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    DROPLET DETECTOR AND EUV LIGHT GENERATION DEVICE
    1.
    发明申请
    DROPLET DETECTOR AND EUV LIGHT GENERATION DEVICE 审中-公开

    公开(公告)号：US20190150260A1

    公开(公告)日：2019-05-16

    申请号：US16244319

    申请日：2019-01-10

    Applicant: Gigaphoton Inc.

    Inventor： Tatsuya YANAGIDA

    IPC: H05G2/00 ,  G03F7/20 ,  H01S3/00

    Abstract: A droplet detector preferably includes: an application unit configured to emit a pulsed beam at a predetermined cycle and apply a plurality of pulsed beams to a droplet moving in a detection region on a trajectory; and a light receiving unit configured to receive a scattered pulsed beam that is generated from the plurality of pulsed beams applied to the droplet and scattered by the droplet.

    EXTREME ULTRAVIOLET LIGHT GENERATING APPARATUS
    2.
    发明申请
    EXTREME ULTRAVIOLET LIGHT GENERATING APPARATUS 审中-公开

    公开(公告)号：US20180255631A1

    公开(公告)日：2018-09-06

    申请号：US15972590

    申请日：2018-05-07

    Applicant: Gigaphoton Inc.

    Inventor： Tatsuya YANAGIDA

    IPC: H05G2/00 ,  G03F7/20

    Abstract: An extreme ultraviolet light generating apparatus includes a target supply unit configured to output a target toward a predetermined region, a laser system configured to output a first laser beam with which the target is irradiated, a second laser beam with which the target is irradiated after being irradiated with the first laser beam, and a third laser beam with which the target is irradiated after being irradiated with the second laser beam, and an optical system configured to cause an irradiation beam diameter of the second laser beam at the target to be larger than an irradiation beam diameter of the third laser beam at the target.

    SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT, AND LASER APPARATUS
    4.
    发明申请
    SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT, AND LASER APPARATUS 审中-公开
    用于产生极光紫外线灯和激光装置的系统和方法

    公开(公告)号：US20150351210A1

    公开(公告)日：2015-12-03

    申请号：US14821442

    申请日：2015-08-07

    Applicant: GIGAPHOTON, INC.

    Inventor： Tatsuya YANAGIDA ,  Osamu WAKABAYASHI

    IPC: H05G2/00 ,  H01S3/10

    CPC classification number: H01S3/10061 ,  H01S3/08054 ,  H01S3/08059 ,  H01S3/2308 ,  H01S3/2383 ,  H01S2301/20 ,  H05G2/003 ,  H05G2/008

    Abstract: An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.

    Abstract translation: 可以提供与激光装置一起使用的极紫外光发生系统，并且极紫外光发生系统可以包括：包括至少一个用于至少一个激光束的窗口的室，以及用于将目标材料供应到 房间 以及设置在激光束路径上的至少一个偏振控制单元，用于控制至少一个激光束的偏振状态。

    SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT, AND LASER APPARATUS
    5.
    发明申请
    SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT, AND LASER APPARATUS 审中-公开
    用于产生极光紫外线灯和激光装置的系统和方法

    公开(公告)号：US20140124685A1

    公开(公告)日：2014-05-08

    申请号：US14152813

    申请日：2014-01-10

    Applicant: GIGAPHOTON, INC.

    Inventor： Tatsuya YANAGIDA ,  Osamu WAKABAYASHI

    IPC: H05G2/00 ,  H01S3/10

    CPC classification number: H01S3/10061 ,  H01S3/08054 ,  H01S3/08059 ,  H01S3/2308 ,  H01S3/2383 ,  H01S2301/20 ,  H05G2/003 ,  H05G2/008

    Abstract: An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.

    Abstract translation: 可以提供与激光装置一起使用的极紫外光发生系统，并且极紫外光发生系统可以包括：包括至少一个用于至少一个激光束的窗口的室，以及用于将目标材料供应到 房间 以及设置在激光束路径上的至少一个偏振控制单元，用于控制至少一个激光束的偏振状态。

    EXTREME ULTRAVIOLET LIGHT GENERATION METHOD
    6.
    发明申请
    EXTREME ULTRAVIOLET LIGHT GENERATION METHOD 审中-公开

    公开(公告)号：US20190159327A1

    公开(公告)日：2019-05-23

    申请号：US16239746

    申请日：2019-01-04

    Applicant: Gigaphoton Inc.

    Inventor： Tatsuya YANAGIDA

    IPC: H05G2/00

    CPC classification number: H05G2/006 ,  H05G2/00 ,  H05G2/008

    Abstract: An extreme ultraviolet light generation method according to one aspect of the present disclosure includes outputting a droplet to a first laser light irradiation region that is a region different from a plasma generation region, irradiating the droplet that reaches the first laser light irradiation region with first laser light to generate a deformed liquid target, irradiating the deformed liquid target that reaches a second laser light irradiation region that is a region different from the plasma generation region with second laser light to generate a fragment jet target, and irradiating at least a part of the fragment jet target that reaches the plasma generation region with third laser light that propagates in a direction intersecting a propagation direction of the second laser light.

    EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
    8.
    发明申请
    EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 审中-公开

    公开(公告)号：US20180242441A1

    公开(公告)日：2018-08-23

    申请号：US15956983

    申请日：2018-04-19

    Applicant: Gigaphoton Inc.

    Inventor： Tatsuya YANAGIDA ,  Osamu WAKABAYASHI

    IPC: H05G2/00 ,  H01S3/223 ,  H01S3/23 ,  H01S3/107 ,  H01S3/06 ,  H01S3/08 ,  H01S3/11 ,  H01S3/16 ,  H01S3/00

    Abstract: An extreme ultraviolet light (EUV) generation system is configured to improve conversion efficiency of energy of a laser system to EUV energy by improving the efficiency of plasma generation. The EUV generation system includes a target generation unit configured to output a target toward a plasma generation region in a chamber. The laser system is configured to generate a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that the target is irradiated with the first pre-pulse laser beam, the second pre-pulse laser beam, and the main pulse laser beam in this order. In addition, the EUV generation system includes a controller configured to control the laser system so that a fluence of the second pre-pulse laser beam is equal to or higher than 1 J/cm2 and equal to or lower than a fluence of the main pulse laser beam.

    EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS
    9.
    发明申请
    EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS 审中-公开

    公开(公告)号：US20180146536A1

    公开(公告)日：2018-05-24

    申请号：US15860137

    申请日：2018-01-02

    Applicant: Gigaphoton Inc.

    Inventor： Toru SUZUKI ,  Tamotsu ABE ,  Osamu WAKABAYASHI ,  Tatsuya YANAGIDA

    IPC: H05G2/00 ,  G03F7/20

    CPC classification number: H05G2/008 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/005

    Abstract: An extreme ultraviolet light generation apparatus may include: a chamber including a plasma generation region to which a target is supplied, the target being turned into plasma so that extreme ultraviolet light is generated in the chamber; a target supply part configured to supply the target to the plasma generation region by outputting the target as a droplet into the chamber; a droplet detector configured to detect the droplet traveling from the target supply part to the plasma generation region; an imaging part configured to capture an image of an imaging region containing the plasma generation region in the chamber; and a controller configured to control an imaging timing at which the imaging part captures the image of the imaging region, based on a detection timing at which the droplet detector detects the droplet.

    SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT, AND LASER APPARATUS
    10.
    发明申请
    SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT, AND LASER APPARATUS 审中-公开
    用于产生极光紫外线灯和激光装置的系统和方法

    公开(公告)号：US20170063020A1

    公开(公告)日：2017-03-02

    申请号：US15352543

    申请日：2016-11-15

    Applicant: GIGAPHOTON INC.

    Inventor： Tatsuya YANAGIDA ,  Osamu WAKABAYASHI

    IPC: H01S3/10 ,  H05G2/00

    CPC classification number: H01S3/10061 ,  H01S3/08054 ,  H01S3/08059 ,  H01S3/2308 ,  H01S3/2383 ,  H01S2301/20 ,  H05G2/003 ,  H05G2/008

    Abstract: An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.

    Abstract translation: 可以提供与激光装置一起使用的极紫外光发生系统，并且极紫外光发生系统可以包括：包括至少一个用于至少一个激光束的窗口的室，以及用于将目标材料供应到 房间 以及设置在激光束路径上的至少一个偏振控制单元，用于控制至少一个激光束的偏振状态。

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