公开(公告)号：US20080036990A1

公开(公告)日：2008-02-14

申请号：US11835035

申请日：2007-08-07

申请人： Shinichiro Hirai ,  Tetsuya Mori ,  Seiya Miura ,  Yoshinori Ohsaki

发明人： Shinichiro Hirai ,  Tetsuya Mori ,  Seiya Miura ,  Yoshinori Ohsaki

IPC分类号： G03B27/74

CPC分类号： G03F9/7034 ,  G03F9/7026 ,  G03F9/7088

摘要： An exposure apparatus is disclosed. The apparatus comprises an image sensor, a measurement optical system configured to guide measurement light to obliquely enter the projection optical system, and further guide the measurement light returned from the projection optical system to the image sensor, and a control unit configured to calculate surface position information of the substrate based on the output from the image sensor. The control unit calculates the surface position information of the substrate based on an interval between the image, of a mark arranged on the original stage, formed by the measurement light which has passed through the mark and the image of the mark formed by the measurement light reflected by the mark.

摘要翻译： 公开了一种曝光装置。 该装置包括图像传感器，测量光学系统，被配置为引导测量光倾斜地进入投影光学系统，并且进一步将从投影光学系统返回的测量光引导到图像传感器;以及控制单元，被配置为计算表面位置 基于来自图像传感器的输出的基板的信息。 控制单元基于由穿过标记的测量光形成的原稿台上的标记的图像与由测量光形成的标记的图像之间的间隔来计算基板的表面位置信息 被标记所反映。

公开(公告)号：US07221431B2

公开(公告)日：2007-05-22

申请号：US11008379

申请日：2004-12-09

申请人： Yoshinori Ohsaki

发明人： Yoshinori Ohsaki

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/74 ,  G03B27/58

CPC分类号： G03F7/7085 ,  G03B27/52 ,  G03F7/70341 ,  G03F9/7096

摘要： An exposure apparatus includes a projection optical system for projecting a pattern on a reticle onto an object to be exposed, a reference mark that serves as a reference for an alignment between the reticle and the object, a first fluid that has a refractive index of 1 or greater, and fills a space between at least part of the projection optical system and the object and a space between at least part of the projection optical system and the reference mark, and an alignment mechanism for aligning the object by using the projection optical system and the first fluid.

摘要翻译： 曝光装置包括：投影光学系统，用于将掩模版上的图案投影到待曝光的物体上;基准标记，其用作参考标号，用于对准所述标线片和所述物体;第一流体，其折射率为1 以上，并且填充投影光学系统的至少一部分与物体之间的空间以及投影光学系统的至少一部分与基准标记之间的空间，以及通过使用投影光学系统对准物体的对准机构 和第一流体。

公开(公告)号：US07218379B2

公开(公告)日：2007-05-15

申请号：US11130174

申请日：2005-05-17

申请人： Yuichi Osakabe ,  Yoshinori Ohsaki

发明人： Yuichi Osakabe ,  Yoshinori Ohsaki

IPC分类号： G03B27/42 ,  G03B27/58 ,  G03B27/62 ,  G01B11/00

CPC分类号： G03F9/7011 ,  G03B27/42

摘要： A scanning exposure apparatus for exposing a substrate (8) to a pattern with an original (1) through a projection optical system (5), while scanning the original and the substrate, includes a first detection system (14c) which detects a first substrate reference mark (18c1, 18c3) corresponding to the substrate through the projection optical system on/at at least one of an optical axis of the projection optical and an off-axis position shifted from the optical axis in a scanning direction, and an alignment system (2, 9) which aligns the original and the substrate on the basis of a detection result of the first detection system.

摘要翻译： 一种用于通过投影光学系统（5）将基板（8）暴露于具有原稿（1）的图案的扫描曝光装置，在扫描原件和基板的同时，包括第一检测系统（14c），其检测第一 通过投影光学系统对应于基板的基板参照标记（18c1,18c3），在投影光学的光轴和离开光轴的扫描方向上偏离的离轴位置 以及基于第一检测系统的检测结果对准原件和基板的对准系统（2,9）。

公开(公告)号：US07154582B2

公开(公告)日：2006-12-26

申请号：US10778978

申请日：2004-02-13

申请人： Yoshinori Ohsaki

发明人： Yoshinori Ohsaki

IPC分类号： G03B27/42

CPC分类号： G03F9/7096 ,  G03F7/70925 ,  G03F9/7088

摘要： An exposure apparatus for projecting a pattern of a reticle onto an object to be exposed with first light having a wavelength of 20 nm or smaller, said exposure apparatus comprising a projection optical system for projecting the pattern onto the object, and a position detecting system for detecting a positional information of a mark by receiving a second light having a wavelength different from that of the first light via the projection optical system.

摘要翻译： 一种曝光装置，用于将波长20nm以下的第一光投射到被曝光物体上的所述掩模版的图案，所述曝光装置具备：投影光学系统，用于将图案投影到物体上;位置检测系统， 通过经由投影光学系统接收具有与第一光的波长不同的波长的第二光来检测标记的位置信息。

公开(公告)号：US07046333B2

公开(公告)日：2006-05-16

申请号：US10797218

申请日：2004-03-09

申请人： Yoshinori Ohsaki

发明人： Yoshinori Ohsaki

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F9/7026 ,  G03B27/42 ,  G03F9/7034

摘要： Disclosed is an exposure method in which high precision focus calibration is realized by measuring a tilt of an image plane in a scanning direction, so that exposure with a high resolution can be performed. The exposure method includes: a measuring step of measuring a position of an image plane of a projection optical system at a plurality of measurement positions different from each other with respect to a scanning direction; and a correcting step of correcting a tilt of the image plane of the projection optical system based on measurements.

摘要翻译： 公开了通过测量扫描方向上的图像平面的倾斜来实现高精度聚焦校准的曝光方法，从而可以进行高分辨率的曝光。 曝光方法包括：测量步骤，用于在相对于扫描方向彼此不同的多个测量位置处测量投影光学系统的像面的位置; 以及基于测量校正投影光学系统的图像平面的倾斜的校正步骤。

公开(公告)号：US06833906B1

公开(公告)日：2004-12-21

申请号：US09577978

申请日：2000-05-25

申请人： Yoshinori Ohsaki

发明人： Yoshinori Ohsaki

IPC分类号： G03B2772

CPC分类号： G03F7/706 ,  G03B27/42

摘要： A projection exposure apparatus includes a projection optical system for projecting a transfer pattern of a first object onto a second object, a first illumination system for performing illumination under a first illumination condition, wherein the transfer pattern of the first object illuminated under the first illumination condition is projected onto the second object through the projection optical system, a second illumination system for performing illumination under a second illumination condition, a light intensity detector, and an information processing system operable, as a particular pattern being illuminated by the second illumination system under the second illumination condition is imaged by the projection optical system, to measure a wavefront aberration of the projection optical system on the basis of detection of a light intensity distribution of an image of the particular pattern made through the light intensity detector.

摘要翻译： 投影曝光装置包括用于将第一物体的转印图案投影到第二物体上的投影光学系统，用于在第一照明条件下进行照明的第一照明系统，其中在第一照明条件下照射的第一物体的转印图案 通过投影光学系统投影到第二物体上，用于在第二照明条件下执行照明的第二照明系统，光强度检测器和信息处理系统，其可操作为由第二照明系统照亮的特定图案 第二照明条件由投影光学系统成像，基于通过光强度检测器形成的特定图案的图像的光强度分布的检测来测量投影光学系统的波前像差。