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39 条记录 (耗时 0.038 秒)

    Method for forming a reduced active area in a phase change memory structure
    21.
    发明授权
    Method for forming a reduced active area in a phase change memory structure 有权
    在相变存储器结构中形成减小的有效面积的方法

    公开(公告)号：US08153471B2

    公开(公告)日：2012-04-10

    申请号：US12945860

    申请日：2010-11-14

    申请人： Li-Shyue Lai ,  Chao-Hsiung Wang ,  Denny Tang ,  Wen-Chin Lin

    发明人： Li-Shyue Lai ,  Chao-Hsiung Wang ,  Denny Tang ,  Wen-Chin Lin

    IPC分类号： H01L21/06

    CPC分类号： H01L45/06 ,  H01L45/1233 ,  H01L45/124 ,  H01L45/1273 ,  H01L45/144 ,  H01L45/1691

    摘要： A phase change memory structure and method for forming the same, the method including providing a substrate comprising a conductive area; forming a spacer having a partially exposed sidewall region at an upper portion of the spacer defining a phase change memory element contact area; and, wherein the spacer bottom portion partially overlaps the conductive area. Both these two methods can reduce active area of a phase change memory element, therefore, reducing a required phase changing electrical current.

    摘要翻译： 一种相变存储器结构及其形成方法，所述方法包括提供包括导电区域的衬底; 在间隔物的上部形成具有部分暴露的侧壁区域的间隔物，其限定相变存储元件接触区域; 并且其中所述间隔件底部部分与所述导电区域重叠。 这两种方法都可以减少相变存储元件的有效面积，从而减少所需的相变电流。

    MRAM arrays and methods for writing and reading magnetic memory devices
    23.
    发明申请
    MRAM arrays and methods for writing and reading magnetic memory devices 有权
    MRAM阵列和写入和读取磁存储器件的方法

    公开(公告)号：US20070091672A1

    公开(公告)日：2007-04-26

    申请号：US11610739

    申请日：2006-12-14

    申请人： Wen-Chin Lin ,  Denny Tang ,  Li-Shyue Lai ,  Chao-Hsiung Wang ,  Fan-Shi Lai

    发明人： Wen-Chin Lin ,  Denny Tang ,  Li-Shyue Lai ,  Chao-Hsiung Wang ,  Fan-Shi Lai

    IPC分类号： G11C11/00

    CPC分类号： G11C11/1673

    摘要： A non-destructive technique and related array for writing and reading magnetic memory cells, including sampling a first signal of a selected read line corresponding to select memory cells, applying a magnetic field to the select memory cells, sampling a second signal of the selected read line, and comparing the first and second signals to determine a logic state of the select memory cells.

    摘要翻译： 一种用于写入和读取磁存储单元的非破坏性技术和相关阵列，包括对与选择存储器单元相对应的所选读取行的第一信号进行采样，向选择存储单元施加磁场，对所选择的读取的第二信号 并且比较第一和第二信号以确定选择存储器单元的逻辑状态。

    Interdigitated capacitor and method for fabrication thereof
    24.
    发明授权
    Interdigitated capacitor and method for fabrication thereof 有权
    交叉电容器及其制造方法

    公开(公告)号：US07035083B2

    公开(公告)日：2006-04-25

    申请号：US10804899

    申请日：2004-03-19

    申请人： Wen-Chin Lin ,  Denny Tang ,  Li-Shyue Lai ,  Chung-Long Chang ,  Chun-Hon Chen

    发明人： Wen-Chin Lin ,  Denny Tang ,  Li-Shyue Lai ,  Chung-Long Chang ,  Chun-Hon Chen

    IPC分类号： H01G4/06

    CPC分类号： H01L23/5223 ,  H01L2924/0002 ,  H01L2924/00

    摘要： A capacitor for use within a microelectronic product employs a first capacitor plate layer that includes a first series of horizontally separated and interconnected tines. A capacitor dielectric layer separates the first capacitor plate layer from a second capacitor plate layer. The second capacitor plate layer includes a second series of horizontally separated and interconnected tines horizontally interdigitated with the first series of horizontally separated and interconnected tines. The capacitor is formed employing a self-aligned method and the capacitor dielectric layer is formed in a serpentine shape.

    摘要翻译： 在微电子产品中使用的电容器采用第一电容器板层，其包括第一系列水平分离和互连的尖齿。 电容器电介质层将第一电容器板层与第二电容器板层分开。 第二电容器板层包括与第一系列水平分离和互相联接的齿水平地交叉指向的第二系列水平分离和互连的齿。 使用自对准方法形成电容器，并且电容器介电层形成为蛇形形状。

    System and method for passing high energy particles through a mask
    25.
    发明申请
    System and method for passing high energy particles through a mask 有权
    将高能粒子通过掩模的系统和方法

    公开(公告)号：US20050077485A1

    公开(公告)日：2005-04-14

    申请号：US10681541

    申请日：2003-10-08

    申请人： Chao-Hsiung Wang ,  Denny Tang ,  Wen-Chin Lin ,  Li-Shyue Lai

    发明人： Chao-Hsiung Wang ,  Denny Tang ,  Wen-Chin Lin ,  Li-Shyue Lai

    IPC分类号： G21G5/00 ,  H01L21/027

    CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00

    摘要： A method and system is disclosed for concentrating high energy particles on a predetermined area on a target semiconductor substrate. A high energy source for generating a predetermined amount of high energy particles, and an electromagnetic radiation source for generating low energy beams are used together. The system also uses a mask set having at least one mask with at least one alignment area and at least one mask target area thereon, the mask target area passing more high energy particles then any other area of the mask. At least one protection shield is incorporated in the system for protecting the alignment area from being exposed to the high energy particles, wherein the mask is aligned with the predetermined target semiconductor substrate by passing the low energy beams through the alignment area, wherein the high energy particles generated by the high energy source pass through the mask target area to land on the predetermined area on the target semiconductor substrate.

    摘要翻译： 公开了一种用于将高能粒子集中在目标半导体衬底上的预定区域上的方法和系统。 用于产生预定量的高能粒子的高能量源和用于产生低能量束的电磁辐射源一起使用。 该系统还使用具有至少一个具有至少一个对准区域和至少一个掩模目标区域的掩模的掩模组，掩模目标区域通过更多的高能粒子，然后通过掩模的任何其它区域。 至少一个保护屏蔽被并入系统中，用于保护对准区域不暴露于高能粒子，其中通过使低能量束通过对准区域，掩模与预定目标半导体衬底对齐，其中高能量 由高能量源产生的粒子通过掩模对象区域落在目标半导体衬底上的预定区域上。

    METHOD FOR FORMING A REDUCED ACTIVE AREA IN A PHASE CHANGE MEMORY STRUCTURE
    26.
    发明申请
    METHOD FOR FORMING A REDUCED ACTIVE AREA IN A PHASE CHANGE MEMORY STRUCTURE 有权
    在相变存储器结构中形成减少的活动区域的方法

    公开(公告)号：US20110059590A1

    公开(公告)日：2011-03-10

    申请号：US12945860

    申请日：2010-11-14

    申请人： Li-Shyue Lai ,  Chao-Hsiung Wang ,  Denny Tang ,  Wen-Chin Lin

    发明人： Li-Shyue Lai ,  Chao-Hsiung Wang ,  Denny Tang ,  Wen-Chin Lin

    IPC分类号： H01L21/02

    CPC分类号： H01L45/06 ,  H01L45/1233 ,  H01L45/124 ,  H01L45/1273 ,  H01L45/144 ,  H01L45/1691

    摘要： A phase change memory structure and method for forming the same, the method including providing a substrate comprising a conductive area; forming a spacer having a partially exposed sidewall region at an upper portion of the spacer defining a phase change memory element contact area; and, wherein the spacer bottom portion partially overlaps the conductive area. Both these two methods can reduce active area of a phase change memory element, therefore, reducing a required phase changing electrical current.

    摘要翻译： 一种相变存储器结构及其形成方法，所述方法包括提供包括导电区域的衬底; 在间隔物的上部形成具有部分暴露的侧壁区域的间隔物，其限定相变存储元件接触区域; 并且其中所述间隔件底部部分与所述导电区域重叠。 这两种方法都可以减少相变存储元件的有效面积，从而减少所需的相变电流。

    Reduced active area in a phase change memory structure
    27.
    发明授权
    Reduced active area in a phase change memory structure 有权
    在相变存储器结构中减少有效面积

    公开(公告)号：US07858980B2

    公开(公告)日：2010-12-28

    申请号：US10791607

    申请日：2004-03-01

    申请人： Li-Shyue Lai ,  Chao-Hsiung Wang ,  Denny Tang ,  Wen-Chin Lin

    发明人： Li-Shyue Lai ,  Chao-Hsiung Wang ,  Denny Tang ,  Wen-Chin Lin

    IPC分类号： H01L29/18

    CPC分类号： H01L45/06 ,  H01L45/1233 ,  H01L45/124 ,  H01L45/1273 ,  H01L45/144 ,  H01L45/1691

    摘要： A phase change memory structure and method for forming the same, the method including providing a substrate comprising a conductive area; forming a spacer having a partially exposed sidewall region at an upper portion of the spacer defining a phase change memory element contact area; and, wherein the spacer bottom portion partially overlaps the conductive area. Both these two methods can reduce active area of a phase change memory element, therefore, reducing a required phase changing electrical current.

    摘要翻译： 一种相变存储器结构及其形成方法，所述方法包括提供包括导电区域的衬底; 在间隔物的上部形成具有部分暴露的侧壁区域的间隔物，其限定相变存储元件接触区域; 并且其中所述间隔件底部部分与所述导电区域重叠。 这两种方法都可以减少相变存储元件的有效面积，从而减少所需的相变电流。

    Multiple-Gate Transistors with Reverse T-Shaped Fins
    28.
    发明申请
    Multiple-Gate Transistors with Reverse T-Shaped Fins 有权
    具有反向T形鳍的多栅极晶体管

    公开(公告)号：US20100163842A1

    公开(公告)日：2010-07-01

    申请号：US12345332

    申请日：2008-12-29

    申请人： Li-Shyue Lai ,  Jing-Cheng Lin

    发明人： Li-Shyue Lai ,  Jing-Cheng Lin

    IPC分类号： H01L29/15 ,  H01L21/20

    CPC分类号： H01L29/785 ,  H01L29/1054 ,  H01L29/165 ,  H01L29/66795

    摘要： A method of forming an integrated circuit structure includes forming a first insulation region and a second insulation region in a semiconductor substrate and facing each other; and forming an epitaxial semiconductor region having a reversed T-shape. The epitaxial semiconductor region includes a horizontal plate including a bottom portion between and adjoining the first insulation region and the second insulation region, and a fin over and adjoining the horizontal plate. The bottom of the horizontal plate contacts the semiconductor substrate. The method further includes forming a gate dielectric on a top surface and at least top portions of sidewalls of the fin; and forming a gate electrode over the gate dielectric.

    摘要翻译： 形成集成电路结构的方法包括：在半导体衬底中形成第一绝缘区域和第二绝缘区域并彼此面对; 以及形成具有反向T形的外延半导体区域。 外延半导体区域包括水平板，该水平板包括在第一绝缘区域和第二绝缘区域之间并邻接第一绝缘区域之间的底部，以及在水平板上并邻接的鳍状物。 水平板的底部接触半导体衬底。 该方法还包括在鳍的顶表面和至少顶部的顶部形成栅电介质; 以及在所述栅极电介质上形成栅电极。