公开(公告)号：US20220148843A1

公开(公告)日：2022-05-12

申请号：US17092250

申请日：2020-11-07

Applicant: Applied Materials, Inc.

Inventor： Costel Biloiu ,  Jay R. Wallace ,  Kevin M. Daniels ,  Frank Sinclair ,  Christopher Campbell

IPC: H01J37/08 ,  H01J37/32

Abstract: An extraction plate for an ion beam system. The extraction plate may include an insulator body that includes a peripheral portion, to connect to a first side of a plasma chamber, and further includes a central portion, defining a concave shape. As such, an extraction aperture may be arranged along a first surface of the central portion, where the first surface is oriented at a high angle with respect to the first side. The extraction plate may further include a patterned electrode, comprising a first portion and a second portion, affixed to an outer side of the insulator body, facing away from the plasma chamber, wherein the first portion is separated from the second portion by an insulating gap.

公开(公告)号：US20210305001A1

公开(公告)日：2021-09-30

申请号：US16828886

申请日：2020-03-24

Applicant: Applied Materials, Inc.

Inventor： Costel Biloiu ,  Adam Calkins ,  Alexander C. Kontos ,  James J. Howarth

IPC: H01J27/02 ,  H01J37/08 ,  H01J37/317

Abstract: Disclosed herein are approaches for adjusting extraction slits of an extraction plate using a set of adjustable beam blockers. In one approach, an ion extraction optics may include an extraction plate including a first opening and a second opening, and a first beam blocker extending over the first opening and a second beam blocker extending over the second opening. Each of the first and second beam blockers may include an inner slit defined by a first distance between an inner edge and the extraction plate, and an outer slit defined by a second distance between an outer edge and the extraction plate, wherein the first and second beam blockers are movable to vary at least one of the first distance and the second distance. As a result, extraction through the inner and outer slits of ion beamlets characterized by similar mean angles may be achieved.

公开(公告)号：US20210035779A1

公开(公告)日：2021-02-04

申请号：US16524646

申请日：2019-07-29

Applicant: APPLIED Materials, Inc.

Inventor： Costel Biloiu ,  Appu Naveen Thomas ,  Tyler Rockwell ,  Frank Sinclair ,  Christopher Campbell

IPC: H01J37/32 ,  H01J37/08

Abstract: An ion beam processing apparatus may include a plasma chamber, and a plasma plate, disposed alongside the plasma chamber, where the plasma plate defines a first extraction aperture. The apparatus may include a beam blocker, disposed within the plasma chamber and facing the extraction aperture. The apparatus may further include a non-planar electrode, disposed adjacent the beam blocker and outside of the plasma chamber; and an extraction plate, disposed outside the plasma plate, and defining a second extraction aperture, aligned with the first extraction aperture.

公开(公告)号：US20240128052A1

公开(公告)日：2024-04-18

申请号：US17964621

申请日：2022-10-12

Applicant: Applied Materials, Inc.

Inventor： Costel Biloiu ,  Adam Calkins ,  Benjamin Alexandrovich ,  Solomon Belangedi Basame ,  Kevin M. Daniels

IPC: H01J37/32 ,  H05H1/46

CPC classification number: H01J37/3211 ,  H05H1/4652

Abstract: An antenna assembly, comprising: an antenna; a dielectric enclosure surrounding the antenna; and a Faraday shield, disposed around the antenna, and arranged between the antenna and the dielectric enclosure, wherein the Faraday shield comprises a non-uniform opacity along an antenna axis of the antenna, wherein a first opacity of the Faraday shield at a first position along the antenna axis is greater than a second opacity of the Faraday shield at a second position along the antenna axis of the antenna.

公开(公告)号：US20230124509A1

公开(公告)日：2023-04-20

申请号：US17503334

申请日：2021-10-17

Applicant: Applied Materials, Inc.

Inventor： Costel Biloiu ,  Jay R. Wallace ,  Solomon Belangedi Basame ,  Kevin R. Anglin ,  Tyler Rockwell

IPC: H01J37/32

Abstract: An extraction assembly may include an extraction plate for placement along a side of a plasma chamber, and having an extraction aperture, elongated along a first direction, and having an aperture height, extending along a second direction, perpendicular to the first direction. The extraction plate defines an inner surface along the extraction aperture, lying in a first plane. A beam blocker is disposed over the extraction aperture, and has an outer surface, disposed in a second plane, different than the first plane. As such, the beam blocker overlaps with the extraction plate along a first edge of the extraction aperture by a first overlap distance, and overlaps with the extraction plate along a second edge of the extraction aperture by a second overlap distance, so as to define a first extraction slit, along the first edge, and a second extraction slit along the second edge.

公开(公告)号：US11361935B2

公开(公告)日：2022-06-14

申请号：US17092250

申请日：2020-11-07

Applicant: Applied Materials, Inc.

Inventor： Costel Biloiu ,  Jay R. Wallace ,  Kevin M. Daniels ,  Frank Sinclair ,  Christopher Campbell

IPC: H01J37/08 ,  H01J37/32

Abstract: An extraction plate for an ion beam system. The extraction plate may include an insulator body that includes a peripheral portion, to connect to a first side of a plasma chamber, and further includes a central portion, defining a concave shape. As such, an extraction aperture may be arranged along a first surface of the central portion, where the first surface is oriented at a high angle with respect to the first side. The extraction plate may further include a patterned electrode, comprising a first portion and a second portion, affixed to an outer side of the insulator body, facing away from the plasma chamber, wherein the first portion is separated from the second portion by an insulating gap.

公开(公告)号：US20210391155A1

公开(公告)日：2021-12-16

申请号：US17160042

申请日：2021-01-27

Applicant: Applied Materials, Inc.

Inventor： Christopher Campbell ,  Costel Biloiu ,  Peter F. Kurunczi ,  Jay R. Wallace ,  Kevin M. Daniels ,  Kevin T. Ryan ,  Minab B. Teferi ,  Frank Sinclair ,  Joseph C. Olson

IPC: H01J37/32

Abstract: A processing system may include a plasma chamber operable to generate a plasma, and an extraction assembly, arranged along a side of the plasma chamber. The extraction assembly may include an extraction plate including an extraction aperture, the extraction plate having a non-planar shape, and generating an extracted ion beam at a high angle of incidence with respect to a perpendicular to a plane of a substrate, when the plane of the substrate is arranged parallel to the side of the plasma chamber.

公开(公告)号：US20200294755A1

公开(公告)日：2020-09-17

申请号：US16354638

申请日：2019-03-15

Applicant: APPLIED Materials, Inc.

Inventor： Frank Sinclair ,  Costel Biloiu ,  Joseph C. Olson ,  Alexandre Likhanskii

IPC: H01J37/05 ,  H01J37/147 ,  H01J37/317

Abstract: An apparatus may include a housing including an entrance aperture, to receive an ion beam. The apparatus may include an exit aperture, disposed in the housing, downstream to the entrance aperture, the entrance aperture and the exit aperture defining a beam axis, extending therebetween. The apparatus may include an electrodynamic mass analysis assembly disposed in the housing and comprising an upper electrode assembly, disposed above the beam axis, and a lower electrode assembly, disposed below the beam axis. The apparatus may include an AC voltage assembly, electrically coupled to the upper electrode assembly and the lower electrode assembly, wherein the upper electrode assembly is arranged to receive an AC signal from the AC voltage assembly at a first phase angle, and wherein the lower electrode assembly is arranged to receive the AC signal at a second phase angle, the second phase angle 180 degrees shifted from the first phase angle.

公开(公告)号：US20200150325A1

公开(公告)日：2020-05-14

申请号：US16228205

申请日：2018-12-20

Applicant: APPLIED Materials, Inc.

Inventor： Joseph C. Olson ,  Ludovic Godet ,  Costel Biloiu

IPC: G02B5/18

Abstract: Optical grating components and methods of forming are provided. In some embodiments, a method includes providing a substrate, and etching a plurality of trenches into the substrate to form an optical grating. The optical grating may include a plurality of angled trenches, wherein a depth of a first trench of the plurality of trenches varies between at least one of the following: a first lengthwise end of the first trench and a second lengthwise end of the first trench, and between a first side of the first trench and a second side of the first trench.