DISPLAY PANEL AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20240074245A1

    公开(公告)日:2024-02-29

    申请号:US18454318

    申请日:2023-08-23

    Abstract: A display panel includes a base layer, a first lower electrode, a first sacrificial pattern layer defining a first lower opening exposing a portion of an upper surface of the first lower electrode, an insulating layer covering a portion of the first sacrificial pattern layer and defining a first emission opening overlapping the first lower opening, a conductive bank defining a first upper opening overlapping the first emission opening, a first emission pattern layer disposed inside the first lower opening, the first emission opening, and the first upper opening and on the first lower electrode, and a first upper electrode disposed on the first emission pattern layer and in contact with an inner surface of the conductive bank defining the first upper opening, and a thickness of the first emission pattern layer is greater than a sum of a thickness of the first sacrificial pattern layer and a thickness.

    DISPLAY DEVICE AND MANUFACTURING METHOD FOR THE SAME

    公开(公告)号:US20230240096A1

    公开(公告)日:2023-07-27

    申请号:US18069946

    申请日:2022-12-21

    Abstract: A display device includes a base layer, a circuit layer on the base layer, an auxiliary pixel defining layer disposed on the circuit layer and that includes a first opening adjacent to the circuit layer and a second opening above the first opening, an inorganic protective layer disposed on the auxiliary pixel defining layer and that includes a third opening above the second opening, a pixel defining layer disposed on the inorganic protective layer and that includes a fourth opening above the third opening, a light-emitting element disposed on the circuit layer and that includes a first electrode, a functional layer disposed on the first electrode, and a second electrode disposed on the functional layer, an auxiliary electrode layer that covers the pixel defining layer and the light-emitting element, and an inorganic layer disposed on the auxiliary electrode layer and that overlaps the pixel defining layer and the light-emitting element.

    MASK, METHOD OF PROVIDING THE SAME, AND METHOD OF PROVIDING DISPLAY PANEL USING MASK

    公开(公告)号:US20230160054A1

    公开(公告)日:2023-05-25

    申请号:US18158679

    申请日:2023-01-24

    CPC classification number: C23C14/042 B05C21/005 H10K71/00 H10K71/166

    Abstract: A mask assembly includes a mask frame in which a first opening is defined, the mask frame including a front surface through which the first opening extends, and a deposition mask which is attached to the front surface of the mask frame and through which a plurality of second openings is defined. The mask frame includes an in which the front surface extends along a direction of gravity, the deposition mask includes an initial mask which is attached to the front surface of the mask frame in the thereof and through which the plurality of second openings is defined, and the of the mask frame having the front surface which extends along the direction of gravity disposes the first opening of the mask frame corresponding to all of the plurality of second openings of the initial mask along the direction of gravity.

    DISPLAY DEVICE
    25.
    发明申请

    公开(公告)号:US20230122827A1

    公开(公告)日:2023-04-20

    申请号:US17886793

    申请日:2022-08-12

    Abstract: A display device includes a first region including a first light emitting element including a first electrode, a second region including a second light emitting element including a second electrode, a pixel defining layer including a first sidewall defining a first opening corresponding to the first electrode and a second sidewall defining a second opening corresponding to the second electrode, a first spacer which protrudes from the pixel defining layer in the first region and includes a first edge closest to the first opening, and a second spacer which protrudes from the pixel defining layer in the second region and includes a second edge closest to the second opening. A distance between the first sidewall and the first edge, is smaller than a distance between the second sidewall and the second edge.

    MASK CHUCK AND MASK MANUFACTURING APPARATUS INCLUDING SAME

    公开(公告)号:US20220179322A1

    公开(公告)日:2022-06-09

    申请号:US17677188

    申请日:2022-02-22

    Abstract: A mask chuck may include a base plate including a central region and an edge region surrounding the central region, a head part including a first surface connected to the edge region of the base plate and configured to move on the edge region to be close to the central region or away from the central region, and a pad part disposed on a second surface of the head part opposite to the first surface of the head part. The edge region may include a first edge region extending in a first direction, a second edge region extending in the first direction and spaced apart from the first edge region in a second direction crossing the first direction, a third edge region extending in the second direction, and a fourth edge region extending in the second direction and spaced apart from the third edge region in the first direction.

    MASK, METHOD OF PROVIDING THE SAME, AND METHOD OF PROVIDING DISPLAY PANEL USING MASK

    公开(公告)号:US20220064779A1

    公开(公告)日:2022-03-03

    申请号:US17324029

    申请日:2021-05-18

    Abstract: A mask assembly includes a mask frame in which a first opening is defined, the mask frame including a front surface through which the first opening extends, and a deposition mask which is attached to the front surface of the mask frame and through which a plurality of second openings is defined. The mask frame includes an in which the front surface extends along a direction of gravity, the deposition mask includes an initial mask which is attached to the front surface of the mask frame in the thereof and through which the plurality of second openings is defined, and the of the mask frame having the front surface which extends along the direction of gravity disposes the first opening of the mask frame corresponding to all of the plurality of second openings of the initial mask along the direction of gravity.

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