Display substrate, display apparatus, and method of fabricating display substrate

    公开(公告)号:US11442319B2

    公开(公告)日:2022-09-13

    申请号:US16071691

    申请日:2018-02-02

    Abstract: The present application discloses display substrate having a base substrate; an insulating layer on the base substrate; and an electrode layer on a side of the insulating layer distal to the base substrate and having a plurality of electrode blocks. The insulating layer has a first side distal to the base substrate and a second side opposite to the first side and proximal to the base substrate. Each of the plurality of electrode blocks has a third side distal to the base substrate and a fourth side opposite to the third side and proximal to the base substrate. The first side of the insulating layer in the inter-electrode block region has a first height relative to a surface of the base substrate greater than a second height of the fourth side of an adjacent electrode of the plurality of electrode blocks relative to the surface of the base substrate.

    DISPLAY SUBSTRATE, DISPLAY APPARATUS, AND METHOD OF FABRICATING DISPLAY SUBSTRATE

    公开(公告)号:US20210200011A1

    公开(公告)日:2021-07-01

    申请号:US16071691

    申请日:2018-02-02

    Abstract: The present application discloses display substrate having a base substrate; an insulating layer on the base substrate; and an electrode layer on a side of the insulating layer distal to the base substrate and having a plurality of electrode blocks. The insulating layer has a first side distal to the base substrate and a second side opposite to the first side and proximal to the base substrate. Each of the plurality of electrode blocks has a third side distal to the base substrate and a fourth side opposite to the third side and proximal to the base substrate. The first side of the insulating layer in the inter-electrode block region has a first height relative to a surface of the base substrate greater than a second height of the fourth side of an adjacent electrode of the plurality of electrode blocks relative to the surface of the base substrate.

    Array substrate, display panel and display apparatus having the same, and fabricating method thereof

    公开(公告)号:US10290684B2

    公开(公告)日:2019-05-14

    申请号:US15520554

    申请日:2016-10-11

    Abstract: The present application discloses an array substrate having a subpixel region and an inter-subpixel region, a display panel and a display apparatus having the same, and a fabricating method thereof. The array substrate includes a plasmonic color filter layer including a plurality of color filter blocks in the subpixel region on a base substrate. Each of the plurality of color filter blocks includes a plurality of plasmonic nanostructures made of a semiconductor material. A first color filter block corresponding to a subpixel of a first color has an arrangement of nanostructures different from that of a second color filter block corresponding to a subpixel of a second color; the second color being different from the first color.

    Array substrate, fabricating method thereof, and display device

    公开(公告)号:US10193100B2

    公开(公告)日:2019-01-29

    申请号:US14906260

    申请日:2015-07-20

    Abstract: The present invention relates to an array substrate, a fabricating method thereof, and a display device. The array substrate comprises a thin film transistor, an auxiliary electrode which is arranged in a same layer as an active layer of the thin film transistor, and a transparent cathode which is electrically connected with the auxiliary electrode, wherein the active layer is an oxide semiconductor, and the auxiliary electrode is an electric conductor which is formed by performing a modification treatment on the oxide semiconductor. According to technical solutions of the present invention, the active layer and the auxiliary electrode are arranged in a same layer, a pattern of the active layer and the auxiliary electrode can be formed by a same etching process, and a separate process for forming the auxiliary electrode is not required, thus reducing the overall process time of the array substrate and saving the fabricating cost.

    Manufacturing method of array substrate, array substrate and display device

    公开(公告)号:US10141352B2

    公开(公告)日:2018-11-27

    申请号:US15325402

    申请日:2016-03-09

    Abstract: A manufacturing method of an array substrate is provided. The method includes sequentially depositing a first electrode layer and a gate metal layer on a base substrate, the first electrode layer including at least two conductive layers, formation materials of the at least two conductive layers having different etching rates. The method also includes forming a photoresist layer on the gate metal layer, exposing and developing the photoresist layer using a halftone mask plate, performing a first etching process on the gate metal layer, etching the first electrode layer, and ashing the photoresist layer, performing a second etching process on the gate metal layer by using remaining photoresist layer as a mask, stripping the remaining photoresist layer, and sequentially forming a semiconductor layer, a source and drain electrode layer, a via-hole and a second electrode layer on the gate metal layer on which the second etching process has been performed.

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