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公开(公告)号:US20160343575A1
公开(公告)日:2016-11-24
申请号:US15099945
申请日:2016-04-15
Applicant: Samsung Electronics Co., Ltd.
Inventor: Shigenobu MAEDA , Jeong Ju Park , Eunsung Kim , Hyunwoo Kim , Shiyong Yi
IPC: H01L21/308 , H01L21/3213 , H01L21/311
CPC classification number: H01L21/3086 , H01L21/0337 , H01L21/31144 , H01L21/32139
Abstract: A method includes forming mask patterns spaced apart from each other by at least one opening on an etch target layer, filling the opening with a block copolymer material including first and second polymer blocks of different properties, and annealing the block copolymer material to form first patterns and second patterns, the first patterns in contact with facing sidewalls of adjacent ones of the mask patterns, respectively, and at least one of the second patterns between the first patterns. The first patterns include the first polymer blocks and the second patterns include the second polymer blocks.
Abstract translation: 一种方法包括形成通过蚀刻目标层上的至少一个开口彼此间隔开的掩模图案,用包含不同性质的第一和第二聚合物嵌段的嵌段共聚物材料填充该开口,并退火嵌段共聚物材料以形成第一图案 和第二图案,分别与相邻的掩模图案的面对的侧壁接触的第一图案以及第一图案之间的至少一个第二图案。 第一图案包括第一聚合物嵌段,第二图案包括第二聚合物嵌段。
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公开(公告)号:US12181799B2
公开(公告)日:2024-12-31
申请号:US16947515
申请日:2020-08-05
Applicant: Samsung Electronics Co., Ltd.
Inventor: Thanh Cuong Nguyen , Daekeon Kim , Tsunehiro Nishi , Naoto Umezawa , Hyunwoo Kim
IPC: G03F7/004 , C07C25/13 , G03F7/038 , G03F7/039 , H01L21/027
Abstract: Disclosed are resist compositions and semiconductor device fabrication methods wing the same. The resist composition comprises a hypervalent iodine compound of Chemical Formula 1 below. Wherein R1 to R7 are as defined herein.
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公开(公告)号:US12041336B2
公开(公告)日:2024-07-16
申请号:US17961131
申请日:2022-10-06
Applicant: Samsung Electronics Co., Ltd.
Inventor: Hyunwoo Kim , Hyunseok Hong
IPC: H04N23/61 , H04N23/51 , H04N23/67 , H04N23/957
CPC classification number: H04N23/61 , H04N23/51 , H04N23/671 , H04N23/957
Abstract: A sensor assembly is provided. The sensor assembly includes a housing including an opening, a circuit substrate disposed in the inside of the housing, an image sensor electrically connected to the circuit substrate, a light-control member configured to change light transmittance from a light transmission state capable of transmitting external light to a light reflection state capable of reflecting light according to application of power, and a contact member disposed adjacent to the opening and allowing light to pass therethrough. wherein, when viewed from a lateral side, the light-control member is disposed such that a longitudinal extension line of the light-control member and a longitudinal extension line of the contact member may form a predetermined angle therebetween, when the light-control member is in the light transmission state, the image sensor is disposed to obtain an image over the light-control member, and when the light-control member is in the light reflection state, the image sensor is disposed to receive light reflected by the light-control member and light directly incident through the contact member.
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公开(公告)号:US11982940B2
公开(公告)日:2024-05-14
申请号:US18313555
申请日:2023-05-08
Applicant: Samsung Electronics Co., Ltd.
Inventor: Eunkyung Lee , Sumin Kim , Hyunwoo Kim , Juhyeon Park , Giyoung Song , Sukkoo Hong , Yoonhyun Kwak , Youngmin Nam , Byunghee Sohn , Sunyoung Lee , Aram Jeon , Sungwon Choi
IPC: G03F7/004 , C07C309/12 , C07C381/12 , C07D333/76 , G03F7/038 , G03F7/039
CPC classification number: G03F7/0045 , C07C309/12 , C07C381/12 , C07D333/76 , G03F7/038 , G03F7/039 , C07C2603/74
Abstract: Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1:
wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.-
公开(公告)号:US20230400764A1
公开(公告)日:2023-12-14
申请号:US18120248
申请日:2023-03-10
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jin-Kyun Lee , Chawon Koh , Ye-Jin Ku , Tsunehiro Nishi , Hyunwoo Kim , Hyung-Ju Ahn
CPC classification number: G03F7/0042 , C07F7/2224 , G03F7/168
Abstract: A resist material is combined with a ligand containing four or more fluorine atoms and is represented by the following formula: [(R1M)iOjXk(OH)m] (OH)nR2p, wherein one of “R1” and “R2” is CaFbHc, CaFbHcNd, CaFbHcPd, CaFbHcSd, CaFbHcOd, CaFbHcNdSe, CaFbHcPdSe, CaFbHcNdOe, or CaFbHcPdOe, the other of “R1” and “R2” is CaHc, CaFbHc, CaFbHcNd, CaFbHcPd, CaFbHcSd, CaFbHcOd, CaFbHcNdSe, CaFbHcPdSe, CaFbHcNdOe, or CaFbHcPdOe, “a” and “c” are each independently an integer of 0 to 20, “b” is an integer of 4 to 30, “d” and “e” are each independently an integer of 0 to 5, “M” is one metal selected from a specified list, “i” is an integer from 1 to 12, “j” is an integer of 1 to 14, “X” is a halogen selected from a specified list, “k” and “m” are each independently an integer of 0 to 6, and “n” and “p” are each independently an integer of 0 to 2.
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公开(公告)号:US11662662B2
公开(公告)日:2023-05-30
申请号:US16994957
申请日:2020-08-17
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Hyunji Song , Sukkoo Hong , Sumin Kim , Yechan Kim , Juyoung Kim , Jinjoo Kim , Hyunwoo Kim , Juhyeon Park , Songse Yi
IPC: G03F7/004 , G03F7/039 , C07D213/68 , C07D263/32 , C07D233/64 , C07D277/26
CPC classification number: G03F7/0045 , C07D213/68 , C07D233/64 , C07D263/32 , C07D277/26 , G03F7/0392
Abstract: A photo-decomposable compound, a photoresist composition, and a method of manufacturing an IC device, the compound generating acid upon exposure and acts as a quenching base that neutralizes acid in an unexposed state and being represented by Formula 1:
wherein, in Formula 1, Ra is a C5 to C40 substituted or unsubstituted cyclic hydrocarbon group including at least one nitrogen atom, Ya is a C1 to C20 divalent linear or cyclic hydrocarbon group, n is an integer of 1 to 5, and A+ is a counter ion.-
27.
公开(公告)号:US11215927B2
公开(公告)日:2022-01-04
申请号:US16243548
申请日:2019-01-09
Applicant: SAMSUNG ELECTRONICS CO., LTD. , NISSAN CHEMICAL CORPORATION
Inventor: Ju-Young Kim , Hyunwoo Kim , Makoto Nakajima , Satoshi Takeda , Shuhei Shigaki , Wataru Shibayama
Abstract: Provided is a substrate treating composition. The substrate treating composition includes a first monomer, a second monomer and an acid. The first monomer is represented by Formula 1 and the second monomer is represented by Formula 7. The molecular weight of the solid content of the substrate treating composition including the first monomer, the second monomer and the acid is from about 1,000 g/mol to about 50,000 g/mol. X—Si(R1)2(R2) [Formula 1] Y—Si(R3)3 [Formula 7]
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公开(公告)号:US10567545B2
公开(公告)日:2020-02-18
申请号:US14583089
申请日:2014-12-24
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jungyoon Cha , Hyunwoo Kim , Heonyong Lee
Abstract: A method of sharing a data quota in an electronic device includes grouping the electronic device and at least one other electronic device for sharing the data quota, selecting a sharing electronic device among the at least one other electronic device, through which to download data from a server, and receiving the download. Other embodiments including a server and an apparatus for sharing a data quota between electronic are also disclosed.
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29.
公开(公告)号:US10353290B2
公开(公告)日:2019-07-16
申请号:US15183541
申请日:2016-06-15
Applicant: Samsung Electronics Co., Ltd.
Inventor: Cheol Hong Park , Chawon Koh , Hyunwoo Kim , Sang-Yoon Woo , Hyejin Jeon
Abstract: The disclosed embodiments provide a photoresist composition for extreme ultraviolet (EUV) and a method of forming a photoresist pattern using the same. The photoresist composition includes an out-of-band (OOB) absorbing material absorbing light of a wavelength of 100 nm to 300 nm.
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公开(公告)号:US12133080B2
公开(公告)日:2024-10-29
申请号:US17949711
申请日:2022-09-21
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jungil Cho , Soonhong Kwon , Hyunwoo Kim , Minkyu Song , Jongsung Lee , Joonghwan Lee , Yongsu Chung , Daesung Choi
IPC: G06F21/00 , H04W12/02 , H04W12/122 , H04W12/61 , H04W12/73
CPC classification number: H04W12/122 , H04W12/02 , H04W12/61 , H04W12/73
Abstract: A method of identifying a malicious access point (AP) by a terminal apparatus includes obtaining first performance information related to hardware of a first AP based on a first beacon signal received from the first AP, comparing the first performance information with previously stored second performance information of a second AP, and determining whether the first AP is a malicious AP, based on a result of the comparing.
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