公开(公告)号：US20150070678A1

公开(公告)日：2015-03-12

申请号：US14395454

申请日：2013-04-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Theodorus Petrus Maria Cadee ,  Sander Christiaan Broers ,  Sven Antoin Johan Hol ,  Yang-Shan Huang ,  Antonius Franciscus Johannes De Groot ,  Bastiaan Lambertus Wilhelmus Marinus Van De Ven

IPC: G03F7/20

CPC classification number: G03F7/70766 ,  G03F7/70533 ,  G03F7/70758 ,  G03F7/709

Abstract: A lithographic apparatus comprises a system. The system comprises a first part, a second part and an energy absorbing element. The second part is configured to move relatively to the first part. The system has a gap located between the first part and the second part during an operation mode of the system. The energy absorbing element is for absorbing energy between the first part and the second part when the first part and the second part crash onto each other in a failure mode of the system. The energy absorbing element is outside the gap.

Abstract translation: 光刻设备包括一个系统。 该系统包括第一部分，第二部分和能量吸收元件。 第二部分被配置为相对于第一部分移动。 该系统在系统的操作模式期间具有位于第一部分和第二部分之间的间隙。 当第一部分和第二部分在系统的故障模式下彼此碰撞时，能量吸收元件用于在第一部分和第二部分之间吸收能量。 能量吸收元件在间隙之外。

公开(公告)号：US11874607B2

公开(公告)日：2024-01-16

申请号：US17606493

申请日：2020-04-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrey Nikipelov ,  Antonius Franciscus Johannes De Groot

IPC: G03F7/00 ,  H01L21/687

CPC classification number: G03F7/707 ,  H01L21/6875 ,  H01L21/68757

Abstract: A method for providing a wear-resistant material on a body. A composite body that may be obtained by the method. The composite body may be a substrate holder or a reticle clamp for use in a lithographic apparatus. The method includes providing a body made of glass, ceramic or glass-ceramic; providing a wear-resistant material having a hardness of more than 20 GPa; and brazing or laser welding the wear-resistant material to the body.

公开(公告)号：US11421729B2

公开(公告)日：2022-08-23

申请号：US17421694

申请日：2019-12-12

Applicant: ASML Netherlands B.V.

Inventor： Erwin Andreas Bernardus Mulder ,  Krijn Frederik Bustraan ,  Antonius Franciscus Johannes De Groot ,  Rinze Koolstra ,  Paul Peter Anna Antonius Brom

IPC: F16C11/12 ,  G03F7/20

Abstract: The invention relates to elastic guiding device to support a mass with respect to a base in a support direction, wherein the stiffness in support direction compared to stiffness in other direction, for example the stiffness in vertical direction compared to the stiffness in horizontal directions is substantially increased. The invention further relates to a positioning device comprising at least one elastic guiding device, and a lithographic apparatus comprising such positioning device.

公开(公告)号：US10684558B2

公开(公告)日：2020-06-16

申请号：US16343569

申请日：2017-09-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Pim Jozef Hendrik Duijsens ,  Antonius Franciscus Johannes De Groot

IPC: G03F7/20 ,  H01L21/68 ,  H02K41/03

Abstract: A motor assembly includes linear motors, each linear motor configured to generate a driving force in a driving direction and each having a first electromagnetic assembly and a second electromagnetic assembly, configured to co-operate with the first electromagnetic assembly, for generating the driving force, wherein the first electromagnetic assembly and the second electromagnetic assembly face each other and define a gap between each other in a direction perpendicular to the driving direction. A first interface connects the first electromagnetic assemblies to a common member. A second interface connects the second electromagnetic assemblies to the object to be driven. The first and second electromagnetic assemblies are stacked in the direction perpendicular to the driving direction, and the first and/or second interface is configured to enable a relative displacement between the respective first electromagnetic assemblies and the second electromagnetic assemblies in the direction perpendicular to the driving direction.

公开(公告)号：US20180267414A1

公开(公告)日：2018-09-20

申请号：US15984040

申请日：2018-05-18

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Santiago E. DELPUERTO ,  Antonius Franciscus Johannes De Groot ,  Kenneth C. HENDERSON ,  Raymond Wilhelmus Louis LAFARRE ,  Matthew Lipson ,  Louis John Markoya ,  Tammo Uitterdijk ,  Ronald Van Der Wilk ,  Johannes Petrus Martinus Bernardus Vermeulen

IPC: G03F7/20 ,  H01L21/67 ,  H01L21/683 ,  H01L21/687

CPC classification number: G03F7/70875 ,  G03F7/70708 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6875

Abstract: A lithographic apparatus is provided. The lithographic apparatus includes a reticle and an electrostatic clamp configured to releasably hold the reticle. The electrostatic clamp includes a first substrate having opposing first and second surfaces, a plurality of burls located on the first surface and configured to contact the reticle, a second substrate having opposing first and second surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

公开(公告)号：US09507275B2

公开(公告)日：2016-11-29

申请号：US14403114

申请日：2013-05-17

Applicant: ASML Netherlands B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Adrianus Hendrik Koevoets ,  Sjoerd Nicolaas Lambertus Donders ,  Menno Fien ,  Antonius Franciscus Johannes De Groot ,  Christiaan Alexander Hoogendam ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Martijn Houben ,  Jan Steven Christiaan Westerlaken ,  Jim Vincent Overkamp ,  Maarten Van Beijnum

IPC: G03B27/58 ,  G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70733

Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.

Abstract translation: 用于光刻设备的支撑设备具有物体保持器和物体保持器径向外侧的提取体。 对象持有者被配置为支持对象。 提取体包括提取开口，其构造成从支撑装置的顶表面提取流体。 提取体与物体保持器间隔开，使得提取体基本上与物体保持器分离。 提取体包括突出部，其被构造为使得其围绕物体保持器并且使得在使用中一层液体保持在突出部上并与支撑在物体保持器上的物体接触。

公开(公告)号：US09389518B2

公开(公告)日：2016-07-12

申请号：US13686854

申请日：2012-11-27

Applicant: ASML Netherlands B.V.

Inventor： Antonius Franciscus Johannes De Groot ,  Raymond Wilhelmus Louis Lafarre ,  Yang-Shan Huang ,  Sander Christiaan Broers ,  Peter Laurentius Maria Ros

IPC: G03F7/20 ,  G03B27/58

CPC classification number: G03F7/70758 ,  G03B27/58 ,  G03F7/70775

Abstract: A movable stage system is configured to support an object. The stage system comprises an object table configured to support the object and an object table support defining an object table support surface configured to support the object table. The object table support comprises at least one first actuator to drive the object table support in a first driving direction substantially parallel to the object table support surface. In a projection on a plane parallel to the object table support surface the at least one actuator is spaced with respect to the object table in a direction perpendicular to the first driving direction such that the risk on slip between the object table support and the object table supported thereon is decreased.

Abstract translation: 可移动台系统被配置为支撑物体。 舞台系统包括被配置为支撑对象的对象表和定义被配置为支持对象表的对象表支持表面的对象表支持。 物体台支撑件包括至少一个第一致动器，以在基本上平行于物体台支撑表面的第一驱动方向上驱动物体台支撑件。 在与物体台支撑表面平行的平面上的突起中，至少一个致动器在垂直于第一驱动方向的方向上相对于物体台间隔开，使得物体台支撑件和物体台之间的滑动风险 支撑在其上。

公开(公告)号：US20150109599A1

公开(公告)日：2015-04-23

申请号：US14403114

申请日：2013-05-17

Applicant: ASML Netherlands B.V.

Inventor： Adrianus Hendrik Koevoets ,  Sjoerd Nicolaas Lambertus Donders ,  Menno Fien ,  Antonius Franciscus Johannes De Groot ,  Christiaan Alexander Hoogendam ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Martijn Houben ,  Raymond Wilhelmus Louis Laffarre ,  Jan Steven Christiaan Westerlaken ,  Jim Vincent Overkamp ,  Maarten Van Beijnum ,  Robert De Jong

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70733

Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.

Abstract translation: 用于光刻设备的支撑设备具有物体保持器和物体保持器径向外侧的提取体。 对象持有者被配置为支持对象。 提取体包括提取开口，其构造成从支撑装置的顶表面提取流体。 提取体与物体保持器间隔开，使得提取体基本上与物体保持器分离。 提取体包括突出部，其被构造为使得其围绕物体保持器并且使得在使用中一层液体保持在突出部上并与支撑在物体保持器上的物体接触。