公开(公告)号：US20230152694A1

公开(公告)日：2023-05-18

申请号：US18056332

申请日：2022-11-17

Applicant: Samsung Electronics Co., Ltd.

Inventor： HONGGU IM ,  Sumin Kim ,  Yechan Kim ,  Jinjoo Kim ,  Hyunwoo Kim ,  Sunghwan Park ,  Juhyeon Park ,  Jicheol Park ,  Giyoung Song ,  Sukkoo Hong

IPC: G03F7/038

CPC classification number: G03F7/0384

Abstract: Photoresist compositions may include a photosensitive polymer including a first repeating unit of Chemical Formula 1; a photoacid generator (PAG); and a solvent.