公开(公告)号：US09953800B2

公开(公告)日：2018-04-24

申请号：US15137290

申请日：2016-04-25

Applicant: NuFlare Technology, Inc.

Inventor： Kei Hasegawa ,  Hayato Kimura ,  Hideo Inoue ,  Yoshiaki Onimaru

IPC: H01J37/304 ,  H01J37/04 ,  H01J37/317

CPC classification number: H01J37/045 ,  H01J37/3177 ,  H01J2237/2485 ,  H01J2237/31762

Abstract: According to one embodiment, in a multi-charged particle beam writing apparatus, a blanking plate includes a plurality of first buffers connected in series, second buffers in a plurality of stages connected in series between the first buffer and a blanker, and an error detection processing circuitry performing error detection on data stored in the first buffer and the second buffers. The blanking control data transfers to the corresponding blanker via the first buffer and the second buffers. In a case where the error detection processing circuitry detects an error, the control processing circuitry retransmits the blanking control data to the blanking plate with regard to a shot having the error detected therein and a shot which comes, in a shot order, after the shot having the error detected therein.

公开(公告)号：US09934935B2

公开(公告)日：2018-04-03

申请号：US15225969

申请日：2016-08-02

Applicant: NuFlare Technology, Inc.

Inventor： Ryoichi Yoshikawa ,  Hideo Inoue ,  Hayato Kimura ,  Yasuo Kato ,  Jun Yashima

IPC: H01J37/20 ,  H01J37/24 ,  H01J37/317

CPC classification number: H01J37/20 ,  H01J37/045 ,  H01J37/243 ,  H01J37/3026 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/20285 ,  H01J2237/20292 ,  H01J2237/30422 ,  H01J2237/30438 ,  H01J2237/31762 ,  H01J2237/31764

Abstract: A multi charged particle beam writing apparatus includes a maximum irradiation time acquisition processing circuitry to acquire, for each shot of multi-beams, a maximum irradiation time of irradiation time of each of the multi-beams, a unit region writing time calculation processing circuitry to calculate, using the maximum irradiation time for each shot, a unit region writing time by totalizing the maximum irradiation time of each shot of a plurality of times of shots of the multi-beams which irradiate a unit region concerned during stage moving, for each unit region of a plurality of unit regions obtained by dividing a writing region of a target object, a stage speed calculation processing circuitry to calculate speed of the stage for each unit region so that the stage speed becomes variable, by using the unit region writing time and a stage control processing circuitry to variably control the stage speed.

公开(公告)号：US09570267B2

公开(公告)日：2017-02-14

申请号：US14885726

申请日：2015-10-16

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi Matsumoto ,  Tomohiro Iijima ,  Munehiro Ogasawara ,  Hideo Inoue ,  Ryoichi Yoshikawa

IPC: A61N5/00 ,  H01J37/04 ,  H01J37/317

CPC classification number: H01J37/045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0432 ,  H01J2237/0435 ,  H01J2237/31771 ,  H01J2237/31774

Abstract: A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of individual blanking systems that respectively perform beam ON/OFF control of a corresponding beam in the multi-beams, and performing blanking control, in addition to the performing ON/OFF switching of the beam for the each beam by the individual blanking system, with respect to the each time irradiation of the irradiation of the plurality of times, so that the beam is in an ON state during an irradiation time corresponding to irradiation concerned, by using a common blanking system that collectively performs beam ON/OFF control for a whole of the multi-beams.

Abstract translation: 多带电粒子束写入方法包括：对于多束带电粒子束中的每个束，针对相关束的单个消隐系统，对于多个照射束的每次照射，执行光束的ON / OFF切换 次，通过使用多个单独的消隐系统，分别执行多光束中相应光束的光束ON / OFF控制，以及执行消隐控制，除了通过对每个光束的光束进行ON / OFF切换 单个消隐系统相对于每次照射多次照射，使得在对应于照射的照射时间期间光束处于ON状态，通过使用共同执行光束ON的公共消隐系统 / OFF控制整个多光束。