公开(公告)号：US11662662B2

公开(公告)日：2023-05-30

申请号：US16994957

申请日：2020-08-17

申请人： SAMSUNG ELECTRONICS CO., LTD.

发明人： Hyunji Song ,  Sukkoo Hong ,  Sumin Kim ,  Yechan Kim ,  Juyoung Kim ,  Jinjoo Kim ,  Hyunwoo Kim ,  Juhyeon Park ,  Songse Yi

IPC分类号： G03F7/004 ,  G03F7/039 ,  C07D213/68 ,  C07D263/32 ,  C07D233/64 ,  C07D277/26

CPC分类号： G03F7/0045 ,  C07D213/68 ,  C07D233/64 ,  C07D263/32 ,  C07D277/26 ,  G03F7/0392

摘要： A photo-decomposable compound, a photoresist composition, and a method of manufacturing an IC device, the compound generating acid upon exposure and acts as a quenching base that neutralizes acid in an unexposed state and being represented by Formula 1:






wherein, in Formula 1, Ra is a C5 to C40 substituted or unsubstituted cyclic hydrocarbon group including at least one nitrogen atom, Ya is a C1 to C20 divalent linear or cyclic hydrocarbon group, n is an integer of 1 to 5, and A+ is a counter ion.

公开(公告)号：US11681219B2

公开(公告)日：2023-06-20

申请号：US16991281

申请日：2020-08-12

申请人： SAMSUNG ELECTRONICS CO., LTD.

发明人： Yechan Kim ,  Su Min Kim ,  Ju-Young Kim ,  Jinjoo Kim ,  Hyunwoo Kim ,  Juhyeon Park ,  Hyunji Song ,  Songse Yi ,  Suk Koo Hong

IPC分类号： G03F7/004 ,  C08L35/00 ,  C07C381/12 ,  C08L25/06

CPC分类号： G03F7/0045 ,  C07C381/12 ,  C08L25/06 ,  C08L35/00

摘要： A resist composition including a polymer; and a compound represented by Formula 1,






in Formula 1, R1 is hydrogen, a halogen, an alkyl group having 1 to 7 carbon atoms, a carbonyl group having 1 to 7 carbon atoms, an ester group having 1 to 7 carbon atoms, an acetal group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, an ether group having 1 to 7 carbon atoms, or a group represented by Formula R, and R2, R3, R4 and R5 are hydrogen, a halogen, an alkyl group having 1 to 7 carbon atoms, an ester group having 1 to 7 carbon atoms, an acetal group having 1 to 7 carbon atoms, an alkoxy group having 1 to 7 carbon atoms, or an ether group having 1 to 7 carbon atoms,

公开(公告)号：US20230152694A1

公开(公告)日：2023-05-18

申请号：US18056332

申请日：2022-11-17

申请人： Samsung Electronics Co., Ltd.

发明人： HONGGU IM ,  Sumin Kim ,  Yechan Kim ,  Jinjoo Kim ,  Hyunwoo Kim ,  Sunghwan Park ,  Juhyeon Park ,  Jicheol Park ,  Giyoung Song ,  Sukkoo Hong

IPC分类号： G03F7/038

CPC分类号： G03F7/0384

摘要： Photoresist compositions may include a photosensitive polymer including a first repeating unit of Chemical Formula 1; a photoacid generator (PAG); and a solvent.