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    METHODS OF PRODUCING SLANTED GRATINGS WITH VARIABLE ETCH DEPTHS
    21.
    发明申请
    METHODS OF PRODUCING SLANTED GRATINGS WITH VARIABLE ETCH DEPTHS 有权

    公开(公告)号：US20210141131A1

    公开(公告)日：2021-05-13

    申请号：US17072261

    申请日：2020-10-16

    Applicant: Applied Materials, Inc.

    Inventor： Morgan Evans ,  Rutger Meyer Timmerman Thijssen ,  Joseph C. Olson

    IPC: G02B5/18 ,  B29D11/00 ,  G02B6/02

    Abstract: Methods of producing gratings with trenches having variable height are provided. In one example, a method of forming a diffracted optical element may include providing an optical grating layer over a substrate, patterning a hardmask over the optical grating layer, and forming a sacrificial layer over the hardmask, the sacrificial layer having a non-uniform height measured from a top surface of the optical grating layer. The method may further include etching a plurality of angled trenches into the optical grating layer to form an optical grating, wherein a first depth of a first trench of the plurality of trenches is different than a second depth of a second trench of the plurality of trenches.

    Optical component having depth modulated angled gratings and method of formation
    22.
    发明授权
    Optical component having depth modulated angled gratings and method of formation 有权

    公开(公告)号：US10935799B2

    公开(公告)日：2021-03-02

    申请号：US16168185

    申请日：2018-10-23

    Applicant: APPLIED Materials, Inc.

    Inventor： Rutger Meyer Timmerman Thijssen ,  Ludovic Godet ,  Morgan Evans ,  Joseph C. Olson

    IPC: G02B5/18 ,  G02B27/09 ,  G02B27/01

    Abstract: A method of forming an optical grating component. The method may include providing a substrate, the substrate comprising an underlayer and a hard mask layer, disposed on the underlayer. The method may include patterning the hard mask layer to define a grating field and etching the underlayer within the grating field to define a variable height of the underlayer along a first direction, the first direction being parallel to a plane of the substrate. The method may include forming an optical grating within the grating field using an angled ion etch, the optical grating comprising a plurality of angled structures, disposed at a non-zero angle of inclination with respect to a perpendicular to a plane of the substrate, wherein the plurality of angled structures define a variable depth along the first direction, based upon the variable height of the underlayer.

    Methods of producing slanted gratings with variable etch depths
    23.
    发明授权
    Methods of producing slanted gratings with variable etch depths 有权

    公开(公告)号：US10823888B1

    公开(公告)日：2020-11-03

    申请号：US16681260

    申请日：2019-11-12

    Applicant: APPLIED Materials, Inc.

    Inventor： Morgan Evans ,  Rutger Meyer Timmerman Thijssen ,  Joseph C. Olson

    IPC: G02B5/18 ,  B29D11/00 ,  G02B6/02

    Abstract: Methods of producing gratings with trenches having variable height are provided. In one example, a method of forming a diffracted optical element may include providing an optical grating layer over a substrate, patterning a hardmask over the optical grating layer, and forming a sacrificial layer over the hardmask, the sacrificial layer having a non-uniform height measured from a top surface of the optical grating layer. The method may further include etching a plurality of angled trenches into the optical grating layer to form an optical grating, wherein a first depth of a first trench of the plurality of trenches is different than a second depth of a second trench of the plurality of trenches.

    SYSTEM AND METHOD FOR DETECTING ETCH DEPTH OF ANGLED SURFACE RELIEF GRATINGS
    25.
    发明申请
    SYSTEM AND METHOD FOR DETECTING ETCH DEPTH OF ANGLED SURFACE RELIEF GRATINGS 审中-公开

    公开(公告)号：US20200158495A1

    公开(公告)日：2020-05-21

    申请号：US16240301

    申请日：2019-01-04

    Applicant: APPLIED Materials, Inc.

    Inventor： Joseph C. Olson ,  Ludovic Godet ,  Rutger Meyer Timmerman Thijssen ,  Morgan Evans

    IPC: G01B11/22 ,  G02B5/18 ,  C03C15/00

    Abstract: Optical grating components and methods of forming are provided. In some embodiments, a method includes providing an optical grating layer, and forming an optical grating in the optical grating layer, wherein the optical grating comprises a plurality of angled trenches disposed at a non-zero angle of inclination with respect to a perpendicular to a plane of the optical grating layer. The method may further include delivering light from a light source into the optical grating layer, and measuring at least one of: an undiffracted portion of the light exiting the optical grating layer, and a diffracted portion of the light exiting the optical grating layer.

    Controlling etch angles by substrate rotation in angled etch tools
    27.
    发明授权
    Controlling etch angles by substrate rotation in angled etch tools 有权

    公开(公告)号：US10302826B1

    公开(公告)日：2019-05-28

    申请号：US15993135

    申请日：2018-05-30

    Applicant: Applied Materials, Inc.

    Inventor： Rutger Meyer Timmerman Thijssen ,  Morgan Evans ,  Joseph C. Olson

    IPC: G02B5/18 ,  H01J37/305 ,  H01J37/20

    Abstract: Embodiments described herein relate to methods of forming gratings with different slant angles on a substrate and forming gratings with different slant angles on successive substrates using angled etch systems. The methods include positioning portions of substrates retained on a platen in a path of an ion beam. The substrates have a grating material disposed thereon. The ion beam is configured to contact the grating material at an ion beam angle ϑ relative to a surface normal of the substrates and form gratings in the grating material. The substrates are rotated about an axis of the platen resulting in rotation angles ϕ between the ion beam and a surface normal of the gratings. The gratings have slant angles ϑ′ relative to the surface normal of the substrates. The rotation angles ϕ selected by an equation ϕ=cos−1 (tan(ϑ′)/tan(ϑ)).

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