公开(公告)号：US10338482B2

公开(公告)日：2019-07-02

申请号：US15961061

申请日：2018-04-24

申请人： NIKON CORPORATION

发明人： Yuichi Shibazaki

IPC分类号： G03B27/58 ,  G03F7/20 ,  G03F9/00

摘要： In an exposure operation, as a second stage is moved in a direction parallel to a predetermined plane, another head different from a plurality of heads faces a grating section instead of one head of the plurality of heads, and positional information of the second stage is measured by multiple heads including remaining heads and the another head, the remaining heads excluding the one head of the plurality of heads, and correction information is acquired for the positional information obtained from the another head, based on the positional information obtained from the plurality of heads including the one head.

公开(公告)号：US10261428B2

公开(公告)日：2019-04-16

申请号：US15185626

申请日：2016-06-17

申请人： ASML NETHERLANDS B.V.

发明人： Joeri Lof ,  Erik Theodorus Maria Bijlaart ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC分类号： G03B27/58 ,  G03F7/20

摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

公开(公告)号：US10114296B2

公开(公告)日：2018-10-30

申请号：US15630449

申请日：2017-06-22

申请人： NIKON CORPORATION

发明人： Koichi Sakata ,  Hiroyoshi Asaumi

IPC分类号： G03B27/58 ,  G03F7/20 ,  G05B19/402 ,  G05B19/19

摘要： A synthetic controlled variable is obtained by obtaining a synthetic quantity using measurement results of a first and a second measuring instruments and corresponding gains (or transfer function) and synthesizing the synthetic quantity and one of the measurement results of the first and the second measuring instruments, respectively, via a high pass filter and a low pass filter. A feedback control system is structured that obtains a control input using a synthetic controlled variable and a desired value, and gives a plant the control input. This makes adding of a high pass filter for removing offset of installation position of the first and the second measuring instruments no longer necessary, and allows a driving system which controls robust driving in a high bandwidth of a plate stage regardless of bandwidth in which resonance appears to be designed.

公开(公告)号：US10073359B2

公开(公告)日：2018-09-11

申请号：US15382825

申请日：2016-12-19

申请人： NIKON CORPORATION

发明人： Yuichi Shibazaki

IPC分类号： G03B27/42 ,  G03B27/58 ,  G03B27/32 ,  G03F7/20

CPC分类号： G03F7/70775 ,  G03F7/70341 ,  G03F7/70725 ,  G03F7/7085

摘要： An exposure apparatus exposes a substrate with illumination light via a projection optical system, and includes a stage disposed below the projection optical system and holds the substrate; an encoder system in which one of a grating section and a head is provided at the stage and the other of the grating section and the head is provided at a frame member to be disposed above the stage, on a lower end side of the projection optical system, and irradiates the grating section with a measurement beam via the head and measures positional information of the stage with a plurality of the heads that face the grating section; and a controller coupled to the encoder system, that controls a drive system based on positional information measured with the encoder system while compensating for measurement error of the encoder system related to measurement direction of the positional information by the heads.

公开(公告)号：US10067428B2

公开(公告)日：2018-09-04

申请号：US15384489

申请日：2016-12-20

申请人： NIKON CORPORATION

发明人： Yuichi Shibazaki

IPC分类号： G03B27/42 ,  G03B27/58 ,  G03B27/32 ,  G03F7/20

CPC分类号： G03F7/70775 ,  G03F7/70341 ,  G03F7/70725 ,  G03F7/7085

摘要： A device manufacturing method develops a substrate that has been exposed with illumination light via a projection optical system. The exposing includes holding the substrate with a stage below the projection optical system; in an encoder system in which one of a grating section and a head is provided at the stage and the other of the grating section and the head is provided at a frame member to be disposed above the stage, on a lower end side of the projection optical system, and which irradiates the grating section with a measurement beam via the head, measuring positional information of the stage with a plurality of the heads that face the grating section; moving the stage based on the positional information measured with the encoder system while compensating for a measurement error of the encoder system related to a measurement direction of the positional information by the heads.

公开(公告)号：US20180202842A1

公开(公告)日：2018-07-19

申请号：US15919519

申请日：2018-03-13

申请人： NIKON CORPORATION

发明人： Zhigiang LIU

IPC分类号： G01D5/34 ,  G03B27/58 ,  G01D5/347 ,  G03F7/20 ,  G01D5/38

摘要： An encoder, which measures a relative moving amount of a second member relative to a first member, includes: a diffraction grating provided on the first member; a light-incident optical member causing a measuring light to come into a grating pattern surface of the diffraction grating substantially perpendicularly; a first reflecting member provided on the second member and reflecting a diffracted light generated from the diffraction grating; a first direction-changing member changing a direction of the diffracted light; a first photo-detector detecting an interference light generated by interference between a double diffracted light and other diffracted light than the double diffracted light or a reference light, the double diffracted light being generated, via diffraction of the diffracted light, from the diffraction grating; and a measuring section which obtains the relative moving amount of the second member relative to the first member by using a detection signal from the first photo-detector.

公开(公告)号：US10018925B2

公开(公告)日：2018-07-10

申请号：US15452445

申请日：2017-03-07

申请人： ASML NETHERLANDS B.V.

发明人： Nicolaas Rudolf Kemper ,  Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Marcel Beckers ,  Marco Polizzi ,  Michel Riepen ,  Anthonie Kuijper ,  Koen Steffens ,  Adrianes Johannes Baeten ,  Anca Mihaela Antonevici

IPC分类号： G03B27/52 ,  G03B27/58 ,  G03B27/60 ,  G03F7/20 ,  B01D19/00

CPC分类号： G03F7/70866 ,  B01D19/0021 ,  G03B27/52 ,  G03F7/70341

摘要： An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.

公开(公告)号：US09983486B2

公开(公告)日：2018-05-29

申请号：US14067503

申请日：2013-10-30

申请人： NIKON CORPORATION

发明人： Yuichi Shibazaki

IPC分类号： G03B27/58 ,  G03F7/20 ,  G03F9/00

CPC分类号： G03F7/70725 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/7085 ,  G03F9/7088

摘要： During the drive of a stage, positional information in a movement plane of a stage is measured by three encoders that include at least one each of an X encoder and a Y encoder of an encoder system, and a controller switches an encoder used for a measurement of positional information of a stage in the movement plane from an encoder to an encoder so that the position of the stage in the movement plane is maintained before and after the switching. Therefore, although the switching of the encoder used for controlling the position of the stage is performed, the position of the stage in the movement plane is maintained before and after the switching, and a correct linkage becomes possible.

公开(公告)号：US09983028B2

公开(公告)日：2018-05-29

申请号：US14397312

申请日：2013-03-14

申请人： NIKON CORPORATION

发明人： Zhigiang Liu

IPC分类号： G01B11/00 ,  G01B11/02 ,  G01B11/14 ,  G03B27/32 ,  G03B27/58 ,  G03B27/62 ,  H02K7/00 ,  H02K41/02 ,  G01D5/347 ,  G01D5/38 ,  G02B5/18 ,  G03F7/20

CPC分类号： G01D5/347 ,  G01D5/38 ,  G02B5/1861 ,  G03F7/20

摘要： There is provided an encoder device to measure a relative moving amount between a first and second members. The encoder device includes: a reflective-type diffraction grating on the first member; a light source unit to radiate a measuring light; a first optical member on the second member; a first and second reflecting units on the second member that cause first and third diffracted lights generated via diffraction of the measuring light and having orders different from each other to come into the diffraction grating respectively, and cause second and fourth diffracted lights generated via diffraction of the first and third diffracted lights respectively to come into the first optical member; photo-detectors configured to detect interference lights between two diffracted lights and other light beam respectively; and a measuring unit to obtain the relative moving amount by using detection signals from the photo-detectors.

公开(公告)号：US09977347B2

公开(公告)日：2018-05-22

申请号：US15589270

申请日：2017-05-08

申请人： CANON KABUSHIKI KAISHA

发明人： Kentaro Suzuki ,  Nobushige Korenaga ,  Satoshi Iwatani

IPC分类号： G03B27/42 ,  G03B27/58 ,  G03F7/20

CPC分类号： G03F7/70775 ,  G03F7/0002 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70758

摘要： An apparatus for moving movable part on surface parallel to first and second directions includes single guide to constrain position of the movable part in the second direction and drive mechanism to drive the movable part. The movable part includes first movable member movable in the first direction while being guided by the guide, second movable member having first and second ends, the first end being connected to the first movable member via rotation bearing and moving above the surface, and third movable member movable within range between the first and second ends while being guided by the second movable member. The drive mechanism includes first driver to drive the first end of the second movable member in the first direction, and second driver to drive the second end of the second movable member in the first direction.