公开(公告)号：US20080203317A1

公开(公告)日：2008-08-28

申请号：US12038326

申请日：2008-02-27

Applicant: Elmar Platzgummer ,  Hans Loschner ,  Samuel Kvasnica ,  Reinhard Springer ,  Mathias Irmscher ,  Florian Letzkus ,  Jorg Butschke

Inventor： Elmar Platzgummer ,  Hans Loschner ,  Samuel Kvasnica ,  Reinhard Springer ,  Mathias Irmscher ,  Florian Letzkus ,  Jorg Butschke

IPC: H01J3/14 ,  H01L21/20

CPC classification number: G03F1/20 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0437

Abstract: The invention relates to a multi-beam deflector array device for use in a particle-beam exposure apparatus employing a beam of charged particles, the multi-beam deflector array device having a plate-like shape with a membrane region, the membrane region including a first side facing towards the incoming beam of particles, an array of apertures, each aperture allowing passage of a corresponding beamlet formed out of the beam of particles, a plurality of depressions, each depression being associated with at least one aperture, and an array of electrodes, each aperture being associated with at least one electrode and each electrode being located in a depression, the electrodes being configured to realize a non-deflecting state, wherein the particles that pass through the apertures are allowed to travel along a desired path, and a deflecting state, wherein the particles are deflected off the desired path.

Abstract translation: 本发明涉及一种用于使用带电粒子束的粒子束曝光装置中的多光束偏转器阵列装置，该多光束偏转器阵列装置具有带有膜区域的板状形状，该膜区域包括一个 第一面朝向输入的粒子束，一组孔，每个孔允许通过由粒子束形成的对应子束，多个凹陷，每个凹陷与至少一个孔相关联，以及阵列的 电极，每个孔与至少一个电极相关联，并且每个电极位于凹陷中，电极被配置为实现非偏转状态，其中允许通过孔的颗粒沿着期望的路径行进，并且 偏转状态，其中颗粒偏离所需的路径。

公开(公告)号：US20050242302A1

公开(公告)日：2005-11-03

申请号：US11119025

申请日：2005-04-29

Applicant: Elmar Platzgummer ,  Stefan Cernusca

Inventor： Elmar Platzgummer ,  Stefan Cernusca

IPC: G03F7/20 ,  G21K1/04 ,  G21K1/08 ,  G21K5/04 ,  G21K5/10 ,  H01J37/04 ,  H01J37/08 ,  H01J37/30 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G21K1/08 ,  H01J37/045 ,  H01J37/3174 ,  H01J2237/31774

Abstract: In a pattern definition device for use in a particle-beam processing apparatus a plurality of apertures (21) are arranged within a pattern definition field (pf) wherein the positions of the apertures (21) in the pattern definition field (pf) taken with respect to a direction (X, Y) perpendicular, or parallel, to the scanning direction are offset to each other by not only multiple integers of the effective width (w) of an aperture taken along said direction, but also multiple integers of an integer fraction of said effective width. The pattern definition field (pf) may be segmented into several domains (D) composed of a many staggered lines (pl) of apertures; along the direction perpendicular to the scanning direction, the apertures of a domain are offset to each other by multiple integers of the effective width (w), whereas the offsets of apertures of different domains are integer fractions of that width.

Abstract translation: 在用于粒子束处理装置的图案定义装置中，多个孔（21）布置在图案定义区（pf）内，其中，图案定义区（pf）中的孔（21）的位置与 垂直于或平行于扫描方向的方向（X，Y）不仅通过沿着所述方向所取的孔的有效宽度（w）的多个整数而彼此偏移，而且也是整数的多个整数 所述有效宽度的分数。 图案定义字段（pf）可以被分割成由许多交错的线（pl）组成的几个域（D）; 沿着与扫描方向垂直的方向，域的孔径相互偏移有效宽度（w）的多个整数，而不同域的孔的偏移量是该宽度的整数分数。

公开(公告)号：US08222621B2

公开(公告)日：2012-07-17

申请号：US12619480

申请日：2009-11-16

Applicant: Heinrich Fragner ,  Elmar Platzgummer ,  Robert Nowak ,  Adrian Bürli

Inventor： Heinrich Fragner ,  Elmar Platzgummer ,  Robert Nowak ,  Adrian Bürli

IPC: G21K5/10 ,  H01J37/08

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  Y10S430/143

Abstract: In a maskless particle multibeam processing apparatus, a particle beam is projected through a pattern definition system producing a regular array of beamlets according to a desired pattern, which is projected onto a target which moves at continuous speed along a scanning direction with respect to the pattern definition system. During a sequence of uniformly timed exposure steps the beam image is moved along with the target along the scanning direction, and between exposure steps the location of the beam image is changed with respect to the target. During each exposure step the target covers a distance greater than the mutual distance of neighboring image elements on the target. The location of the beam image at consecutive exposure steps corresponds to a sequence of interlacing placement grids, and after each exposure step the beam image is shifted to a position associated with a different placement grid, with a change of location generally including a component across the scanning direction, thus cycling through the set of placement grids.

Abstract translation: 在无掩模粒子多波束处理装置中，粒子束通过图案定义系统投射，根据期望的图案产生规则的子束阵列，该期望图案被投影到相对于图案沿扫描方向以连续速度移动的目标 定义系统 在一系列均匀曝光步骤期间，光束图像沿着扫描方向与目标一起移动，并且在曝光步骤之间，光束图像的位置相对于目标改变。 在每个曝光步骤期间，目标覆盖的距离大于目标上相邻图像元素的相互距离。 在连续曝光步骤中的光束图像的位置对应于交错放置网格的序列，并且在每个曝光步骤之后，光束图像被移动到与不同的放置网格相关联的位置，其中位置的变化通常包括横跨 扫描方向，从而循环通过一组放置网格。

公开(公告)号：US08183543B2

公开(公告)日：2012-05-22

申请号：US12178153

申请日：2008-07-23

Applicant: Elmar Platzgummer

Inventor： Elmar Platzgummer

IPC: A61N5/00 ,  G21G5/00

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3007 ,  H01J2237/0437 ,  H01J2237/0453 ,  H01J2237/04928 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/151 ,  H01J2237/3045

Abstract: A multi-beam source for generating a plurality of beamlets of energetic electrically charged particles. The multi-beam source includes an illumination system generating an illuminating beam of charged particles and a beam-forming system being arranged after the illumination system as seen in the direction of the beam, adapted to form a plurality of telecentric or homocentric beamlets out of the illuminating beam. The beam forming system includes a beam-splitter and an electrical zone device, the electrical zone having a composite electrode composed of a plurality of substantially planar partial electrodes, adapted to be applied different electrostatic potentials and thus influencing the beamlets.

Abstract translation: 一种用于产生能量带电粒子的多个子束的多光束源。 多光束源包括产生带电粒子的照明光束的照明系统，以及沿着光束的方向被布置在照明系统之后的束形成系统，适于在多个远心或同心圆的子束之外形成 照明光束。 束形成系统包括分光器和电区装置，电区具有由多个基本上平面的部分电极组成的复合电极，其适于施加不同的静电电势并因此影响子束。

公开(公告)号：US07763851B2

公开(公告)日：2010-07-27

申请号：US11951543

申请日：2007-12-06

Applicant: Elmar Platzgummer

Inventor： Elmar Platzgummer

IPC: G21K1/08 ,  G01N23/00

CPC classification number: H01J37/05 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/0435 ,  H01J2237/057

Abstract: In a particle-beam apparatus for irradiating a target, a pattern defined in a pattern definer is projected onto the target through a projection system by a beam of energetic electrically charged particles of, largely, a species of a nominal mass having a nominal kinetic energy. To generate the beam, a particle source, a velocity-dependent deflector and an illumination optics system are provided. The velocity-dependent deflector includes a transversal dipole electrical field and/or a transversal dipole magnetic field, which act upon the particles so as to causing a deviation of the path of the particles with regard to the paths of the nominal species which is dependent on the velocity of the particles. A delimiter is provided as a component of the pattern definer or, preferably, the projection system, serving to remove particles whose paths are deviating from the nominal path.

Abstract translation: 在用于照射目标物的粒子束装置中，以图案定义器定义的图案通过投影系统通过能量带电的粒子束投射到目标物上，该光束的大部分具有标称质量的物质具有标称动能 。 为了产生光束，提供了粒子源，速度依赖偏转器和照明光学系统。 与速度相关的偏转器包括横向偶极电场和/或横向偶极子磁场，其作用于颗粒，从而导致颗粒相对于标称物质的路径的偏离，这取决于 颗粒的速度。 分隔符被提供为图案定义器的一个部件，或者优选地，该投影系统用于去除其路径偏离标称路径的颗粒。

公开(公告)号：US20100127185A1

公开(公告)日：2010-05-27

申请号：US12619480

申请日：2009-11-16

Applicant: Heinrich Fragner ,  Elmar Platzgummer ,  Robert Nowak ,  Adrian Bürli

Inventor： Heinrich Fragner ,  Elmar Platzgummer ,  Robert Nowak ,  Adrian Bürli

IPC: H01J37/147 ,  H01J37/30 ,  H01J3/26

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  Y10S430/143

Abstract: In a maskless particle multibeam processing apparatus, a particle beam is projected through a pattern definition system producing a regular array of beamlets according to a desired pattern, which is projected onto a target which moves at continuous speed along a scanning direction with respect to the pattern definition system. During a sequence of uniformly timed exposure steps the beam image is moved along with the target along the scanning direction, and between exposure steps the location of the beam image is changed with respect to the target. During each exposure step the target covers a distance greater than the mutual distance of neighboring image elements on the target. The location of the beam image at consecutive exposure steps corresponds to a sequence of interlacing placement grids, and after each exposure step the beam image is shifted to a position associated with a different placement grid, with a change of location generally including a component across the scanning direction, thus cycling through the set of placement grids.

Abstract translation: 在无掩模粒子多波束处理装置中，粒子束通过图案定义系统投射，根据期望的图案产生规则的子束阵列，该期望图案被投影到相对于图案沿扫描方向以连续速度移动的目标 定义系统 在一系列均匀曝光步骤期间，光束图像沿着扫描方向与目标一起移动，并且在曝光步骤之间，光束图像的位置相对于目标改变。 在每个曝光步骤期间，目标覆盖的距离大于目标上相邻图像元素的相互距离。 在连续曝光步骤中的光束图像的位置对应于交错放置网格的序列，并且在每个曝光步骤之后，光束图像被移动到与不同的放置网格相关联的位置，其中位置的变化通常包括横跨 扫描方向，从而循环通过一组放置网格。

公开(公告)号：US20100124722A1

公开(公告)日：2010-05-20

申请号：US12619071

申请日：2009-11-16

Applicant: Heinrich Fragner ,  Elmar Platzgummer ,  Adrian Burli

Inventor： Heinrich Fragner ,  Elmar Platzgummer ,  Adrian Burli

IPC: G03F7/20

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  Y10S430/143

Abstract: The invention relates to a method for forming a pattern on a substrate surface of a target by means of a beam of electrically charged particles in a number of exposure steps, where the beam is split into a patterned beam and there is a relative motion between the substrate and the pattern definition means. This results in an effective overall motion of the patterned particle beam over the substrate surface and exposition of image elements on the substrate surface in each exposure step, wherein the image elements on the target are exposed to the beamlets multiply, namely several times during a number of exposure steps according to a specific sequence. The sequence of exposure steps of the image elements is arranged in a non-linear manner according to a specific rule from one exposure step to the subsequent exposure step in order to reduce the current variations in the optical column of the multi-beam exposure apparatus during the exposure of the pattern.

Abstract translation: 本发明涉及一种用于在多个曝光步骤中通过带电粒子束在靶的衬底表面上形成图案的方法，其中光束被分裂成图案化的束，并且在两者之间存在相对运动 底物和图案定义方式。 这导致图案化的粒子束在衬底表面上的有效的总体运动，并且在每个曝光步骤中在衬底表面上曝光图像元素，其中靶上的图像元素暴露于子束多次，即在数字期间多次 的曝光步骤。 根据从一个曝光步骤到随后的曝光步骤的特定规则，图像元素的曝光步骤的顺序以非线性方式排列，以便减少多光束曝光设备的光学列中的电流变化 曝光的图案。

公开(公告)号：US07714298B2

公开(公告)日：2010-05-11

申请号：US12120130

申请日：2008-05-13

Applicant: Elmar Platzgummer

Inventor： Elmar Platzgummer

IPC: H01J37/302

CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1472 ,  H01J37/3177 ,  H01J2237/0437

Abstract: A multi-beam pattern definition device for use in a particle-beam processing or inspection apparatus, which is set up to be irradiated with a beam of electrically charged particles and allow passage of the beam through a plurality of apertures thus forming beamlets, which are imaged onto a target. A deflection array has a plurality of electrostatic deflector electrodes for each beamlet. Each deflector electrode can be applied an electrostatic potential individually. Counter electrodes are electrically connected to a counter potential independently of the deflection array through a counter-electrode array. The counter potentials may be a common ground potential or individual potentials in order to improve system reliability. In conjunction with an associated counter electrode, each deflector electrode deflects its beamlet sufficiently to deflect the beamlet off its nominal path when applied an activating voltage against the respective counter electrode.

Abstract translation: 一种用于粒子束处理或检查装置的多光束图案定义装置，其被设置为被一束带电粒子照射，并允许光束通过多个孔，从而形成子束， 成像到目标上。 偏转阵列具有用于每个子束的多个静电偏转器电极。 每个偏转器电极可以分别施加静电电位。 反电极通过对电极阵列独立于偏转阵列电连接到反电位。 为了提高系统的可靠性，反电势可能是共同的潜力或个别的潜力。 结合相关的对电极，当向相应的对电极施加激活电压时，每个偏转器电极充分偏转其子束以使子束偏离其标称路径。

公开(公告)号：US07598499B2

公开(公告)日：2009-10-06

申请号：US11978661

申请日：2007-10-30

Applicant: Elmar Platzgummer

Inventor： Elmar Platzgummer

IPC: G01K1/08 ,  H01J3/14 ,  H01J3/26

CPC classification number: H01J37/3007 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/02 ,  H01J37/045 ,  H01J37/09 ,  H01J37/3174 ,  H01J2237/022 ,  H01J2237/0435 ,  H01J2237/0451 ,  H01J2237/0453 ,  H01J2237/0458 ,  H01J2237/0835

Abstract: In a particle-beam projection processing apparatus a target (41) is irradiated by means of a beam (pb) of energetic electrically charged particles, using a projection system (103) to image a pattern presented in a pattern definition means (102) onto the target (41) held at position by means of a target stage; no elements—other than the target itself—obstruct the path of the beam after the optical elements of the projection system. In order to reduce contaminations from the target space into the projection system, a protective diaphragm (15) is provided between the projection system and the target stage, having a central aperture surrounding the path of the patterned beam, wherein at least the portions of the diaphragm defining the central aperture are located within a field-free space after the projection system (103).

Abstract translation: 在粒子束投影处理装置中，使用投影系统（103）将图案定义装置（102）中呈现的图案成像到图像定义装置（102）的图像上，借助于能量带电粒子束（pb）照射目标（41） 目标（41）通过目标阶段保持在位置; 没有元件 - 除了目标本身 - 在投影系统的光学元件之后阻挡光束的路径。 为了减少从目标空间到投影系统的污染，在投影系统和目标台之间提供保护膜片（15），其具有围绕图案化梁的路径的中心孔，其中至少部分 限定中心孔的光阑在投影系统（103）之后位于无场空间内。

公开(公告)号：US20090200495A1

公开(公告)日：2009-08-13

申请号：US12294262

申请日：2007-03-16

Applicant: Elmar Platzgummer

Inventor： Elmar Platzgummer

IPC: G21K5/10

CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3175 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/1506 ,  H01J2237/31766 ,  H01J2237/31774 ,  H01J2237/31777

Abstract: In a charged-particle exposure apparatus for exposure of a target with a beam of electrically charged particles, the illumination system includes a deflector device adapted to vary the direction of incidence of the illuminating beam upon the pattern definition device, the pattern definition device forms the shape of the illuminating beam into a desired pattern, and the projection optics system projects an image of the beam shape defined in the pattern definition device onto the target; the projection optics system includes a blocking aperture device having an opening and being adapted to block passage of beams traversing outside the opening, namely when the deflector device is activated to tilt the beamlet by a sufficient angle from its non-deflected path, e.g., for blanking out during the process of loading a pattern into the pattern definition device.

Abstract translation: 在用于用带电粒子束曝光目标物的带电粒子曝光装置中，照明系统包括偏转装置，该偏转装置适于改变在图案定义装置上的照射光束的入射方向，图案定义装置形成 将照明光束的形状形成为期望的图案，并且投影光学系统将在图案定义装置中限定的光束形状的图像投影到目标上; 投影光学系统包括具有开口并且适于阻挡穿过开口外侧的光束通过的阻挡孔径装置，即当偏转器装置被激活以使其与其非偏转路径足够的角度倾斜时，例如， 在将图案加载到图案定义装置的过程中消隐。