公开(公告)号：US07708964B2

公开(公告)日：2010-05-04

申请号：US11460547

申请日：2006-07-27

申请人： Richard D. Boardman ,  Robert A. Carrington

发明人： Richard D. Boardman ,  Robert A. Carrington

IPC分类号： B01D53/38 ,  B01D53/56 ,  B01D53/48 ,  B01D53/68 ,  B01D53/74 ,  B01J20/30 ,  F23B99/00 ,  F23C99/00

CPC分类号： B01D53/60 ,  B01D53/46 ,  B01D2251/20 ,  B01D2253/20 ,  B01D2257/204 ,  B01D2257/302 ,  B01D2257/308 ,  B01D2257/404 ,  B01D2257/602 ,  C04B7/364 ,  C04B7/4446 ,  F23G2900/7013 ,  F23J7/00 ,  F23J15/003 ,  Y02A50/2344 ,  Y02C20/30 ,  Y10S502/514

摘要： Pollution control substances may be formed from the combustion of oil shale, which may produce a kerogen-based pyrolysis gas and shale sorbent, each of which may be used to reduce, absorb, or adsorb pollutants in pollution producing combustion processes, pyrolysis processes, or other reaction processes. Pyrolysis gases produced during the combustion or gasification of oil shale may also be used as a combustion gas or may be processed or otherwise refined to produce synthetic gases and fuels.

摘要翻译： 污染控制物质可以由油页岩的燃烧形成，这可能产生基于油母质的裂解气和页岩吸附剂，其中每一种可用于减少，吸收或吸附污染物的燃烧过程，热解过程或 其他反应过程。 在油页岩的燃烧或气化期间产生的热解气体也可以用作燃烧气体，或者可以被加工或以其它方式被精炼以产生合成气体和燃料。

公开(公告)号：US07611684B2

公开(公告)日：2009-11-03

申请号：US11891075

申请日：2007-08-08

申请人： Mark Johnsgard ,  Kris Johnsgard

发明人： Mark Johnsgard ,  Kris Johnsgard

IPC分类号： B01D53/34 ,  B01D53/74 ,  B01D53/75 ,  B01D53/78 ,  G05D21/00

CPC分类号： B01D53/46 ,  B01D53/78 ,  B01D2251/10 ,  B01D2258/0216 ,  Y10S423/05

摘要： An effluent gas scrubber and a method of scrubbing effluent gases are provided. An inlet port receives an effluent gas. The gas passes through successive chambers in which it is sprayed with a scrubbing fluid. An oxidizer within the scrubbing fluid is effective to oxidize non-water soluble gases within the effluent gas. An oxidation-reduction potential probe measures the oxidation-reduction potential of the scrubbing fluid and adds the oxidizer to the scrubbing fluid as needed. A pH probe measures the pH of the scrubbing fluid and adds a base to the scrubbing fluid as needed to maintain the pH at or above a threshold such as pH 7, or pH 12.

摘要翻译： 提供废气洗涤器和洗涤废气的方法。 入口端口接收废气。 气体通过连续的室，其中用洗涤液喷射气体。 洗涤液中的氧化剂有效地氧化流出气体内的非水溶性气体。 氧化还原电位探针测量洗涤流体的氧化还原电位，并根据需要将氧化剂添加到洗涤液中。 pH探针测量洗涤液的pH值，并根据需要向洗涤液添加碱，以保持pH值等于或高于阈值，如pH 7或pH 12。

公开(公告)号：US07594957B2

公开(公告)日：2009-09-29

申请号：US11531292

申请日：2006-09-13

申请人： George E. McKedy

发明人： George E. McKedy

IPC分类号： B01J20/02

CPC分类号： B01D53/46 ,  A23L3/3436 ,  A23V2002/00 ,  B01D2253/106 ,  B01D2257/104 ,  Y10S95/90 ,  A23V2250/056 ,  A23V2250/1592

摘要： An oxygen-absorbing composition including iron and a soluble tartrate. A method of absorbing oxygen from a closed environment including the steps of providing an oxygen-absorbing composition containing iron and a tartrate, injecting water into the composition, and placing the composition into the closed environment. An oxygen-absorbing packet containing iron and a tartrate. All of the foregoing-mentioned compositions preferably include an electrolyte. The tartrates may be selected from the group which may include solium acid tartrate, potassium acid tartrate, potassium sodium tartrate tetrahydrate and sodium tartrate dihydrate, but are not limited thereto.

摘要翻译： 包含铁和可溶性酒石酸盐的氧吸收组合物。 一种从封闭环境吸收氧气的方法，包括提供含铁和酒石酸盐的氧吸收组合物，将水注入组合物中，并将组合物置于封闭环境中的步骤。 含铁和酒石酸盐的吸氧包。 所有上述组合物优选包括电解质。 酒石酸盐可以选自可以包括酒石酸钠，酒石酸钾，酒石酸钾钠四水合物和酒石酸钠二水合物的组，但不限于此。

公开(公告)号：US20090232713A1

公开(公告)日：2009-09-17

申请号：US12476597

申请日：2009-06-02

申请人： Tetsuya KUME ,  Yasuyuki HIGAONNA ,  Kazuaki YANAGI

发明人： Tetsuya KUME ,  Yasuyuki HIGAONNA ,  Kazuaki YANAGI

IPC分类号： B01D53/34

CPC分类号： B01D53/77 ,  B01D53/42 ,  B01D53/46 ,  B01D53/76 ,  B01D2257/00 ,  B01D2258/02

摘要： Disclosed is an apparatus for processing an exhaust gas containing an alkaline substance, the exhaust gas being emitted when activating a carbon material with an alkaline substance. The apparatus includes a humidified-gas preparing device for preparing a humidified gas, which exhibits a dew point of 25° C. or more; a gas mixing device for mixing the humidified gas with the exhaust gas at a temperature equal to or greater than the dewpoint of the humidified gas, thereby generating a hydroxide of metallic alkali; and a trapping device for trapping the generated hydroxide out of the mixture gas of the humidified gas and the exhaust gas.

摘要翻译： 公开了一种用于处理含有碱性物质的排气的装置，当用碱性物质活化碳材料时排出废气。 该装置包括一个加湿气体制备装置，用于制备露点为25℃或更高的加湿气体; 气体混合装置，用于在加湿气体的露点以上的温度下混合加湿气体和排气，从而产生金属碱的氢氧化物; 以及用于将生成的氢氧化物从加湿气体和废气的混合气体中捕获的捕集装置。

公开(公告)号：US20090047187A1

公开(公告)日：2009-02-19

申请号：US12162092

申请日：2007-01-16

申请人： Katsumasa Suzuki ,  Masaya Yamawaki ,  Takayuki Sato

发明人： Katsumasa Suzuki ,  Masaya Yamawaki ,  Takayuki Sato

IPC分类号： B01D53/68 ,  G05B21/00

CPC分类号： B01D53/46 ,  B01D53/323 ,  B01D53/346 ,  B01D2258/0216 ,  B01D2259/818

摘要： An exhaust gas treatment system, which comprises: an arithmetic processing part wherein the type of gas, the flow rate and the supply time of a gas supplied to a gas-using facility are inputted as parameters, and the type of gas, the flow rate and the supply time of an additive gas is calculated based on these parameters; an additive gas supply part, which supplies an additive gas while controlling the type of gas, the flow rate and the supply time of the additive gas in accordance with indication signals sent from the arithmetic processing part; and a removal part wherein the additive gas is added to an exhaust gas exhausted from the gas-using facility, and a target compound included in the exhaust gas is removed by reacting the additive gas and the target compound included in the exhaust gas.

摘要翻译： 一种废气处理系统，包括：运算处理部，其输入供给到气体使用设备的气体的气体类型，流量和供给时间作为参数，并且气体的种类，流量 并根据这些参数计算添加气体的供给时间; 添加气体供给部，其根据从运算处理部发送的指示信号，控制添加气体的种类，流量和供给时间，供给添加气体; 以及将添加气体添加到从气体使用设备排出的排气中的除去部，通过使添加气体和废气中包含的目标化合物反应来除去废气中包含的目标化合物。

公开(公告)号：US20080134890A1

公开(公告)日：2008-06-12

申请号：US11982725

申请日：2007-11-02

申请人： Dietmar Lundszien ,  Franz Irsigler ,  Peter Lechner

发明人： Dietmar Lundszien ,  Franz Irsigler ,  Peter Lechner

IPC分类号： B01D47/00

CPC分类号： F23G7/06 ,  B01D53/46 ,  B01D53/68 ,  B01D53/77 ,  B01D2257/204 ,  B01D2257/30 ,  B01D2258/0216 ,  C23C16/24 ,  C23C16/4405 ,  C23C16/4412 ,  F23G2209/142 ,  F23J15/006 ,  Y02C20/30

摘要： A plant for producing silicon thin-film solar cells has at least one chamber (1) in which the silicon thin-film is deposited from silicon hydride gas during the production process. The chamber (1) is subsequently cleaned of contaminants by an etching process e.g. with sulfur hexafluoride as the etchant gas. The waste gas formed during the production process and containing silicon hydride is supplied to a burner (6) and subsequently filtered. The waste gas formed during the etching process and containing sulfur hexafluoride is washed with water after having been supplied to a burner. The hydrofluoric acid formed by burning of the sulfur hexafluoride is separated from the washing water.

摘要翻译： 用于制造硅薄膜太阳能电池的设备具有至少一个室（1），在制造过程中硅沉积硅薄膜。 随后通过蚀刻工艺（1）清洁腔室（1）。 用六氟化硫作为蚀刻剂气体。 在生产过程中形成并含有氢化硅的废气被提供给燃烧器（6）并随后被过滤。 在蚀刻过程中形成的并含有六氟化硫的废气在被供应到燃烧器之后用水洗涤。 通过燃烧六氟化硫形成的氢氟酸与洗涤水分离。

公开(公告)号：US07258725B2

公开(公告)日：2007-08-21

申请号：US10497311

申请日：2002-12-04

申请人： Tadahiro Ohmi ,  Yoshio Ishihara ,  Akihiro Nakamura

发明人： Tadahiro Ohmi ,  Yoshio Ishihara ,  Akihiro Nakamura

IPC分类号： B01D53/00

CPC分类号： C01B23/0052 ,  B01D53/46 ,  B01D53/68 ,  B01D53/70 ,  B01D53/74 ,  B01D2257/11 ,  B01D2257/2066 ,  C01B23/001 ,  C01B2210/0029 ,  C01B2210/0035 ,  C01B2210/0042 ,  Y02P20/154

摘要： Gas supplying method and system in which effective component gas in exhaust gas can be separated and purified efficiently to be resupplied regardless of variation in the flow rate or composition of the exhaust gas and consumed gas can be replenished efficiently. In a method for collecting exhaust gas discharged from a gas using facility, separating/purifying effective component gas contained in the exhaust gas and supplying the effective component gas thus obtained to the gas using facility, the exhaust gas discharged from the gas using facility is added with a replenishing gas of the same components as the effective component gas before the effective component gas is separated and purified.

摘要翻译： 可以有效地补充排气中的有效成分气体能够有效地分离和净化而被补充的气体供给方法和系统，而不管排气和消耗气体的流量或组成如何变化。 在从气体使用设备中排出的废气的收集方法中，分离/净化排气中含有的有效成分气体并将由此获得的有效成分气体供给到气体使用设备中，从气体使用设备排出的排气被添加 在有效成分气体被分离和纯化之前，补充与有效成分气体相同成分的气体。

公开(公告)号：US07252858B2

公开(公告)日：2007-08-07

申请号：US10780341

申请日：2004-02-17

申请人： Kurt A. Carlsen

发明人： Kurt A. Carlsen

IPC分类号： C23C16/00

CPC分类号： B01D53/46 ,  C23C16/4412

摘要： A system and method for abating a simultaneous flow of silane and arsine contained in an exhaust gas of DRAM processing chamber (12). The system includes a CVD abatement apparatus (20) and a resin-type absorber (22). The CVD abatement apparatus comprises an enclosure (24) that defines a chamber (26) for receiving the exhaust gas. The enclosure contains a plurality of removable substrates (32) arranged as a series of baffles inside the enclosure. As the exhaust gas flows through the CVD abatement apparatus, the silicon within the silane is deposited as a film upon the substrates by chemical vapor deposition. The arsine continues to flow through the CVD apparatus to the absorber where it is adsorbed by the resin contained therein. After the film has reached a particular thickness, the substrates can be removed from the enclosure, cleaned of the film and returned to the enclosure for further use.

摘要翻译： 一种用于减轻DRAM处理室（12）的废气中所含的硅烷和胂的同时流动的系统和方法。 该系统包括CVD消除装置（20）和树脂型吸收器（22）。 CVD消除装置包括限定用于接收废气的室（26）的外壳（24）。 外壳包含多个可移除的基板（32），其被布置为外壳内的一系列挡板。 当废气流过CVD消除装置时，通过化学气相沉积将硅烷内的硅作为膜沉积在基板上。 胂继续通过CVD装置流到吸收器，在其中被其中所含的树脂吸附。 在膜已经达到特定厚度之后，可以将基板从外壳中取出，清除胶片并返回外壳进一步使用。

公开(公告)号：US20060062708A1

公开(公告)日：2006-03-23

申请号：US10943723

申请日：2004-09-17

申请人： Glen Pettibone

发明人： Glen Pettibone

IPC分类号： B01D53/64 ,  B01D53/46 ,  C23C16/00

CPC分类号： C23C16/4412 ,  B01D53/46 ,  B01D53/64 ,  B01D2251/106 ,  B01D2258/0216 ,  C23C16/4405

摘要： A method and apparatus for reducing the level of metal hydride found in effluent of a process chamber is disclosed. The method includes introducing hydrogen peroxide into the process chamber to react with metal hydride and reduce the level of metal hydride to a level under a permissible exposure limit. Additionally, an apparatus having a process chamber and a vaporizing device for introducing hydrogen peroxide into the process chamber is disclosed.

摘要翻译： 公开了一种用于降低在处理室的流出物中发现的金属氢化物的水平的方法和装置。 该方法包括将过氧化氢引入处理室以与金属氢化物反应，并将金属氢化物的水平降低到允许的暴露极限下的水平。 另外，公开了具有处理室和用于将过氧化氢引入处理室的蒸发装置的装置。

公开(公告)号：US20060002830A1

公开(公告)日：2006-01-05

申请号：US11217780

申请日：2005-09-01

申请人： Lee Tong ,  Chong Chee

发明人： Lee Tong ,  Chong Chee

IPC分类号： B01D50/00

CPC分类号： B01D53/78 ,  B01D53/46

摘要： A new method of silane abatement is achieved. The novel silane abatement system comprises a water-filled chamber within an outer chamber. An air intake is located in one upper portion of said outer chamber and an exhaust output is located in another upper portion of the outer chamber. A silane gas intake pipe runs into the outer chamber and has its output under water in the water-filled chamber. A drain is connected through a valve at a bottom portion of the water-filled chamber. Many safety features are built into the wet abatement system, including temperature and water level sensors, water sprinklers, and means for shutting off air supply, exhaust, and silane intake. Waste silane gas is bubbled into a water-filled chamber. The waste silane gas is reacted with oxygen in water in the water-filled chamber whereby SiO2 precipitates are formed and wherein the SiO2 precipitates settle to a bottom surface of the water-filled chamber. The SiO2 precipitates are drained out of the water-filled chamber to complete the abatement process.

摘要翻译： 实现了硅烷消除的新方法。 新型硅烷消除系统包括在外室内的充水室。 进气口位于所述外室的一个上部，排气口位于外室的另一上部。 硅烷气体进入管进入外部室，并且在充满水的室中具有在水下的输出。 排水口通过充水室底部的阀连接。 湿度减轻系统中包含许多安全功能，包括温度和水位传感器，喷水灭火器以及关闭供气，排气和硅烷进气的方法。 废硅烷气体鼓泡入充水室。 废水硅烷气体与填充水的室内的水中的氧气反应，由此形成SiO 2沉淀，其中SiO 2沉淀物沉淀到水的底部表面 填充室。 将SiO 2 H 2·沉淀物从充满水的室排出以完成减排过程。