公开(公告)号：US11003095B2

公开(公告)日：2021-05-11

申请号：US16332002

申请日：2017-08-31

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Krijn Frederik Bustraan ,  Yang-Shan Huang ,  Antonius Franciscus Johannes De Groot ,  Minkyu Kim ,  Jasper Anne Frido Marikus Simons ,  Theo Anjes Maria Ruijl ,  Ronald Josephus Maria Lamers

IPC: G03F7/20

Abstract: A positioning system for positioning an object. The positioning system includes a stage, a balance mass and an actuator system. The stage is for holding the object. The actuator system is arranged to drive the stage in a first direction while driving the balance mass in a second direction opposite to the first direction. The stage is moveable in the first direction in a movement range. When the stage is moving in the first direction and is at an end of the movement range, the positioning system is arranged to collide the stage frontally into the balance mass.

公开(公告)号：US11421729B2

公开(公告)日：2022-08-23

申请号：US17421694

申请日：2019-12-12

Applicant: ASML Netherlands B.V.

Inventor： Erwin Andreas Bernardus Mulder ,  Krijn Frederik Bustraan ,  Antonius Franciscus Johannes De Groot ,  Rinze Koolstra ,  Paul Peter Anna Antonius Brom

IPC: F16C11/12 ,  G03F7/20

Abstract: The invention relates to elastic guiding device to support a mass with respect to a base in a support direction, wherein the stiffness in support direction compared to stiffness in other direction, for example the stiffness in vertical direction compared to the stiffness in horizontal directions is substantially increased. The invention further relates to a positioning device comprising at least one elastic guiding device, and a lithographic apparatus comprising such positioning device.

公开(公告)号：US10530111B2

公开(公告)日：2020-01-07

申请号：US15903392

申请日：2018-02-23

Applicant: ASML Netherlands B.V.

Inventor： Sudhir Srivastava ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen ,  Nan Lin ,  Sjoerd Nicolaas Lambertus Donders ,  Krijn Frederik Bustraan ,  Petrus Wilhelmus Smorenburg ,  Gerrit Jacobus Hendrik Brussaard

IPC: G03F7/20 ,  H01S3/00 ,  H05G2/00 ,  G03F1/84 ,  G01N21/956 ,  G02F1/35 ,  G01N21/88

Abstract: Disclosed is gas delivery system which is suitable for a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a gas delivery element delivers gas in a first direction. The gas delivery element has an optical input and an optical input, defining an optical path running in a second direction. The first direction is arranged relative to the second direction at an angle that is not perpendicular or parallel. Also disclosed is a gas delivery element having a gas jet shaping device, or a pair of gas delivery elements, one of which delivers a second gas, such that the gas jet shaping device or second gas is operable to modify a flow profile of the gas such that the number density of the gas falls sharply.

公开(公告)号：US20190212657A1

公开(公告)日：2019-07-11

申请号：US16351771

申请日：2019-03-13

Applicant: ASML Netherlands B.V.

Inventor： Sudhir SRIVASTAVA ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen ,  Nan Lin ,  Sjoerd Nicolaas Lambertus Donders ,  Krijn Frederik Bustraan ,  Petrus Wilhelmus Smorenburg ,  Gerrit Jacobus Hendrik Brussaard

IPC: G03F7/20 ,  G01N21/956 ,  G03F1/84

CPC classification number: G03F7/7085 ,  G01N21/8806 ,  G01N21/956 ,  G02F2001/354 ,  G03F1/84 ,  G03F7/70616 ,  G03F7/7065 ,  G03F7/70883 ,  H01S3/00 ,  H01S3/0092 ,  H05G2/008

Abstract: Disclosed is a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a pump radiation source is operable to emit pump radiation at a high harmonic generation gas medium thereby exciting the high harmonic generation gas medium within a pump radiation interaction region so as to generate the high harmonic radiation and an ionization radiation source is operable to emit ionization radiation at the high harmonic generation gas medium to ionize a gas at an ionization region between the pump radiation interaction region and an optical output of the illumination source.