摘要:
A drive system for a vehicle includes an engine, a transmission, a clutch mechanism including first and second clutch portions, the clutch mechanism being switchable between connected and disconnected states, and a clutch operation mechanism switching the clutch mechanism between the connected and disconnected states, the clutch operation mechanism including a clutch drum forming a drum chamber, a piston dividing the drum chamber into a spring chamber and a pressurizing chamber, a control valve, a biasing member arranged in the spring chamber and exerting a biasing force in a direction in which the first and second clutch portions are engaged with each other, and a bore formed in the clutch drum, the bore discharging oil of the spring chamber to an outer side of the spring chamber in a state where a counteracting force against a centrifugal force acting in the pressurizing chamber is generated in the spring chamber.
摘要:
This invention discloses a method to form a resist pattern on a to-be-processed substrate by immersion exposure. A resist film is formed on the central portion of the upper surface of the to-be-processed substrate, on a bevel portion of the upper surface, which is obtained by chamfering the peripheral portion of the to-be-processed substrate, and on the end portion of the to-be-processed substrate. Pattern exposure for forming the latent image of a desired pattern on the resist film is executed while a liquid whose refractive index is higher than that of air exists between the resist film and a constituent element of a projection optical system of an exposure apparatus, which is nearest to the to-be-processed substrate. The resist film formed on the end portion of the to-be-processed substrate is removed by supplying a rinse solution to the end portion of the to-be-processed substrate after executing pattern exposure.
摘要:
To provide a folding mechanism for folding a sheet with a simplified structure having no fear of causing a deviation from the fold position, wrinkle and the like, provided are a transport path 33 for transporting a sheet, and folding processing means 48 disposed in the transport path to fold the sheet. Then, the folding processing means is comprised of folding roll pairs (41b, 49, 50) coming into press-contact with one another to rotate in the opposite directions, and folding deflecting members (53, 54) for guiding the fold of the sheet to the nip portions (Np1, Np2) of the folding roll pairs. Then, the folding deflecting members are provided with driven rollers (53a, 54a) in contact press-contact with the roll periphery of one of the folding roll pair, and curved guides (53a, 54a) along the roll periphery of the other one. The driven roller provides the sheet with transport force to guide to the nip portion, and the curved guide brings the sheet along the roll periphery of the other one to guide to the nip portion.
摘要:
A template for imprinting in which a pattern is transferred onto a first substrate applied curable resin thereon, including a second substrate having a surface to be contacted with the curable resin, a concave portion provided on the surface and corresponding to a pattern to be transferred onto the first substrate, and at least one convex portion arranged in the concave portion to decrease volume of the concave portion.
摘要:
A positive-side heatsink and a negative-side heatsink that constitute a rectifier are disposed inside a case at a rear end of a rotor so as to be separated axially such that front surfaces of a positive-side base portion and a negative-side base portion face each other. The negative-side heatsink is disposed such that radiating fins that are disposed so as to project from a rear surface of the negative-side base portion are positioned radially outside a cooling fan so as to face a coil end of a stator coil.
摘要:
A pattern forming method includes forming a spin on dielectric film on a substrate, washing the spin on dielectric film by using a washing liquid, drying a surface of the spin on dielectric film after the washing, forming a photosensitive film on the dried coating type insulation film, emitting energy rays to a predetermined position of the photosensitive film in order to form a latent image on the photosensitive film, developing the photosensitive film in order to form a photosensitive film pattern which corresponds to the latent image, and processing the spin on dielectric film with the photosensitive film pattern serving as a mask.
摘要:
A measurement accuracy check system of a sphygmomanometer includes a sphygmomanometer having a blood pressure measurement mode for measuring a blood pressure based on a change in internal pressure of a cuff attached to a blood pressure measurement site, and an accuracy check mode for checking measurement accuracy in the blood pressure measurement mode, and an accuracy check device communicably connected with the sphygmomanometer for determining the measurement accuracy of the sphygmomanometer in the accuracy check mode. The sphygmomanometer includes an air system piping communicating to the cuff in the blood pressure measurement mode and communicating to an air system of the accuracy check device in the accuracy check mode, a pressurization and depressurization unit for adjusting pressure to be applied to the air system piping, and a first pressure detection unit for detecting pressure in the air system piping.
摘要:
A substrate-processing apparatus includes a sample table which mounts thereon a to-be-processed substrate, a first line which supplies a chemical solution, a second line which supplies a cleaning liquid, a three-way valve connected to the first and second lines and configured to select one of the first and second lines, a filter provided across the first line upstream of the three-way valve, and configured to eliminate a foreign material from the chemical solution, and a nozzle provided downstream of the three-way valve and configured to discharge the chemical solution or the cleaning liquid when the first or second line is selected via the three-way valve. The three-way valve selects the first line when the substrate is coated with the chemical solution, and selects the second line in other cases.
摘要:
A method of generating a writing pattern is disclosed, which generates, from pattern data, writing pattern data to write a mask pattern in a photomask used in an exposure tool comprising a projection optical system to transfer the mask pattern to a resist film formed on a substrate, an immersion mechanism which forms a liquid film in a local region, and a movement mechanism which moves the substrate with respect to the projection optical system and the immersion mechanism, the method comprising obtaining a typical distribution of contact history values between the resist film and the liquid film in the unit exposure region, dividing a pattern which corresponds to the pattern data into a plurality of regions according to the typical distribution of the contact history values, and carrying out correction of a pattern included in each of the divided regions under a rule according to the contact history values.