摘要:
Basic logic gates are formed in a small area, and a highly integrated and microscopic structure is provided. In an nMOSFET and a pMOSFET, gate electrodes are formed facing each other and sandwiching a semiconductor region via gate insulting layers. Respective drain regions of the nMOSFET and the pMOSFET are connected to each other. A high potential is applied to a source region of the pMOSFET while an intermediate potential between the high and a low potential is applied to a source region of the nMOSFET. As a result, a NAND gate is provided. The intermediate potential between the high and the low potential is applied to the source region of the pMOSFET. The low potential is applied to the source region of the nMOSFET. As a result, a NOR gate is provided.
摘要:
A data compression apparatus includes a characterizing point extracting part which extracts data expressing characterizing points included in a plurality of data showing a result of carrying out simulation a quantized data generating part which generates quantized data obtained by quantizing data except for data expressing characterizing points, and a file number converting part which converts the same types of quantized data including in the quantized data, into a relating file number. During data compression, data except for the characterizing points is compressed. If the same quantized data is included at the same address location in the previously-compressed file, the quantized data is replaced with the file number of the previous compression file, thereby compressing data at high efficiency.
摘要:
According to an aspect of the invention, a nonvolatile semiconductor memory comprises: a semiconductor substrate; a trench formed in the semiconductor substrate; a first insulating film being formed on a wall surface of the trench; a floating gate electrode formed on the first insulating film inside the trench; a source region formed in the semiconductor substrate; a drain region formed in the semiconductor substrate; a channel region formed between the source region and the drain region in the semiconductor substrate, a second insulating film formed on a surface of the semiconductor substrate; and a control gate electrode formed on the channel region and a surface of the second insulating film. The channel region is adjacent to the trench. A storage state of the nonvolatile semiconductor memory is formed by injecting or drawing charge into or from the floating gate electrode when a tunnel current flows through the first insulating film.
摘要:
A semiconductor memory includes first to sixth ridges, an insulating layers on the first to sixth ridges, a first gate line above the first to fourth ridges, and a second gate line above the third to sixth ridges, wherein the first and sixth ridges, the insulating layers, and the first and second gate lines implement first and second capacitors, the second and third ridges and the first gate line implement first driver and load transistors, and the fourth and fifth ridges and the second gate lines implement second load and driver transistors.
摘要:
A time limit function utilization apparatus includes a first function block, a second function block, a signal line which connects the first and second function blocks and allows using a desired function that is generated by accessing the first and second function blocks with each other, and a semiconductor time switch interposed in or connected to the signal line, and disables or enables mutual access between the first and second function blocks upon the lapse of a predetermined time.