/958 ,  B60J1/00

摘要： A method of installing a glass panel on a vehicle that includes an opaque coating formed about a perimeter of the glass panel that includes a plurality of voids where the opaque coating is absent. The method includes determining whether a primer has been applied to the opaque coating by inspecting the glass panel to determine whether at least some of the plurality of voids have been covered by the primer. After determining whether a primer has been applied to the opaque coating, it is determined whether the primer has been correctly applied to the opaque coating by inspecting the glass panel to determine whether each of the plurality of voids has been covered by the primer. Then, after determining whether the primer has been correctly applied, an adhesive may be applied to the primer and the glass panel may be installed on the vehicle.

公开(公告)号：US11536654B2

公开(公告)日：2022-12-27

申请号：US17092397

申请日：2020-11-09

申请人： ASML Netherlands B.V.

发明人： Maxim Pisarenco ,  Nitesh Pandey ,  Alessandro Polo

IPC分类号： G01N21/95 ,  G01N29/06 ,  G03F7/20 ,  G01N21/956 ,  G01N21/47 ,  G01N29/44

摘要： An acoustic scatterometer has an acoustic source operable to project acoustic radiation onto a periodic structure and formed on a substrate. An acoustic detector is operable to detect the −1st acoustic diffraction order diffracted by the periodic structure and while discriminating from specular reflection (0th order). Another acoustic detector is operable to detect the +1st acoustic diffraction order diffracted by the periodic structure, again while discriminating from the specular reflection (0th order). The acoustic source and acoustic detector may be piezo transducers. The angle of incidence of the projected acoustic radiation and location of the detectors and are arranged with respect to the periodic structure and such that the detection of the −1st and +1st acoustic diffraction orders and discriminates from the 0th order specular reflection.

公开(公告)号：US20220381702A1

公开(公告)日：2022-12-01

申请号：US17880328

申请日：2022-08-03

申请人： Arun Anath AIYER

发明人： Arun Anath AIYER

IPC分类号： G01N21/956 ,  G01N21/45 ,  G01N21/39 ,  G01N21/31

摘要： An optical system configured to measure a raised or receded surface feature on a surface of a sample may comprise a broadband light source; a tunable filter configured to filter broadband light emitted from the broadband light source and to generate a first light beam at a selected wavelength; a linewidth control element configured to receive the first light beam and to generate a second light beam having a predefined linewidth and a predetermined coherence length; collimating optics optically coupled to the second light beam and configured to collimate the second light beam; collinearizing optics optically coupled to the collimating optics and configured to align the collimated second light beam onto the raised or receded surface feature of the sample, and a processor system and at least one digital imager configured to measure a height of the raised surface or depth of the receded surface from light reflected at least from those surfaces.

公开(公告)号：US11513445B2

公开(公告)日：2022-11-29

申请号：US17404632

申请日：2021-08-17

申请人： Tokyo Electron Limited

发明人： Anton J. Devilliers

IPC分类号： G03F9/00 ,  G03F7/20 ,  H01L23/544 ,  G06T7/33 ,  G06V10/24 ,  G06T7/00 ,  H01L21/66 ,  G06T7/73 ,  H04N5/225 ,  G01N21/956

摘要： Aspects of the present disclosure provide a method of aligning a wafer pattern. For example, the method can include providing a wafer having a reference pattern located below a front side of the wafer, and directing a light beam to the wafer. The method can further include identifying at least one of power and a wavelength of the light beam such that the light beam is capable of passing through the wafer and reaching the reference pattern, or identifying at least one of power and a wavelength of the light beam based on at least one of a material of the wafer and a depth of the reference pattern below the front side of the wafer. The method can further include using the light beam to image the reference pattern.

公开(公告)号：US20220373480A1

公开(公告)日：2022-11-24

申请号：US17772282

申请日：2020-10-27

申请人： HAMAMATSU PHOTONICS K.K.

发明人： Tomonori NAKAMURA ,  Kenichiro IKEMURA

IPC分类号： G01N21/956 ,  G01N21/64 ,  G01B11/27

摘要： An inspection apparatus includes a light source unit, cameras, a keyboard, and a controller that determines a wavelength of the excitation light, based on the information on the emission color received by the keyboard, and that controls the light source unit so that the light source unit generates excitation light with the determined wavelength. The controller determines a wavelength longer than an absorption edge wavelength of the substrate of the sample and shorter than a peak wavelength of an emission spectrum of the light-emitting element, the peak wavelength being specified from the information on the emission color, to be the wavelength of the excitation light.

公开(公告)号：US20220350258A1

公开(公告)日：2022-11-03

申请号：US17728144

申请日：2022-04-25

申请人： Carl Zeiss SMT GmbH

发明人： Walter Pauls ,  Renzo Capelli

IPC分类号： G03F7/20 ,  G01N21/55 ,  G01N21/21 ,  G01N21/956

摘要： To measure an effect of a wavelength-dependent measuring light reflectivity RRet of a lithography mask, a measuring light beam is caused to impinge on said lithography mask within a field of view of a measuring apparatus. The measuring light has a wavelength bandwidth between a wavelength lower limit and a wavelength upper limit differing therefrom. The reflected measuring light emanating from an impinged section of the lithography mask is captured by a detector. A filter with a wavelength-dependent transmission within the wavelength bandwidth is introduced into a beam path of the measuring light beam between the measuring light source and the detector. The measuring light reflected by the lithography mask is captured again by the detector once the filter has been introduced. The wavelength-dependent reflectivity RRet or an effect of the wavelength-dependent reflectivity RRet is determined on the basis of the capture results. In comparison with the prior art, this yields an improved method for measuring an effect of a measuring light reflectivity on a lithography mask. Additionally, a method for measuring an effect of a polarization of measuring light on a measuring light impingement on a lithography mask is specified, wherein as a result of this the effect of the lithography mask on measuring light is made accessible in respect of further optical parameters of a measurement.

公开(公告)号：US20220349838A1

公开(公告)日：2022-11-03

申请号：US17594378

申请日：2020-11-19

申请人： Tata Consultancy Services Limited

发明人： PRACHIN LALIT JAIN ,  SWAGATAM BOSE CHOUDHURY ,  PRAKRUTI VINODCHANDRA BHATT ,  SANAT SARANGI ,  SRINIVASU PAPPULA

IPC分类号： G01N21/956 ,  G06T7/12 ,  G01N33/24

摘要： This disclosure relates generally to a system and method for monitoring performance of low-cost sensors plied in a field for soil moisture measurement. The low-cost sensors are calibrated to give useful derived parameters to support farming such as volumetric water content (VWC) of the soil. Further, the steps are being incorporated to de-noise their response to derive stable measurements similar to expensive rugged sensors. The calibration of the low-cost sensor and normalization of incoming values from the low-cost sensor are based on values determined through rugged sensors for soil moisture measurement. The normalization involves finding a minimum value and maximum value of soil moisture. Performance of the low-cost sensors are analyzed based on a range of values of the soil moisture. Finally, the performance analysis provides degradation stages and based on the degradation stages evaluated recommendations to modify the sensor are shared with the user.

公开(公告)号：US11482399B2

公开(公告)日：2022-10-25

申请号：US16652352

申请日：2018-09-25

申请人： ASML Netherlands B.V.

发明人： Jian Zhang ,  Qing Jiu Chen ,  Yixiang Wang

IPC分类号： H01J37/22 ,  G01N21/95 ,  G01N21/956 ,  G02B27/09

摘要： A system and method for advanced charge control of a light beam is provided. The system comprising a laser source comprising a laser diode for emitting a beam and a beam homogenizer to homogenize the emitted beam. The system and methods further comprise a beam shaper configured to shape the emitted beam using an anamorphic prism group and a driver configured to direct the shaped beam to a specified position on a wafer, wherein the laser source, the beam shaper, and the driver are coaxially aligned.

公开(公告)号：US20220283100A1

公开(公告)日：2022-09-08

申请号：US17747639

申请日：2022-05-18

申请人： Aplied Materials, Inc.

发明人： Weimin Li ,  Wen Xiao ,  Vibhu Jindal ,  Sanjay Bhat

IPC分类号： G01N21/956 ,  G03F1/24 ,  G03F7/20

摘要： Apparatus and methods for measuring surface topography are described. The analysis apparatus and methods detect light reflected from the reflective backside of a cantilever assembly including a tip, calculate a background level (BGL) value obtained from an optical scan of a reference sample using a power spectral density (PSD) value obtained from a topographical scan of a reference sample to generate a correlational coefficient between the BGL and the PSD values. The correlational coefficient between the BGL and PSD values is used to measure the BGL value of additional EUV mask blanks by a topographical scan of the EUV mask blanks using the same tip mounted to the cantilever.

公开(公告)号：US11422095B2

公开(公告)日：2022-08-23

申请号：US16286315

申请日：2019-02-26

申请人： KLA-Tencor Corporation

发明人： Phillip Atkins ,  Liequan Lee ,  Shankar Krishnan ,  David C. S. Wu ,  Emily Chiu

IPC分类号： G01N21/956 ,  G01N21/25 ,  G01N21/47 ,  G03F7/20 ,  G01N21/95

摘要： A metrology system may receive a model for measuring one or more selected attributes of a target including features distributed in a selected pattern based on regression of spectroscopic scatterometry data from a scatterometry tool for a range of wavelengths. The metrology system may further generate a weighting function for the model to de-emphasize portions of the spectroscopic scatterometry data associated with wavelengths at which light captured by the scatterometry tool when measuring the target is predicted to include undesired diffraction orders. The metrology system may further direct the spectroscopic scatterometry tool to generate scatterometry data of one or more measurement targets including fabricated features distributed in the selected pattern. The metrology system may further measure the selected attributes for the one or more measurement targets based on regression of the scatterometry data of the one or more measurement targets to the model weighted by the weighting function.