Abstract:
A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.
Abstract:
A DC power supply 1 is connected with the DC-type high voltage generator 2 that boosts the power supply. A negative output terminal 3 and a positive output terminal 6 of the generator 2 are respectively connected to a cathode electrode 5 and an anode electrode 7. A dielectric sheet 4 with appropriate relative permittivity and certain range of volume resistivity is closely attached on the cathode electrode surface opposed to the anode electrode. The cathode electrode 5 together with the dielectric sheet 4 constitutes a DC-type dielectric barrier electrode 9. The power supply 1 and the generator 2 are disposed on an upper surface of a belt-type attachment 15, and the discharge electrode 9 and the anode electrode 7 are disposed on the lower surface thereof. The electrodes 9 and 7 become opposed to each other upon wrapping the attachment 15 around the affected part of a subject.
Abstract:
In one embodiment, an apparatus includes a main body defining a channel configured to receive and hold a cable connector. Means for releasably securing the main body to a device are provided. The channel is aligned with a receptacle of the device when the main body is secured to the device. A first resilient member extends outwardly from an inner wall of the main body and into the channel. The first resilient member is deformably tensionable against the cable connector when received and held within the channel.
Abstract:
An extraction electrode manipulator system, comprising an ion source, a suppression electrode and a ground electrode, wherein the two electrode are supported by coaxially arranged two water cooled support tubes. A high voltage insulator ring is located on the other end of the coaxial support tube system to act as a mechanical support of the inner tube and also as a high voltage vacuum feedthrough to prevent sputtering and coating of the insulating surface.
Abstract:
An ion implantation system includes an electrostatic lens. The electrostatic lens includes a terminal electrode, a ground electrode and a suppression electrode disposed therebetween. An ion beam enters the electrostatic lens through the terminal electrode and exits through the ground electrode. The electrodes have associated electrostatic equipotentials. An end plate is disposed between a top and bottom portion of the suppression electrode and/or the top and bottom portion of the ground electrode. The respective end plate has a shape which corresponds to the electrostatic equipotential associated with the particular electrode in order to maintain uniformity of the beam as it passes through the electrostatic lens.
Abstract:
An apparatus (200) for accelerating an ion beam comprising: a) a first electrode (202) having a proximal side and a distal side and having at least one aperture (201) therethrough, the wall of the aperture being shaped such that the radius of the aperture on the distal side of the first electrode is greater than that on the proximal side of the electrode; b) a second electrode (204) located such that it is adjacent to but spaced from the distal side of the first electrode and having at least one aperture therethrough; and c) a third electrode (206) located such that it is adjacent to and spaced from the second electrode and having at least one aperture therethrough, said at least one apertures in each electrode being aligned with corresponding apertures in the other electrodes; wherein the electrodes are arranged such that there is a potential difference between the first and second electrodes and a potential difference between the second and third electrodes.
Abstract:
A substrate treatment apparatus includes a chamber providing a reaction region and including first and second sides facing each other, a module connected to the first side, an upper electrode in the reaction region, a substrate holder facing the upper electrode, wherein a substrate is disposed on the substrate holder, and first and second points are defined on the substrate, wherein the first point corresponds to a center of the substrate, and the second point is distant from the first point toward the first side, and a feeding line for applying an RF power, the feeding line connected to the upper electrode corresponding to the second point.
Abstract:
An extraction electrode manipulator system, comprising an ion source, a suppression electrode and a ground electrode, wherein the two electrode are supported by coaxially arranged two water cooled support tubes. A high voltage insulator ring is located on the other end of the coaxial support tube system to act as a mechanical support of the inner tube and also as a high voltage vacuum feedthrough to prevent sputtering and coating of the insulating surface.
Abstract:
This invention relates to an Ion gun (10) which comprises of plasma generator (11) driven from an RF source (12), a plasma or source chamber (13), having an outlet (14), across which is mounted an accelerator grid (15). The accelerator grid (15) comprises four individual grids. The first grid (16), which is closest to the outlet (14), is maintained at a positive voltage by a DC source (16a), the second grid (17) is maintained strongly negative by DC source (17a). The third grid (18) is maintained at a negative voltage, which is much lower than that of the second grid (17), by DC source (18a) and the fourth grid is grounded. Means of mounting these grids are also described.
Abstract:
A confocal method in which a sample is disposed in the center, a collective lens and a front objective lens are disposed on the incident side, and a back objective lens and a projection lens are disposed symmetrically on the outgoing side is so configured that a spatial filter can be inserted in front of the sample and behind it. As a result, the advantage of the confocal method, which is in the possibility of disposing a spatial filter in front of the sample, is realized and the disadvantages of the conventional transmission phase contrast electron microscope (halo, electron beam loss) are eliminated, thereby providing a phase contrast electron microscope device that enables the establishment of an electron microscopy technology that makes it possible to view of a wide range of materials from material science to life science in a non-dyed state with a high contrast and a high resolution.