公开(公告)号：US07521679B2

公开(公告)日：2009-04-21

申请号：US11706330

申请日：2007-02-15

Applicant: Hidetoshi Nishiyama ,  Mari Nozoe

Inventor： Hidetoshi Nishiyama ,  Mari Nozoe

IPC: G21K7/00 ,  G01N23/00

CPC classification number: H01J37/026 ,  H01J37/226 ,  H01J37/28 ,  H01J2237/047 ,  H01J2237/2594 ,  H01J2237/2817

Abstract: An electron beam system using a scanning electron microscope equipped with a function for controlling a charged state of a sample to be observed includes electron optics for obtaining image data of the scanning electron microscope, and a monitor that displays a relationship between an equation for determining a degree of separation of peaks which appear in a histogram obtained on a basis of the image data and at least one parameter among parameters for controlling the charged state of the sample. An optimized parameter for controlling the charged stage of the sample can be visually distinguished on the monitor.

Abstract translation: 使用具有用于控制要观察的样品的带电状态的功能的扫描电子显微镜的电子束系统包括用于获得扫描电子显微镜的图像数据的电子光学器件和显示用于确定扫描电子显微镜的方程之间的关系的监视器 基于图像数据获得的直方图中出现的峰的分离度和用于控制样品的充电状态的参数中的至少一个参数。 用于控制样品充电阶段的优化参数可以在显示器上进行目视辨别。

公开(公告)号：US20090098688A1

公开(公告)日：2009-04-16

申请号：US12091836

申请日：2008-03-17

Applicant: Shingo Okushima ,  Junichi Seki ,  Atsunori Terasaki

Inventor： Shingo Okushima ,  Junichi Seki ,  Atsunori Terasaki

IPC: H01L21/56 ,  B29C35/08

CPC classification number: B29C35/0888 ,  B29C37/0053 ,  B29C43/003 ,  B29C43/021 ,  B29C43/58 ,  B29C2035/0827 ,  B29C2043/025 ,  B29C2043/3634 ,  B29C2043/5833 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01J37/026 ,  H01J2237/0042 ,  H01J2237/0047

Abstract: An imprint method is constituted by a step of curing a resin material formed on a substrate in a state in which an imprint pattern of a mold is in contact or proximity with the resin material, and a step of parting the mold from the cured resin material. The parting is effected while irradiating an entire area in which the imprint pattern of the mold is formed and the cured resin material with an electromagnetic wave for ionizing gaseous molecules in an atmosphere in which the mold and the cured resin material are placed.

Abstract translation: 压印方法由在模具的压印图案与树脂材料接触或接近的状态下固化形成在基板上的树脂材料的步骤和从固化树脂材料分离模具的步骤构成的步骤 。 在放置模具和固化树脂材料的气氛中照射形成有模具的印模图案的整个区域和固定的树脂材料进行分离，并用电离气体离子化气态分子。

公开(公告)号：US20090065694A1

公开(公告)日：2009-03-12

申请号：US12289461

申请日：2008-10-28

Applicant: Noriaki Arai ,  Makoto Ezumi ,  Yoichi Ose

Inventor： Noriaki Arai ,  Makoto Ezumi ,  Yoichi Ose

IPC: G21K7/00

CPC classification number: H01J37/026 ,  H01J37/28 ,  H01J2237/0044 ,  H01J2237/12 ,  H01J2237/2817

Abstract: An object of the invention is to reduce the beam drift in which the orbit of the charged particle beam is deflected by a potential gradient generated by a nonuniform sample surface potential on a charged-particle-beam irradiation area surface, the nonuniform sample surface potential being generated by electrification made when observing an insulating-substance sample using a charged particle beam.Energy of the charged particle beam to be irradiated onto the sample is set so that generation efficiency of secondary electrons generated from the sample becomes equal to 1 or more. A flat-plate electrode (26) is located in such a manner as to be directly opposed to the sample. Here, the flat-plate electrode is an electrode to which a voltage can be applied independently, and which is equipped with a hole through which a primary charged particle beam can pass. Furthermore, a voltage can be applied independently to a sample stage (12) on which the sample is mounted. Here, the sample stage's surface directly opposed to the sample is formed into a planarized structure with no projections and depressions thereon. Also, diameter D of the hole provided in the flat-plate electrode (26) and distance L between the flat-plate electrode (26) and the sample are set such that a relation of D/L≦1. 5 is satisfied.

Abstract translation: 本发明的目的是减少带电粒子束的轨道偏转由带电粒子束照射区域表面上的不均匀样品表面电位产生的电位梯度的光束漂移，不均匀的样品表面电位为 通过使用带电粒子束观察绝缘物质样品时进行通电而产生。 设定要照射到样品上的带电粒子束的能量被设定为使得从样品产生的二次电子的产生效率等于1或更大。 平板电极（26）以与样品直接相对的方式定位。 这里，平板电极是能够独立施加电压的电极，并且具有一次带电粒子束可以穿过的孔。 此外，可以独立地对安装有样品的样品台（12）施加电压。 这里，与样品直接相对的样品台的表面形成为在其上没有凸起和凹陷的平坦化结构。 此外，设置在平板电极（26）中的孔的直径D和平板电极（26）与样品之间的距离L设定为D / L <1的关系。 5满足。

公开(公告)号：US07501625B2

公开(公告)日：2009-03-10

申请号：US11442566

申请日：2006-05-30

Applicant: Hikaru Koyama ,  Hiroshi Makino ,  Mitsugu Sato

Inventor： Hikaru Koyama ,  Hiroshi Makino ,  Mitsugu Sato

IPC: G21K7/00

CPC classification number: H01J37/026 ,  H01J2237/0042 ,  H01J2237/0047 ,  H01J2237/2817

Abstract: A charge control electrode emitting photoelectrons is disposed just above a wafer (sample) in parallel thereto, and the electrode has a through hole so that ultraviolet light can be irradiated to the wafer through the charge control electrode. Specifically, a metal plate which is formed in mesh or includes one or plural holes is used as the charge control electrode. By disposing the charge control electrode just above the sample in parallel thereto, when negative voltage is applied to the electrode, electric field approximately perpendicular to the wafer is generated. Therefore, photoelectrons are efficiently absorbed in the wafer. Also, by using the charge control electrode having approximately the same size as that of the wafer, charges on a whole surface of the wafer can be removed collectively and uniformly. Therefore, time required for the process can be reduced.

Abstract translation: 发射光电子的电荷控制电极平行于晶片（样品）正上方，并且电极具有通孔，使得可以通过充电控制电极将紫外光照射到晶片。 具体地，使用形成为网状或包含一个或多个孔的金属板作为充电控制电极。 通过将电荷控制电极与样品平行放置在正上方，当向电极施加负电压时，产生大致垂直于晶片的电场。 因此，光电子被有效地吸收在晶片中。 此外，通过使用具有与晶片大致相同尺寸的电荷控制电极，可以集中均匀地去除晶片的整个表面上的电荷。 因此，可以减少该过程所需的时间。

公开(公告)号：US07417240B2

公开(公告)日：2008-08-26

申请号：US10718777

申请日：2003-11-21

Applicant: Andreas Kyek

Inventor： Andreas Kyek

IPC: H01J37/304

CPC classification number: H01J43/02 ,  H01J37/026 ,  H01J37/06 ,  H01J2237/0045

Abstract: An apparatus includes a primary electrode and an acceleration electrode. The acceleration electrode or, alternatively, an additional secondary electrode contains a slot that extends obliquely through the acceleration electrode or through the secondary electrode. This measure allows secondary electrons to be produced in a highly effective manner.

Abstract translation: 一种装置包括主电极和加速电极。 加速电极或备选地，附加的次级电极包含倾斜地穿过加速电极或通过次级电极延伸的槽。 该测量允许以高效的方式产生二次电子。

公开(公告)号：US07402816B2

公开(公告)日：2008-07-22

申请号：US11281175

申请日：2005-11-17

Applicant: Anthony Renau ,  Donna L. Smatlak ,  James Buff ,  Eric Hermanson

Inventor： Anthony Renau ,  Donna L. Smatlak ,  James Buff ,  Eric Hermanson

IPC: H01J1/50

CPC classification number: H01J27/02 ,  H01J37/026 ,  H01J37/05 ,  H01J37/3171 ,  H01J2237/0041 ,  H01J2237/055 ,  H01J2237/057 ,  H05H7/08

Abstract: One or more electron sources are utilized to inject electrons into an ion beam being transported between the polepieces of a magnet. In some embodiments, the electron sources are located in cavities in one or both polepieces of the magnet. In other embodiments, a radio frequency or microwave plasma flood gun is located in a cavity in at least one of the polepieces or between the polepieces.

Abstract translation: 一个或多个电子源用于将电子注入到在磁体的极柱之间传输的离子束中。 在一些实施例中，电子源位于磁体的一个或两个磁极中的空腔中。 在其他实施例中，无线电频率或微波等离子体喷枪位于至少一个极杆中或杆之间的空腔中。

公开(公告)号：US20080135775A1

公开(公告)日：2008-06-12

申请号：US11568000

申请日：2006-12-07

Applicant: Donna L. Smatlak ,  Gordon C. Angel ,  Rajesh Dorai

Inventor： Donna L. Smatlak ,  Gordon C. Angel ,  Rajesh Dorai

IPC: H01J1/50

CPC classification number: H01J37/3171 ,  H01J37/026 ,  H01J2237/0041 ,  H01J2237/055 ,  H01J2237/152 ,  H01J2237/31701

Abstract: Techniques for confining electrons in an ion implanter are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for confining electrons in an ion implanter. The apparatus may comprise a first array of magnets and a second array of magnets positioned along at least a portion of a beam path, the first array being on a first side of the beam path and the second array being on a second side of the beam path, the first side opposing the second side. At least one magnet in the first array may have a pole facing an opposite pole of a corresponding magnet in the second array.

Abstract translation: 公开了将电子限制在离子注入机中的技术。 在一个特定的示例性实施例中，技术可以被实现为用于将电子限制在离子注入机中的装置。 该装置可以包括第一磁体阵列和沿着光束路径的至少一部分定位的第二磁体阵列，第一阵列位于光束路径的第一侧上，第二阵列位于光束的第二侧上 路径，第一面反对第二面。 第一阵列中的至少一个磁体可以具有面对第二阵列中相应磁体的相对极的极。

公开(公告)号：US07385183B2

公开(公告)日：2008-06-10

申请号：US11335725

申请日：2006-01-19

Applicant: Sung-Chan Park ,  Sung-Wook Hwang

Inventor： Sung-Chan Park ,  Sung-Wook Hwang

IPC: H05H3/02 ,  H01J37/26 ,  H01S1/00

CPC classification number: H01J37/026 ,  H01J37/32357 ,  H01J2237/0042 ,  H01J2237/334

Abstract: In a substrate processing apparatus using a neutralized beam and a method thereof, the substrate processing apparatus includes: an ion source for emitting an ion beam at an emitting angle; reflectors at which the ion beam emitted by the ion source is incident and subject to 2n collisions (where n is a positive integer) in first and second opposite directions to neutralize the ion beam as a neutralized beam and to restore a direction of propagation of the neutralized beam to the emitting angle of the ion beam; and a substrate at which the neutralized beam generated by the reflectors is incident on to perform a process. Accordingly, an incident angle of the resultant neutralized beam is perpendicular to a substrate, while the direction of propagation of the originating ion source and the surface of the substrate are maintained to be perpendicular to each other.

Abstract translation: 在使用中和束的基板处理装置及其方法中，基板处理装置包括：用于以发射角发射离子束的离子源; 由离子源发射的离子束入射并且在第一和第二相反方向上经受2n次碰撞（其中n是正整数）的反射器，以将离子束中和作为中和的光束，并恢复所述离子束的传播方向 中和的束到离子束的发射角; 以及由反射器产生的被中和的光束入射的基板，以执行处理。 因此，所得中和束的入射角垂直于基板，而原始离子源和基板的表面的传播方向保持彼此垂直。

公开(公告)号：US20080067436A1

公开(公告)日：2008-03-20

申请号：US11523148

申请日：2006-09-19

Applicant: Bo H. Vanderberg ,  Robert D. Rathmell ,  Edward C. Eisner

Inventor： Bo H. Vanderberg ,  Robert D. Rathmell ,  Edward C. Eisner

IPC: H01J37/08

CPC classification number: H01J37/026 ,  H01J37/1475 ,  H01J37/3171 ,  H01J2237/004 ,  H01J2237/0041 ,  H01J2237/055

Abstract: A magnetic scanner employs constant magnetic fields to mitigate zero field effects. The scanner includes an upper pole piece and a lower pole piece that generate an oscillatory time varying magnetic field across a path of an ion beam and deflect the ion beam in a scan direction. A set of entrance magnets are positioned about an entrance of the scanner and generate a constant entrance magnetic field across the path of the ion beam. A set of exit magnets are positioned about an exit of the scanner and generate a constant exit magnetic field across the path of the ion beam.

Abstract translation: 磁扫描仪采用恒定磁场来减轻零场效应。 该扫描器包括上极片和下极片，其在离子束的路径上产生振荡时变磁场并使扫描方向偏转离子束。 一组入口磁体围绕扫描器的入口定位，并且在离子束的路径上产生恒定的入射磁场。 一组出口磁体围绕扫描器的出口定位，并在离子束的路径上产生恒定的出射磁场。

公开(公告)号：US20080067429A1

公开(公告)日：2008-03-20

申请号：US11932770

申请日：2007-10-31

Applicant: Takashi Fuse ,  Tadashi Kotsugi ,  Kyo Tsuboi ,  Koji Takeya

Inventor： Takashi Fuse ,  Tadashi Kotsugi ,  Kyo Tsuboi ,  Koji Takeya

IPC: H01L21/30

CPC classification number: H01J37/1474 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/026 ,  H01J37/147 ,  H01J37/3174 ,  H01J2237/03 ,  H01J2237/151 ,  H01L21/67017 ,  H01L21/67213 ,  Y10T29/49117 ,  Y10T29/49204 ,  Y10T29/49224 ,  Y10T29/49885

Abstract: A substrate processing apparatus which irradiates a substrate under processing with an electron beam and processes the substrate with the electron beam is disclosed. The substrate processing apparatus includes an electron beam generation mechanism which generates the electron beam, first area having a plurality of first static electricity deflecting devices whose thicknesses gradually increase in a traveling direction of the electron beam, and a second area disposed on a downstream side of the electron beam of the first area and having a plurality of second static electricity deflecting devices whose thicknesses are nearly same in the traveling direction of the electron beam. The substrate processing apparatus may further include a plurality of lenses whose thicknesses gradually decrease in the traveling direction of the electron beam, at least one of the plurality of lenses being disposed in each of the first area and the second area.

Abstract translation: 公开了一种用电子束照射处理基板并用电子束处理基板的基板处理装置。 基板处理装置包括：电子束发生机构，其产生电子束，第一区域具有多个第一静电偏转装置，其厚度在电子束的行进方向上逐渐增加，第二区域设置在电子束的下游侧 第一区域的电子束，并且具有多个第二静电偏转装置，其厚度在电子束的行进方向上几乎相同。 基板处理装置还可以包括其厚度在电子束的行进方向上逐渐减小的多个透镜，多个透镜中的至少一个设置在第一区域和第二区域中的每一个中。