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    EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
    21.
    发明申请
    EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 有权
    极致超紫外光发生系统

    公开(公告)号：US20170027047A1

    公开(公告)日：2017-01-26

    申请号：US15284805

    申请日：2016-10-04

    Applicant: Gigaphoton Inc.

    Inventor： Tatsuya YANAGIDA ,  Osamu WAKABAYASHI

    IPC: H05G2/00 ,  H01S3/107 ,  H01S3/23 ,  H01S3/11 ,  H01S3/08 ,  H01S3/223

    CPC classification number: H05G2/008 ,  H01S3/005 ,  H01S3/0602 ,  H01S3/08054 ,  H01S3/107 ,  H01S3/1115 ,  H01S3/1611 ,  H01S3/1643 ,  H01S3/1673 ,  H01S3/2232 ,  H01S3/2308 ,  H01S3/2316 ,  H01S3/235 ,  H05G2/006

    Abstract: An extreme ultraviolet light (EUV) generation system is configured to improve conversion efficiency of energy of a laser system to EUV energy by improving the efficiency of plasma generation. The EUV generation system includes a target generation unit configured to output a target toward a plasma generation region in a chamber. The laser system is configured to generate a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that the target is irradiated with the first pre-pulse laser beam, the second pre-pulse laser beam, and the main pulse laser beam in this order. In addition, the EUV generation system includes a controller configured to control the laser system so that a fluence of the second pre-pulse laser beam is equal to or higher than 1 J/cm2 and equal to or lower than a fluence of the main pulse laser beam.

    Abstract translation: 远端紫外线（EUV）发生系统被配置为通过提高等离子体产生的效率来提高激光系统的能量对EUV能量的转换效率。 EUV生成系统包括被配置为将目标朝向室内的等离子体产生区域输出的目标生成单元。 激光系统被配置为产生第一预脉冲激光束，第二预脉冲激光束和主脉冲激光束，使得靶被第一预脉冲激光束照射，第二预脉冲激光 光束和主脉冲激光束。 此外，EUV生成系统包括：控制器，被配置为控制激光系统，使得第二预脉冲激光束的能量密度等于或高于1J / cm 2，并且等于或低于主脉冲的能量密度 激光束。

    EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
    23.
    发明申请
    EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 审中-公开
    极致超紫外光发生系统

    公开(公告)号：US20150102239A1

    公开(公告)日：2015-04-16

    申请号：US14578141

    申请日：2014-12-19

    Applicant: GIGAPHOTON INC.

    Inventor： Tatsuya YANAGIDA ,  Hakaru MIZOGUCHI ,  Osamu WAKABAYASHI

    IPC: H05G2/00

    CPC classification number: H05G2/008 ,  G03F7/70033 ,  H05G2/005

    Abstract: The extreme ultraviolet light generation system may be configured to irradiate a target with a first pulse laser beam and a second pulse laser beam to turn the target into plasma thereby generating extreme ultraviolet light. The system may include a chamber having at least one aperture configured to introduce the first pulse laser beam and the second pulse laser beam; a target supply device configured to supply the target to a predetermined region in the chamber; a first laser apparatus configured to output the first pulse laser beam with which the target in the chamber is to be irradiated, the first pulse laser beam having pulse duration less than 1 ns; and a second laser apparatus configured to output the second pulse laser beam with which the target which has been irradiated with the first pulse laser beam is to be further irradiated.

    Abstract translation: 远紫外线发生系统可以被配置为用第一脉冲激光束和第二脉冲激光束照射目标物，以将靶转化成等离子体，从而产生极紫外光。 该系统可以包括具有配置成引入第一脉冲激光束和第二脉冲激光束的至少一个孔的腔室; 目标供给装置，被配置为将所述目标物供给到所述室中的预定区域; 第一激光装置，被配置为输出要照射所述室中的靶的所述第一脉冲激光束，所述脉冲持续时间小于1ns的所述第一脉冲激光束; 以及第二激光装置，被配置为输出要被进一步照射已经被第一脉冲激光束照射的靶的第二脉冲激光束。

    EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT
    24.
    发明申请
    EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT 有权
    极光紫外线光源装置及产生极光紫外线灯的方法

    公开(公告)号：US20130284949A1

    公开(公告)日：2013-10-31

    申请号：US13846852

    申请日：2013-03-18

    Applicant: GIGAPHOTON INC.

    Inventor： Hiroshi KOMORI ,  Tatsuya YANAGIDA ,  Yoshifumi UENO ,  Akira SUMITANI ,  Akira ENDO ,  Tsukasa HORI

    IPC: G21K5/00

    CPC classification number: G21K5/00 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

    Abstract: An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the excited level of tin on a target material to ionize the target material. The ionized target material is extracted from the ionizer with a high voltage applied from an ion beam extractor, and accelerated and supplied to a plasma generation chamber. When driver laser beam is irradiated on the ionized target material, a plasma is generated, thereby emitting EUV radiation.

    Abstract translation: EUV（Extreme Ultra Violet）光源装置将离子发生器中的目标材料离子化，并将电离靶材材料提供到产生等离子体的点。 这减少了碎片的产生。 离子发生器同时将与激发的锡水平相对应的多个波长的激光束照射在目标材料上以电离目标材料。 电离目标材料从离子束提取器施加的高电压从电离器中提取，并被加速并提供给等离子体产生室。 当驱动激光束照射在电离靶材上时，产生等离子体，从而发射EUV辐射。

    EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
    25.
    发明申请
    EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 审中-公开

    公开(公告)号：US20200150543A1

    公开(公告)日：2020-05-14

    申请号：US16710208

    申请日：2019-12-11

    Applicant: Gigaphoton Inc.

    Inventor： Tatsuya YANAGIDA ,  Osamu WAKABAYASHI

    IPC: G03F7/20

    Abstract: An extreme ultraviolet light (EUV) generation system is configured to improve conversion efficiency of energy of a laser system to EUV energy by improving the efficiency of plasma generation. The EUV generation system includes a target generation unit configured to output a target toward a plasma generation region in a chamber. The laser system is configured to generate a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that the target is irradiated with the first pre-pulse laser beam, the second pre-pulse laser beam, and the main pulse laser beam in this order. In addition, the EUV generation system includes a controller configured to control the laser system so that a fluence of the second pre-pulse laser beam is equal to or higher than 1 J/cm2 and equal to or lower than a fluence of the main pulse laser beam.

    THOMSON SCATTERING MEASUREMENT SYSTEM AND EUV LIGHT GENERATION SYSTEM
    26.
    发明申请
    THOMSON SCATTERING MEASUREMENT SYSTEM AND EUV LIGHT GENERATION SYSTEM 审中-公开

    公开(公告)号：US20190293488A1

    公开(公告)日：2019-09-26

    申请号：US16435693

    申请日：2019-06-10

    Applicant: Gigaphoton Inc.

    Inventor： Kouichiro KOUGE ,  Tatsuya YANAGIDA

    IPC: G01J1/42 ,  G03F7/20 ,  G01J3/44 ,  G01J3/02 ,  H05G2/00

    Abstract: A Thomson scattering measurement system according to the present disclosure includes: a transfer optical system provided on an optical path of a slit light beam group generated by division through a slit array and configured to transfer the slit light beam group to a plurality of transfer image groups separated from each other; and a second slit provided on an optical path of light from the transfer image groups and configured to selectively allow light from a plurality of transfer images positioned on a straight line extending in a direction corresponding to a first direction to pass through the second slit, the transfer images corresponding to slit light beams at positions different from each other in a second direction in the slit light beam group among transfer images included in the transfer image groups.

    EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
    29.
    发明申请
    EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 有权
    极致超紫外光发生系统

    公开(公告)号：US20160073487A1

    公开(公告)日：2016-03-10

    申请号：US14945096

    申请日：2015-11-18

    Applicant: GIGAPHOTON INC.

    Inventor： Tatsuya YANAGIDA ,  Osamu WAKABAYASHI

    IPC: H05G2/00 ,  H01S3/06 ,  H01S3/11

    CPC classification number: H05G2/008 ,  H01S3/005 ,  H01S3/0602 ,  H01S3/08054 ,  H01S3/107 ,  H01S3/1115 ,  H01S3/1611 ,  H01S3/1643 ,  H01S3/1673 ,  H01S3/2232 ,  H01S3/2308 ,  H01S3/2316 ,  H01S3/235 ,  H05G2/006

    Abstract: An extreme ultraviolet light generation system includes a chamber; a target generation unit configured to output a target toward a plasma generation region in the chamber; a laser system configured to generate a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that the target is irradiated with the first pre-pulse laser beam, the second pre-pulse laser beam, and the main pulse laser beam in this order; and a controller configured to control the laser system so that a fluence of the second pre-pulse laser beam is equal to or higher than 1 J/cm2 and equal to or lower than a fluence of the main pulse laser beam.

    Abstract translation: 一种极紫外光发生系统包括一个室; 目标产生单元，被配置为将所述目标朝向所述室中的等离子体产生区域输出; 激光系统，其被配置为产生第一预脉冲激光束，第二预脉冲激光束和主脉冲激光束，使得靶被第一预脉冲激光束照射，第二预脉冲激光束 ，主脉冲激光束依次为 以及控制器，被配置为控制所述激光系统，使得所述第二预脉冲激光束的能量密度等于或高于1J / cm 2并且等于或低于所述主脉冲激光束的能量密度。

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