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    INSPECTION APPARATUS FOR LITHOGRAPHY
    41.
    发明申请
    INSPECTION APPARATUS FOR LITHOGRAPHY 有权
    检验仪器

    公开(公告)号：US20110032500A1

    公开(公告)日：2011-02-10

    申请号：US12920968

    申请日：2009-03-20

    申请人： Alexander Straaijer

    发明人： Alexander Straaijer

    IPC分类号： G03B27/52 ,  G01J4/00

    CPC分类号： G03F7/70616 ,  G01N21/211 ,  G01N21/956

    摘要： The measurement of two separately polarized beams (Ix, Iy) upon diffraction from a substrate (W) in order to determine properties of the substrate is disclosed. Circularly or elliptically polarized radiation is passed via a variable phase retarder in order to change the phase of one of two orthogonally polarized radiation beams with respect to the other of the two beams. The phase change is dependent on the wavelength of the polarized beam. The relative phases of the two radiation beams and other features of the beams as measured in a detector gives rise to properties of the substrate surface.

    摘要翻译： 公开了从衬底（W）衍射出的两个单独偏振光束（Ix，Iy）的测量，以便确定衬底的性质。 圆形或椭圆偏振辐射通过可变相位延迟器通过，以改变两个正交偏振辐射束中的一个相对于两个光束中的另一个的相位。 相位变化取决于偏振光束的波长。 在检测器中测量的两个辐射束的相对相位和光束的其它特征产生了衬底表面的性质。

    Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method
    43.
    发明申请
    Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method 有权
    检验方法和装置，平版印刷设备，平版印刷加工单元和器件制造方法

    公开(公告)号：US20100157299A1

    公开(公告)日：2010-06-24

    申请号：US12718599

    申请日：2010-03-05

    申请人： Alexander Straaijer ,  Ronald Franciscus Herman Hugers

    发明人： Alexander Straaijer ,  Ronald Franciscus Herman Hugers

    IPC分类号： G01J4/00

    CPC分类号： G01B11/0641 ,  G01N2021/4711 ,  G01N2021/4792 ,  G03F7/70625 ,  G03F7/70633

    摘要： The simultaneous measurement of four separately polarized beams upon diffraction from a substrate is used to determine properties of the substrate. Circularly or elliptically polarized light sources are passed via up to three polarizing elements. This polarizes the light sources by 0, 45, 90 and 135°. The plurality of polarizing beamsplitters replaces the use of a phase modulator, but enables the measurement of the intensity of all four beams and thus the measurement of the phase modulation and amplitude of the combined beams to give the features of the substrate.

    摘要翻译： 使用从衬底衍射的同时测量四个分离的偏振光束来确定衬底的性质。 圆形或椭圆偏振光源最多通过三个偏振元件。 这使光源偏振0°，45°，90°和135°。 多个偏振分束器取代了相位调制器的使用，但是能够测量所有四个光束的强度，从而测量组合光束的相位调制和幅度，以给出基板的特征。

    Lithographic apparatus and device manufacturing method
    49.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US07158211B2

    公开(公告)日：2007-01-02

    申请号：US10946340

    申请日：2004-09-22

    申请人： Alexander Straaijer

    发明人： Alexander Straaijer

    IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/60 ,  B25B11/00

    CPC分类号： G03F7/707 ,  G03F7/70341

    摘要： A table configured to support a substrate has one or more projections which support the substrate. In an embodiment, the table also has a raised perimeter defining a space which is configured to be filled with a liquid. A pump is configured to remove liquid from the space via outlet passages to an optional inlet. The removal of liquid can create a pressure differential across the substrate which then clamps it in place. Liquid circulated to the inlet may be filtered by a filter to remove contaminants.

    摘要翻译： 被配置为支撑衬底的工作台具有支撑衬底的一个或多个突起。 在一个实施例中，桌子还具有限定被填充有液体的空间的凸起周边。 泵构造成通过出口通道将液体从空间移除到可选的入口。 液体的去除可以在衬底上产生压差，然后将其夹在适当位置。 循环到入口的液体可以通过过滤器过滤以除去污染物。

    Lithographic apparatus and device manufacturing method
    50.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20060250591A1

    公开(公告)日：2006-11-09

    申请号：US11120198

    申请日：2005-05-03

    申请人： Alexander Straaijer

    发明人： Alexander Straaijer

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70341

    摘要： A lithographic projection apparatus uses a volume of a second liquid to confine a first liquid to a space between the projection system and the substrate. In an embodiment, the first and second liquids are substantially immiscible and may be a cycloalkane, such as cyclooctane, decalin, bicyclohexyl, exo-tetrahydro-dicyclopentadiene and cyclohexane, another high-index hydrocarbon, a perfluoropolyether, such as perfluoro-N-methylmorpholine and perfluoro E2, a perfluoroalkane, such as perfluorohexane, or a hydrofluoroether; and water, respectively.

    摘要翻译： 光刻投影设备使用一定体积的第二液体将第一液体限制在投影系统和基底之间的空间上。 在一个实施方案中，第一和第二液体基本上是不混溶的，并且可以是环烷烃，例如环辛烷，十氢化萘，二环己基，外 - 四氢 - 二环戊二烯和环己烷，另一种高折射率烃，全氟聚醚，如全氟-N-甲基吗啉 和全氟E2，全氟烷烃如全氟己烷或氢氟醚; 和水。